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    • 31. 发明授权
    • Optical system for use in exposure apparatus and device manufacturing method using the same
    • 用于曝光装置的光学系统及使用其的装置制造方法
    • US07102727B2
    • 2006-09-05
    • US10799196
    • 2004-03-12
    • Shinichi Hara
    • Shinichi Hara
    • G03B27/42
    • G03F7/70591G03F7/70891
    • Disclosed is an optical system for directing light from a light source to a predetermined plane, and it includes an optical element, a measuring mechanism for performing position measurement to a surface of the optical element, at plural measurement points on that surface, a first temperature controlling mechanism for controlling temperature of a first control region of the optical element, a second temperature controlling mechanism for controlling temperature of a second control region of the optical element, and a temperature controller for controlling the first and second temperature controlling mechanisms on the basis of the measurement made by the measuring mechanism. The proposed structure is very effective to prevent thermal deformation of the optical element due to irradiation with light, particularly in a case where only a portion of the optical element is locally irradiated with light.
    • 公开了一种用于将光从光源引导到预定平面的光学系统,其包括光学元件,用于在该表面上的多个测量点处对光学元件的表面进行位置测量的测量机构,第一温度 用于控制光学元件的第一控制区域的温度的控制机构,用于控制光学元件的第二控制区域的温度的第二温度控制机构和用于基于光学元件控制第一和第二温度控制机构的温度控制器 由测量机构进行的测量。 所提出的结构对于防止由于光的照射而导致的光学元件的热变形是非常有效的,特别是在仅光学元件的一部分被局部照射的情况下。
    • 34. 发明授权
    • Exposure apparatus for synchrotron radiation lithography
    • 用于同步辐射光刻的曝光装置
    • US6167111A
    • 2000-12-26
    • US108373
    • 1998-07-01
    • Yutaka WatanabeShunichi UzawaYasuaki FukudaNobutoshi MizusawaShinichi Hara
    • Yutaka WatanabeShunichi UzawaYasuaki FukudaNobutoshi MizusawaShinichi Hara
    • G03F7/20G21K1/06G21K5/00
    • G03F7/70058G21K1/06
    • An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask. When a light ray advancing from a light emission point of the light source toward a center of a predetermined region of the mask, to be transferred to the substrate, is taken as a chief ray, when a normal to each of the first and second mirrors at an incidence position of a corresponding chief ray is taken as a Z axis, when a direction perpendicular to a plane defined by the Z axis of each mirror and a corresponding chief ray is taken as an X axis, and when a Y axis is taken along a direction perpendicular to the Z axis and X axis of each mirror, the first mirror has a reflection surface of a shape which is concave with respect to the X axis direction and concave with respect to the Y axis direction, while the second mirror has a reflection surface of a shape which is convex with respect to the Y axis direction.
    • 一种用于利用来自同步加速器辐射光源的辐射光将掩模图案转印到基板上的装置,包括用于共同地反射来自同步加速器辐射光源的辐射光的第一反射镜和用于反射来自第一反射镜的辐射光的第二反射镜 并将其投射到面罩。 当将从光源的发光点向掩模的预定区域的中心传播的光线作为主光线时,当第一和第二反射镜中的每一个的法线 当将相应的主光线的入射位置作为Z轴时,当将与每个反射镜的Z轴和相应的主光线所定义的平面垂直的方向作为X轴,并且当采用Y轴时 沿着与每个反射镜的Z轴和X轴垂直的方向,第一反射镜具有相对于X轴方向为凹形且相对于Y轴方向凹陷的形状的反射面,而第二反射镜具有 相对于Y轴方向凸出的形状的反射面。