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    • 40. 发明授权
    • Catadioptric projection objective with tilted deflecting mirrors, projection exposure apparatus, projection exposure method, and mirror
    • 反射折射投影物镜具有倾斜的偏转镜,投影曝光装置,投影曝光方法和反射镜
    • US08411356B2
    • 2013-04-02
    • US13217793
    • 2011-08-25
    • Ralf MuellerAksel GoehnermeierWolfgang Singer
    • Ralf MuellerAksel GoehnermeierWolfgang Singer
    • G02B17/08
    • G02B17/08G02B27/286G03F7/70225G03F7/70566
    • A projection objective has an object surface and an image surface. The projection objective includes a plurality of optical elements arranged along an optical axis and configured so that during operation the projection objective images a pattern arranged in the object surface onto the image surface. The optical elements include a concave mirror a first deflecting mirror and a second deflecting mirror. The first deflecting mirror is tilted relative to the optical axis by a first tilt angle, t1, about a first tilt axis so that during operation the first deflecting mirror deflects light at a wavelength λ from the object surface towards the concave mirror or deflects light at λ from the concave mirror towards the image surface. The second deflecting mirror is tilted relative to the optical axis by a second tilt angle, t2, about a second tilt axis. For a pattern including a grating having a line width of 45 nm and a pitch, p, the projection objective images the pattern to the image surface such that for a first orientation of the pattern and a second orientation of the pattern a difference, ΔHV, between the imaged line width is 1.2 nm or less for 100 nm
    • 投影物镜具有物体表面和图像表面。 投影物镜包括沿着光轴布置的多个光学元件,并且被配置为使得在操作期间,投影物镜将布置在物体表面中的图案图像映像到图像表面上。 光学元件包括凹面镜,第一偏转镜和第二偏转镜。 第一偏转镜相对于光轴相对于第一倾斜轴倾斜第一倾斜角度t1,使得在操作期间,第一偏转镜将波长λ的物体从物体表面偏转到凹面镜,或使光线偏转 λ从凹面镜朝向图像表面。 第二偏转镜相对于光轴倾斜第二倾斜角t2,约为第二倾斜轴。 对于包括具有45nm的线宽度和间距p的光栅的图案,投影物镜将图案图像到图像表面,使得对于图案的第一取向和图案的第二取向而言,Dgr; HV,对于100nm