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31. 发明授权

US07521692B2 TDI detecting device, a feed-through equipment, an electron beam apparatus using these device and equipment, and a semiconductor device manufacturing method using the same electron beam apparatus 有权
标题翻译： TDI检测装置，馈通装置，使用这些装置和设备的电子束装置，以及使用该电子束装置的半导体装置的制造方法
公开(公告)号：US07521692B2
公开(公告)日：2009-04-21
申请号：US11896519
申请日：2007-09-04
申请人： Masahiro Hatakeyama , Tohru Satake , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
发明人： Masahiro Hatakeyama , Tohru Satake , Takeshi Murakami , Kenji Watanabe , Nobuharu Noji
IPC分类号： G01K1/08 , H01J3/14 , H01J3/26
CPC分类号： H01J37/222 , G01N21/956 , H01J37/224 , H01J37/244 , H01J2237/2445 , H01J2237/2447 , H01R13/2421 , H04N5/2253 , Y10S439/935
摘要： An electron beam apparatus comprises a TDI sensor 64 and a feed-through device 50. The feed-through device has a socket contact 54 for interconnecting a pin 52 attached to a flanged 51 for separating different environments and the other pin 53 making a pair with the pin 52, in which the pin 52, the other pin 53 and the socket contact 54 together construct a connecting block, and the socket contact 54 has an elastic member 61. Accordingly, even if a large number of connecting blocks are provided, the connecting force may be kept to such a low level as to prevent the breakage in the sensor. The pin 53 is connected with the TDI sensor 64, in which a pixel array has been adaptively configured based on the optical characteristic of an image projecting optical system. That sensor has a number of integration stages that can reduce the field of view of the image projecting optical system to as small as possible so that a maximal acceptable distortion within the field of view may be set larger. Further, the number of integration stage may be determined such that the data rate of the TDI sensor would not be reduced but the number of pins would not be increased as much as possible. Preferably, the number of line count may be almost equal to the number of integration stages.
摘要翻译：电子束装置包括TDI传感器64和馈通装置50.馈通装置具有插座触点54，用于互连连接到凸缘51的引脚52，用于分离不同的环境，而另一个引脚53与销52，销52，另一销53和插座接触54一起构成连接块，插座触头54具有弹性构件61.因此，即使设置了大量的连接块，连接力可以保持在如此低的水平，以防止传感器中的破损。引脚53与TDI传感器64连接，其中像素阵列已经基于图像投影光学系统的光学特性被自适应地配置。该传感器具有可以将图像投影光学系统的视野尽可能地减小的多个积分级，使得视野内的最大可接受失真可以被设定得更大。此外，可以确定积分级的数量，使得TDI传感器的数据速率不会降低，但是引脚的数量不会尽可能多地增加。优选地，行计数的数量可以几乎等于积分级数。

32. 发明授权

US07499162B2 Method and apparatus for observing and inspecting defects 有权
标题翻译：观察和检查缺陷的方法和装置
公开(公告)号：US07499162B2
公开(公告)日：2009-03-03
申请号：US11475667
申请日：2006-06-26
申请人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
发明人： Yukihiro Shibata , Shunji Maeda , Kazuo Yamaguchi , Minoru Yoshida , Atsushi Yoshida , Kenji Oka , Kenji Watanabe
IPC分类号： G01J4/00
CPC分类号： G01N21/21 , G01N21/9501 , G01N21/956 , G01N21/95607 , G02B21/0016
摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.
摘要翻译：缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

33. 发明授权

US07490541B2 Compressor 有权
标题翻译：压缩机
公开(公告)号：US07490541B2
公开(公告)日：2009-02-17
申请号：US10482170
申请日：2002-07-03
申请人： Takeshi Kawata , Kenji Watanabe , Kenji Okuzono , Nobunao Tsuchida
发明人： Takeshi Kawata , Kenji Watanabe , Kenji Okuzono , Nobunao Tsuchida
IPC分类号： F01B31/10
CPC分类号： F04C29/026 , F01C21/10
摘要： A compressor comprises a compressing mechanism which compresses fluid including a lubricant, a separation chamber into which the fluid compressed by the compressing mechanism is introduced and in which at least a portion of the lubricant included in the fluid is separated from the fluid, and an oil-storage chamber in which the lubricant separated from the fluid in the separation chamber is stored. An oil-introducing passage is formed between the separation chamber and the oil-storage chamber to bring these chambers into communication with each other, the oil-introducing passage introduces the lubricant separated in the separation chamber into the oil-storage chamber, an opening of the oil-introducing passage on the side of the oil-storage chamber is lower than an oil level of the lubricant stored in the oil-storage chamber in the vertical direction.
摘要翻译：压缩机包括压缩机构，其压缩包括润滑剂的流体，分离室，由压缩机构压缩的流体被引入到该分离室中，其中包含在流体中的润滑剂的至少一部分与流体分离，其中存储有与分离室中的流体分离的润滑剂的储存室。在分离室和储油室之间形成有油引入通道，使这些室相互连通，导油通路将分离室中分离的润滑剂引入储油室，储油室一侧的导油通路低于储存在储油室中的润滑油在垂直方向上的油位。

34. 发明授权

US07483560B2 Method for measuring three dimensional shape of a fine pattern 有权
标题翻译：用于测量精细图案的三维形状的方法
公开(公告)号：US07483560B2
公开(公告)日：2009-01-27
申请号：US10679290
申请日：2003-10-07
申请人： Chle Shishido , Ryo Nakagaki , Maki Tanaka , Kenji Watanabe , Yuya Toyoshima
发明人： Chle Shishido , Ryo Nakagaki , Maki Tanaka , Kenji Watanabe , Yuya Toyoshima
IPC分类号： G06K9/00
CPC分类号： H01L22/34 , G01N21/956 , G06T7/0004 , G06T2207/30148 , H01L2924/0002 , H01L2924/00
摘要： In a method of measuring a three dimensional shape of an arbitrary fine pattern on a semiconductor device, an optical measurement system carries out a measurement to obtain cross-section information, and an electron microscope obtains an electron beam image of the arbitrary fine pattern. Plane information and cross-section information obtained from the electron beam image of the arbitrary fine pattern are combined to measure the three dimensional shape of the arbitrary fine pattern.
摘要翻译：在半导体装置中测定任意精细图案的三维形状的方法中，光学测量系统进行测量以获得横截面信息，并且电子显微镜获得任意精细图案的电子束图像。从任意精细图案的电子束图像获得的平面信息和横截面信息被组合以测量任意精细图案的三维形状。

35. 发明授权

US07423267B2 Electron beam apparatus and method of manufacturing semiconductor device using the apparatus 失效
标题翻译：电子束装置及使用该装置制造半导体器件的方法
公开(公告)号：US07423267B2
公开(公告)日：2008-09-09
申请号：US11528673
申请日：2006-09-28
申请人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
发明人： Mamoru Nakasuji , Nobuharu Noji , Tohru Satake , Masahiro Hatakeyama , Kenji Watanabe , Takao Kato , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima
IPC分类号： G01N23/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N23/225 , H01J37/06 , H01J37/063 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J37/3174 , H01J2237/0435 , H01J2237/0635 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/2446 , H01J2237/24485 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.
摘要翻译：本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。在电子束装置中，电子枪具有用于发射一次电子束的阴极。阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

36. 发明授权

US07411207B2 Method and its apparatus for inspecting particles or defects of a semiconductor device 有权
标题翻译：用于检查半导体器件的颗粒或缺陷的方法及其装置
公开(公告)号：US07411207B2
公开(公告)日：2008-08-12
申请号：US11782760
申请日：2007-07-25
申请人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
发明人： Hidetoshi Nishiyama , Minori Noguchi , Yoshimasa Ohshima , Akira Hamamatsu , Kenji Watanabe , Tetsuya Watanabe , Takahiro Jingu
IPC分类号： G01N21/88
CPC分类号： G01N21/274 , G01N21/47 , G01N21/4738 , G01N21/8806 , G01N21/94 , G01N21/95 , G01N21/956 , G01N2021/8854
摘要： An apparatus for inspecting particles and/or pattern defects of an object under inspection. Data processing means obtains information on size of the particles and/or the pattern defects from an intensity of the scattered light detected by the light detecting means by referring to a relationship between an intensity of scattered light from a standard particle and a size of the standard particle, and using a calibration coefficient for compensating for a change in intensity of the light of the illuminating means from a predetermined intensity.
摘要翻译：一种用于检查被检查物体的颗粒和/或图案缺陷的装置。数据处理装置通过参考来自标准粒子的散射光的强度与标准尺寸之间的关系，从光检测装置检测到的散射光的强度获得关于颗粒尺寸和/或图案缺陷的信息并且使用用于从预定强度补偿照明装置的光的强度变化的校准系数。

37. 发明申请

US20080099697A1 Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same 有权
标题翻译：带电粒子束装置，使用其散光的散光的方法和使用其的制造装置的方法
公开(公告)号：US20080099697A1
公开(公告)日：2008-05-01
申请号：US11898358
申请日：2007-09-11
申请人： Kenji Watanabe , Takeshi Murakami , Ryo Tajima , Masahiro Hatakeyama , Masatoshi Tsuneoka , Nobuharu Noji
发明人： Kenji Watanabe , Takeshi Murakami , Ryo Tajima , Masahiro Hatakeyama , Masatoshi Tsuneoka , Nobuharu Noji
IPC分类号： G21K5/10
CPC分类号： H01J37/28 , H01J37/026 , H01J37/153 , H01J37/29 , H01J2237/0047 , H01J2237/1532 , H01J2237/216
摘要： [Problem] To adjust astigmatism quickly with a simple algorithm by utilizing an autofocus estimation value of an image obtained from a pattern formed on a sample. [Means] A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting means 17 for adjusting astigmatism of the charged particle beam. Astigmatism adjusting means 17 is supplied with a correction voltage which maximizes a focus estimation value obtained from a pattern formed on sample W. Astigmatism adjusting means 17 is a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatus 400 capable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.
摘要翻译： [问题]通过利用从样品上形成的图案获得的图像的自动聚焦估计值，通过简单的算法快速调节像散。用于通过对样品W施加带电粒子束以检测从样品发射的电子，反射电子和反向散射电子的二次带电粒子来观察和估计样品W的带电粒子束装置300包括散光调节装置17，用于调整带电粒子束的散光。散光调节装置17被提供校正电压，该校正电压使得从样本W上形成的图案获得的聚焦估计值最大化。散光调节装置17是包括多对电极或线圈彼此面对的多极，以将光轴带电粒子束在中心。还公开了一种能够在整个样品W上不存在电荷的情况下能够观察和估计样品表面的带电粒子束装置400。

38. 发明授权

US07336303B2 Imaging device 失效
标题翻译：成像设备
公开(公告)号：US07336303B2
公开(公告)日：2008-02-26
申请号：US10347585
申请日：2003-01-22
申请人： Kenichi Shimomura , Yoshikazu Kondo , Youichi Kato , Kenji Watanabe
发明人： Kenichi Shimomura , Yoshikazu Kondo , Youichi Kato , Kenji Watanabe
IPC分类号： H04N5/262
CPC分类号： G06T3/4007 , H04N5/232 , H04N5/23296 , H04N5/2628 , H04N5/3454 , H04N5/361
摘要： An imaging control unit specifies a scan region, including an effective pixel region and a blanking region, of an image based on a magnification for electronic zooming, and converts an input optical signal into an electrical signal by scanning the scan region. The imaging control unit reads the electrical signal stored and delivers the electrical signal to an image sensor unit as picture data. An RW control unit stores the picture data in a register based on the magnification for electronic zooming, and then reads the picture data at a predetermined frame rate. A resolution converter performs interpolation processing of the picture data based on the magnification for electronic zooming.
摘要翻译：成像控制单元基于用于电子变焦的放大率来指定包括图像的有效像素区域和消隐区域的扫描区域，并且通过扫描扫描区域将输入的光学信号转换为电信号。成像控制单元读取存储的电信号并将电信号传送到图像传感器单元作为图像数据。 RW控制单元基于用于电子变焦的放大率将图像数据存储在寄存器中，然后以预定帧速率读取图像数据。分辨率转换器基于用于电子变焦的倍率执行图像数据的插值处理。

39. 发明申请

US20080039511A1 Thiazole Compound and Use Thereof 失效
标题翻译：噻唑化合物及其用途
公开(公告)号：US20080039511A1
公开(公告)日：2008-02-14
申请号：US11587862
申请日：2005-05-16
申请人： Isao Takemura , Kenji Watanabe , Kunio Oshima , Nobuaki Ito , Junpei Haruta , Hidetaka Hiyama , Masatoshi Chihiro , Hideki Kawasome , Yoko Sakamoto , Hironobu Ishiyama , Takumi Sumida , Kazuhiko Fujita , Hideki Kitagaki
发明人： Isao Takemura , Kenji Watanabe , Kunio Oshima , Nobuaki Ito , Junpei Haruta , Hidetaka Hiyama , Masatoshi Chihiro , Hideki Kawasome , Yoko Sakamoto , Hironobu Ishiyama , Takumi Sumida , Kazuhiko Fujita , Hideki Kitagaki
IPC分类号： A61K31/425 , A61P17/00 , C07D277/00
CPC分类号： C07D495/04 , C07D277/24 , C07D277/56 , C07D417/06
摘要： An object of the present invention is to provide a novel thiazole compound with specific inhibitory activity against phosphodiesterase 4. The present invention provides a compound represented by Formula (1), an optical isomer thereof, or a salt thereof: wherein R1 is a di-C1-6 alkoxyphenyl group; R2 is any one of the following groups (a) to (t): (a) a phenyl group; (b) a naphthyl group; (c) a pyridyl group; (d) a furyl group; (e) a thienyl group; (f) an isoxazolyl group; (g) a thiazolyl group; (h) a pyrrolyl group; (i) an imidazolyl group; (j) a tetrazolyl group; (k) a pyrazinyl group; (l) a thienothienyl group; (m) a benzothienyl group; (n) an indolyl group; (o) a benzimidazolyl group; (p) an indazolyl group; (q) a quinolyl group; (r) a 1,2,3,4-tetrahydroquinolyl group; (s) a quinoxalinyl group; and (t) a 1,3-benzodioxolyl group; and A is any one of the following groups (i) to (vi): (i) —CO—B— wherein B is a C1-6 alkylene group; (ii) —CO—Ba wherein Ba is a C2-6 alkenylene group; (iii) —CH(OH)—B—; (iv) —COCH(COOR3)-Bb- wherein R3 is a C1-6 alkyl group and Bb is a C1-6 alkylene group; and (v) -Bc- wherein Bc is a C2-6 alkylene group.
摘要翻译：本发明的目的是提供一种对磷酸二酯酶4具有特异抑制活性的噻唑类化合物。本发明提供式（1）表示的化合物，其光学异构体或其盐：其中R1是二 C 1-6烷氧基苯基; R2是下述（a）〜（t）中的任一个：（a）苯基; （b）萘基; （c）吡啶基; （d）呋喃基; （e）噻吩基; （f）异恶唑基; （g）噻唑基; （h）吡咯基; （i）咪唑基; （j）四唑基; （k）吡嗪基; （1）噻吩并噻吩基; （m）苯并噻吩基; （n）吲哚基; （o）苯并咪唑基; （p）吲唑基; （q）喹啉基; （r）1,2,3,4-四氢喹啉基; 喹喔啉基; 和（t）1,3-苯并二恶唑基; A为下列基团（i）至（vi）中的任何一个：（i）-CO-B-其中B为C 1-6亚烷基; （ⅱ）-CO-Ba，其中Ba为C 2-6亚烯基; （ⅲ）-CH（OH）-B-; （ⅳ）-COCH（COOR3）-Bb-，其中R3是C 1-6烷基，Bb是C 1-6亚烷基; 和（v）-Bc-其中Bc是C 2-6亚烷基。

40. 发明授权

US07312449B2 Electron beam system and method of manufacturing devices using the system 失效
标题翻译：电子束系统及其制造方法
公开(公告)号：US07312449B2
公开(公告)日：2007-12-25
申请号：US11034873
申请日：2005-01-14
申请人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
发明人： Mamoru Nakasuji , Takao Kato , Tohru Satake , Kenji Watanabe , Takeshi Murakami , Nobuharu Noji
IPC分类号： G01N23/00
CPC分类号： H01J37/28 , G01N23/04 , H01J2237/2817
摘要： An electron beam system wherein a shot noise of an electron beam can be reduced and a beam current can be made higher, and further a shaped beam is formed by a two-stage lenses so as to allow for an operation with high stability. In this electron beam system, an electron beam emitted from an electron gun is irradiated onto a sample and secondary electrons emanated from the sample are detected. The electron gun is a thermionic emission type and designed to operate in a space charge limited condition. A shaping aperture and a NA aperture are arranged in front locations of the electron gun. An image of the shaping aperture formed by an electron beam emitted from the thermionic emission electron gun is focused onto a surface of the sample through the two-stage lenses.
摘要翻译：一种电子束系统，其中可以减少电子束的喷射噪声并且可以使束流更高，并且还可以通过两级透镜形成成形梁，以允许具有高稳定性的操作。在该电子束系统中，从电子枪发射的电子束照射到样品上，并检测从样品发出的二次电子。电子枪是一种热离子发射型，设计用于在空间电荷限制条件下工作。成形孔径和NA孔径布置在电子枪的前部位置。由从热电子发射电子枪发射的电子束形成的成形孔的图像通过两级透镜聚焦到样品的表面上。

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