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21. 发明申请

US20090073443A1 Method And Equipment For Detecting Pattern Defect 有权
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20090073443A1
公开(公告)日：2009-03-19
申请号：US12271348
申请日：2008-11-14
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An inspection apparatus and method includes a light source which emits an ultraviolet laser beam, an illuminating unit having a polarization controller and an object lens for illuminating a specimen with light emitted from the light source and passed through the polarization controller and the object lens, a detection unit having a sensor for detecting light from the specimen illuminated by the illuminating unit, a processor which processes a signal output from the sensor so as to detect a defect on the specimen, and a display which displays information output from the processor. The processor processes an image formed from the signal output from the sensor in which the image is reduced in speckle pattern.
摘要翻译：一种检查装置和方法，包括发射紫外线激光的光源，具有偏振光控制器和物镜的照明单元，用于利用从光源发出并通过偏振光控制器和物镜的光照射样本，检测单元，具有用于检测由照明单元照射的样本的光的传感器;处理器，处理从传感器输出的信号以检测样本上的缺陷;以及显示器，显示从处理器输出的信息。处理器处理从传感器输出的信号形成的图像，其中图像以斑点图案被减少。

22. 发明申请

US20060183040A1 Method for controlling semiconductor device production process and a method for producing semiconductor devices 失效
标题翻译：半导体器件制造方法的控制方法以及半导体器件的制造方法
公开(公告)号：US20060183040A1
公开(公告)日：2006-08-17
申请号：US11304778
申请日：2005-12-16
申请人： Hideaki Sasazawa , Yasuhiro Yoshitake
发明人： Hideaki Sasazawa , Yasuhiro Yoshitake
IPC分类号： G03C5/00
CPC分类号： G03F7/70641
摘要： In order to realize individually and easily optimization of exposure conditions such as exposure dose and focus by photolithography in a production process of semiconductor devices, the present invention is such that: light is radiated onto a pattern on a semiconductor wafer; by an optical system that detects information on a pattern shape using scattered light by its reflection, waveforms of an FEM sample wafer having a plurality of shape deformation patterns prepared in advance are detected and stored; one or more characteristic points on a spectral waveform generated in association with a pattern change is recorded; and a variation model of the characteristic points is obtained. As to a pattern to be measured, a spectral waveform is detected in the same manner as that described above, and deviations (exposure dose deviation and focus deviation) of the formation conditions are estimated from a displacement of the characteristic points on the waveform using the variation model. Thereby, the exposure dose and focus can be independently fed back and the process control can be achieved with high accuracy.
摘要翻译：为了在半导体器件的生产过程中实现通过光刻的曝光量和曝光量等的曝光条件的单独和容易的优化，本发明使得：将光照射到半导体晶片上的图案上; 通过利用其反射检测使用散射光的图案形状的信息的光学系统，检测并存储具有预先准备的多个形状变形图案的FEM样品晶片的波形; 记录与图案变化相关联地生成的光谱波形上的一个或多个特征点; 并获得特征点的变化模型。对于要测量的图案，以与上述相同的方式检测光谱波形，并且使用波形的波形上的特征点的位移来估计形成条件的偏差（曝光剂量偏差和聚焦偏差）变异模型。因此，可以独立地反馈曝光剂量和聚焦，并且可以以高精度实现过程控制。

23. 发明授权

US06542830B1 Process control system 有权
标题翻译：过程控制系统
公开(公告)号：US06542830B1
公开(公告)日：2003-04-01
申请号：US09142546
申请日：1998-09-10
申请人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
发明人： Fumio Mizuno , Seiji Isogai , Kenji Watanabe , Yasuhiro Yoshitake , Terushige Asakawa , Yuichi Ohyama , Hidekuni Sugimoto , Seiji Ishikawa , Masataka Shiba , Jun Nakazato , Makoto Ariga , Tetsuji Yokouchi , Toshimitsu Hamada , Ikuo Suzuki , Masami Ikota , Mari Nozoe , Isao Miyazaki , Yoshiharu Shigyo
IPC分类号： H01L2166
CPC分类号： H01L22/20 , G01N21/9501 , G01R31/2894 , G01R33/06 , H01L2223/54466 , H01L2924/0002 , H01L2924/00
摘要： A process management system in accordance with the present invention includes inspection apparatuses for inspecting defects on a wafer, the inspection apparatuses being connected through a communication network, inspection information and image information obtained from these inspection apparatuses being collected to construct a data base and an image file, therein definition of defects is given by combinations of elements which characterize the defect based on the inspection information and the image information obtained from the inspection apparatuses. By giving definition of the defect, characteristics of the defect can be subdivided and known. Therefore, the cause of a defect can be studied.
摘要翻译：根据本发明的处理管理系统包括用于检查晶片上的缺陷的检查装置，通过通信网络连接的检查装置，从这些检查装置获得的检查信息和图像信息被收集以构建数据库和图像文件，其中缺陷的定义通过基于检查信息和从检查装置获得的图像信息来表征缺陷的元件的组合来给出。通过给出缺陷的定义，可以细分和知道缺陷的特征。因此，可以研究缺陷的原因。

24. 发明授权

US5324953A Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens 失效
$Reduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lens$
标题翻译：具有色差校正系统的减少投影曝光系统，包括全息透镜等衍射透镜
公开(公告)号：US5324953A
公开(公告)日：1994-06-28
申请号：US12775
申请日：1993-02-03
申请人： Yasuhiro Yoshitake , Yoshitada Oshida , Masataka Shiba , Yasuhiko Nakayama
发明人： Yasuhiro Yoshitake , Yoshitada Oshida , Masataka Shiba , Yasuhiko Nakayama
IPC分类号： G02B5/32 , G02B27/00 , G03F7/23 , G03F9/00 , H01L21/027 , H01L21/30 , G06K7/015
CPC分类号： G03F9/70 , G02B27/0037 , G02B27/4211 , G02B27/4222 , G02B5/32
摘要： A novel exposure system includes a reduced-projection lens optimized for a predetermined single exposure wavelength and a chromatic aberration correction system for TTL (Through The Lens) alignment with broadband light. The correction system includes a holographic lens which dispersion has a negative number in contrast to a conventional glass lens which has a positive dispersion number. By employing a holographic lens, the total optical length of an alignment system can be made short enough to avoid the necessity of installing a mirror therein, thus realizing a highly accurate alignment system.
摘要翻译：一种新颖的曝光系统包括针对预定的单一曝光波长优化的缩小投影透镜和用于与宽带光进行TTL（透镜））对准的色差校正系统。校正系统包括与具有正色散数的常规玻璃透镜相反的色散具有负数的全息透镜。通过采用全息透镜，可以使对准系统的总光学长度足够短以避免在其中安装反射镜，从而实现高精度的对准系统。

25. 发明授权

US5016149A Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same 失效
标题翻译：用于进行照明的照明方法和照明装置，以及用于进行曝光的投影曝光方法和投影曝光装置
公开(公告)号：US5016149A
公开(公告)日：1991-05-14
申请号：US439436
申请日：1989-11-20
申请人： Minoru Tanaka , Yoshitada Oshida , Yasuhiro Yoshitake , Tetsuzo Tanimoto
发明人： Minoru Tanaka , Yoshitada Oshida , Yasuhiro Yoshitake , Tetsuzo Tanimoto
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70058 , G03F7/70566 , G03F7/70583
摘要： An illuminating method and an illuminating apparatus for use in combination, for example, with an exposure apparatus. The illuminating apparatus comprises amplitude distribution control means for converting the intensity distribution of a light beam emitted by a highly directional light source into a substantially linear intensity distribution, beam splitting means for splitting the light beam into a plurality of component beams, and superposing means for superposing the component beams in a desired area on an object, such as a reticle, in an uniform illuminance distribution.
摘要翻译：照明方法和照明装置，例如用曝光装置组合使用。该照明装置包括用于将由高度定向的光源发射的光束的强度分布转换为基本线性强度分布的幅度分布控制装置，用于将光束分成多个分量光束的分束装置，以及用于在均匀的照度分布中将分量光束叠加在物体（例如光罩）上的期望区域中。

26. 发明授权

US08736830B2 Pattern inspection device of substrate surface and pattern inspection method of the same 有权
标题翻译：基板表面图案检查装置及图案检验方法相同
公开(公告)号：US08736830B2
公开(公告)日：2014-05-27
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/00
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

27. 发明授权

US08730471B2 DUV-UV band spectroscopic optical system and spectrometer using same 有权
标题翻译： DUV-UV光谱分光光学系统和光谱仪
公开(公告)号：US08730471B2
公开(公告)日：2014-05-20
申请号：US13145942
申请日：2009-12-17
申请人： Keiko Oka , Yasuhiro Yoshitake
发明人： Keiko Oka , Yasuhiro Yoshitake
IPC分类号： G01J3/28
CPC分类号： G01B11/0625 , G01B2210/56 , G01J3/02 , G01J3/0208 , G01J3/0278 , G01J3/0297 , G01J3/10 , G01N21/9501 , G01N21/956 , G02B13/143 , G02B21/16 , G02B27/0025 , G11B5/84
摘要： Disclosed are a spectroscopic optical system and a spectrometer both enabling vertical illumination by means of an optical system using only refractive lenses and enabling wide-band color correction in the DUV-UV (190 to 400 nm) range. The spectroscopic optical system and spectrometer each comprise a light source (100), a folding mirror (110), a field stop (120), an object-side focusing lens system (130) for focusing light onto a sample, an image-side focusing lens (140) disposed on the image forming plane of the object-side focusing lens system, and a spectroscope (150) for dispersing regularly reflected light from the sample. The object-side focusing lens system (130) and the image-side focusing lens system (140) are each a spectroscopic optical system corrected with respect to color in a broad band of wavelength from 190 to 400 nm and configured from only refractive lenses enabling vertical illumination. The working distance (WD) of each lens is set shorter than a predetermined distance, and the doublet interval (D) is set longer than a predetermined distance.
摘要翻译：公开了一种分光光学系统和光谱仪，其通过仅使用折射透镜的光学系统实现垂直照明，并且能够在DUV-UV（190-400nm）范围内实现宽带色彩校正。分光光学系统和光谱仪各自包括光源（100），折叠镜（110），场停止器（120），用于将光聚焦到样本上的物体侧聚焦透镜系统（130），图像侧设置在物体侧聚焦透镜系统的图像形成平面上的聚焦透镜（140）以及用于从样品中均匀地分散反射光的分光镜（150）。物体侧聚焦透镜系统（130）和图像侧聚焦透镜系统（140）分别是相对于190至400nm的波长宽带中的颜色校正的分光光学系统，并且仅由折射透镜构成，使得能够垂直照明每个透镜的工作距离（WD）设定为短于预定距离，并且双重间隔（D）被设定为比预定距离长。

28. 发明授权

US08553216B2 Defect inspection device using catadioptric objective lens 有权
标题翻译：使用反折射物镜的缺陷检查装置
公开(公告)号：US08553216B2
公开(公告)日：2013-10-08
申请号：US12747949
申请日：2008-12-19
申请人： Keiko Yoshimizu , Yasuhiro Yoshitake
发明人： Keiko Yoshimizu , Yasuhiro Yoshitake
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/8806 , G01N21/94 , G02B17/0808 , G02B21/0016 , G02B21/04 , G02B27/46
摘要： A defect inspection device comprises an inspection optical system including a light source, a half mirror for reflecting illumination light emitted from the light source, a catadioptric objective lens for collecting reflected light from the sample by illumination light reflected by the half mirror, an imaging lens for focusing the reflected light transmitted through the catadioptric objective lens, a relay lens having a blocking member provided at a position at which specularly reflected light from the sample is focused by the imaging lens, and a detector for detecting specularly reflected light not blocked by the blocking member; and a computation processing unit for detecting defects of the sample on the basis of the signals detected by the detector.
摘要翻译：缺陷检查装置包括检查光学系统，包括光源，用于反射从光源发射的照明光的半反射镜，用于通过由半反射镜反射的照明光收集来自样品的反射光的反射折射物镜，成像透镜用于对透射反射折射物镜透射的反射光进行聚焦的中继透镜，具有设置在通过成像透镜聚焦的来自样品的镜面反射光的位置处的阻挡构件的中继透镜，以及检测器，用于检测未被该反射折射物镜遮挡的镜面反射光阻挡构件; 以及计算处理单元，用于基于由检测器检测到的信号来检测样本的缺陷。

29. 发明授权

US08259414B2 Magnetic recording disk having aligning pattern and method for aligning thereof 有权
标题翻译：具有对准图案的磁记录盘及其对准方法
公开(公告)号：US08259414B2
公开(公告)日：2012-09-04
申请号：US12156338
申请日：2008-05-29
申请人： Takenori Hirose , Yasuhiro Yoshitake
发明人： Takenori Hirose , Yasuhiro Yoshitake
IPC分类号： G11B5/82
CPC分类号： G11B5/82 , B82Y10/00 , G11B5/743 , G11B5/855
摘要： Embodiments of the invention provide patterned media in which the center and the direction of the disk can be detected. According to one embodiment, patterned media has a bit pattern including convex portions of a magnetic material on one surface or both surfaces of a nonmagnetic substrate having a central hole. A diffraction grating pattern is formed as an alignment pattern in the inner circumference (or outer circumference) of the patterned media. The diffraction grating pattern is a pattern having a repetitive configuration, and includes a pattern with a repetitive pitch different from that in other portions, or a portion having no pattern, at least one region on a circumference. The diffraction grating pattern is irradiated with detection light and diffracted light is detected, thereby a center and a direction of the disk can be detected.
摘要翻译：本发明的实施例提供了可以检测盘的中心和方向的图案化介质。根据一个实施例，图案化介质具有在具有中心孔的非磁性基板的一个表面或两个表面上具有包括磁性材料的凸部的位图案。在图案化介质的内圆周（或外圆周）上形成衍射光栅图案作为对准图案。衍射光栅图案是具有重复构造的图案，并且包括具有与其它部分不同的重复间距的图案，或者具有无图案的部分，圆周上的至少一个区域。用检测光照射衍射光栅图案，并检测衍射光，从而可以检测光盘的中心和方向。

30. 发明申请

US20120013890A1 PATTERN INSPECTION DEVICE OF SUBSTRATE SURFACE AND PATTERN INSPECTION METHOD OF THE SAME 有权
标题翻译：基板表面图案检测装置及其图案检测方法
公开(公告)号：US20120013890A1
公开(公告)日：2012-01-19
申请号：US13145968
申请日：2009-12-10
申请人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
发明人： Masahiro Watanabe , Toshihiko Nakata , Yasuhiro Yoshitake , Hideaki Sasazawa , Minoru Yoshida
IPC分类号： G01N21/956 , G01N21/47
CPC分类号： G01Q60/22 , G01N21/95607 , G11B5/84
摘要： There is provided a pattern inspection device for a substrate surface which can inspect a substrate including a pattern whose size is equal to or smaller than light resolution limit at high speed. The pattern inspection device for the substrate surface includes: a near-field optical head 101 having a fine repetitive pattern; a θ driving unit 311 of scanning an inspected substrate 900 relatively to the near-field optical head 101; a space holding mechanism of holding a space between the near-field optical head 101 and the inspected substrate 900 constant; alight source 110 of irradiating light to the near-field optical head 101; a detection system 201 of detecting an intensity of scattered light generated by interaction between the fine repetitive pattern on the near-field optical head 101 and a fine pattern on a surface of the inspected substrate 900; and a signal processing unit 321 of inspecting the fine pattern on the inspected substrate 900 based on an output of the detection system 201.
摘要翻译：提供了一种用于基板表面的图案检查装置，其能够高速检查尺寸等于或小于光分辨率极限的图案的基板。用于基板表面的图案检查装置包括：具有精细重复图案的近场光学头101; a＆thetas; 驱动单元311，其相对于近场光学头101扫描被检查的基板900; 在近场光学头101和被检查基板900之间保持一定间隔的空间保持机构; 将光照射到近场光学头101的光源110; 检测系统201，用于检测由近场光学头101上的细重复图案与被检查基板900的表面上的微细图案之间的相互作用产生的散射光的强度; 以及基于检测系统201的输出来检查被检查基板900上的精细图案的信号处理单元321。

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