专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明专利

JP2006339169A Method of manufacturing device using electron beam apparatus 有权
标题翻译：使用电子束装置制造装置的方法
公开(公告)号：JP2006339169A
公开(公告)日：2006-12-14
申请号：JP2006231802
申请日：2006-08-29
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , NOMICHI SHINJI , HAMASHIMA MUNEKI , OKUBO YUKIHARU , KOHAMA SADAAKI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , YOSHIKAWA SEIJI , KANEUMA TOSHIFUMI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： H01J37/28 , G01N23/225 , H01J37/09 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To improve a throughput, precision or the like of an electron beam apparatus. SOLUTION: An electron beam apparatus is composed of a single electron gun which discharges electron beams, a condenser lens, an open plate having a plurality of holes, an E×B separator and a objective lens, and moreover, is provided with a first optical system which irradiates the electron beams from the electron gun on to a surface of a testpiece to be inspected, a second optical system which takes into a secondary electron detecting apparatus a secondary electron which is discharged from the above testpiece and accelerated by the objective lens and separated from the first optical system by the E×B separator, and the condenser lens made in two steps is positioned adjacent to the electron gun and the above open plate is positioned behind the two-step condenser lens and a plurality of electron beams are formed by irradiating electron beams on the open plate. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了提高电子束装置的产量，精度等。解决方案：电子束装置由放电电子束的单电子枪，聚光透镜，具有多个孔的开放板，E×B分离器和物镜组成，此外，第一光学系统，其将来自电子枪的电子束照射到要检查的被测件的表面;第二光学系统，其进入二次电子检测装置，二次电子从上述试件排出并被加速物镜，并通过E×B分离器与第一光学系统分离，并且以两个步骤制成的聚光透镜邻近电子枪定位，并且上述开放板位于两步聚光透镜后面，并且具有多个电子通过在开放板上照射电子束形成光束。版权所有（C）2007，JPO＆INPIT

32. 发明专利

JP2006269091A Electron beam device 有权
标题翻译：电子束装置
公开(公告)号：JP2006269091A
公开(公告)日：2006-10-05
申请号：JP2005080989
申请日：2005-03-22
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KAGA TORU , SOFUGAWA TAKUJI
IPC分类号： H01J37/29 , H01J37/12 , H01J37/153 , H01J37/244 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To correct an aberration outside a lens axis excellently that is generated by an axial color aberration correcting lens.
SOLUTION: A secondary electron emitted from a sample 10 by irradiation of an electron beam is deflected by a beam separator 7, and deflected to the vertical direction by an aberration correcting electrostatic deflector 11, and a magnified image is formed on the main face of an auxiliary lens 12. A secondary electron beam diverged by the auxiliary lens 12 passes through the axial color aberration correcting lenses 14 to 17, and an image is formed on the main face of an auxiliary lens 18 for a magnifying lens 19. Since the magnified image formed on the main face of the auxiliary lens 12 is also formed on a position separated from the optical axis, an enlarged aberration outside the lens axis is generated, if the secondary electron beam diverged from the auxiliary lens 12 is incident directly into the axial color aberration correcting lenses 14 to 17. In order to eliminate this, the image on the aperture 24 is arranged by the auxiliary lens 12 so as to be formed nearly at the center 18 of the optical axis direction of the axial color correcting lenses 14 to 17.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：为了校正由轴向色差校正透镜产生的透镜轴之外的像差。解决方案：通过电子束的照射从样品10发射的二次电子被束分离器7偏转，并由像差校正静电偏转器11偏转到垂直方向，并且在主体上形成放大图像由辅助透镜12发散的二次电子束通过轴向色像差校正透镜14至17，并且在用于放大透镜19的辅助透镜18的主面上形成图像。由于形成在辅助透镜12的主面上的放大图像也形成在与光轴分离的位置上，如果从辅助透镜12发散的二次电子束直接入射到透镜轴外侧，则产生扩大的像差轴向色像差校正透镜14至17.为了消除这种情况，孔24上的图像由辅助透镜12布置成几乎形成在中心18处轴向色彩校正透镜14〜17的光轴方向。（C）2007年，JPO＆INPIT

33. 发明专利

JP2006120436A Electron beam apparatus and device manufacturing method using the same 审中-公开
标题翻译：电子束装置和使用该装置的装置制造方法
公开(公告)号：JP2006120436A
公开(公告)日：2006-05-11
申请号：JP2004306641
申请日：2004-10-21
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , MURAKAMI TAKESHI , SOFUGAWA TAKUJI
IPC分类号： H01J37/29 , H01J37/141 , H01J37/145 , H01J37/153 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To provide an electron beam apparatus capable of lessening blooming of secondary electron due to a space charge effect of primary electron and lessening axial chromatic aberration or other aberration, as well as a manufacturing method of a device using the apparatus.
SOLUTION: The apparatus for making a distance between a sample and the main face of an objective lens larger than a Bohr radius of the objective lens by constituting the objective lens with a magnetic lens and having its magnetic gap at a light axis side, as well as the manufacturing method of a semiconductor device using the apparatus are provided.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够减少由于一次电子的空间电荷效应引起的二次电子的起伏和减小轴向色差或其他像差的电子束装置，以及使用该电子束的装置的制造方法仪器。解决方案：通过用磁性透镜构成物镜并且在光轴侧具有磁隙，用于使样品与物镜的主面之间的距离大于物镜的玻尔半径的装置，以及使用该装置的半导体器件的制造方法。版权所有（C）2006，JPO＆NCIPI

34. 发明专利

JP2006032278A Electron beam device, and device manufacturing method using the same 审中-公开
标题翻译：电子束装置及使用其的装置制造方法
公开(公告)号：JP2006032278A
公开(公告)日：2006-02-02
申请号：JP2004213083
申请日：2004-07-21
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , SATAKE TORU , SOFUGAWA TAKUJI , MURAKAMI TAKESHI
IPC分类号： H01J37/244 , H01J37/28 , H01J37/29 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To effectively detect each of a plurality of secondary electron beams.
SOLUTION: The electron beam device forming a plurality of primary electron beams from electron emitted from an electron gun 21 and irradiating them on a sample face is provided with an E×B separator 27 separating the secondary electron beam emitted from each scanning point of the sample from the primary electron beams, an electronic magnifying lens 31 magnifying mutual distances of the separated plurality of secondary electron beams, a fiber optical plate 32 transferring the magnified plurality of secondary electron beams by converting them into optical signals with a scintillator, a photoelectric conversion element 35 converting the optical signals into electric signals, an optical system zoom lens 33 imaging the optical signals from the scintillator on the photoelectric conversion element, and a rotating mechanism 36 for making the photoelectric conversion element 35 rotate around an optical axis.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：有效地检测多个二次电子束中的每一个。解决方案：从电子枪21发射的电子形成多个一次电子束并将其照射在样品面上的电子束装置设置有E×B分离器27，其分离从每个扫描点发射的二次电子束来自一次电子束的样品的电子放大镜31，放大分离的多个二次电子束的相互距离的电子放大透镜31，通过用闪烁体将它们转换成光信号而将放大的多个二次电子束转印的光纤板32，将光信号转换为电信号的光电转换元件35，对来自光电转换元件上的闪烁体的光信号进行成像的光学系统变焦透镜33，以及使光电转换元件35绕光轴旋转的旋转机构36。版权所有（C）2006，JPO＆NCIPI

35. 发明专利

JP2003323861A Pattern test device using electron beam, as well as manufacturing method of semiconductor device using the same 审中-公开
标题翻译：使用电子束的图案测试装置，作为使用其的半导体器件的制造方法
公开(公告)号：JP2003323861A
公开(公告)日：2003-11-14
申请号：JP2002127752
申请日：2002-04-30
申请人： Dainippon Screen Mfg Co Ltd , Ebara Corp , 大日本スクリーン製造株式会社 , 株式会社荏原製作所
发明人： ONISHI HIROYUKI , SASA YASUSHI , KANEUMA TOSHIFUMI , SATAKE TORU , KARIMATA TSUTOMU , WATANABE KENJI , NOMICHI SHINJI , MURAKAMI TAKESHI , HATAKEYAMA MASAKI , NAKASUJI MAMORU , SOFUGAWA TAKUJI , YOSHIKAWA SEIJI , OWADA SHIN , NISHIFUJI MUTSUMI
IPC分类号： G01N23/225 , G06T1/00 , G06T7/00 , H01J37/06 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To enable to obtain an S/N ratio of a secondary electron detecting signal of a desired size, even when a radiation amount of a primary electron beam is reduced in order not to damage electric characteristics of a substrate. SOLUTION: An electron gun 1-9 is set to be actuated within a space charge restricted area by monitoring a heating current vs. an electron gun current or an anode voltage vs. the electron gun current. A cathode of the electron gun 1-9 is constituted of a single crystal LaB 6 , the electronic beams emitted from the electron gun 1-9 are narrowed to a value of a desired beam diameter D with a condenser lens 2-9 and an objective lens 9-9, and a picture is shown on a substrate 10-9. A secondary electron emitted from a wafer is detected by a detector 41-9, and converted into image data by an image processing part 42-9, and a prescribed pattern test is carried out. Because the electron gun 1-9 is actuated within the space charge restricted area, shot noises become smaller, and the S/N ratio of the detected signal becomes larger, even when the radiated amount of the primary electron beam is made smaller. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：为了获得所需尺寸的二次电子检测信号的S / N比，即使当一次电子束的辐射量减小以便不损坏基板的电特性时。解决方案：电子枪1-9被设置为通过监测加热电流对电子枪电流或阳极电压与电子枪电流的关系而在空间电荷限制区内被致动。电子枪1-9的阴极由单晶LaB SB 6构成，从电子枪1-9发射的电子束通过冷凝器变窄到所需光束直径D的值透镜2-9和物镜9-9，并且在基板10-9上示出图像。从晶片发射的二次电子由检测器41-9检测，并通过图像处理部42-9转换成图像数据，进行规定的图案检验。因为电子枪1-9在空间电荷限制区域内被致动，所以即使当一次电子束的辐射量变小时，射击噪声变小，并且检测信号的S / N比变大。版权所有（C）2004，JPO

36. 发明专利

JP2003031173A Charged particle beam control device and charged particle beam optical device using the same, and charged particle beam defect checking device 审中-公开
标题翻译：充电粒子束控制装置和使用其的带电粒子束光学装置和充电颗粒光束缺陷检查装置
公开(公告)号：JP2003031173A
公开(公告)日：2003-01-31
申请号：JP2001210863
申请日：2001-07-11
申请人： Ebara Corp , Nikon Corp , 株式会社ニコン , 株式会社荏原製作所
发明人： SOFUGAWA TAKUJI , SUGIYAMA KIWA
IPC分类号： G01N23/225 , G21K1/08 , G21K1/087 , G21K5/04 , G21K7/00 , H01J37/05 , H01J37/147 , H01J49/48
CPC分类号： H01J37/1472 , H01J37/05 , H01J2237/1508 , H01J2237/24592
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam control device and a charged particle beam optical device using the same, and a charged particle beam defect checking device which can accurately and easily position an electric field and a magnetic field. SOLUTION: A pair of electrodes 11, 12 facing each other are formed by covering a part of ceramics by metal, and a Wien's filter A is constructed by arranging a pair of magnetic poles 13, 14 perpendicular to the pair of electrodes 11, 12. Here, side surfaces 11e, 11f and side surfaces 12e, 12f are formed to the part of the electrodes 11, 12 which are not covered by metal, and a first positioning surfaces 13e, 13f are formed to the magnetic poles 13, 14, and relative position of the electrodes 11, 12 and the magnetic poles 13,14 are fixed by making above surfaces contact with each other, thus, the electrodes 11, 12 and the magnetic poles 13, 14 are positioned.
摘要翻译：要解决的问题：提供一种带电粒子束控制装置和使用其的带电粒子束光学装置，以及能够精确地容易地定位电场和磁场的带电粒子束缺陷检查装置。解决方案：通过用金属覆盖陶瓷的一部分而形成一对彼此面对的电极11,12，并且通过布置垂直于该对电极11,12的一对磁极13,14来构成维恩滤波器A. 这里，侧面11e，11f和侧面12e，12f形成在电极11,12的未被金属覆盖的部分上，第一定位面13e，13f形成在磁极13,14上，通过使上述表面彼此接触来固定电极11,12和磁极13,14的相对位置，因此电极11,12和磁极13,14被定位。

37. 发明专利

JP2014112087A Inspection device using charged particle beam, and method of manufacturing device using the inspection device 有权
标题翻译：使用充电颗粒束的检查装置以及使用检查装置制造装置的方法
公开(公告)号：JP2014112087A
公开(公告)日：2014-06-19
申请号：JP2013253948
申请日：2013-12-09
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NOJI NOBUHARU , SATAKE TORU , SOFUGAWA TAKUJI , KANEUMA TOSHIFUMI , HATAKEYAMA MASAKI , YOSHIKAWA SEIJI , MURAKAMI TAKESHI , WATANABE KENJI , KARIMATA TSUTOMU , SUEMATSU KENICHI , TABE YUTAKA , TAJIMA RYO , TOYAMA KEIICHI
IPC分类号： G01N23/225 , H01J37/20 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To prevent unevenness of a charge amount on a substrate surface.SOLUTION: An electron beam inspection device for inspecting a substrate W by using an electron beam includes: an electron gun 59-6 for irradiating an inspected area of the substrate W; a detector 59-4 for detecting electrons emitted from the substrate W; and a pre-charge unit 59-5. The pre-charge unit 59-5 is at least one of: means of irradiating an area including an inspection area with an electron beam before irradiation of an electron beam; means of coating the area including the inspection area with a conductive film before irradiation of an electron beam; means of spraying negative gas of argon, oxygen or the like onto the surface of the substrate W during inspection; and means 59-21 of performing adjustment so as to be in a negative charge mode having irradiation energy of 3-5 keV; and means of performing adjustment so as to inspect a reflection electron in irradiation energy of 0.5-3 keV.
摘要翻译：要解决的问题：防止基板表面上的电荷量的不均匀。解决方案：用于通过使用电子束检查基板W的电子束检查装置包括：用于照射基板的检查区域的电子枪59-6 瓦; 用于检测从衬底W发射的电子的检测器59-4; 和预充电单元59-5。预充电单元59-5至少是以下中的至少一种：在电子束照射之前用电子束照射包括检查区域的区域的装置; 在电子束照射之前用导电膜涂覆包括检查区域的区域的装置; 在检查期间将氩气，氧气等的负气体喷射到基板W的表面上的方法; 以及进行调整以使其具有照射能量为3-5keV的负电荷模式的装置59-21; 以及进行调整以在0.5-3keV的照射能量下检查反射电子的装置。

38. 发明专利

JP2013167207A Turbo-molecular pump 审中-公开
标题翻译：涡轮分子泵
公开(公告)号：JP2013167207A
公开(公告)日：2013-08-29
申请号：JP2012030970
申请日：2012-02-15
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KAWASAKI HIROYUKI , SOFUGAWA TAKUJI
IPC分类号： F04D19/04
CPC分类号： F04D19/042
摘要： PROBLEM TO BE SOLVED: To provide a turbo-molecular pump capable of preventing trouble of inflow of dust or a foreign matter to a vacuum container, or the like due to air intrusion that occurs in a vacuum pumping system provided with the turbo-molecular pump and, meanwhile, capable of preventing air intrusion to the turbo-molecular pump.SOLUTION: An automatic opening and closing valve provided with a valve body 41 that opens and closes according to a pressure difference is disposed on a suction port and/or a pump exhaust port of a pump casing 1, or near the suction port and/or the pump exhaust port of the pump casing 1. The automatic opening and closing valve includes a valve seat 1s, a valve body 41 pushed in one direction by a restoring force of at least two springs 43 and at least two valve body support rods 42 which support the valve body 41 and, at the same time, guide the movement of the valve body 41, and is configured such that, when a pressure is applied in a direction reverse to the direction into which the valve body 41 is pushed, the spring 43 is contracted in the pressure actuating direction and, thereby, the valve body 41 is moved in the axial direction of the valve body support rods 42 such that the valve seat 1s is closed.
摘要翻译：要解决的问题：提供一种涡轮分子泵，其能够防止由于在具有涡轮分子泵的真空泵送系统中发生的空气侵入而导致灰尘或异物流入真空容器等的麻烦同时能够防止空气侵入涡轮分子泵。解决方案：具有阀体41的自动开关阀，其根据压力差打开和关闭，设置在吸入口和/或泵泵壳1的排气口或泵壳1的吸入口和/或泵排出口附近。自动开关阀包括阀座1s，通过恢复力沿一个方向推动的阀体41 至少两个弹簧43和至少两个支撑阀体41的阀体支撑杆42，并且同时引导阀体41的运动，并且构造成使得当在方向反转在阀体41被推动的方向上，弹簧43在压力致动方向上收缩，从而阀体41沿着阀体支撑杆42的轴向移动，使得阀座1s为关闭。

39. 发明专利

JP2012119704A Seat beam type inspection device 有权
标题翻译：座椅类型检测装置
公开(公告)号：JP2012119704A
公开(公告)日：2012-06-21
申请号：JP2012006612
申请日：2012-01-16
申请人： Ebara Corp , 株式会社荏原製作所
发明人： NAKASUJI MAMORU , NOMICHI SHINJI , SATAKE TORU , KANEUMA TOSHIFUMI , SOFUGAWA TAKUJI , KARIMATA TSUTOMU , OWADA SHIN , YOSHIKAWA SEIJI , NISHIFUJI MUTSUMI
IPC分类号： H01L21/683 , G01N23/225 , G03F1/76 , G03F1/78 , H01J37/06 , H01J37/073 , H01J37/18 , H01J37/20 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
CPC分类号： G01N23/225 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/20 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To provide an electrostatic chuck capable of sucking and holding a wafer reliably.SOLUTION: An electrostatic chuck 1410, for electrostatically sucking and holding a wafer, is composed of a substrate 1405, an electrode plate 1412, and an insulating layer 1404 overlapped, and generates a suction force between the wafer and the chuck by applying to an electrode plate of the electrostatic chuck a voltage linked to a voltage applied to the wafer, increasing or decreasing from 0 volt to a prescribed voltage with time.

40. 发明专利

JP2011142090A Inspection device by electron beam, inspection method, and device manufacturing method using its inspection device 有权
标题翻译：电子束检查装置，检查方法和使用其检查装置的装置制造方法
公开(公告)号：JP2011142090A
公开(公告)日：2011-07-21
申请号：JP2011007078
申请日：2011-01-17
申请人： Ebara Corp , Toshiba Corp , 株式会社東芝 , 株式会社荏原製作所
发明人： YAMAZAKI YUICHIRO , WATANABE KENJI , SOFUGAWA TAKUJI , NOMICHI SHINJI , SATAKE TORU , YOSHIKAWA SEIJI , KARIMATA TSUTOMU , NAKASUJI MAMORU , HATAKEYAMA MASAKI , MURAKAMI TAKESHI , NAGAHAMA ICHIROTA , NAGAI TAKAMITSU , SUGIHARA KAZUYOSHI
IPC分类号： H01J37/29 , H01J37/09 , H01J37/22 , H01J37/244 , H01J37/28 , H01L21/66
CPC分类号： H01J37/28 , H01J37/224 , H01J37/244 , H01J2237/006 , H01J2237/20221 , H01J2237/2445 , H01J2237/2817
摘要： PROBLEM TO BE SOLVED: To improve inspection speed for detecting a defect of a sample such as wafers.
SOLUTION: In an electron beam test device equipped with a first electronic optical system which irradiates the electron beam to the sample to be inspected, a second optical system which makes the second beam irradiated from the wafers to a detector and a control equipment to control the detector, the electron beam test device includes a first column, a second column, and a chamber. The first column is arranged with an electron gun and the first electronic optical system. In the chamber, a stage is installed, and the sample is put thereon. At the second column, on a light axis, a cathode lens, a numerical aperture, a Wien filter, a second lens, a field aperture, a third lens, a fourth lens, and the detector are arranged. An opening part is arranged to be a focus position of the electron beam and a focal position of the cathode lens. The cathode lens and the numerical aperture constitute a telecentric electronic optical system.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提高用于检测诸如晶片的样品的缺陷的检查速度。解决方案：在配备有将电子束照射到待检查样品的第一电子光学系统的电子束测试装置中，使得将第二光束从晶片照射到检测器的第二光学系统和控制设备为了控制检测器，电子束测试装置包括第一列，第二列和室。第一列配置有电子枪和第一电子光学系统。在室中，安装一个台，将样品放在其上。在第二列处，在光轴上布置有阴极透镜，数值孔径，维恩滤波器，第二透镜，场光圈，第三透镜，第四透镜和检测器。开口部被配置为电子束的焦点位置和阴极透镜的焦点位置。阴极透镜和数值孔径构成远心电子光学系统。版权所有（C）2011，JPO＆INPIT

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式