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31. 发明授权

US5576247A Thin layer forming method wherein hydrophobic molecular layers preventing a BPSG layer from absorbing moisture 失效
标题翻译：疏水分子层防止BPSG层吸收水分的薄层形成方法
公开(公告)号：US5576247A
公开(公告)日：1996-11-19
申请号：US97231
申请日：1993-07-27
申请人： Kousaku Yano , Masayuki Endo , Yuka Terai , Noboru Nomura , Tomoyasu Murakami , Tetsuya Ueda , Satoshi Ueda
发明人： Kousaku Yano , Masayuki Endo , Yuka Terai , Noboru Nomura , Tomoyasu Murakami , Tetsuya Ueda , Satoshi Ueda
IPC分类号： H01L21/3105 , H01L21/316
CPC分类号： H01L21/3105 , Y10S438/974
摘要： A BPSG layer serving as a silicon oxide layer is formed on a semiconductor substrate 1. Formed on the surface of the BPSG layer is a hydrophobic molecular layer comprising hydrophobic groups such as methyl, ethyl and the like, by a silylation reaction (in which silyl having hydrophobic groups such as methyl groups, ethyl groups and the like, is reacted with OH groups, and in which the hydrophobic groups are substituted with H of the OH groups to generate --O--Si(CH.sub.3).sub.3 or the like). The molecular layer prevents the BPSG layer from absorbing moisture.
摘要翻译：在半导体衬底1上形成用作氧化硅层的BPSG层。在BPSG层的表面上形成疏水性分子层，其通过甲硅烷基化反应（甲基，具有疏水基团如甲基，乙基等与OH基团反应，并且其中疏水基团被H的OH基团取代以产生-O-Si（CH 3）3等）。分子层防止BPSG层吸湿。

32. 发明授权

US5312776A Method of preventing the corrosion of metallic wirings 失效
标题翻译：防止金属布线腐蚀的方法
公开(公告)号：US5312776A
公开(公告)日：1994-05-17
申请号：US977022
申请日：1992-11-16
申请人： Tomoyasu Murakami , Michinari Yamanaka , Kousaku Yano , Masayuki Endo , Noboru Nomura , Staoshi Ueda , Naoto Matsuo , Hiroshi Imai , Masafumi Kubota
发明人： Tomoyasu Murakami , Michinari Yamanaka , Kousaku Yano , Masayuki Endo , Noboru Nomura , Staoshi Ueda , Naoto Matsuo , Hiroshi Imai , Masafumi Kubota
IPC分类号： H01L21/02 , H01L21/3213 , H01L23/532 , H01L71/44
CPC分类号： H01L21/02071 , H01L23/5329 , H01L2924/0002 , Y10S148/131
摘要： According to the method of preventing the corrosion of metallic wirings of the present invention, aluminium alloy wirings are formed on the surface of a substrate with the use of photoresists, and the photoresists are then removed. Thereafter, HMDS (hexamethyl disilazine) serving as a surface-active agent or its derivative is supplied to the aluminium alloy wirings to form hydrophobic molecular layers on the lateral walls of the aluminium alloy wirings.
摘要翻译：根据本发明的防止金属配线的腐蚀的方法，使用光致抗蚀剂在基板的表面上形成铝合金布线，然后除去光致抗蚀剂。此后，将作为表面活性剂或其衍生物的HMDS（六甲基二硅嗪）供给到铝合金布线，以在铝合金布线的侧壁上形成疏水性分子层。

33. 发明授权

US5259922A Drying etching method 失效
标题翻译：干燥蚀刻法
公开(公告)号：US5259922A
公开(公告)日：1993-11-09
申请号：US744583
申请日：1991-08-14
申请人： Atsuhiro Yamano , Tokuhiko Tamaki , Masafumi Kubota , Kenji Harafuji , Noboru Nomura
发明人： Atsuhiro Yamano , Tokuhiko Tamaki , Masafumi Kubota , Kenji Harafuji , Noboru Nomura
IPC分类号： H01L21/311 , H01L21/3213 , H01L21/00
CPC分类号： H01J37/32082 , H01L21/31116 , H01L21/32137
摘要： A dry etching method of a substrate or layer of a semiconductor or other material which includes the steps of providing a metallic chamber having an anode and a cathode which are spaced from each other and mounting the substrate or layer to be etched on the cathode, and applying a potential from a RF power supply to the cathode so that a plasma is generated between the anode and the cathode to produce a bulk region and sheath regions between the cathode and the anode. The frequency of the RF power supply is set at a level higher than 13.56 MHz under which the substrate or layer is subjected to etching with the ions. A polysilicon, SiN or Al alloy layer can be efficiently etched with a Cl-based etching gas.
摘要翻译：一种半导体或其他材料的衬底或层的干蚀刻方法，其包括提供具有阳极和阴极的金属室，所述金属室彼此间隔开并将待蚀刻的衬底或层安装在阴极上，以及将来自RF电源的电势施加到阴极，使得在阳极和阴极之间产生等离子体，以在阴极和阳极之间产生体积区域和鞘区域。 RF电源的频率设定在高于13.56MHz的水平，在该水平下，用离子对衬底或层进行蚀刻。可以用Cl基蚀刻气体有效地蚀刻多晶硅，SiN或Al合金层。

34. 发明授权

US5252430A Fine pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：US5252430A
公开(公告)日：1993-10-12
申请号：US812839
申请日：1991-12-20
申请人： Kazuhiko Hashimoto , Noboru Nomura
发明人： Kazuhiko Hashimoto , Noboru Nomura
IPC分类号： G03F7/004 , G03F7/20 , G03F7/38 , G03C5/00
CPC分类号： G03F7/0045 , G03F7/2059 , G03F7/38 , Y10S430/143
摘要： The fine pattern forming method includes the steps of applying an organic polymer film on a semiconductor substrate and heat treating the same; applying a resin solution (including an acid degradation polymer or an acid reactive monomer, an acid generator capable of generating an acid by irradiation with an electric charged beam, and a silicone resin) on the organic polymer layer and heat treating the same; carrying out a heat treatment after a pattern is written, causing the generated acid to react with the acid degradation polymer or the acid reactive monomer and carrying out a development in an alkaline solution to form a resist pattern; and etching the organic polymer layer using the resist pattern as a mask. The use of the resist layer including the silicone resin, the acid generator, and the acid degradation polymer or the acid reactive monomer enables an accurate fine resist pattern to be formed which has a high sensitivity and dry etching resistance, and in which charging is prevented when a pattern is written by a charged beam.
摘要翻译：精细图案形成方法包括以下步骤：在半导体衬底上施加有机聚合物膜并对其进行热处理; 在有机聚合物层上涂布树脂溶液（包括酸降解聚合物或酸反应性单体，能够通过带电束照射产生酸的酸产生剂和有机硅树脂）并对其进行热处理; 在图案写入之后进行热处理，使所产生的酸与酸降解聚合物或酸反应性单体反应，并在碱性溶液中进行显影以形成抗蚀剂图案; 并使用抗蚀图案作为掩模蚀刻有机聚合物层。使用包含硅树脂，酸产生剂，酸降解聚合物或酸反应性单体的抗蚀剂层，能够形成具有高灵敏度和耐干蚀刻性的精确的抗蚀剂图案，并且防止充电当图案由带电束写入时。

35. 发明授权

US5169494A Fine pattern forming method 失效
标题翻译：精细图案形成方法
公开(公告)号：US5169494A
公开(公告)日：1992-12-08
申请号：US742550
申请日：1991-08-08
申请人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
发明人： Kazuhiko Hashimoto , Taichi Koizumi , Kenji Kawakita , Noboru Nomura
IPC分类号： G03F7/039 , G03F7/09
CPC分类号： G03F7/094 , G03F7/039
摘要： The present invention provides a method of forming a fine pattern comprising the steps of forming on a semiconductor substrate an organic polymer film and heat treating it, forming on the organic polymer film an inorganic film and heat treating it, forming on the inorganic film an electron beam resist film and heat treating it, drawing a pattern on the resist film, developing it to form a resist pattern, and etching the inorganic film and the organic polymer film using the resist pattern as a mask, wherein the improvement comprises using one substance selected from the group consisting of a polyphenylene sulfide, a derivative thereof, and a polymer represented by the formula (I): ##STR1## where n is a positive integer, for forming at least one of the organic polymer film and the electron beam resist film. According to the present invention, it is possible to prevent charging by incident electrons, thereby keeping free of field butting and reduction of overlay accuracy, and to form an accurate and vertical fine resist pattern.
摘要翻译：本发明提供一种形成精细图案的方法，包括以下步骤：在半导体衬底上形成有机聚合物膜并进行热处理，在有机聚合物膜上形成无机膜并进行热处理，在无机膜上形成电子抗蚀剂膜并对其进行热处理，在抗蚀剂膜上绘制图案，将其显影以形成抗蚀剂图案，并使用抗蚀剂图案作为掩模蚀刻无机膜和有机聚合物膜，其中改进包括使用选择的一种物质由聚苯硫醚，其衍生物和由式（I）表示的聚合物组成：其中n为正整数，用于形成至少一个有机聚合物膜和电子光束抗蚀膜。根据本发明，可以防止入射电子的充电，从而保持无间隙对接和降低覆盖精度，并形成精确和垂直的精细抗蚀剂图案。

36. 发明授权

US5057689A Scanning electron microscope and a method of displaying cross sectional profiles using the same 失效
标题翻译：扫描电子显微镜和使用其显示跨部分轮廓的方法
公开(公告)号：US5057689A
公开(公告)日：1991-10-15
申请号：US583541
申请日：1990-09-17
申请人： Noboru Nomura , Hideo Nakagawa , Taichi Koizumi , Kenji Harafuji , Mitsuhiro Okuni , Norimichi Anazawa
发明人： Noboru Nomura , Hideo Nakagawa , Taichi Koizumi , Kenji Harafuji , Mitsuhiro Okuni , Norimichi Anazawa
IPC分类号： H01J37/141 , H01J37/153
CPC分类号： H01J37/141 , H01J37/153
摘要： A scanning electron microscope is disclosed in which an objective lens includes a first pole piece and a second pole piece. The first pole piece is provided with a hole through which an electron beam passes, and is disposed between an electron gun for emitting the electron beam and the second pole piece. The second pole piece has a planar portion on which a specimen is placed, and the second pole piece being mounted on a supporting block movable in a plane substantially perpendicular to the projecting direction of the electron beam.

37. 发明授权

US4948238A Optical projection system 失效
标题翻译：光学投影系统
公开(公告)号：US4948238A
公开(公告)日：1990-08-14
申请号：US321683
申请日：1989-03-10
申请人： Nobuhiro Araki , Takeo Sato , Koichi Kawata , Noboru Nomura , Keisuke Koga
发明人： Nobuhiro Araki , Takeo Sato , Koichi Kawata , Noboru Nomura , Keisuke Koga
IPC分类号： G02B13/00 , G02B13/18 , G02B13/24
CPC分类号： G02B13/18 , G02B13/00 , G02B13/24
摘要： A first lens, a second lens, means and a third lens means are arranged successively in a direction of travel of a ray. The first lens means each comprising a single lens element power. The second lens means has a predetermined negative refracting power. The third lens means has a predetermined positive refracting power. A fourth lens means consisting of a plurality of lens elements follows the third lens means in the direction of travel of the ray and has a predetermined positive refracting power. At least one surface of the first, second, third, and fourth lens elements is aspherical. The follwoing conditions (1), (2), and (3) are satisfied:4f

38. 发明授权

US4745042A Water-soluble photopolymer and method of forming pattern by use of the same 失效
标题翻译：水溶性光聚合物及其形成方法
公开(公告)号：US4745042A
公开(公告)日：1988-05-17
申请号：US724304
申请日：1985-04-17
申请人： Masaru Sasago , Masayuki Endo , Kenichi Takeyama , Noboru Nomura
发明人： Masaru Sasago , Masayuki Endo , Kenichi Takeyama , Noboru Nomura
IPC分类号： G03F7/021 , G03F7/022 , G03F7/09 , G03F7/095 , G03C1/495 , G03C1/52 , G03C1/71 , G03C5/16
CPC分类号： G03F7/022 , G03F7/0215 , G03F7/091 , G03F7/095
摘要： This invention relates to a composition of a water-soluble photopolymer which is synthesized from a water-soluble organic matter, which matter is a base polymer produced and refined particularly by bacterial culture biotechnically and contains at least one of polysaccharides, protein, gelatin, casein, polyvinyl pyrrolidone and polyvinyl alcohol, in particular pullulan which is a natural polysaccharide, and chemicals to add functions to aqueous solution of the base polymer, for example, water-soluble radiation sensitive chemical, crosslinking agent, catalyst, epoxy compound, and a compound possessing bleaching or fading action with respect to radiation.The water-soluble photopolymer can be developed in water, and is high in safety and small in aging, and is expected to be used as the material of single-layer resist or multi-layer resist of high resolution and high resistance, or as the material for contrast enhanced litography. Besides, when it is applied in said pattern forming method, much finer patterns may be formed.
摘要翻译：本发明涉及一种由水溶性有机物合成的水溶性光聚合物组合物，其特征在于生物技术生产和精制而成的基质聚合物，并含有多糖，蛋白质，明胶，酪蛋白中的至少一种，聚乙烯吡咯烷酮和聚乙烯醇，特别是作为天然多糖的支链淀粉，以及赋予基础聚合物水溶液功能的化学品，例如水溶性辐射敏感化学品，交联剂，催化剂，环氧化合物和化合物拥有相对于辐射的漂白或褪色作用。水溶性光聚合物可以在水中显影，安全性高，老化程度低，有望用作高分辨率，高电阻的单层抗蚀剂或多层抗蚀剂的材料，或作为材料对比增强了诉讼。此外，当以所述图案形成方法应用时，可以形成更精细的图案。

39. 发明申请

US20070213930A1 Position Estimation System 审中-公开
标题翻译：位置估算系统
公开(公告)号：US20070213930A1
公开(公告)日：2007-09-13
申请号：US11578328
申请日：2004-05-21
申请人： Kiyomi Sakamoto , Atsushi Iisaka , Atsushi Yamashita , Noboru Nomura , Hiroyuki Ogino , Shigeki Ueda
发明人： Kiyomi Sakamoto , Atsushi Iisaka , Atsushi Yamashita , Noboru Nomura , Hiroyuki Ogino , Shigeki Ueda
IPC分类号： G01C21/00
CPC分类号： G01C21/12 , G01C21/28 , G01C22/006 , G01S19/48
摘要： In a position estimation apparatus, an information acquisition/storage section 3 acquires, when a receiver 1 can track an artificial satellite, a current position obtained from the receiver 1 and an output value from each of pressure sensors 2R and 2L, and then stores at least a travel speed and a travel direction for a user and the obtained output value. Also, when the receiver 1 cannot track the artificial satellite, a locator 4 in the position estimation apparatus retrieves, from the information acquisition/storage section 3, a travel speed and a travel direction of the user based on the output value acquired from each of the sensors 2R and 2L and the output value stored in the information acquisition/storage section 3. Thereafter, the locator 4 estimates a current position of the user based on the retrieved travel speed and travel direction.
摘要翻译：在位置估计装置中，当接收机1能够跟踪人造卫星时，获取从接收机1获得的当前位置和来自压力传感器2 R和2 L的输出值的信息获取/存储部分3，然后存储用户的行驶速度和行驶方向的至少一个以及所获得的输出值。此外，当接收机1不能跟踪人造卫星时，位置估计装置中的定位器4基于从每个接收机1获取的输出值，从信息获取/存储部分3检索用户的行进速度和行进方向传感器2 R和2 L以及存储在信息获取/存储部分3中的输出值。此后，定位器4基于检索到的行驶速度和行驶方向来估计用户的当前位置。

40. 发明申请

US20060009248A1 Mobile communication device containable in ad hoc network 失效
标题翻译：移动通信设备可以在ad hoc网络中包含
公开(公告)号：US20060009248A1
公开(公告)日：2006-01-12
申请号：US10535101
申请日：2004-05-21
申请人： Kiyomi Sakamoto , Atsushi Iisaka , Atsushi Yamashita , Noboru Nomura
发明人： Kiyomi Sakamoto , Atsushi Iisaka , Atsushi Yamashita , Noboru Nomura
IPC分类号： H04Q7/20 , H04B7/00
CPC分类号： H04W72/02 , H04W72/0406 , H04W84/18
摘要： In a mobile communication device 1, when an inquiry packet sent from another mobile communication device 1 for inquiring whether to accept or deny the participation in an ad hoc network is transferred to a work area 13, a transmission/reception control section 12 determines whether a denial flag set in a storage device 6 is 1. When the denial flag is 1, the transmission/reception control section 12 generates a first response for denying the participation in the ad hoc network, and transmits it through a transmission/reception section 14 to the another mobile communication device 1 having transmitted the inquiry packet.
摘要翻译：在移动通信装置1中，当从另一移动通信装置1发送的询问是否接受或拒绝参与自组织网络的查询分组被传送到工作区域13时，发送/接收控制部分12确定是否设置在存储装置6中的拒绝标志为1。当拒绝标志为1时，发送/接收控制部分12生成拒绝参与自组织网络的第一响应，并且通过发送/接收部分14将其发送到已经发送了查询分组的另一个移动通信设备1 。

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