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31. 发明授权

US4582572A Method for detecting end point of titration 失效
标题翻译：检测滴定终点的方法
公开(公告)号：US4582572A
公开(公告)日：1986-04-15
申请号：US608965
申请日：1984-05-10
申请人： Seiji Ishikawa
发明人： Seiji Ishikawa
IPC分类号： G01N27/26 , G01N27/44 , G01N31/16 , G01N27/42
CPC分类号： G01N31/164
摘要： An end point of polarization titration is detected by the steps of passing constant DC pulse having a magnitude of 0.1-100 .mu.A between a pair of detection electrodes immersed in a solution to be titrated, detecting a polarization state generated between the detection electrodes at each current passage before the polarization reaches an equilibrium state and judging the end point based on the detected polarization state. The polarization state is detected by integrating a polarization potential generated at each current passage and the polarization is eliminated by short circuiting the detection electrodes before passing the next DC pulse.
摘要翻译：通过在浸没在待滴定溶液中的一对检测电极之间通过使具有0.1-100μA量级的恒定DC脉冲的步骤来检测极化滴定的终点，检测在每个检测电极之间产生的偏振状态极化前的电流通过达到平衡状态，并根据检测到的极化状态判断终点。通过积分在每个电流通道处产生的极化电位来检测极化状态，并且通过在通过下一个DC脉冲之前短路检测电极来消除偏振。

32. 发明授权

US4373087A O-Tolidine sulfone based copolyamide fiber 失效
标题翻译： O-托吡啶砜基共聚酰胺纤维
公开(公告)号：US4373087A
公开(公告)日：1983-02-08
申请号：US243423
申请日：1981-03-13
申请人： Takaho Kaneda , Seiji Ishikawa , Hiroshi Daimon , Toshio Katsura , Tadahiro Hondo , Masahiro Ueda
发明人： Takaho Kaneda , Seiji Ishikawa , Hiroshi Daimon , Toshio Katsura , Tadahiro Hondo , Masahiro Ueda
IPC分类号： D01F6/80 , C08G69/32
CPC分类号： C08G69/32
摘要： A novel copolyamide fiber having an excellent initial modulus of elasticity and mechanical strength, is made from a copolyamide consisting essentially of unit A of the formula (A): ##STR1## unit (B) of the formula (B): ##STR2## and unit (C) of the formula (C): ##STR3## wherein CH.sub.3 groups in the formula (A) are located in the ortho-position to NH groups, the sum of the amount of units (A) and (B) is substantially equimolar to the amount of unit (C) and the molar ratio of unit (A) to unit (B) is from 10/90 to 50/50.
摘要翻译：具有优异的初始弹性模量和机械强度的新型共聚酰胺纤维由基本上由式（A）的单元A组成的共聚酰胺制成：式（B）的单元（B）：图像（B）和式（C）的单元（C）：其中式（A）中的CH3基团位于NH基团的邻位，单位量（C）（A）和（B）与单位（C）的量基本上等摩尔，单元（A）与单元（B）的摩尔比为10/90至50/50。

33. 发明授权

US4302299A Titration control method 失效
标题翻译：滴定控制方法
公开(公告)号：US4302299A
公开(公告)日：1981-11-24
申请号：US82227
申请日：1979-10-04
申请人： Seiji Ishikawa
发明人： Seiji Ishikawa
IPC分类号： G01N27/26 , G01N27/44 , G01N31/16 , G01N27/56
CPC分类号： G01N31/164 , G01N27/44 , Y10T436/116664
摘要： In a titration controlling method and apparatus wherein variations of a titration system caused by intermittent titrations are successively detected electrically, and the quantity of each intermittent titration is controlled by an electric signal obtained by the detection until an end point is reached. According to the present invention, the quantity of each intermittent titration is determined by dividing the quantity of the immediately prior titration, which has been memorized, by the variation of the titration system caused by the immediately prior titration.
摘要翻译：在滴定控制方法和装置中，其中由间歇滴定引起的滴定系统的变化被依次电检测，并且每个间歇滴定的量由通过检测获得的电信号控制直到达到终点。根据本发明，每次间歇滴定的量通过将由已经记忆的紧接在前的滴定量除以由立即进行滴定引起的滴定系统的变化来确定。

34. 发明授权

US08908921B2 Object detection method and object detector using the method 有权
标题翻译：对象检测方法和物体检测器采用该方法
公开(公告)号：US08908921B2
公开(公告)日：2014-12-09
申请号：US13990005
申请日：2011-11-28
申请人： Seiji Ishikawa , Joo Kooi Tan , Yuuki Nakashima , Takashi Morie
发明人： Seiji Ishikawa , Joo Kooi Tan , Yuuki Nakashima , Takashi Morie
IPC分类号： G06K9/00 , G06K9/46
CPC分类号： G06K9/00624 , G06K9/00362 , G06K9/4642 , G06K9/6228 , G06K9/6231
摘要： In an object detection method and an object detector 10 using the method, HOG feature (A) of a target image is computed, and existence of a target object P in the image is judged based on HOG feature (B) pre-computed for a sample image 20 having the object P pictured therein. A classifier 18 to judge the existence of the object P in the image is constructed based on a feature pattern representing the existence of the object P obtained by calculating a plurality of the HOG features (B) having different bin numbers for each of a plurality of local areas (cells) 19 in the image 20. The existence of the object P in the image is judged by the classifier 18 based on a plurality of the HOG features (A) having different bin numbers computed for each of the local areas 19 in the image.
摘要翻译：在使用该方法的物体检测方法和对象检测器10中，计算目标图像的HOG特征（A），并且基于对于图像预先计算的HOG特征（B）来判断图像中的目标对象P的存在其中具有对象P的样本图像20。基于通过计算多个具有不同的箱号的多个HOG特征（B）而获得的表示对象P的存在的特征图案来构造图像中对象P的存在的分类器18，图像20中的局部区域（单元格）19。基于对于每个局部区域19计算的具有不同的箱号的多个HOG特征（A），由分类器18判断图像中的对象P的存在图片。

35. 发明授权

US08274642B2 Maskless exposure method 有权
标题翻译：无掩膜曝光方法
公开(公告)号：US08274642B2
公开(公告)日：2012-09-25
申请号：US12390687
申请日：2009-02-23
申请人： Hiroyasu Matsuura , Seiji Ishikawa , Tadamichi Wachi , Toshimasa Ishigaki
发明人： Hiroyasu Matsuura , Seiji Ishikawa , Tadamichi Wachi , Toshimasa Ishigaki
IPC分类号： G03B27/32 , G03B27/44 , G03B27/42
CPC分类号： G03F7/70791 , G03F7/70433
摘要： A maskless exposure method of drawing a circuit pattern includes: moving a substrate with respect to a projection optical system; scanning, by the projection optical system, the substrate in a first direction; shifting a scanning region in a second direction; scanning the substrate in the first direction so that an overlapping part is formed. A plurality of marks different from the circuit pattern are exposed in a vicinity of the overlapping part. The plurality of marks are a set of marks at least including two marks disposed on one side of the overlapping part and two marks disposed on another side of the overlapping part. Deviations between the pair of the scanning regions, an inclination of exposing light, and a yawing angle of a stage are analyzed by measuring deviations of distances among the plurality of marks. Calibration data are obtained from a result of the analyzing.
摘要翻译：绘制电路图案的无掩模曝光方法包括：相对于投影光学系统移动基板; 通过投影光学系统沿第一方向扫描基板; 沿第二方向移动扫描区域; 在第一方向扫描基板，从而形成重叠部分。与电路图案不同的多个标记在重叠部分附近露出。多个标记是至少包括设置在重叠部分的一侧上的两个标记和设置在重叠部分的另一侧上的两个标记的一组标记。通过测量多个标记之间的距离的偏差来分析一对扫描区域之间的偏差，曝光的倾斜度和舞台的偏航角度。校准数据是从分析结果中获得的。

36. 发明授权

US07945410B2 Semiconductor device yield prediction system and method 失效
标题翻译：半导体器件产量预测系统及方法
公开(公告)号：US07945410B2
公开(公告)日：2011-05-17
申请号：US11836199
申请日：2007-08-09
申请人： Natsuyo Morioka , Seiji Ishikawa , Katsumi Ikegaya , Yasunori Yamaguchi , Kazuo Ito , Yuichi Hamamura
发明人： Natsuyo Morioka , Seiji Ishikawa , Katsumi Ikegaya , Yasunori Yamaguchi , Kazuo Ito , Yuichi Hamamura
IPC分类号： G01N37/00 , G06F19/00
CPC分类号： G05B15/02 , G05B17/02
摘要： An average fault ratio is calculated from product characteristics of a product as a target of yield prediction, in order to predict yield accurately in the course of manufacturing the prediction target product.With respect to a reference product, whose wiring pattern is different from the prediction target product but manufactured by the same manufacturing process, a monthly electric fault density is calculated from actually measured data. Respective average fault ratios are obtained from product characteristics of the prediction target product and the reference product. A monthly electric fault density of the prediction target product is obtained by multiplying the monthly electric fault density of the reference product by the ratio of the average fault ratios. The yield is calculated by using the monthly electric fault density of the month in which a yield prediction target lot of the prediction target product was processed.
摘要翻译：从作为产量预测目标的产品的产品特性计算平均故障率，以便在制造预测目标产品的过程中准确地预测产量。对于其参考产品，其布线图案与预测目标产品不同但通过相同的制造工艺制造，每月电故障密度由实际测量数据计算。相应的平均故障率是从预测目标产品和参考产品的产品特性获得的。通过将参考产品的每月电气故障密度乘以平均故障率的比率来获得预测目标乘积的每月电气故障密度。通过使用处理预测目标产品的产量预测目标批次的月份的每月电气故障密度来计算产量。

37. 发明申请

US20080241486A1 Liquid Crystal Display Device with Evaluation Patterns Disposed Thereon, and Method for Manufacturing the Same 审中-公开
标题翻译：具有评估模式的液晶显示装置及其制造方法
公开(公告)号：US20080241486A1
公开(公告)日：2008-10-02
申请号：US12055501
申请日：2008-03-26
申请人： Seiji Ishikawa , Hiroyasu Matsuura , Yuichi Hamamura , Tadamichi Wachi
发明人： Seiji Ishikawa , Hiroyasu Matsuura , Yuichi Hamamura , Tadamichi Wachi
IPC分类号： G03F7/20 , B32B5/00
CPC分类号： G03F9/7003 , G03F7/70275 , G03F7/70383 , G03F7/70475 , G03F7/70791 , Y10T428/24802
摘要： Direct exposure equipment having a multiple heads generally conducts overlapping exposure at an exposure area boundary between the heads. In such a case, if the heads are misaligned, a flaw will occur in a pattern shape at an area that is subject to overlapping exposure. To overcome this, TEGs are disposed for evaluating line width and resistance at an overlapping exposure area between the exposure heads and at a returning exposure area formed when direct exposure equipment having a multi-head configuration exposes a substrate. By examining measured values from these TEGs, a misalignment in the multiple exposure heads is detected.
摘要翻译：具有多个头部的直接曝光设备通常在头部之间的曝光区域边界处进行重叠曝光。在这种情况下，如果头部不对准，则在受到重叠曝光的区域上的图案形状的缺陷将发生。为了克服这个原因，TEG被设置用于评估曝光头之间的重叠曝光区域和在具有多头构造的直接曝光设备暴露基板时形成的返回曝光区域的线宽和电阻。通过检查这些TEG的测量值，检测多个曝光头中的未对准。

38. 发明授权

US07150386B2 Systems and structures for supporting vibrators 有权
标题翻译：用于支撑振动器的系统和结构
公开(公告)号：US07150386B2
公开(公告)日：2006-12-19
申请号：US10346661
申请日：2003-01-17
申请人： Seiji Ishikawa , Takayuki Kikuchi
发明人： Seiji Ishikawa , Takayuki Kikuchi
IPC分类号： H01L41/053
CPC分类号： G01C19/5783
摘要： An object of the present invention is to provide a novel system for supporting a vibrator having a terminal for electrical connection so that the vibrator may be miniaturized and the deviation of vibration property among vibrators mounted on the supporting systems may be prevented. The supporting system has a substrate 11 and bonding wires 9, 10 supported on the substrate 11 and to be joined with a vibrator 1. The vibrator 1 is supported with the bonding wires 9, 10 so that the vibrator 1 does not directly contact the substrate 11 and bonding wires 9, 10 are electrically connected with a terminal 6 of the vibrator 1.
摘要翻译：本发明的目的是提供一种用于支撑具有用于电连接的端子的振动器的新型系统，使得振动器可以小型化，并且可以防止安装在支撑系统上的振动器之间的振动特性的偏差。支撑系统具有基板11和支撑在基板11上并与振动器1接合的接合线9,10。振动器1由接合线9,10支撑，使得振动器1不直接接触基板11，并且接合线9,10与振动器1的端子6电连接。

39. 再颁专利

USRE39262E1 Polishing apparatus including turntable with polishing surface of different heights 有权
标题翻译：抛光装置包括具有不同高度的抛光表面的转台
公开(公告)号：USRE39262E1
公开(公告)日：2006-09-05
申请号：US09821046
申请日：2002-02-28
申请人： Masayoshi Hirose , Yoshimi Sasaki , Akira Ogata , Seiji Ishikawa , Tamami Takahashi , Hirokuni Hiyama , Yutaka Wada
发明人： Masayoshi Hirose , Yoshimi Sasaki , Akira Ogata , Seiji Ishikawa , Tamami Takahashi , Hirokuni Hiyama , Yutaka Wada
IPC分类号： B24B29/02
CPC分类号： B24B37/24
摘要： A polishing apparatus includes a turntable with an abrasive cloth mounted on an upper surface thereof, and a top ring disposed above the turntable for supporting a workpiece to be polished and pressing the workpiece against the abrasive cloth under a predetermined pressure. The turntable and the top ring are movable relatively to each other to polish a surface of the workpiece supported by the top ring with the abrasive cloth. The abrasive cloth has a projecting region on a surface thereof for more intensive contact with the workpiece than other surface regions of the abrasive cloth. The projecting region has a smaller dimension in a radial direction of the turntable than a diameter of the workpiece when the projecting region is held in contact with the workpiece. A position of the projection region is determined on the basis of an area in which the projecting region acts on the workpiece.
摘要翻译：抛光装置包括：转盘，其具有安装在其上表面上的研磨布;以及顶环，其设置在所述转台上方，用于支撑待抛光的工件，并在预定压力下将所述工件压靠所述研磨布。转盘和顶环彼此相对移动，用研磨布抛光由顶环支撑的工件的表面。研磨布在其表面上具有突出区域，用于与研磨布的其它表面区域更加紧密地接触工件。当突出区域与工件保持接触时，突出区域在转台的径向上具有比工件的直径更小的尺寸。基于突出区域作用在工件上的区域来确定投影区域的位置。

40. 发明申请

US20060009130A1 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device 审中-公开
公开(公告)号：US20060009130A1
公开(公告)日：2006-01-12
申请号：US11221924
申请日：2005-09-09
申请人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
发明人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
IPC分类号： B24B49/00
CPC分类号： H01L21/67161 , B08B1/04 , B24B27/0023 , B24B37/04 , B24B37/345 , B24B51/00 , B24B55/12 , F24F3/161 , H01L21/67028 , H01L21/67046 , H01L21/67057 , H01L21/67167 , H01L21/67219 , H01L21/67745 , H01L21/67778 , H03M13/39 , H04N5/4401 , H04N5/455
摘要： A polishing apparatus includes an arrangement of a plurality of units to deal with various operations and a robot having at least one arm. The plurality of units are disposed around the robot and include a loading unit for receiving thereon a, e.g. dry, workpiece to be polished, a polishing system including at least one polishing unit for polishing the workpiece, a washing system and a drying system at least including one washing unit for washing and drying the polished workpiece, and an unloading unit for receiving thereon a resultant clean and dry polished workpiece.

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