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31. 发明专利

JP2012102237A Polyimide precursor resin composition and article 有权
标题翻译：聚酰亚胺前体树脂组合物及其制品
公开(公告)号：JP2012102237A
公开(公告)日：2012-05-31
申请号：JP2010252027
申请日：2010-11-10
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： AMAGAI YOSHITSUNA , SAKAYORI KATSUYA , KATAYAMA ASAMI
IPC分类号： C08L79/08 , C08K5/17 , C09D7/12 , C09D179/08 , C09J11/06 , C09J179/08 , G02B6/12
摘要： PROBLEM TO BE SOLVED: To provide a polyimide precursor resin composition capable of being imidized with mild heat treatment conditions by bringing heating temperature in obtaining a polyimide from a polyimide precursor to be lower and curing promoting activity at the low temperature to be higher, and an article using the polyimide precursor resin composition, especially suitably, the article obtained by forming a part composed of the polyimide on an article with low heat resistance.SOLUTION: The polyimide precursor resin composition contains a polyimide precursor and a base having a ≥150°C boiling point and ≤200°C melting point and a base selected from the group consisting of primary and secondary aliphatic amines having an alcoholic hydroxyl group and no acidic group included in a group consisting of a carboxyl group, a sulfo group and a phosphate group. The article, at least a part of it, is formed of the resin composition or its cured material.
摘要翻译：解决问题的方法为了提供一种能够通过使从聚酰亚胺前体获得聚酰亚胺的加热温度降低并且在低温下的固化促进活性更高的温和热处理条件而酰亚胺化的聚酰亚胺前体树脂组合物以及使用聚酰亚胺前体树脂组合物的制品，特别适合于通过在耐热性低的制品上形成由聚酰亚胺构成的部分而得到的制品。解决方案：聚酰亚胺前体树脂组合物含有聚酰亚胺前体和沸点≥150℃和≤200℃熔点的碱和选自具有醇羟基的伯和仲脂族胺的碱并且没有酸性基团包括在由羧基，磺基和磷酸基组成的组中。该制品的至少一部分由树脂组合物或其固化材料形成。版权所有（C）2012，JPO＆INPIT

32. 发明专利

JP2012093744A Photosensitive resin composition, material for forming pattern comprising the photosensitive resin composition, method for manufacturing relief pattern using the photosensitive resin composition, and article using the composition 审中-公开
标题翻译：感光性树脂组合物，形成包含感光性树脂组合物的图案的材料，使用感光性树脂组合物制造缓解图案的方法和使用组合物的制品
公开(公告)号：JP2012093744A
公开(公告)日：2012-05-17
申请号：JP2011215942
申请日：2011-09-30
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , AMANO HIROKO , FUKUDA TOSHIHARU , SAKAYORI KATSUYA
IPC分类号： G03F7/004 , G03F7/038 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, which induces little outgas or odor in use and can give a pattern with a good profile independent from types of polymer precursors.SOLUTION: The photosensitive resin composition contains: a polymer precursor the reaction of which reaching a final product is promoted by a basic substance or by heating in the presence of a basic substance; and a base generator which has a specified structure and generates a base by irradiation with electromagnetic waves as well as forms a covalent bond with the polymer precursor by heating and/or by irradiation with electromagnetic waves.
摘要翻译：要解决的问题：提供一种感光树脂组合物，其在使用中引起很少的气味或气味，并且可以形成独立于聚合物前体类型的良好轮廓的图案。光敏树脂组合物含有：通过碱性物质或通过在碱性物质的存在下加热而达到最终产物的反应的聚合物前体; 以及具有特定结构的基底发生器，通过电磁波的照射产生基底，并且通过加热和/或通过电磁波的照射与聚合物前体形成共价键。版权所有（C）2012，JPO＆INPIT

33. 发明专利

JP2012092328A Base generator, photosensitive resin composition, pattern formation material comprising the photosensitive resin composition, and method for producing relief pattern and article using the composition 审中-公开
标题翻译：基因发生器，感光性树脂组合物，包含感光性树脂组合物的图案形成材料，以及使用该组合物制造消除图案和制品的方法
公开(公告)号：JP2012092328A
公开(公告)日：2012-05-17
申请号：JP2011215941
申请日：2011-09-30
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , AMANO HIROKO , FUKUDA TOSHIHARU , SAKAYORI KATSUYA
IPC分类号： C09K3/00 , G03F7/004
摘要： PROBLEM TO BE SOLVED: To provide a base generator with less occurrence of outgas or odor when in use, and to provide a photosensitive resin composition applicable to various polymeric precursors and having less occurrence of outgas or odor when in use.SOLUTION: The base generator which generates a base by electromagnetic irradiation is characterized by including in one molecule, at least one blocked covalent bond-forming group in which a part of the structure thereof varies by heating and/or electromagnetic irradiation to become a functional group possible to form a covalent bond together with other molecules. The photosensitive resin composition includes the polymeric precursor in which the reaction to a final product is accelerated by a basic material or heating in the presence of the basic material, and contains the base generator as an essential component.
摘要翻译：要解决的问题：提供一种在使用中较少发生气味或气味的基础发生器，并提供适用于各种聚合物前体的光敏树脂组合物，并且在使用时具有较少的气味或气味的出现。解决方案：通过电磁辐射产生碱的基底发生器的特征在于在一个分子中包含至少一个封闭的共价键形成基团，其中结构的一部分通过加热和/或电磁辐射而变化，成为可能与其他分子一起形成共价键的官能团。感光性树脂组合物包括聚合物前体，其中通过碱性材料加速最终产物的反应或在碱性物质的存在下加热，并且含有作为必需成分的碱发生剂。版权所有（C）2012，JPO＆INPIT

34. 发明专利

JP2011227485A Method for manufacturing relief pattern and electronic part 有权
标题翻译：制造放射图案和电子零件的方法
公开(公告)号：JP2011227485A
公开(公告)日：2011-11-10
申请号：JP2011070715
申请日：2011-03-28
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： AMAGAI KEI , SAKAYORI KATSUYA , FUKUDA TOSHIHARU , KATAYAMA ASAMI
IPC分类号： G03F7/38 , G03F7/004 , G03F7/038 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a relief pattern improved in residual film ratio and an electronic part having the relief pattern formed by the manufacturing method.SOLUTION: The method for manufacturing the relief pattern includes a process for heating a coating film or a compact, before a development process for forming the coating film or the compact by using a negative photosensitive resin composition, irradiating the coating film or the compact with an electromagnetic wave in a predetermined pattern shape, and then, removing the coating film of an unexposed part, to form the pattern. The heating process is a process for heating the coating film or the compact through a heating medium or by the radiation of the electromagnetic wave under an atmosphere where a gas is actively and continuously supplied from the outside of a system and a volatile component generated from the coating film or the compact is actively removed to the outside of the system.
摘要翻译：要解决的问题：提供一种用于制造改善残留膜比的浮雕图案的方法和具有通过该制造方法形成的浮雕图案的电子部件。解决方案：浮雕图案的制造方法包括在通过使用负型感光性树脂组合物形成涂膜或成型体的显影处理之前，对涂膜或成形体进行加热的方法，照射涂膜或用预定图案形状的电磁波压制，然后去除未曝光部分的涂膜，以形成图案。加热过程是一种通过加热介质或通过电磁波的辐射来加热涂膜或压块的过程，在气体从系统的外部积极连续地供给的气氛和由涂层膜或压块被主动地移除到系统的外部。版权所有（C）2012，JPO＆INPIT

35. 发明专利

JP2011118198A Photosensitive resin composition, article using the same, and method for forming negative pattern 有权
标题翻译：感光性树脂组合物，使用其的制品和形成负面图案的方法
公开(公告)号：JP2011118198A
公开(公告)日：2011-06-16
申请号：JP2009276177
申请日：2009-12-04
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： FUKUDA TOSHIHARU , SAKAYORI KATSUYA , KATAYAMA ASAMI
IPC分类号： G03F7/004 , G03F7/038 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a photosensitive resin composition giving high solubility contrast regardless to the kind of a polyimide precursor by addition of a smaller amount of a photo-base generator, and thereby, giving a pattern having preferable features while maintaining a sufficient process margin. SOLUTION: The photosensitive resin composition contains a photo-base generator expressed by general formula (1) or (2) and a polyimide precursor. In formulae, R1 and R2 each represent a hydrogen atom, 1-18C alkyl group, 2-18C alkenyl group, 2-18C alkynyl group or 6-12C aryl group; n is an integer of 2 or 3; m is an integer of 3 to 5; and A represents a group expressed by general formula (3) (not shown) or general formula (4) (not shown). COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决问题：通过添加较少量的光产生剂来提供具有高溶解度对比度的感光性树脂组合物，而不管聚酰亚胺前体的种类如何，通过添加较少量的光产生剂，从而提供具有优选特征的图案，同时保持足够的流程保证金。光敏树脂组合物含有由通式（1）或（2）表示的光碱产生剂和聚酰亚胺前体。在式中，R 1和R 2各自表示氢原子，1-18C烷基，2-18C烯基，2-18C炔基或6-12C芳基; n为2或3的整数; m为3〜5的整数， A表示通式（3）（未示出）或通式（4）（未示出）表示的基团。版权所有（C）2011，JPO＆INPIT

36. 发明专利

JP2010254982A Base generator, resin composition, pattern forming material consisting of the resin composition, pattern forming method using the resin composition and article using the resin composition 有权
标题翻译：基质发生器，树脂组合物，形成树脂组合物的材料的图案，使用树脂组合物的图案形成方法和使用树脂组合物的文章
公开(公告)号：JP2010254982A
公开(公告)日：2010-11-11
申请号：JP2010078541
申请日：2010-03-30
申请人： Dainippon Printing Co Ltd , 大日本印刷株式会社
发明人： KATAYAMA ASAMI , FUKUDA TOSHIHARU , SAKAYORI KATSUYA
IPC分类号： C09K3/00 , C07C235/34 , C07C271/18 , C07D317/64 , C08K5/00 , C08L101/00 , G03F7/004 , G03F7/038
摘要： PROBLEM TO BE SOLVED: To provide a base generator which contains no salt, can generate tertiary amine as a strong base and has a wide applicable range and to provide a resin composition which has a wide range of choice applicable onto the structure of a polymer precursor wherein reaction to an end product is promoted by a basic substance or heating in the presence of the basic substance. SOLUTION: The base generator generates a base expressed by chemical formula (1) when irradiated with electromagnetic wave and/or heated, and the generated base is subjected to Michael addition in the same molecule by heating. The resin composition contains the polymer precursor wherein reaction to the end product is promoted by the base generator and the basic substance or by heating in the presence of the basic substance. Symbols in the formula (1) are specially defined. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供不含盐的碱发生剂，可以产生作为强碱的叔胺，并且具有广泛的适用范围，并且提供具有广泛选择性的树脂组合物，其可应用于其中对最终产物的反应由碱性物质促进或在碱性物质存在下加热的聚合物前体。解决方案：当用电磁波照射和/或加热时，基底发生器产生由化学式（1）表示的碱，并且通过加热在所述相同分子中进行迈克尔加成。树脂组合物含有聚合物前体，其中通过碱产生剂和碱性物质促进最终产物的反应，或通过在碱性物质的存在下加热。公式（1）中的符号是特别定义的。版权所有（C）2011，JPO＆INPIT

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