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    • 25. 发明授权
    • Method for providing pedestal-defined zero throat writer
    • 提供基座定义零喉作家的方法
    • US06785955B1
    • 2004-09-07
    • US09769060
    • 2001-01-23
    • Yingjian ChenHugh Craig HinerBenjamin ChenXizeng ShiKyusik Sin
    • Yingjian ChenHugh Craig HinerBenjamin ChenXizeng ShiKyusik Sin
    • H04R3100
    • G11B5/3967G11B5/3109Y10T29/49032Y10T29/49041Y10T29/49043Y10T29/49044Y10T29/49048Y10T29/49052Y10T29/49062
    • A method and system for providing a writer is disclosed. The method and system include providing a first pole, an insulator covering a portion of the first pole and a coil on the first insulator. The coil includes a plurality of turns. The method and system also include providing a second insulator covering the coil, providing a second pole on the second insulator and providing a write gap separating a portion of the first pole from a second portion of the second pole. A first portion of the second pole is coupled with the first pole. In one aspect, the method and system include providing a coil having a plurality of turns with a pitch of no more than 1.2 micrometers. In another aspect, the plurality of turns of the coil is provided using a hard mask layer on a photoresist layer. A portion of the hard mask layer and a portion of the photoresist layer define a plurality of spaces between the pluralities of turns of the coil. In another aspect, the writer is a pedestal defined zero throat writer. In this aspect, the first insulator has a depression therein and the coil is provided on the depression.
    • 公开了一种用于提供写入器的方法和系统。 该方法和系统包括提供第一极,覆盖第一极的一部分的绝缘体和第一绝缘体上的线圈。 线圈包括多个匝。 该方法和系统还包括提供覆盖线圈的第二绝缘体,在第二绝缘体上提供第二极,并提供将第一极的一部分与第二极的第二部分分开的写间隙。 第二极的第一部分与第一极耦合。 在一个方面,该方法和系统包括提供具有不超过1.2微米的间距的多个匝的线圈。 在另一方面,使用光致抗蚀剂层上的硬掩模层来提供线圈的多圈。 硬掩模层的一部分和光致抗蚀剂层的一部分在线圈的多圈之间限定多个空间。 在另一方面,作者是一个基座定义的零喉作家。 在这方面,第一绝缘体具有凹陷,线圈设置在凹部上。
    • 29. 发明申请
    • Method For Manufacturing Wraparound Shield Write Head Using Hard Masks
    • 使用硬掩模制造绕组屏蔽写头的方法
    • US20130026131A1
    • 2013-01-31
    • US13193520
    • 2011-07-28
    • Shiwen HuangFenglin LiuQiping ZhongKyusik ShinYingjian Chen
    • Shiwen HuangFenglin LiuQiping ZhongKyusik ShinYingjian Chen
    • G11B5/127
    • G11B5/3116G11B5/3163
    • The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
    • 本公开描述了通过实施三层(三层)硬掩模制造全封装屏蔽镶嵌写头的方法。 根据本发明的实施例,在形成写入头期间,各种硬掩模层用于不同的目的。 本发明的环绕式屏蔽头表现出改进的物理特性,进一步导致改善的性能特征。 根据本发明的硬掩模层的使用允许使用可以比其它工艺中使用的那些方法更加严格地控制的制造工艺。 例如,可以使用较小尺寸的光刻技术。 此外,在使用CMP工艺不如使用本发明可能的沉积或光刻技术那样不受控制的情况下,对某些CMP工艺的依赖是不必要的。