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21. 发明授权

US07361612B2 Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same 失效
标题翻译：包含硅的阻挡涂层组合物和使用其形成光刻胶图案的方法
公开(公告)号：US07361612B2
公开(公告)日：2008-04-22
申请号：US11447932
申请日：2006-06-07
申请人： Sang-Jun Choi , Mitsuhiro Hata , Han-Ku Cho
发明人： Sang-Jun Choi , Mitsuhiro Hata , Han-Ku Cho
IPC分类号： H01L21/469
CPC分类号： G03F7/11 , G03F7/0758 , G03F7/2041
摘要： Provided are example embodiments of the invention including a range of polymer structures suitable for incorporation in barrier compositions for use, for example, in immersion photolithography in combination with a suitable solvent or solvent system. These polymers exhibit a weight average molecular weight (Mw) of 5,000 to 200,000 daltons and may be generally represented by formula I: wherein the expressions (1+m+n)=1; 0.1≦(1/(1+m+n))≦0.7; 0.3≦(m/(1+m+n))≦0.9; and 0.0≦(n/(1+m+n))≦0.6 are satisfied; R1, R2 and R3 are C1 to C5 alkyl, C1 to C5 alkoxy and hydroxyl groups; and Z represents an alkene that includes at least one hydrophilic group. Barrier coating compositions will include an organic solvent or solvent system selected from C3 to C10 alcohol-based organic solvents, C4 to C12 alkane-based organic solvents and mixtures thereof.
摘要翻译：提供本发明的示例性实施方案，其包括适用于结合到阻挡组合物中的聚合物结构的范围，用于例如浸渍光刻法与合适的溶剂或溶剂体系的组合。这些聚合物的重均分子量（Mw）为5000〜200,000道尔顿，通常可以由式I表示：式（1 + m + n）= 1; 0.1 <=（1 /（1 + m + n））<= 0.7; 0.3 <=（m /（1 + m + n））<= 0.9; 并且满足0.0 <=（n /（1 + m + n））<= 0.6; R 1，R 2和R 3均为C 1至C 5烷基 C 1 -C 5烷氧基和羟基; Z表示包含至少一个亲水基团的烯烃。阻挡涂层组合物将包括选自C 3〜C 10醇基有机溶剂，C 4〜C 6烷基的有机溶剂或溶剂体系，基于烷烃的有机溶剂及其混合物。

22. 发明申请

US20090317744A1 POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE SAME 有权
标题翻译：聚合物和化学稳定化合物包括它们
公开(公告)号：US20090317744A1
公开(公告)日：2009-12-24
申请号：US12467683
申请日：2009-05-18
申请人： Yusuke FUJI , Mitsuhiro Hata
发明人： Yusuke FUJI , Mitsuhiro Hata
IPC分类号： G03F7/004 , C08G63/00
CPC分类号： C08F220/28 , C08F220/18 , Y10S430/114
摘要： A polymer comprising a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom etc., R2 represents a linear, branched chain or cyclic C1-C8 alkyl group, R3 represents a methyl group, n represents an integer of 0 to 14, Z1 represents a single bond etc., k represents an integer of 1 to 4, R4 and R5 each independently represents a hydrogen atom etc., and m represents an integer of 1 to 3, a structural unit represented by the formula (II): wherein R6 and R7 each independently represents a hydrogen atom etc., R8 represents a methyl group, R9 represents a hydrogen atom etc., n′ represents an integer of 0 to 12, Z2 represents a single bond etc., k′ represents an integer of 1 to 4, R21 and R22 each independently represents a hydrogen atom etc., and R23 represents a C1-C30 monovalent hydrocarbon group, and at least one structural unit selected from the group consisting of structural units represented by the formulae (IIIa), (IIIb), (IIIc), (IIId) and (IIIf) wherein R10 represents a hydrogen atom etc., R11 represents a methyl group, R12 is independently in each occurrence a carboxyl group etc., j represents an integer of 0 to 3, a represents an integer of 0 to 5, b represents an integer of 0 to 3, c represents an integer of 0 to (2j+2), Z3 represents a single bond etc., and k″ represents an integer of 1 to 4.
摘要翻译：一种包含由式（Ia）或（Ib）表示的结构单元的聚合物：其中R1表示氢原子等，R2表示直链，支链或环状的C1-C8烷基，R3表示甲基，n表示 0〜14的整数，Z1表示单键等，k表示1〜4的整数，R4和R5各自独立地表示氢原子等，m表示1〜3的整数，表示的结构单元式（II）表示：其中R6和R7各自独立地表示氢原子等，R8表示甲基，R9表示氢原子等，n'表示0〜12的整数，Z2表示单键等 k表示1〜4的整数，R 21和R 22各自独立地表示氢原子等，R 23表示碳原子数为1〜30的一价烃基，以及至少一个选自以下结构单元的结构单元：通式（IIIa），（IIIb），（IIIc），（IIId）和（IIIf））其中R 10表示氢原子等，R 11表示甲基，R 12各自独立地表示羧基等，j表示0〜3的整数，a表示0〜5的整数，b表示整数 0〜3的整数，c表示0〜（2j + 2）的整数，Z 3表示单键等，k表示1〜4的整数。

23. 发明申请

US20080305638A1 Coating compositions for use in forming patterns and methods of forming patterns 审中-公开
标题翻译：用于形成图案的涂料组合物和形成图案的方法
公开(公告)号：US20080305638A1
公开(公告)日：2008-12-11
申请号：US12222433
申请日：2008-08-08
申请人： Sang-jung Choi , Mitsuhiro Hata , Man-hyoung Ryoo , Jung-hwan Hah
发明人： Sang-jung Choi , Mitsuhiro Hata , Man-hyoung Ryoo , Jung-hwan Hah
IPC分类号： H01L21/311
CPC分类号： G03F7/40 , H01L21/0273 , H01L21/31144
摘要： A coating composition for forming etch mask patterns may include a polymer and an organic solvent. The polymer may have an aromatic ring substituted by a vinyl ether functional group. The polymer may be, for example, a Novolak resin partially substituted by a vinyl ether functional group or poly(hydroxystyrene) partially substituted by a vinyl ether functional group.
摘要翻译：用于形成蚀刻掩模图案的涂料组合物可以包括聚合物和有机溶剂。聚合物可以具有被乙烯基醚官能团取代的芳环。聚合物可以是例如部分被乙烯基醚官能团取代的酚醛清漆树脂或部分被乙烯基醚官能团取代的聚（羟基苯乙烯）。

24. 发明授权

US08476473B2 Compound, method for preparing the compound and resist composition containing the compound 有权
标题翻译：化合物，制备化合物的方法和含有该化合物的抗蚀剂组合物
公开(公告)号：US08476473B2
公开(公告)日：2013-07-02
申请号：US12552085
申请日：2009-09-01
申请人： Ichiki Takemoto , Nobuo Ando , Mitsuhiro Hata
发明人： Ichiki Takemoto , Nobuo Ando , Mitsuhiro Hata
IPC分类号： C07C69/63 , C07C69/74
CPC分类号： C07C67/08 , C07C67/11 , C07C69/63 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0392
摘要： A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
摘要翻译：由式（I）或式（I'）表示的化合物。其中Z 1和Z 2独立地表示氢原子，C 1至C 12烷基或C 3至C 12环状饱和烃基，条件是Z 1和Z 2中的至少一个表示C 1至C 12烷基或C 3至C 12环状饱和烃组; 环Y1和Y2独立地表示任选取代的C 3至C 20脂环族烃基; Q1至Q4和Q'1至Q'4独立地表示氟原子或C1至C6全氟烷基; m和n独立地表示0〜5的整数。

25. 发明授权

US08048612B2 Polymer and chemically amplified resist composition comprising the same 有权
标题翻译：包含其的聚合物和化学增幅抗蚀剂组合物
公开(公告)号：US08048612B2
公开(公告)日：2011-11-01
申请号：US12467683
申请日：2009-05-18
申请人： Yusuke Fuji , Mitsuhiro Hata
发明人： Yusuke Fuji , Mitsuhiro Hata
IPC分类号： G03F7/00 , G03F7/004 , C08F10/00
CPC分类号： C08F220/28 , C08F220/18 , Y10S430/114
摘要： A polymer comprising a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom etc., R2 represents a linear, branched chain or cyclic C1-C8 alkyl group, R3 represents a methyl group, n represents an integer of 0 to 14, Z1 represents a single bond etc., k represents an integer of 1 to 4, R4 and R5 each independently represents a hydrogen atom etc., and m represents an integer of 1 to 3, a structural unit represented by the formula (II): wherein R6 and R7 each independently represents a hydrogen atom etc., R8 represents a methyl group, R9 represents a hydrogen atom etc., n′ represents an integer of 0 to 12, Z2 represents a single bond etc., k′ represents an integer of 1 to 4, R21 and R22 each independently represents a hydrogen atom etc., and R23 represents a C1-C30 monovalent hydrocarbon group, and at least one structural unit selected from the group consisting of structural units represented by the formulae (IIIa), (IIIb), (IIIc), (IIId) and (IIIf) wherein R10 represents a hydrogen atom etc., R11 represents a methyl group, R12 is independently in each occurrence a carboxyl group etc., j represents an integer of 0 to 3, a represents an integer of 0 to 5, b represents an integer of 0 to 3, c represents an integer of 0 to (2j+2), Z3 represents a single bond etc., and k″ represents an integer of 1 to 4.
摘要翻译：一种包含由式（Ia）或（Ib）表示的结构单元的聚合物：其中R1表示氢原子等，R2表示直链，支链或环状的C1-C8烷基，R3表示甲基，n表示 0〜14的整数，Z1表示单键等，k表示1〜4的整数，R4和R5各自独立地表示氢原子等，m表示1〜3的整数，表示的结构单元式（II）表示：其中R6和R7各自独立地表示氢原子等，R8表示甲基，R9表示氢原子等，n'表示0〜12的整数，Z2表示单键等 k表示1〜4的整数，R 21和R 22各自独立地表示氢原子等，R 23表示碳原子数为1〜30的一价烃基，以及至少一个选自以下结构单元的结构单元：通过式（IIIa），（IIIb），（IIIc），（IIId）和（ IIIf）其中R10表示氢原子等，R11表示甲基，R12各自独立地表示羧基等，j表示0〜3的整数，a表示0〜5的整数，b表示 0〜3的整数，c表示0〜（2j + 2）的整数，Z 3表示单键等，k表示1〜4的整数。

26. 发明申请

US20110183264A1 RESIST PROCESSING METHOD AND USE OF POSITIVE TYPE RESIST COMPOSITION 审中-公开
标题翻译：电阻加工方法和正极型电阻组合物的使用
公开(公告)号：US20110183264A1
公开(公告)日：2011-07-28
申请号：US13063670
申请日：2009-09-08
申请人： Kazuhiko Hashimoto , Mitsuhiro Hata , Satoshi Yamamoto
发明人： Kazuhiko Hashimoto , Mitsuhiro Hata , Satoshi Yamamoto
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： A resist processing method has the steps of: (1) forming a first resist film by applying a first resist composition comprising: a resin (A) including a structural unit represented by the formula (XX), and having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution, and being rendered soluble in alkali aqueous solution through the action of an acid, and a photo acid generator (B) onto a substrate and drying; (2) prebaking the first resist film; (3) exposing the first resist film; (4) post-exposure baking of the first resist film; (5) developing with a first alkali developer to obtain a first resist pattern; (6) hard-baking the first resist pattern, (7) obtaining a second resist film by applying a second resist composition onto the first resist pattern, and then drying; (8) pre-baking the second resist film; (9) exposing the second resist film; (10) post-exposure baking the second resist film; and (11) developing with a second alkali developer to obtain a second resist pattern. wherein, Ra1 represents a hydrogen atom, a halogen atom or a C1 to C3 saturated hydrocarbon group which may be substituted with a halogen atom; Ra2 represents a single bond or a divalent organic group; Ra3 represents a hydrogen atom, a C1 to C12 saturated hydrocarbon group which may be substituted with a hydroxy group etc., and Ra4 represent a C1 to C12 saturated hydrocarbon group.
摘要翻译：抗蚀剂处理方法具有以下步骤：（1）通过施加第一抗蚀剂组合物形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含：包含由式（XX）表示的结构单元并具有酸不稳定基团的树脂（A）在碱性水溶液中不溶或难溶，并且通过酸的作用使碱溶液和光酸产生剂（B）溶解在基材上并干燥; （2）预烘第一抗蚀膜; （3）曝光第一抗蚀膜; （4）第一抗蚀剂膜的曝光后烘烤; （5）用第一碱性显影剂显影以获得第一抗蚀剂图案; （6）对第一抗蚀剂图案进行硬烘烤，（7）通过将第二抗蚀剂组合物施加到第一抗蚀剂图案上，然后干燥获得第二抗蚀剂膜; （8）预烘烤第二抗蚀剂膜; （9）使第二抗蚀剂膜曝光; （10）曝光后烘烤第二抗蚀膜; 和（11）用第二碱性显影剂显影以获得第二抗蚀剂图案。其中，Ra1表示氢原子，卤素原子或可被卤素原子取代的C1〜C3饱和烃基; Ra2表示单键或二价有机基团; Ra3表示氢原子，可被羟基取代的C1〜C12饱和烃基等，Ra4表示C1〜C12饱和烃基。

27. 发明申请

US20100055609A1 COMPOUND, METHOD FOR PREPARING THE COMPOUND AND RESIST COMPOSITION CONTAINING THE COMPOUND 有权
标题翻译：化合物，用于制备化合物的方法和含有该化合物的抗蚀剂组合物
公开(公告)号：US20100055609A1
公开(公告)日：2010-03-04
申请号：US12552085
申请日：2009-09-01
申请人： Ichiki TAKEMOTO , Nobuo Ando , Mitsuhiro Hata
发明人： Ichiki TAKEMOTO , Nobuo Ando , Mitsuhiro Hata
IPC分类号： G03F7/004 , C07C69/63
CPC分类号： C07C67/08 , C07C67/11 , C07C69/63 , C07C2601/02 , C07C2601/04 , C07C2601/08 , C07C2601/14 , C07C2602/42 , C07C2603/74 , G03F7/0045 , G03F7/0392
摘要： A compounds represented by the Formula (I) or the Formula (I′). wherein Z1 and Z2 independently represent a hydrogen atom, a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group, provided that at least one of Z1 and Z2 represent a C1 to C12 alkyl group or a C3 to C12 cyclic saturated hydrocarbon group; rings Y1 and Y2 independently represents an optionally substituted C3 to C20 alicyclic hydrocarbon group; Q1 to Q4 and Q′1 to Q′4 independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group; and m and n independently represent an integer of 0 to 5.
摘要翻译：由式（I）或式（I'）表示的化合物。其中Z 1和Z 2独立地表示氢原子，C 1至C 12烷基或C 3至C 12环状饱和烃基，条件是Z 1和Z 2中的至少一个表示C 1至C 12烷基或C 3至C 12环状饱和烃组; 环Y1和Y2独立地表示任选取代的C 3至C 20脂环族烃基; Q1至Q4和Q'1至Q'4独立地表示氟原子或C1至C6全氟烷基; m和n独立地表示0〜5的整数。

28. 发明授权

US09063414B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US09063414B2
公开(公告)日：2015-06-23
申请号：US13190173
申请日：2011-07-25
申请人： Koji Ichikawa , Mitsuhiro Hata , Takahiro Yasue
发明人： Koji Ichikawa , Mitsuhiro Hata , Takahiro Yasue
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0397
摘要： The present invention provides a photoresist composition comprising a resin which comprises a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator and a compound represented by the formula (I): wherein R1 and R2 are independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，其包含衍生自具有酸不稳定基团的化合物的结构单元，其在碱性水溶液中不溶或难溶于碱性水溶液，但通过酸，酸产生剂和由式（I）表示的化合物：其中R1和R2在每次出现时独立地为C1-C12烃基，C1-C6烷氧基，C2-C7酰基，C2-C7 酰氧基，C 2 -C 7烷氧基羰基，硝基或卤素原子，m和n分别表示0〜4的整数。

29. 发明授权

US08546059B2 Photoresist composition 有权
标题翻译：光刻胶组成
公开(公告)号：US08546059B2
公开(公告)日：2013-10-01
申请号：US12953606
申请日：2010-11-24
申请人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
发明人： Koji Ichikawa , Takayuki Miyagawa , Mitsuhiro Hata
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0382 , G03F7/0392 , G03F7/0397 , G03F7/2041
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rc1 represents an aromatic group which can have one or more substituents, Rc2 and Rc3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rc4 and Rc6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc4 and Rc6 are bonded each other to form an alkanediyl group, Rc5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rc7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rc5 and Rc7 are bonded each other to form an alkanediyl group.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（C1）表示的化合物：其中Rc1表示可以具有一个或多个取代基的芳基，Rc2和Rc3各自独立地表示氢原子，可具有一个或多个取代基的脂族烃基或可具有一个或多个取代基的芳族基团，R c4和R c6各自独立地表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc4和Rc6键合彼此形成烷二基，Rc5表示可具有一个或多个取代基的脂族烃基或可具有一个或两个取代基的氨基，R c7表示氢原子或可具有一个或多个取代基的脂族烃基，或Rc5和Rc7彼此键合形成烷二基。

30. 发明申请

US20110065040A1 PHOTORESIST COMPOSITION 有权
标题翻译：光电组合物
公开(公告)号：US20110065040A1
公开(公告)日：2011-03-17
申请号：US12880852
申请日：2010-09-13
申请人： Tatsuro MASUYAMA , Mitsuhiro Hata
发明人： Tatsuro MASUYAMA , Mitsuhiro Hata
IPC分类号： G03F7/004 , C07C271/22 , C07D207/16 , G03F7/20
CPC分类号： C07C271/22 , C07D207/16 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/20
摘要： The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein R1 represents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc., R2 and R3 each independently represent a hydrogen atom, etc., R4, R5 and R6 each independently represent a hydrogen atom, etc., A1 represents a single bond or a C1-C2 alkylene group in which one or more —CH2— can be replaced by —O—.
摘要翻译：本发明提供一种光致抗蚀剂组合物，其包含树脂，酸产生剂和由式（I）表示的化合物：其中R1表示可具有一个或多个羟基的C 2 -C 12烷基等，R 2和R 3各自独立地表示氢原子等，R4，R5和R6各自独立地表示氢原子等，A1表示单键或C1-C2亚烷基，其中一个或多个-CH2-可以被-O - 。

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