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31. 发明授权

US07492941B2 Mask defect analysis system 失效
公开(公告)号：US07492941B2
公开(公告)日：2009-02-17
申请号：US11769431
申请日：2007-06-27
申请人： James A. Bruce , Orest Bula , Edward W. Conrad , William C. Leipold , Michael S. Hibbs , Joshua J. Krueger
发明人： James A. Bruce , Orest Bula , Edward W. Conrad , William C. Leipold , Michael S. Hibbs , Joshua J. Krueger
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： An automated system for analyzing mask defects in a semiconductor manufacturing process is presented. This system combines results from an inspection tool and design layout data from a design data repository corresponding to each mask layer being inspected with a computer program and a predetermined rule set to determine when a defect on a given mask layer has occurred. Mask inspection results include the presence, location and type (clear or opaque) of defects. Ultimately, a determination is made as to whether to scrap, repair or accept a given mask based on whether the defect would be likely to cause product failure. Application of the defect inspection data to the design layout data for each mask layer being inspected prevents otherwise acceptable wafer masks from being scrapped when the identified defects are not in critical areas of the mask.

32. 发明申请

US20080089575A1 Alternating phase shift mask inspection using biased inspection data 失效
标题翻译：使用偏置检查数据的交替相移掩模检查
公开(公告)号：US20080089575A1
公开(公告)日：2008-04-17
申请号：US11549263
申请日：2006-10-13
申请人： Karen D. Badger , Michael S. Hibbs , Christopher K. Magg
发明人： Karen D. Badger , Michael S. Hibbs , Christopher K. Magg
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G03F1/30
摘要： An inspection system uses inspection data biased to compensate for mismatches that occur as a result of using an optical lithography system to print an alternating phase shift mask that operates at a wavelength of light that is different from the wavelength of light that an inspection system uses to inspect the mask for defects.
摘要翻译：检查系统使用偏置的检查数据来补偿由于使用光学光刻系统来印刷在与检查系统使用的光的波长不同的光的波长下操作的交替相移掩模而发生的错配，检查面具有缺陷。

33. 发明申请

US20070196741A1 Phase Calibration for Attenuating Phase-Shift Masks 失效
标题翻译：衰减相移掩模的相位校准
公开(公告)号：US20070196741A1
公开(公告)日：2007-08-23
申请号：US11276232
申请日：2006-02-20
申请人： Michael S. Hibbs , Timothy A. Brunner
发明人： Michael S. Hibbs , Timothy A. Brunner
IPC分类号： G03C5/00 , G03F1/00
CPC分类号： G03F1/84 , G03F1/32
摘要： A phase metrology pattern for attenuating phase masks. The phase error of this pattern can be determined to high accuracy by aerial image measurements. This pattern can be used to create an optical phase standard for calibrating phase metrology equipment for attenuated phase masks, or as a witness pattern on a product mask to verify the phase accuracy of that mask. The pattern includes an effective line to space ratio and can be tested using a microscope or stepper system or can be measured directly using a detector for the 0 order diffraction measurement.
摘要翻译：用于衰减相位掩模的相位计量模式。该图案的相位误差可以通过空间图像测量确定为高精度。该模式可用于创建用于校准衰减相位掩模的相位计量设备的光学相位标准，或者作为产品掩模上的见证图案，以验证该掩模的相位精度。该图案包括有效的线间距比，并且可以使用显微镜或步进系统进行测试，或者可以使用用于0次衍射测量的检测器直接测量。

34. 发明授权

US06834548B1 Method and apparatus for reduction of high-frequency vibrations in thick pellicles 失效
标题翻译：降低厚膜中高频振动的方法和装置
公开(公告)号：US06834548B1
公开(公告)日：2004-12-28
申请号：US10250255
申请日：2003-06-18
申请人： Michael S. Hibbs
发明人： Michael S. Hibbs
IPC分类号： G01N2904
CPC分类号： G03F1/62 , G01N29/11 , G01N29/12 , G01N2291/0237 , G03F7/709
摘要： A method of reducing sound-induced vibrations in pellicles used in lithographic production of microelectronic features comprises providing a pellicle for protecting a photomask, monitoring background sound in the vicinity, or vibration, of the pellicle, providing opposing sound waves to the background sound, and causing the opposing sound waves to strike the pellicle to substantially cancel vibrations due to the background sound or vibration. When the background sound strikes the pellicle on one surface of the pellicle, the opposing sound waves may strike the pellicle on the opposing surface of the pellicle, and may be provided with substantially the same frequency and amplitude in the same phase to the background sound. Alternatively, opposing sound waves may strike the pellicle on the same surface of the pellicle as the background sound waves, may be provided with substantially the same frequency and amplitude in opposing phase to the background sound.
摘要翻译：一种降低用于微电子特征的平版印刷生产中的薄膜中的声音引起的振动的方法包括提供用于保护光掩模的防护薄膜，监测防护薄膜组件附近的背景声音或振动，为背景声提供相反的声波，以及导致相对的声波撞击防护薄膜，以基本上抵消由于背景声音或振动引起的振动。当背景声音在防护薄膜组件的一个表面上撞击防护薄膜组件时，相对的声波可能会撞击防护薄膜组件的相对表面上的防护薄膜组件，并且可以在与背景声音相同的相位中提供基本上相同的频率和振幅。或者，相反的声波可以在防护薄膜的与背景声波相同的表面上撞击防护薄膜，可以以与背景声音相反的相位具有基本上相同的频率和幅度。

35. 发明授权

US06582857B1 Repair of masks to promote adhesion of patches 有权
标题翻译：修复口罩以促进贴片的粘附
公开(公告)号：US06582857B1
公开(公告)日：2003-06-24
申请号：US09526858
申请日：2000-03-16
申请人： Philip S. Flanigan , Dennis M. Hayden , Michael S. Hibbs , Timothy E. Neary
发明人： Philip S. Flanigan , Dennis M. Hayden , Michael S. Hibbs , Timothy E. Neary
IPC分类号： G03F900
CPC分类号： G03F1/72 , G03F1/26 , G03F1/74
摘要： The current invention performs short pulse laser ablation of clear defect regions on a mask prior to patching the clear defect regions. The short-pulse laser ablation removes any residue that absorbs light. Thus, the ablation completely cleans the surface of the clear defect regions, meaning that any patches of the surface will better adhere to the surface of the mask. This is particularly important during those situations where a later etch of a conductive surface added to the mask creates a solvent because the etchant interacts with residue on the mask, and wherein the solvent attacks the patch material at the patch material's interface.
摘要翻译：本发明在修补清晰的缺陷区域之前对掩模上的清晰缺陷区进行短脉冲激光烧蚀。短脉冲激光烧蚀消除了吸收光的残留物。因此，消融完全清洁透明缺陷区域的表面，意味着表面的任何贴片将更好地粘附到掩模的表面。这在这些情况下特别重要，在这些情况下，添加到掩模中的导电表面的后续蚀刻产生溶剂，因为蚀刻剂与掩模上的残余物相互作用，并且其中溶剂在补片材料的界面处攻击补片材料。

36. 发明授权

US6156461A Method for repair of photomasks 有权
标题翻译：光掩模修复方法
公开(公告)号：US6156461A
公开(公告)日：2000-12-05
申请号：US504031
申请日：2000-02-14
申请人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
发明人： Brian J. Grenon , Richard A. Haight , Dennis M. Hayden , Michael S. Hibbs , J. Peter Levin , Timothy E. Neary , Raymond E. Rochefort , Dennis A. Schmidt , Jacek G. Smolinski , Alfred Wagner
IPC分类号： B23K26/06 , G03F1/74 , H01L21/027 , G03S9/00
CPC分类号： G03F1/74 , B23K26/0624
摘要： A method of repairing defects on masks includes the step of providing a coating on the mask to prevent damage to clear regions of the mask from laser ablation splatter, laser ablation caused quartz pitting, laser deposition staining, and FIB caused gallium staining. The coating is a metal, a polymer, or a carbon material. The coating is formed on clear regions of the mask as well as either over or under the light absorbing material of the mask. A coating comprising a thin copper layer significantly improves imaging with the ion beam while protecting clear regions of the mask from FIB stain. A coating formed of a photosensitive polymer is used to etch opaque defects. While wanted opaque regions adjacent an opaque defect are also etched in this etch step, these created clear defects are then repaired in a subsequent FIB deposition step while a copper coating protects adjacent clear regions from FIB stain. In another embodiment, opaque defects are repaired with a short pulse duration laser without damage to underlying quartz or adjacent clear regions while avoiding the need for a coating.
摘要翻译：修复掩模上的缺陷的方法包括在掩模上提供涂层以防止由于激光烧蚀溅射，激光烧蚀引起的石英点蚀，激光沉积染色和FIB引起的镓染色而对掩模的清晰区域的损害的步骤。涂层是金属，聚合物或碳材料。涂层形成在掩模的透明区域以及掩模的光吸收材料的上方或下方。包含薄铜层的涂层显着地改善了用离子束的成像，同时保护掩模的清除区域不受FIB染色。由光敏聚合物形成的涂层用于蚀刻不透明缺陷。虽然在该蚀刻步骤中也蚀刻邻近不透明缺陷的不透明区域，然后在随后的FIB沉积步骤中修复这些产生的明确缺陷，而铜涂层保护相邻的清晰区域免受FIB染色。在另一个实施例中，用短脉冲持续时间激光修复不透明缺陷，而不损害下面的石英或相邻的透明区域，同时避免了涂层的需要。

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