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31. 发明申请

US20100227261A1 Flare-measuring mask, flare-measuring method, and exposure method 有权
标题翻译：闪光测量面罩，闪光测量方法和曝光方法
公开(公告)号：US20100227261A1
公开(公告)日：2010-09-09
申请号：US12654438
申请日：2009-12-18
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G03F7/20 , G03F1/00
CPC分类号： G03F1/44 , G01N21/4738 , G03F1/14 , G03F1/144 , G03F1/22 , G03F1/70 , G03F1/84 , G03F7/70941
摘要： A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern surrounded by a first side, a second side which is inclined at a predetermined angle with respect to the first side, and an inner diameter portion and an outer diameter portion which connect both ends of the first side and both ends of the second side; projecting an image of the sectoral pattern via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern and a light amount provided at a position away from the image. With the flare measuring method, it possible to correctly measure the flare information in an arbitrary angle range.
摘要翻译：一种用于测量投影光学系统的耀斑信息的方法包括：在投影光学系统的物平面上布置由第一侧围绕的扇形图案，相对于第一侧以预定角度倾斜的第二侧，以及连接第一侧的两端和第二侧的两端的内径部和外径部; 通过投影光学系统投影扇形图案的图像; 以及基于扇区图案的图像的光量和设置在远离图像的位置处的光量来确定闪光信息。通过闪光测量方法，可以正确地测量任意角度范围内的耀斑信息。

32. 发明申请

US20080259439A1 Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror 有权
标题翻译：多层膜反射镜，曝光装置，器件制造方法以及多层膜反射镜的制造方法
公开(公告)号：US20080259439A1
公开(公告)日：2008-10-23
申请号：US12074903
申请日：2008-03-07
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G02B5/26 , G02B1/10 , B05D5/06
CPC分类号： B82Y10/00 , G02B5/0891 , G03F1/24 , G03F7/70958 , G21K1/062 , G21K2201/064 , G21K2201/067
摘要： Multilayer-film reflective mirrors are disclosed. An exemplary such mirror has a base and a multilayer film formed on the base. The multilayer film includes multiple layer pairs. Each layer pair includes a respective first layer and a respective second layer, wherein the first and second layers are laminated together in an alternating manner. The multilayer film has first and second regions that reflect extreme ultraviolet light. A first group of layers is disposed in the first and second regions and has a first periodic length. A second group disposed in the first region has a second periodic length different from the first periodic length, and a third group disposed in the second region has a substantially same periodic length as the first periodic length.
摘要翻译：公开了多层膜反射镜。示例性的这种反射镜具有形成在基底上的基底和多层膜。多层膜包括多层对。每个层对包括相应的第一层和相应的第二层，其中第一层和第二层以交替的方式层压在一起。多层膜具有反射极紫外光的第一和第二区域。第一组层设置在第一和第二区域中并具有第一周期长度。设置在第一区域中的第二组具有与第一周期长度不同的第二周期长度，并且设置在第二区域中的第三组具有与第一周期长度基本相同的周期长度。

33. 发明授权

US07440182B2 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US07440182B2
公开(公告)日：2008-10-21
申请号：US11907798
申请日：2007-10-17
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

34. 发明申请

US20100086865A1 Measuring member, sensor, measuring method, exposure apparatus, exposure method, and device producing method 有权
标题翻译：测量部件，传感器，测量方法，曝光装置，曝光方法和装置制造方法
公开(公告)号：US20100086865A1
公开(公告)日：2010-04-08
申请号：US12591925
申请日：2009-12-04
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G03F7/20 , G03B27/54 , G03B27/72 , G01B11/02
CPC分类号： G03F7/7085 , G03F7/706 , G03F9/7034 , G03F9/7076
摘要： A measuring member has a first face and a plurality of first marks arranged on the first face. The first marks have respective orientations corresponding to their positions in a first direction.
摘要翻译：测量构件具有布置在第一面上的第一面和多个第一标记。第一标记具有对应于它们在第一方向上的位置的各自的取向。

35. 发明申请

US20100033699A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD 有权
标题翻译：照明光学系统，曝光装置和曝光方法
公开(公告)号：US20100033699A1
公开(公告)日：2010-02-11
申请号：US12502474
申请日：2009-07-14
申请人： Masayuki SHIRAISHI
发明人： Masayuki SHIRAISHI
IPC分类号： G03B27/54 , G03B27/70 , G03B27/32
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70083
摘要： In an illumination optical system, a light flux from a light source is made to come into a first fly's eye optical system, and an illumination area is illuminated, via a second fly's eye optical system and a condenser optical system, with light fluxes from a plurality of mirror elements which construct the first fly's eye optical system, wherein a reflecting surface of each of the mirror elements has a width in one direction narrower than a width of each of the mirror elements in a direction perpendicular to the one direction, and a reflectance distribution in the one direction of each of the mirror elements is trapezoidal. The intensity distribution of the illumination area can be set to be a nonuniform distribution, and respective points in the illumination area can be illuminated with the light fluxes having an approximately same aperture angle distribution.
摘要翻译：在照明光学系统中，使来自光源的光束进入第一飞眼光学系统，并且经由第二飞眼光学系统和聚光镜系统照射照明区域，其中光束来自构成第一飞眼光学系统的多个镜元件，其中每个镜元件的反射表面在垂直于该一个方向的方向上在一个方向上的宽度比每个镜元件的宽度窄，并且每个镜元件的一个方向上的反射率分布是梯形的。可以将照明区域的强度分布设定为不均匀分布，并且可以用具有大致相同的孔径角分布的光束照射照明区域中的各个点。

36. 发明申请

US20090097104A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
标题翻译：多层镜，其制造方法和曝光设备
公开(公告)号：US20090097104A1
公开(公告)日：2009-04-16
申请号：US12232241
申请日：2008-09-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G02B5/26
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.
摘要翻译：多层反射镜旨在减少反射率的入射角依赖性。衬底由具有0.2nm RMS或更少表面粗糙度的低热抛光膨胀玻璃制成。在其形成的表面上是具有宽的全宽半峰值反射率的Ru / Si多层，并且形成的Ru / Si多层是具有高峰值反射率值的Mo / Si多层。与仅提供Ru / Si相比，具有比单独提供的Mo / Si多层的全宽半宽的反射率峰值更高的反射率。由于Ru吸收比Mo更多的EUV射线，因此可以获得比在Mo / Si多层上形成有Ru / Si多层的结构更高的反射率。具有宽全宽半最大值的多层膜在光谱反射率方面具有小的入射角反射率依赖性，从而在投影光学系统中实现高成像性能。

37. 发明申请

US20080204861A1 Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods 有权
标题翻译：具有受保护反射表面的表面校正多层膜反射镜，包括其的曝光系统以及相关方法
公开(公告)号：US20080204861A1
公开(公告)日：2008-08-28
申请号：US12070622
申请日：2008-02-19
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G02B5/08 , G02B1/10
CPC分类号： G02B5/0891 , G02B1/105 , G02B1/14
摘要： Multilayer-film reflective mirrors are disclosed that exhibit desired optical characteristics and resistance to reflective-surface degradation. An exemplary multilayer-film mirror includes a base and a multilayer film on the base. The multilayer film is made of first and second layers alternatingly laminated at a prescribed period length. The surface of the multilayer film has an irregular surface profile, relative to the surface profile of the base. The multilayer film reflects incident extreme ultraviolet (EUV) light. A third layer, situated on and covering the surface of the multilayer film, is formed of a substance having substantially the same refractive index to EUV light as the refractive index of a vacuum. The third layer has a surface profile substantially the same as the surface contour of the base. The third layer is covered with a protective layer.
摘要翻译：公开了表现出期望的光学特性和抗反射表面退化的多层膜反射镜。示例性的多层膜反射镜包括基底和在基底上的多层膜。多层膜以规定的周期长度交替层叠的第一层和第二层制成。多层膜的表面相对于基底的表面轮廓具有不规则的表面轮廓。多层膜反射入射极紫外（EUV）光。位于多层膜表面上并覆盖多层膜表面的第三层由与真空的折射率相当的EUV光的折射率基本相同的物质形成。第三层具有与基部的表面轮廓基本相同的表面轮廓。第三层被保护层覆盖。

38. 发明申请

US20080043213A1 Euv Light Source, Euv Exposure System, and Production Method for Semiconductor Device 有权
标题翻译： Euv光源，Euv曝光系统和半导体器件的制造方法
公开(公告)号：US20080043213A1
公开(公告)日：2008-02-21
申请号：US11629498
申请日：2005-06-22
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： G03B27/54 , G03C5/00 , G21K5/00
CPC分类号： H05G2/003 , H05G2/005
摘要： An Sn—Ga type alloy having a composition in which the atomic % of Sn is 15% or less is accommodated inside a heated tank 4. The Sn alloy pressurized by the pressurizing pump is conducted to a nozzle 1, so that a liquid-form Sn alloy is caused to jet from the tip end of this nozzle 1 disposed inside a vacuum chamber 7. The liquid-form Sn alloy that is caused to jet from the nozzle 1 has a spherical shape as a result of surface tension, and forms a target 2. Laser light generated by an Nd:YAG laser light source 8 disposed on the outside of the vacuum chamber 7 is focused by a lens 9 and introduced into the vacuum chamber 7. The target 2 that is irradiated by the laser is converted into a plasma, and radiates light that includes EUV light.
摘要翻译：具有Sn原子％为15％以下的Sn-Ga型合金被容纳在加热槽4内。由加压泵加压的Sn合金被导入喷嘴1，从而形成液态使Sn合金从设置在真空室7内的喷嘴1的前端射出。由喷嘴1喷射的液态Sn合金由于表面张力而呈球形，形成由设置在真空室7外部的Nd：YAG激光光源8产生的激光由透镜9聚焦并被引入真空室7.被激光照射的靶2被转换成等离子体，并辐射包含EUV光的光。

39. 发明授权

US07145987B2 X-ray-generating devices and exposure apparatus comprising same 有权
标题翻译： X射线产生装置和包括其的曝光装置
公开(公告)号：US07145987B2
公开(公告)日：2006-12-05
申请号：US11084380
申请日：2005-03-18
申请人： Masayuki Shiraishi
发明人： Masayuki Shiraishi
IPC分类号： H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70841 , G03F7/70975
摘要： Devices are disclosed for generating X-rays, especially in a vacuum chamber from plasma formed by irradiating a target material with laser light, that provide convenient removal from the vacuum chamber of high-frequency-maintenance components without disturbing other components. In one configuration denoted a liquid-jet-type of X-ray generator, a nozzle (for spraying target material) and a mirror are situated in a vacuum chamber. The nozzle has a higher maintenance frequency than the mirror. A flange member is provided on an outer wall of the vacuum chamber to cover an opening in the wall. The nozzle is connected to a conduit having a base mounted to the flange member. The nozzle is removable for maintenance by detaching the flange member and withdrawing the nozzle through the opening. Thus, the highest-frequency-maintenance component, the nozzle, is removed without moving or removing any other component in the chamber, such as the mirror.
摘要翻译：公开了用于产生X射线的装置，特别是在通过用激光照射目标材料形成的等离子体的真空室中，提供方便地从高频维护部件的真空室中移除而不干扰其他部件。在液体喷射型X射线发生器的一个结构中，喷嘴（用于喷射靶材料）和反射镜位于真空室中。喷嘴的维护频率比镜子高。凸缘构件设置在真空室的外壁上以覆盖壁中的开口。喷嘴连接到具有安装到凸缘构件的基部的导管。通过拆卸凸缘构件并将喷嘴从开口中取出，喷嘴可拆卸以进行维护。因此，除去最高频率维护部件喷嘴，而不移动或移除腔室中的任何其它部件，例如反射镜。

40. 发明申请

US20060192147A1 Multilayer mirror, method for manufacturing the same, and exposure equipment 有权
公开(公告)号：US20060192147A1
公开(公告)日：2006-08-31
申请号：US11401946
申请日：2006-04-12
申请人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
发明人： Noriaki Kandaka , Katsuhiko Murakami , Takaharu Komiya , Masayuki Shiraishi
IPC分类号： G21G5/00 , A61N5/00
CPC分类号： G03F7/70316 , B82Y10/00 , G02B5/0891 , G03F7/70958 , G21K1/062
摘要： A multilayer mirror aims to reduce incidence angle dependence of reflectivity. A substrate is made of low thermal polished expansion glass with 0.2 nm RMS or less roughness of the surface. On the surface thereof formed is a Ru/Si multilayer having a wide full-width half maximum of peak reflectivity, and on the Ru/Si multilayer formed is a Mo/Si multilayer having a high peak reflectivity value. This enables higher reflectivity than when Ru/Si alone provided and a reflectivity peak having a wider full-width half maximum than when the Mo/Si multilayer alone provided. Since Ru absorbs EUV ray more than Mo does, higher reflectivity is obtainable than that of a structure having the Ru/Si multilayer formed on the Mo/Si multilayer. The multilayer with a wide full-width half maximum has small incidence angle dependence of reflectivity in spectral reflectivity, thereby achieving high imaging performance in projection optical system.

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