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21. 发明专利

JP2012242507A Device for sticking optical film to substrate 有权
标题翻译：用于将基片遮盖光膜的装置
公开(公告)号：JP2012242507A
公开(公告)日：2012-12-10
申请号：JP2011110779
申请日：2011-05-17
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide a device for sticking an optical film to a substrate capable of sticking a thin sheet-like object such as an optical film to a substrate highly efficiently without including air bubbles and foreign matters and without generating deflection and wrinkles.SOLUTION: In a vacuum chamber 1, a substrate 10 is processed in the following manner: a seal material is ejected on the edge parts of it by a dispenser 31; liquid crystal is dropped on it by a liquid crystal dropping nozzle; and an optical film 12 is stuck to it by a pressing surface plate 51. The optical film 12 moves to between the pressing surface plate 51 and the substrate 10 while being held by a holding member 8a.
摘要翻译：要解决的问题：提供一种用于将光学膜粘附到能够高效率地粘贴诸如光学膜的薄片状物体的基板的装置，而不包括气泡和异物并且不产生偏转和皱纹。解决方案：在真空室1中，以如下方式处理基板10.密封材料通过分配器31喷射在其边缘部分上; 液晶滴落在液晶滴下喷嘴上; 并且通过按压面板51将光学膜12粘贴在其上。光学膜12在被保持构件8a保持的同时移动到按压面板51与基板10之间。版权所有（C）2013，JPO＆INPIT

22. 发明专利

JP2011161534A Abrasive head and abrading device 有权
标题翻译：磨砂头和抛光装置
公开(公告)号：JP2011161534A
公开(公告)日：2011-08-25
申请号：JP2010024532
申请日：2010-02-05
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , HIRANO TAKAFUMI , MIZUMURA MICHINOBU
IPC分类号： B24B21/00
CPC分类号： B24B7/005 , B24B21/06 , B24B49/12
摘要： PROBLEM TO BE SOLVED: To abrade a minute protrusion on a substrate up to a required height, even when an abrasive head can not be installed and adjusted accurately, and to prevent damage to an abrasive tape.
SOLUTION: The abrasive head 521b is oscillatably mounted in a lower part of a base member 521a by making a direction orthogonal to a width direction of the abrasive tape 510 as a shaft 521c. The abrasive tape 510 including smooth surfaces 510e, 510e functioning as stoppers in abrading operations at both ends of the width direction across an abrasive surface 510d is pressed against the minute protrusion α by the abrasive head 521b, and the minute protrusion α is abraded by transferring the abrasive tape 510. Here, abrasion progresses, and as the height of the minute protrusion α becomes lower, the inclination of the abrasive head 521 with respect to the substrate BS becomes is reduced, and eventually, both smooth surfaces 510e, 510e abut on the substrate BS, thereby enabling prevention of one-sided contact of the abrasive tape 510.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：即使在研磨头不能被精确地安装和调整并且防止磨损带损坏的情况下，将基板上的微小突起磨损至所需高度。解决方案：研磨头521b通过使与作为轴521c的砂带510的宽度方向正交的方向以可摆动的方式安装在基座构件521a的下部。包括在研磨面510d的宽度方向的两端的研磨操作中作为止动器的光滑面510e，510e的研磨带510被研磨头521b按压在微小凸起α上，微小突起α通过转印研磨带510.这里，磨损进行，并且随着微小突起α的高度变低，研磨头521相对于基板BS的倾斜变小，并且最终两个平滑表面510e，510e邻接从而能够防止砂带510的单面接触。版权所有：（C）2011，JPO＆INPIT

23. 发明专利

JP2017082313A 成膜マスクの製造方法审中-公开
公开(公告)号：JP2017082313A
公开(公告)日：2017-05-18
申请号：JP2015214330
申请日：2015-10-30
申请人：株式会社ブイ・テクノロジー , V Technology Co Ltd
发明人： KUDO SHUJI , KIMURA ERIKO , KOBAYASHI IKUNORI
IPC分类号： C23C14/04 , B23K26/18 , B23K26/38 , H01L51/50 , H05B33/10
CPC分类号： B23K26/18 , B23K26/38 , C23C14/04 , H01L51/50 , H05B33/10
摘要：【課題】開口パターンの縁部におけるバリの発生を簡単なプロセスで抑制する。【解決手段】レーザ加工可能な樹脂製フィルム4の表裏何れか一方の面に、前記フィルム4とは異なる樹脂材料から成り、可視光よりも波長の短いレーザ光L1を吸収する樹脂製のサポート層2を形成する工程と、前記フィルム4の前記サポート層2を形成した面とは反対側からレーザ光L1を照射して、該フィルム4を貫通する開口パターン3を形成する工程と、前記フィルム4に対して前記サポート層2を選択除去する工程と、を行うものである。【選択図】図1

24. 发明专利

JP2013229287A Method for forming thin-film pattern 有权
标题翻译：形成薄膜图案的方法
公开(公告)号：JP2013229287A
公开(公告)日：2013-11-07
申请号：JP2012264451
申请日：2012-12-03
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI , HONEY MAHAL AZIZ , KAJIYAMA YOSHITAKA
IPC分类号： H05B33/10 , C23C14/04 , H01L21/3205 , H01L21/768 , H01L51/50 , H05B33/04 , H05B33/12 , H05B33/22 , H05B33/26
CPC分类号： H01M4/00 , H01L27/3211 , H01L51/0016
摘要： PROBLEM TO BE SOLVED: To provide a method for forming a thin-film pattern capable of easily forming a high-definition thin-film pattern on a surface of a substrate in which an electrode is formed in a thin-film pattern formation region in advance.SOLUTION: A method for forming a thin-film pattern 14 having a prescribed shape on a surface of a substrate 1 in which an electrode is formed in a thin-film pattern formation region in advance comprises the steps of: sticking a resin film 2 which transmits visible light onto the substrate 1; forming an opening pattern 21 having the same shape as the thin-film pattern 14 on the film 2 by irradiating a thin-film pattern formation region 11 on the substrate 1 with a laser beam L; depositing the thin-film pattern 14 in the thin-film pattern formation region 11 on the substrate 1 via the opening pattern 21 of the film 2; and peeling the film 2.
摘要翻译：要解决的问题：提供一种在预先在薄膜图案形成区域中形成电极的基板的表面上形成能够容易地形成高清晰度薄膜图案的薄膜图案的方法解决方案：预先在薄膜图案形成区域中形成电极的基板1的表面上形成具有规定形状的薄膜图案14的方法包括以下步骤：将树脂膜2 其将可见光透射到基板1上; 通过用激光束L照射在基板1上的薄膜图案形成区域11，形成与膜2上的薄膜图案14相同形状的开口图案21; 通过膜2的开口图案21将薄膜图案14沉积在基板1上的薄膜图案形成区域11中; 并剥离薄膜2。

25. 发明专利

JP2013171081A Light deflecting element 审中-公开
标题翻译：光偏转元件
公开(公告)号：JP2013171081A
公开(公告)日：2013-09-02
申请号：JP2012033221
申请日：2012-02-17
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： MIZUMURA MICHINOBU , KUDO SHUJI , ISHIKAWA DAIGO , SENABA TADASHI , KIMURA ERIKO
IPC分类号： G02F1/29
CPC分类号： G02F1/29 , G02F2201/18 , G02F2203/24
摘要： PROBLEM TO BE SOLVED: To provide a light deflecting element capable of deflecting a laser beam having a large beam diameter and making the laser beam scan at high speed.SOLUTION: Electro-optic crystal materials 1a-1e are arranged in a plate thickness direction of the same, electrodes 2b-2e are interposed between the respective electro-optic crystal materials, and an electrode 2a is provided on a top surface and an electrode 2f is provided on a bottom surface. Each of the electro-optic crystal materials 1a-1e is provided with a first area of which a crystal optical axis faces upward and a second area of which a crystal optical axis faces downward, and the second area of an electro-optic crystal material of a lower layer is arranged directly under the first area of an electro-optic crystal material of an upper layer. Electric potential E is applied to the electrodes 2a, 2c, 2e and ground potential is applied to the electrodes 2b, 2d, 2f.
摘要翻译：要解决的问题：提供一种能够偏转具有大光束直径的激光束并使激光束以高速扫描的光偏转元件。解决方案：电光晶体材料1a-1e沿板厚方向相同的是，电极2b-2e插在相应的电光晶体材料之间，电极2a设置在顶表面上，电极2f设置在底表面上。每个电光晶体材料1a-1e设置有晶体光轴面向上的第一区域和晶体光轴面朝下的第二区域，并且电光晶体材料的第二区域下层布置在上层的电光晶体材料的第一区域的正下方。对电极2a，2c，2e施加电位E，将电位施加到电极2b，2d，2f。

26. 发明专利

JP2013147700A Vapor deposition apparatus 审中-公开
标题翻译：蒸气沉积装置
公开(公告)号：JP2013147700A
公开(公告)日：2013-08-01
申请号：JP2012008775
申请日：2012-01-19
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , MIZUMURA MICHINOBU , IWAMOTO MASAMI , KUDO SHUJI
IPC分类号： C23C14/24 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To prevent a substrate from becoming dislodged from a substrate holder even if there is an electrostatic adsorption failure.SOLUTION: There is provided a vapor deposition apparatus that forms a thin film pattern by vapor deposition of a vapor deposition material on a substrate 7 through openings 18 in a vapor deposition mask 3, the substrate being held by being electrostatically adsorbed onto a holding surface of a substrate holder 2. In the substrate holder 2, heaters 13 which can be conducted by a separately provided heater power source 12 are respectively provided at a plurality of positions of a peripheral edge area of the holding surface 2b. A solder placed on an installation part 14 of each heater 13 is heated and melted by the each heater 13, and the substrate 7 is soldered to the holding surface 2b and held.
摘要翻译：要解决的问题：即使存在静电吸附故障，也可防止基板从基板保持架脱落。解决方案：提供一种蒸镀装置，其通过在蒸镀材料上气相沉积形成薄膜图案衬底7通过蒸镀掩模3中的开口18，基板被静电吸附到基板保持器2的保持表面上。在基板保持器2中，可以通过单独提供的加热器电源12 分别设置在保持面2b的周缘部的多个位置。放置在每个加热器13的安装部分14上的焊料被每个加热器13加热和熔化，并且将基板7焊接到保持表面2b并保持。

27. 发明专利

JP2013124373A Vapor deposition apparatus 审中-公开
标题翻译：蒸气沉积装置
公开(公告)号：JP2013124373A
公开(公告)日：2013-06-24
申请号：JP2011272080
申请日：2011-12-13
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： C23C14/04 , C23C14/00 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To form a highly precise thin film pattern and to improve film deposition efficiency.SOLUTION: A vapor deposition apparatus includes in a vacuum chamber 1: a vapor deposition source 2; a substrate holder 3 which houses an electromagnet therein and holds a substrate 10 to face the vapor deposition source 2; a composite mask 4 which has such a structure that a plurality of opening patterns having the same shape as that of a thin film pattern are formed in a visible light transmitting long film at the same alignment pitch as that of the thin film pattern side by side in the major axis direction of the film, and a plurality of penetrated opening parts each having a size larger than the shape of the opening pattern are formed in accordance with the opening pattern in a magnetic metal thin plate stuck to the surface on the vapor deposition source 2 side of the film, and which moves stepwise in parallel with the surface of the substrate holder 3 through between the vapor deposition source 2 and the substrate holder 3 in the major axis direction of the film; a delivering reel 5 which is provided to one side with the substrate holder 3 in-between and delivers the composite mask 4; and a winding-up reel 6 which is provided to the other side with the substrate holder 3 in-between and winds up the composite mask 4.
摘要翻译：要解决的问题：形成高精度薄膜图案并提高成膜效率。解决方案：气相沉积设备包括在真空室1中：气相沉积源2; 衬底保持器3，其中容纳电磁体并保持衬底10面对气相沉积源2; 具有这样一种结构的复合掩模4，其形成与薄膜图案的形状相同的取向间距的可见光透过长膜的多个开口图案与薄膜图案的形状相同在膜的长轴方向上形成有多个穿透开口部，其各自具有比开口图案的形状大的尺寸，根据在气相沉积物表面粘附的磁性金属薄板中的开口图案形成源2侧，并且在膜的长轴方向上通过蒸镀源2和基板保持件3与基板保持件3的表面平行地逐步移动; 输送卷轴5，其一侧设置有衬底保持件3，并传送复合掩模4; 和卷绕卷轴6，其被设置在另一侧上，衬底保持件3在其间并卷起复合掩模4.版权所有（C）2013，JPO＆INPIT

28. 发明专利

JP2013065446A Thin film pattern forming method 有权
标题翻译：薄膜图案形成方法
公开(公告)号：JP2013065446A
公开(公告)日：2013-04-11
申请号：JP2011203155
申请日：2011-09-16
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： H05B33/10 , C23C14/04 , H01L51/50
摘要： PROBLEM TO BE SOLVED: To allow a thin film pattern with high fineness to be easily formed.SOLUTION: A thin film pattern forming method is a method for forming a thin film pattern with a certain shape on a substrate 1, and comprises: a first step of placing a resin film 4 that transmits visible light, on the substrate 1; a second step of processing a portion of the film 4, which corresponds to a predetermined portion on the substrate 1, at a constant speed to form a hole part 5 having a certain depth, and then processing a bottom part of the hole part 5 at a speed slower than the previous speed to penetrate the hole part 5, and forming a mask 7 having an opening 6 with a certain shape; a third step of forming a film at the predetermined portion on the substrate 1 through the opening 6 of the mask 7; and a fourth step of removing the mask 7.
摘要翻译：要解决的问题：允许容易地形成高细度的薄膜图案。解决方案：薄膜图案形成方法是在基板1上形成具有一定形状的薄膜图案的方法，包括：将可见光透射的树脂膜4放置在基板1上的第一步骤 ; 第二步，以一定的速度处理与基板1上的预定部分对应的胶片4的一部分，以形成具有一定深度的孔部5，然后在孔部5的底部处理比先前速度慢的速度穿透孔部5，形成具有一定形状的开口6的面罩7; 通过掩模7的开口6在基板1上的预定部分处形成膜的第三步骤; 以及去除掩模7的第四步骤。版权所有（C）2013，JPO＆INPIT

29. 发明专利

JP2013041685A Vacuum deposition method, vacuum deposition apparatus, manufacturing method of organic el display device and organic el display device 有权
标题翻译：真空沉积方法，真空沉积装置，有机EL显示装置和有机EL显示装置的制造方法
公开(公告)号：JP2013041685A
公开(公告)日：2013-02-28
申请号：JP2011176251
申请日：2011-08-11
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , KIMURA ERIKO , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： H05B33/10 , C23C14/04 , H01L51/50 , H05B33/12
摘要： PROBLEM TO BE SOLVED: To facilitate deposition of a high definition thin film pattern without using a shadow mask.SOLUTION: The manufacturing method of an organic EL display device in which a luminous layer of an organic EL material is formed by evaporating the organic EL material in a vacuum vessel, and depositing the organic EL material selectively on a plurality of pixel electrodes provided in matrix on the surface of a substrate for organic EL display, includes a step for not electrifying a resistor provided in contact electrically with the surface of a pixel electrode, located corresponding to a point where the luminous layer is formed, on the substrate side but electrifying the resistor so that a temperature limited not to cause sublimation of the organic EL material occurs therein, and a step for electrifying a resistor provided in contact electrically with the surface of a pixel electrode, located corresponding to the point where the luminous layer is not formed, on the substrate side so that a temperature sufficient for causing sublimation of the organic EL material occurs therein.
摘要翻译：要解决的问题：为了便于在不使用荫罩的情况下沉积高清晰度薄膜图案。解决方案：通过在真空容器中蒸发有机EL材料并且将有机EL材料选择性地沉积在多个像素电极上而形成有机EL材料的发光层的有机EL显示装置的制造方法在用于有机EL显示器的基板的表面上以矩阵形式提供的步骤包括：在基板侧上不使带有与形成有发光层的点相对应地与像素电极的表面接触的电阻器通电的步骤但是使电阻器通电，使得限制不引起有机EL材料升华的温度发生在其中，并且使电阻器设置为与像素电极的表面电接触的步骤，该电阻器对应于发光层为没有形成在基板侧，使得发生足以引起有机EL材料升华的温度。版权所有（C）2013，JPO＆INPIT

30. 发明专利

JP2013040058A Self-organization method and epitaxial growth method 有权
标题翻译：自组织方法和外延生长方法
公开(公告)号：JP2013040058A
公开(公告)日：2013-02-28
申请号：JP2011176253
申请日：2011-08-11
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KUDO SHUJI , MIZUMURA MICHINOBU , KAJIYAMA KOICHI
IPC分类号： C30B25/18 , C23C16/02 , C23C16/42 , C30B29/38 , H01L33/32
摘要： PROBLEM TO BE SOLVED: To grow a single crystalline epitaxial layer on non-single crystalline substrates such as a glass and a ceramic.SOLUTION: A self-organization method for preparing an underlayer that is lattice-matched with a single crystalline thin film to be subjected to crystalline growth includes: a step of applying a solution comprising an organic-inorganic hybrid material on the non-single crystalline substrate; and a step of treating the organic-inorganic hybrid material applied on the substrate at predetermined temperature and under an atmosphere, so that regularly-arranged lattices are voluntarily produced.

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