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31. 发明授权

US06550990B2 Substrate processing apparatus and processing method by use of the apparatus 有权
公开(公告)号：US06550990B2
公开(公告)日：2003-04-22
申请号：US10022637
申请日：2001-12-20
申请人： Hideaki Sakurai , Masamitsu Itoh , Shinichi Ito
发明人： Hideaki Sakurai , Masamitsu Itoh , Shinichi Ito
IPC分类号： G03D500
CPC分类号： G03D5/003
摘要： An apparatus for processing a substrate comprising a substrate holding mechanism for holding the substrate substantially horizontally, a chemical solution discharge/suction mechanism having a chemical solution discharge/suction portion which has a chemical solution outlet for discharging a chemical solution onto the substrate and chemical solution inlets for sucking up the chemical solution present on the substrate, and a chemical solution supply/suction system for supplying the chemical solution to the chemical solution discharge/suction mechanism simultaneously with sucking the chemical solution by the chemical solution supply/suction mechanism.

32. 发明授权

US06495807B2 Heat treating method and heat treating apparatus 失效
标题翻译：热处理方法和热处理装置
公开(公告)号：US06495807B2
公开(公告)日：2002-12-17
申请号：US09983667
申请日：2001-10-25
申请人： Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
发明人： Hideaki Sakurai , Shinichi Ito , Iwao Higashikawa , Akitoshi Kumagae
IPC分类号： H05B302
CPC分类号： H01L21/67115 , F26B3/28 , H05B3/0047
摘要： Disclosed is a heat treating method for heating a target substrate by means of light irradiation, in which light irradiation treatment is applied to the target substrate such that the light irradiation regions of the target substrate do not overlap with each other, the light irradiation treatment being performed by using an irradiating light adjusted such that the distribution of the light intensity within the light irradiation region of the target substrate is rendered uniform.
摘要翻译：公开了一种通过光照射对目标基板进行加热的热处理方法，其中对目标基板施加光照射处理，使得目标基板的光照射区域彼此不重叠，光照射处理为通过使用被调整为使得目标基板的光照射区域内的光强度分布变得均匀的照射光进行。

33. 发明授权

US09595393B2 Dielectric-thin-film forming composition, method of forming dielectric thin film, and dielectric thin film formed by the method 有权
标题翻译：电介质薄膜形成组合物，形成电介质薄膜的方法以及通过该方法形成的电介质薄膜
公开(公告)号：US09595393B2
公开(公告)日：2017-03-14
申请号：US13220936
申请日：2011-08-30
申请人： Guillaume Guegan , Toshiaki Watanabe , Nobuyuki Soyama , Hideaki Sakurai
发明人： Guillaume Guegan , Toshiaki Watanabe , Nobuyuki Soyama , Hideaki Sakurai
IPC分类号： H01G7/06 , C04B35/468 , C04B35/47 , C04B35/622 , H01L49/02
CPC分类号： H01G7/06 , C04B35/4682 , C04B35/47 , C04B35/62218 , C04B2235/3213 , C04B2235/3215 , C04B2235/3232 , H01L28/55
摘要： A dielectric-thin-film forming composition for forming a BST dielectric thin film, includes a liquid composition for forming a thin film which takes a form of a mixed composite metal oxide in which a composite oxide B including Cu (copper) is mixed into a composite metal oxide A expressed by a formula: Ba1-xSrxTiyO3 (wherein 0.2
摘要翻译：用于形成BST电介质薄膜的电介质薄膜形成组合物包括用于形成薄膜的液体组合物，该组合物采用混合复合金属氧化物的形式，其中将包含Cu（铜）的复合氧化物B混合到复合金属氧化物A由下式表示：Ba1-xSrxTiyO3（其中0.2

34. 发明授权

US09289720B2 System and method for treating mercury in flue gas 有权
标题翻译：烟气处理汞的系统和方法
公开(公告)号：US09289720B2
公开(公告)日：2016-03-22
申请号：US14398079
申请日：2012-05-31
申请人： Seiji Kagawa , Hideaki Sakurai , Nobuyuki Ukai , Susumu Okino , Tatsuto Nagayasu
发明人： Seiji Kagawa , Hideaki Sakurai , Nobuyuki Ukai , Susumu Okino , Tatsuto Nagayasu
IPC分类号： B01D53/50 , B01D53/56 , B01D53/64 , B01D53/75 , B01D53/60 , B01D53/86
CPC分类号： B01D53/64 , B01D53/50 , B01D53/56 , B01D53/60 , B01D53/75 , B01D53/8625 , B01D2251/2062 , B01D2253/102 , B01D2257/602 , B01D2258/0283
摘要： A system for treating mercury in flue gas is provided. The system includes a mercury adsorbent supply device to adsorb the mercury with the mercury adsorbent; a precipitator to collect the mercury adsorbent with adsorbed mercury and soot in the flue gas; a mercury adsorption assistant supply device to remove mercury remaining in the flue gas; and a desulfurization device to remove sulfur oxide (SOx) in the flue gas.
摘要翻译：提供了一种处理废气中汞的系统。该系统包括用汞吸附剂吸附汞的汞吸附剂供应装置; 一种除尘器，用于在烟道气中吸收汞和烟灰来收集汞吸附剂; 汞吸附助剂供应装置，用于去除废气中剩余的汞; 以及除去烟道气中的硫氧化物（SOx）的脱硫装置。

35. 发明授权

US08859051B2 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film and ferroelectric thin film formed by the method thereof 有权
标题翻译：用于铁电薄膜形成的组合物，形成铁电薄膜的方法和通过该方法形成的铁电薄膜
公开(公告)号：US08859051B2
公开(公告)日：2014-10-14
申请号：US12736944
申请日：2009-05-28
申请人： Jun Fujii , Hideaki Sakurai , Takashi Noguchi , Nobuyuki Soyama
发明人： Jun Fujii , Hideaki Sakurai , Takashi Noguchi , Nobuyuki Soyama
IPC分类号： B05D3/02 , H01B3/14 , C04B24/40 , C04B24/42 , C04B35/624 , H01L41/18 , B05D3/04 , C01G25/00 , C23C18/12 , H01G4/12 , H01G4/20 , H01L21/02 , H01L21/316 , H01L41/318 , C04B35/491 , C04B35/493 , C04B35/632 , C04B111/92 , H01L27/115 , H01L49/02
CPC分类号： H01L41/1876 , B05D3/02 , B05D3/0209 , B05D3/04 , B05D3/0406 , B05D3/0413 , B05D3/0453 , B05D3/0473 , C01G25/006 , C01P2002/50 , C01P2006/40 , C04B24/40 , C04B24/42 , C04B35/491 , C04B35/493 , C04B35/624 , C04B35/632 , C04B35/6325 , C04B2111/92 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3229 , C04B2235/3232 , C04B2235/3293 , C04B2235/3298 , C04B2235/3418 , C04B2235/44 , C04B2235/441 , C04B2235/443 , C04B2235/447 , C04B2235/449 , C04B2235/6585 , C23C18/1204 , C23C18/1225 , C23C18/1279 , C23C30/00 , H01B3/14 , H01G4/1245 , H01G4/206 , H01L21/02197 , H01L21/02282 , H01L21/31691 , H01L27/108 , H01L27/11502 , H01L28/55 , H01L41/18 , H01L41/1875 , H01L41/318
摘要： Disclosed is a composition for ferroelectric thin film formation which is used in the formation of a ferroelectric thin film of one material selected from the group consisting of PLZT, PZT, and PT. The composition for ferroelectric thin film formation is a liquid composition for the formation of a thin film of a mixed composite metal oxide formed of a mixture of a composite metal oxide (A) represented by general formula (1): (PbxLay)(ZrzTi(1-z))O3 [wherein 0.9
摘要翻译：公开了用于形成选自PLZT，PZT和PT的一种材料的铁电薄膜的铁电薄膜形成用组合物。铁电薄膜形成用组合物是由通式（1）表示的复合金属氧化物（A）：（PbxLay）（ZrzTi（Zr x Ti y））的混合物形成的混合复合金属氧化物的薄膜的液体组合物， 1）表示的复合氧化物（B）或羧酸（B），通式（2）表示的化合物（其中0.9

36. 发明授权

US08025732B2 Apparatus for processing a substrate 有权
标题翻译：用于处理衬底的装置
公开(公告)号：US08025732B2
公开(公告)日：2011-09-27
申请号：US12071235
申请日：2008-02-19
申请人： Hideaki Sakurai , Masamitsu Itoh
发明人： Hideaki Sakurai , Masamitsu Itoh
IPC分类号： H01L21/027 , G03F7/30
CPC分类号： H01L21/6708
摘要： A method for a substrate processing apparatus having a substrate holding mechanism and a chemical solution dispensing/sucking mechanism including a chemical solution dispensing port for supplying a first chemical solution and a chemical solution suction port, includes placing the target substrate on the substrate holding mechanism, laying out an auxiliary plate at a periphery of the substrate such that the two main faces are substantially flush with each other, supplying a second chemical solution onto the main faces, dispensing the first solution from the dispensing port and sucking the first and second solutions through the suction port, with the dispensing and suction ports brought into contact with the second solution, and while dispensing the first solution from the dispensing port and sucking the first solution through the suction port, scanning the dispensing/sucking mechanism such that the dispensing and suction ports are opposed to the main face of the substrate.
摘要翻译：一种具有基板保持机构的基板处理装置和包括用于供给第一化学溶液的化学溶液分配口和化学溶液吸入口的化学溶液分配/吸引机构的方法，包括将目标基板放置在基板保持机构上，在所述基板的周围布置辅助板，使得所述两个主面彼此基本齐平，将第二化学溶液供应到所述主面上，从所述分配端口分配所述第一溶液并将所述第一溶液和所述第二溶液通过所述吸入口与所述分配和吸入口与所述第二溶液接触，并且在从所述分配端口分配所述第一溶液并且通过所述吸入口吸入所述第一溶液的同时，扫描所述分配/吸入机构，使得所述分配和抽吸端口与基板的主面相对。

37. 发明申请

US20110098173A1 Composition for ferroelectric thin film formation, method for forming ferroelectric thin film, and ferroelectric thin film formed by the method thereof 有权
标题翻译：铁电薄膜形成用组合物，形成铁电薄膜的方法，以及通过该方法形成的铁电薄膜
公开(公告)号：US20110098173A1
公开(公告)日：2011-04-28
申请号：US12929056
申请日：2010-12-27
申请人： Jun Fujii , Hideaki Sakurai , Takashi Noguchi , Noboyuki Soyama
发明人： Jun Fujii , Hideaki Sakurai , Takashi Noguchi , Noboyuki Soyama
IPC分类号： C04B35/491 , H01B3/20 , B05D5/12
CPC分类号： H01L41/1876 , B05D3/02 , B05D3/0209 , B05D3/04 , B05D3/0406 , B05D3/0413 , B05D3/0453 , B05D3/0473 , C01G25/006 , C01P2002/50 , C01P2006/40 , C04B24/40 , C04B24/42 , C04B35/491 , C04B35/493 , C04B35/624 , C04B35/632 , C04B35/6325 , C04B2111/92 , C04B2235/3224 , C04B2235/3225 , C04B2235/3227 , C04B2235/3229 , C04B2235/3232 , C04B2235/3293 , C04B2235/3298 , C04B2235/3418 , C04B2235/44 , C04B2235/441 , C04B2235/443 , C04B2235/447 , C04B2235/449 , C04B2235/6585 , C23C18/1204 , C23C18/1225 , C23C18/1279 , C23C30/00 , H01B3/14 , H01G4/1245 , H01G4/206 , H01L21/02197 , H01L21/02282 , H01L21/31691 , H01L27/108 , H01L27/11502 , H01L28/55 , H01L41/18 , H01L41/1875 , H01L41/318
摘要： Disclosed is a composition for ferroelectric thin film formation which is used in the formation of a ferroelectric thin film of one material selected from the group consisting of PLZT, PZT, and PT. The composition for ferroelectric thin film formation is a liquid composition for the formation of a thin film of a mixed composite metal oxide formed of a mixture of a composite metal oxide (A) represented by general formula (1): (PbxLay)(ZrzTi(1−z))O3 [wherein 0.9
摘要翻译：公开了用于形成选自PLZT，PZT和PT的一种材料的铁电薄膜的铁电薄膜形成用组合物。铁电薄膜形成用组合物是由通式（1）表示的复合金属氧化物（A）：（PbxLay）（ZrzTi（Zr x Ti y））的混合物形成的混合复合金属氧化物的薄膜的液体组合物，（B）或由通式（2）表示的羧酸（B），其中0.9

38. 发明申请

US20080173400A1 Substrate processing method, substrate processing apparatus, and semiconductor device manufacturing method 有权
标题翻译：基板加工方法，基板处理装置以及半导体装置的制造方法
公开(公告)号：US20080173400A1
公开(公告)日：2008-07-24
申请号：US12071235
申请日：2008-02-19
申请人： Hideaki Sakurai , Masamitsu Itoh
发明人： Hideaki Sakurai , Masamitsu Itoh
IPC分类号： C23F1/08
CPC分类号： H01L21/6708
摘要： A method for a substrate processing apparatus having a substrate holding mechanism and a chemical solution dispensing/sucking mechanism including a chemical solution dispensing port for supplying a first chemical solution and a chemical solution suction port, includes placing the target substrate on the substrate holding mechanism, laying out an auxiliary plate at a periphery of the substrate such that the two main faces are substantially flush with each other, supplying a second chemical solution onto the main faces, dispensing the first solution from the dispensing port and sucking the first and second solutions through the suction port, with the dispensing and suction ports brought into contact with the second solution, and while dispensing the first solution from the dispensing port and sucking the first solution through the suction port, scanning the dispensing/sucking mechanism such that the dispensing and suction ports are opposed to the main face of the substrate.
摘要翻译：一种具有基板保持机构的基板处理装置和包括用于供给第一化学溶液的化学溶液分配口和化学溶液吸入口的化学溶液分配/吸引机构的方法，包括将目标基板放置在基板保持机构上，在所述基板的周围布置辅助板，使得所述两个主面彼此基本齐平，将第二化学溶液供应到所述主面上，从所述分配端口分配所述第一溶液并将所述第一溶液和所述第二溶液通过所述吸入口与所述分配和吸入口与所述第二溶液接触，并且在从所述分配端口分配所述第一溶液并且通过所述吸入口吸入所述第一溶液的同时，扫描所述分配/吸入机构，使得所述分配和抽吸端口与基板的主面相对。

39. 发明授权

US07205094B2 Coating fluid for printing plates and method of making a printing plate 失效
标题翻译：用于印版的涂布液和制造印版的方法
公开(公告)号：US07205094B2
公开(公告)日：2007-04-17
申请号：US10962490
申请日：2004-10-13
申请人： Yasuharu Suda , Hideaki Sakurai , Toyoshi Ohto
发明人： Yasuharu Suda , Hideaki Sakurai , Toyoshi Ohto
IPC分类号： G03F7/26
CPC分类号： B41C1/1025 , B41C2201/04 , B41C2201/14 , B41C2210/04 , B41C2210/20 , B41C2210/24 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： A coating fluid for printing plates which can be suitably used to make printing plates that permit images to be written in response to input digital data and that can be easily regenerated and reused. This coating fluid for printing plates comprises at least a carrier liquid, thermoplastic resin particles and an IR absorber, and the IR absorber has a decomposition starting temperature higher than the melt starting temperature of the thermoplastic resin particles.
摘要翻译：用于印版的涂布液，其可适用于制造印刷版，其允许根据输入的数字数据写入图像，并且可以容易地再生和重复使用。该印刷用涂布液至少含有载液，热塑性树脂粒子和IR吸收剂，IR吸收剂的分解开始温度高于热塑性树脂粒子的熔融起始温度。

40. 发明授权

US07070903B2 Coating formulation for printing plate precursor, printing plate precursor, printing press, fabrication process of printing plate, and regeneration process of printing plate 失效
公开(公告)号：US07070903B2
公开(公告)日：2006-07-04
申请号：US10131594
申请日：2002-04-25
申请人： Yasuharu Suda , Hiroshi Tonegawa , Minoru Sueda , Hideaki Sakurai , Yoshiyuki Tasaka , Yasuhiro Akita , Toyoshi Ohto , Kimihiko Ohya , Shuuichi Nagahata
发明人： Yasuharu Suda , Hiroshi Tonegawa , Minoru Sueda , Hideaki Sakurai , Yoshiyuki Tasaka , Yasuhiro Akita , Toyoshi Ohto , Kimihiko Ohya , Shuuichi Nagahata
IPC分类号： G03F7/04
CPC分类号： B41N3/006 , B41C1/1025 , B41C2201/04 , B41C2201/10 , B41C2201/14 , B41C2210/04 , B41C2210/08 , B41C2210/24 , B41C2210/262 , B41C2210/266 , B41P2227/70 , Y10S430/165 , Y10T428/1393 , Y10T428/254 , Y10T428/31931 , Y10T428/31935
摘要： Disclosed are a printing plate precursor, a fabrication process of the printing plate precursor, a fabrication process of a printing plate, a regeneration process of the printing plate, a printing press, and a coating formulation for the printing plate precursor. According to the present invention, a printing plate can be fabricated directly from digital data, and sufficient image quality can be obtained without a developing step, i.e., a developer. To permit repeated use of the precursor, the precursor has a surface, which contains a photocatalyst and is capable of showing hydrophilicity when exposed to activating light having energy higher than band gap energy of the photocatalyst. A coating formulation—which comprises fine particles of a thermoplastic resin having both a property that the particles unite to the surface when heated and a property that the particles decompose under action of the photocatalyst when exposed to activating light having energy higher than band gap energy of the photocatalyst—is applied as a hydrophobizing agent onto the surface. At least a part of the surface of the precursor is heated such that the fine particles applied on the part of the surface are fixed to form a hydrophobic image area. The fine particles applied on the remaining part of the surface with the image area formed thereon are then removed.

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