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31. 发明专利

JPH05227926A HIGH-PRESSURE PROCESSING UNIT FOR FOOD OR THE LIKE 失效
公开(公告)号：JPH05227926A
公开(公告)日：1993-09-07
申请号：JP3373192
申请日：1992-02-20
申请人： KOBE STEEL LTD
发明人： INOUE YOICHI , NAOI TOSHIKATSU , YAMAUCHI TAKANORI , KANDA TAKESHI
IPC分类号： A23L3/015 , A61L2/02 , B01J3/04
摘要： PURPOSE:To provide the subject processing unit having a specific structure, designed to maintain safety in terms of food hygiene through blocking contamination with foreign substances in e.g. sterilizing a liquid food, etc., by high-pressure treatment. CONSTITUTION:A high-pressure chamber 23 is internally formed using (A) a cylindrical high-pressure treatment vessel 20 with openings and (B) closure members 21, 22, and (1) a mobile cylindrical partition wall 26 dividing the high- pressure chamber 23 into a pressurizing chamber 29 and a treatment chamber 30 and (2) packings 27, 28 to seal between the chambers 29 and 30 are provided at the top and bottom of the partition wall 26, respectively. A food to be treated 32 packed in the treatment chamber 30 is pressurized through the elastic deformation of the partition wall 26 by the action of a pressurizing medium on the pressurizing chamber 29 and put to treatment such as sterilization without causing impulse; and the food treated is discharged via the second port 33 provided on the bottom closure member 22 with no treated food 32 left in the treatment chamber 30. Cleaning the inside of the treatment chamber 30 can also be made easily by removing the closure members 21, 22 and releasing the openings, etc., of the pressure vessel 20.

32. 发明专利

JPH02223790A HEAT INSULATING STRUCTURAL BODY FOR HIGH-TEMPERATURE FURNACE 失效
公开(公告)号：JPH02223790A
公开(公告)日：1990-09-06
申请号：JP4392689
申请日：1989-02-22
申请人： KOBE STEEL LTD
发明人： INOUE YOICHI
IPC分类号： C04B35/645 , B22F3/14 , B22F3/15 , C04B35/64 , F27B17/00
摘要： PURPOSE:To facilitate assembling work and stabilize heat insulating performance uniformly by a method wherein wires are bound by sewing to the sheets of a heat insulating layer, in which gaps are formed between the mutual sheets of multiple layers through wires. CONSTITUTION:A structural body 11, in which wires 10 are sewed integrally to a small gas impregnatable sheet 9, is employed and a laminate is formed by winding the sheet 9 around a cylindrical body 12 for core so as to have multiple layers. Assembling work, in which the sheet 9 is wound around the cylindrical body 12, may be facilitated by employing such a structural body 11 whereby the sheet 9 may be laminated easily and orderly. According to this orderly lamination, the whole of the structural body is assembled uniformly whereby local unevenness in the heat insulating performance may be eliminated and the heat insulating performance can be stabilized uniformly. On the other hand, the downward deviation of the wires 10 during employing may be eliminated while the wire 10 restrains the development of cracks whereby the life of the title structural body may be improved remarkably.

33. 发明专利

JPH02207997A ISOTROPIC PRESSURIZING DEVICE 失效
公开(公告)号：JPH02207997A
公开(公告)日：1990-08-17
申请号：JP2838689
申请日：1989-02-06
申请人： KOBE STEEL LTD
发明人： INOUE YOICHI , NISHIMOTO TAKEO , NAOI TOSHIKATSU
IPC分类号： B30B11/00 , B22F3/04
摘要： PURPOSE:To provide the isotropic pressurizing device which allows extremely easy mold exchange between a wet type and a dry type by providing a rubber mold sealed at both top and bottom ends on the inner periphery of a cylindrical body disposed in a high-pressure chamber and providing a pressure medium passage for pressurizing the rubber mold in the cylindrical body part. CONSTITUTION:The cylindrical body 26 is inserted together with the rubber mold 32 into the high-pressure chamber 25 and a part 38 to be treated which is powder of ceramics, etc., is housed and packed into a molding chamber 32A at the time of executing dry type CIP. The mold 32 is then closed with plugs 36 and the pressure medium is supplied 24 into the chamber 25 in the same manner as with ordinary CIP to elastically deform the mold 32 in the inside direction of the diameter like the left half part from the center line 0-0 shown in the figure. The work 38 is thus compressively molded by the isotropic pressure. On the other hand, an upper cap 21 is held removed and the mold 32 is removed together with the cylindrical body 26 from the upper opening of a container 20 in the case of exchanging the above- mentioned device to the wet type device. The rubber mold of the wet type is then inserted into the chamber 25. The upper and lower caps 21, 22 are utilized as they are at this time and the need for a centering work for this purpose is eliminated. The reliability of the high-pressure sealing is thus improved.

34. 发明专利

JPS63404A HOT STATIC WATER PRESSURE FORMING METHOD 失效
公开(公告)号：JPS63404A
公开(公告)日：1988-01-05
申请号：JP13954987
申请日：1987-06-03
申请人： KOBE STEEL LTD
发明人： YONEDA JITSUO , INOUE YOICHI , MATSUURA SHIRO
IPC分类号： B28B3/00 , B22F3/14 , F27B17/00
摘要： PURPOSE:To remarkably improve the productivity by inserting as sliding integrately a furnace body having heat insulating exterior and heating device with a body to be treated into a high pressure vessel arranged in a forming station and forming the body to be treated laid on a composite plug closing the lower opening part of high pressure vessel by hot static water pressure. CONSTITUTION:The furnace body 14 in an auxiliary station B is integrately inserted into the high pressure space 1 of high pressure vessel 2 in a forming station A through lower part plugs 4a, 4b. Next, high pressure gas is introduced into the space 1 and a high pressure and high temp. treatment space 9 and heated 8 to pressure, heat and form the body to be treated 6 laid on a table 5 of the inside plug 4a under high pressure, high temp. gas atmosphere. In succession, after the formed body 6 to be treated is taken out from the lower opening of high pressure cylinder 2, it is carried 13 to the auxiliary station B position and only the plug 4a and the body to be treated 6 is carried 13 to a product take-out station E, to take out the preduct body to be treated from the table 5. After that, the new body to be treated 6 is laid on the table 5 and again carried on the station B together with the plug 4a and carried to the station A, to execute next the above forming operation.

35. 发明专利

JPS61168781A HIGH-TEMPERATURE HYDROSTATIC PRESSING DEVICE 失效
公开(公告)号：JPS61168781A
公开(公告)日：1986-07-30
申请号：JP823985
申请日：1985-01-18
申请人： KOBE STEEL LTD
发明人： INOUE YOICHI
IPC分类号： B22F3/14 , B22F3/15 , C04B35/64 , C04B35/645 , F27B17/00

36. 发明专利

JP2005033135A Cleaning device for microstructure 审中-公开
标题翻译：用于微结构的清洁装置
公开(公告)号：JP2005033135A
公开(公告)日：2005-02-03
申请号：JP2003273587
申请日：2003-07-11
申请人： Dainippon Screen Mfg Co Ltd , Kobe Steel Ltd , 大日本スクリーン製造株式会社 , 株式会社神戸製鋼所
发明人： YAMAGATA MASAHIRO , INOUE YOICHI , OSHIBA HISANORI , MURAOKA YUSUKE , IWATA TOMOMI , SAITO KIMITSUGU
IPC分类号： B08B3/08 , B08B7/00 , H01L21/00 , H01L21/027 , H01L21/304
CPC分类号： H01L21/67051 , B08B7/0021
摘要： PROBLEM TO BE SOLVED: To provide a cleaning device for a microstructure whereby a contamination caused by a toxic substance leaking from the cleaning device can be minimized and a human body is hardly affected in the cleaning device for removing an unwanted substance adhering to the microstructure by fluidizing, under high pressure, a cleaning agent composition essentially containing carbon dioxide and a cleaning component and bringing the composition into contact with the microstructure.
SOLUTION: The cleaning device removes an unwanted substance adhering to the microstructure by fluidizing, under high pressure, the cleaning agent composition essentially containing carbon dioxide and the cleaning component and bringing the composition into contact with the microstructure. In a cleaning process performed by the cleaning device, the toxic substance is present anywhere on the cleaning device. Of the cleaning device, a part where the toxic substance is likely to leak is housed in an enclosed structure comprising a first evacuating means.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于微结构的清洁装置，由此能够使从清洁装置泄漏的有毒物质引起的污染最小化，并且在清洁装置中几乎不影响人体，以除去附着于通过在高压下流化基本上含有二氧化碳和清洁组分并使组合物与微结构接触的清洁剂组合物的微结构。解决方案：清洁装置通过在高压下流化基本上包含二氧化碳和清洁组分并使组合物与微结构接触的清洁剂组合物来除去附着在微结构上的不需要的物质。在由清洁装置执行的清洁过程中，有毒物质存在于清洁装置上的任何地方。在清洁装置中，有毒物质可能泄漏的部分容纳在包括第一排气装置的封闭结构中。版权所有（C）2005，JPO＆NCIPI

37. 发明专利

JP2003334501A High pressure treatment apparatus 审中-公开
标题翻译：高压处理设备
公开(公告)号：JP2003334501A
公开(公告)日：2003-11-25
申请号：JP2002140766
申请日：2002-05-15
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： WATANABE KATSUMITSU , INOUE YOICHI , SAKASHITA YOSHIHIKO , SARUMARU SHIYOUGO
IPC分类号： B08B5/00 , B08B7/00 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a high pressure treatment apparatus capable of ensuring the uniformity of treatment equivalent to a sheet-fed type, non-contamination properties and required throughput.
SOLUTION: This high pressure treatment apparatus has a first outside body 3, an intermediate body 4 relatively movable to come into contact with and separate from the first outside body 3 and forming the first treatment chamber 6 along with the first outside body 3 at the time of contact with the first outside body 3 and the second outside body 5 movable to come into contact with and separate from the intermediate body 4 and forming the second treatment chamber 7 along with the intermediate body 4 at the time of contact with the intermediate body 4. The apparatus is also provided with an introducing means 13 for introducing a high pressure fluid into the first and second treatment chambers 6 and 7 so as to form a high pressure atmosphere in the first and second treatment chambers 6 and 7 when both treatment chambers 6 and 7 are formed.
COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供能够确保与单张纸类型相同的处理的均匀性的高压处理装置，无污染特性和所需的生产量。解决方案：该高压处理装置具有第一外侧主体3和与第一外侧主体3接触并分离的中间体4，与第一外部主体3一体形成第一处理室6 在与第一外部主体3和第二外部主体5接触时可以与中间体4接触并与中间体4分离，并且在与第二处理室7接触的同时与中间体4一起形成第二处理室7 该装置还设置有用于将高压流体引入第一和第二处理室6和7中的引入装置13，以在第一和第二处理室6和7中形成高压气氛，当两者形成处理室6和7。版权所有（C）2004，JPO

38. 发明专利

JP2003071394A High-pressure treatment apparatus 审中-公开
标题翻译：高压处理设备
公开(公告)号：JP2003071394A
公开(公告)日：2003-03-11
申请号：JP2001261319
申请日：2001-08-30
申请人： Dainippon Screen Mfg Co Ltd , Kobe Steel Ltd , 大日本スクリーン製造株式会社 , 株式会社神戸製鋼所
发明人： SAITO KIMITSUGU , MURAOKA YUSUKE , MIZOBATA IKUO , KITAKADO RYUJI , INOUE YOICHI , OSHIBA HISANORI , SAKASHITA YOSHIHIKO , WATANABE KATSUMITSU
IPC分类号： B08B3/02 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To realize a high-pressure treatment apparatus having a double- structured chamber to the inner chamber of which high pressure withstanding strength is unnecessary.
SOLUTION: A substrate 103 is placed in the inner chamber 102 of the double- structured chamber 100 and cleaned by a supercritical fluid in which a liquid chemical to be supplied from a liquid chemical tank 170 is mixed. Another supercritical fluid containing no liquid chemical is supplied to the gap region between an outer chamber 101 and the chamber 102. A communication port 106 is formed on the wall of the chamber 102 so that the supercritical fluid can be made to pass through the port 106 freely between the chamber 102 and the gap region. The pressure of the gap region and that of the chamber 102 to be detected by the first and second pressure detectors 230 and 240 are adjusted by the first and second pressure adjusting valves 210 and 220 under the control of a pressure controlling part 200.
COPYRIGHT: (C)2003,JPO
摘要翻译：要解决的问题：为了实现对于不需要高耐压强度的内室的具有双重结构室的高压处理装置。解决方案：衬底103被放置在双结构室100的内室102中，并由其中混合从液体化学容器170供给的液体化学物质的超临界流体清洗。将不含液体化学物质的另一种超临界流体供应到外室101和腔室102之间的间隙区域。在腔室102的壁上形成有连通口106，使超临界流体可以通过端口106 在腔室102和间隙区域之间自由。第一和第二压力检测器230和240检测的间隙区域和室102的压力由压力控制部分200的控制由第一和第二压力调节阀210和220进行调节。

39. 发明专利

JP2002313764A HIGH PRESSURE PROCESSOR 失效
公开(公告)号：JP2002313764A
公开(公告)日：2002-10-25
申请号：JP2001117701
申请日：2001-04-17
申请人： KOBE STEEL LTD
发明人： INOUE YOICHI , YAMAGATA MASAHIRO
IPC分类号： G03F7/42 , B08B3/08 , H01L21/027 , H01L21/304 , H01L21/306
摘要： PROBLEM TO BE SOLVED: To provide a high pressure processor capable of efficiently supplying a liquid chemical at a required timing and effectively reducing costs in the high pressure processor installable inside a clean room. SOLUTION: The high pressure processor is a device for performing removal processing of unrequired materials on an object to be processed by bringing a high pressure fluid and the liquid chemical other than the high pressure fluid into contact with the object under a pressure, and is provided with a plurality of high pressure processing chambers, a common high pressure fluid supply means for supplying the high pressure fluid to the high pressure processing chambers, a separation means for separating gaseous components from the mixture of the high pressure fluid and the liquid chemical discharged from the high pressure processing chambers after processing and a common take-out/ take-in means for taking the object in and out of the respective high pressure processing chambers. A liquid chemical supply means for supplying the liquid chemical to the high pressure processing chamber is provided for each high pressure processing chamber.

40. 发明专利

JP2001223221A HIGH-TEMPERATURE AND HIGH-PRESSURE PROCESSING APPARATUS FOR SEMICONDUCTOR MATERIAL 失效
公开(公告)号：JP2001223221A
公开(公告)日：2001-08-17
申请号：JP2000029415
申请日：2000-02-07
申请人： KOBE STEEL LTD
发明人： INOUE YOICHI , SAKASHITA YOSHIHIKO , ISHII TAKAHIKO
IPC分类号： H01L21/3205 , H01L21/324 , H01L23/52
摘要： PROBLEM TO BE SOLVED: To provide a high-temperature and high-pressure processing apparatus which prevents a semiconductor material from being contaminated with particles which are generated from a heater, and is suited to a treatment of the material. SOLUTION: A high-temperature and high-pressure processing apparatus for a semiconductor material, which treats the material under the atmosphere of high-temperature and high-pressure gas, is provided with a pressure container 3, a heater 15 which is installed in the container 3 and is used for hating the material, and hermetic casings 35 and 45 constituted in such a way as to encircle the heater 15 with a material of a low gas permeability. A first gas passage 40 communication with the interiors and exteriors of the casings 35 and 45 is formed in the casings 35 and 45, and a filter 41 for trapping dusts is provided on the passage 40.

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