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    • 33. 发明申请
    • METHOD OF FABRICATING MEMORY DEVICE
    • 制造存储器件的方法
    • US20160093637A1
    • 2016-03-31
    • US14832285
    • 2015-08-21
    • Jae-goo LEEYoung-woo PARK
    • Jae-goo LEEYoung-woo PARK
    • H01L27/115H01L21/28H01L21/311
    • H01L27/11582H01L21/28282H01L27/11575
    • A method of fabricating a memory device includes alternately stacking a plurality of insulating layers and a plurality of sacrificial layers on a substrate, forming a channel hole by etching the insulating layers and the sacrificial layers to expose a partial region of the substrate, forming a channel structure in the channel hole, forming an opening by etching the insulating layers and the sacrificial layers to exposed a portion of the substrate, forming a plurality of side openings that include first side openings and a second side opening by removing the sacrificial layers through the opening, forming gate electrodes to fill the first side openings, and forming a blocking layer to fill the second side opening.
    • 一种制造存储器件的方法包括在衬底上交替堆叠多个绝缘层和多个牺牲层,通过蚀刻绝缘层和牺牲层形成通道孔,以暴露衬底的部分区域,形成通道 通道孔中的结构,通过蚀刻绝缘层和牺牲层形成开口以暴露基板的一部分,通过开口去除牺牲层,形成包括第一侧开口和第二侧开口的多个侧开口 形成栅电极以填充第一侧开口,以及形成阻挡层以填充第二侧开口。