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    • 30. 发明授权
    • Method for manufacturing semiconductor device
    • 制造半导体器件的方法
    • US06887767B2
    • 2005-05-03
    • US10392878
    • 2003-03-21
    • Mayumi NakasatoKazuhiro SasadaMasahiro Oda
    • Mayumi NakasatoKazuhiro SasadaMasahiro Oda
    • H01L21/76H01L21/762
    • H01L21/76235
    • A method for manufacturing a semiconductor device including forming a buffer film on a semiconductor substrate, forming a element partitioning trench, forming a oxidized film on the surface of the element partitioning trench, and washing the semiconductor substrate with hydrofluoric acid. The washing removes part of the buffer film, and the end of the buffer film is inwardly removed from the top edge of the element partitioning trench by a predetermined distance. The distance and the thickness of the oxidized film are represented by the expression 0≦x≦(d/2 sin θ), where x represents the distance, and θ represents the angle between a plane parallel to the semiconductor substrate and a side surface of the element partitioning trench.
    • 一种制造半导体器件的方法,包括在半导体衬底上形成缓冲膜,形成元件分隔沟槽,在元件分隔沟槽的表面上形成氧化膜,并用氢氟酸洗涤半导体衬底。 洗涤物去除部分缓冲膜,缓冲膜的端部从元件分隔槽的顶部边缘向内移除预定距离。 氧化膜的距离和厚度由表达式0 <= x <=(d /2sinθ)表示,其中x表示距离,θ表示平行于半导体衬底的平面与侧面之间的角度 元件分隔沟的表面。