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21. 发明申请

US20080225247A1 OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES 有权
标题翻译：光学元件曝光过程
公开(公告)号：US20080225247A1
公开(公告)日：2008-09-18
申请号：US12046186
申请日：2008-03-11
申请人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
发明人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
IPC分类号： G03B27/54 , G03B27/52 , G02B23/16
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： An optical element unit including a first optical element module and a sealing arrangement is disclosed. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially prevents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：公开了一种包括第一光学元件模块和密封装置的光学元件单元。第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。第一部件类型是光学元件，第二部件类型与第一部件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并至少在第一方向上基本上防止物质从第一空间和第二空间中的一个进入第一空间和第二个空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

22. 发明申请

US20080192215A1 Optical element unit for exposure processes 有权
标题翻译：用于曝光过程的光学元件单元
公开(公告)号：US20080192215A1
公开(公告)日：2008-08-14
申请号：US12008879
申请日：2008-01-15
申请人： Bernhard Gellrich , Jens Kugler , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Dieter Schmerek , Detlev Mueller , Thomas Schletterer
发明人： Bernhard Gellrich , Jens Kugler , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Dieter Schmerek , Detlev Mueller , Thomas Schletterer
IPC分类号： G03B27/52 , G02B7/02
CPC分类号： G02B27/0006 , G02B1/18 , G02B7/023 , G03B27/52 , G03F7/70341 , G03F7/70808 , G03F7/70833 , G03F7/70933
摘要： An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.
摘要翻译：提供一种光学元件单元，包括光学元件组; 接收所述光学元件组并具有内部壳体部分和出口端的壳体; 以及净化单元，其连接到所述壳体并且向所述内壳体部件提供净化介质。光学元件组包括极限光学元件。最终的光学元件位于壳体的出口端处，并将内部壳体部件与壳体外部的环境分离。最终的光学元件和壳体限定了密封间隙。净化单元向密封间隙提供净化介质以防止污染物侵入内壳体部分。

23. 发明申请

US20070132969A1 Microlithographic projection exposure apparatus and method for introducing an immersion liquid into an immersion space 审中-公开
标题翻译：用于将浸没液引入浸入空间的微光刻投影曝光装置和方法
公开(公告)号：US20070132969A1
公开(公告)日：2007-06-14
申请号：US10565612
申请日：2004-07-08
申请人： Bernhard Gellrich , Gerd Reisinger , Dieter Schmerek , Jens Kugler
发明人： Bernhard Gellrich , Gerd Reisinger , Dieter Schmerek , Jens Kugler
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： The invention relates to a projection exposure system for microlithography, said system comprising an illumination device for generating a projection light, and a projection objective comprising a plurality of optical elements such as lenses (L5) and enabling a reticle that can be arranged in an object plane of the projection objective to be imaged onto a light-sensitive surface (26) that can be arranged in an image plane of the projection objective and is applied to a carrier (30). The inventive system is also provided with an immersion device between an image-side last optical element (L5) of the projection objective and the light-sensitive surface (26), for introducing an immersion liquid (34) into an immersion chamber (50). Said immersion device comprises means (44; 66) which can prevent the appearance of gas bubbles (48) in the immersion liquid (34), affecting the imaging quality, and/or can remove existing gas bubbles (48). Said means can be, for example, an ultrasound source (66) or a degasifier (44).
摘要翻译：本发明涉及一种用于微光刻的投影曝光系统，所述系统包括用于产生投射光的照明装置，以及包括诸如透镜（L 5）的多个光学元件的投影物镜，并且能够将一个掩模版布置在将被投影物镜的物体平面成像到能够被布置在投影物镜的像平面中并被施加到载体（30）的光敏表面（26）上。本发明的系统还在投影物镜的最后一个光学元件（L 5）和光敏表面（26）之间设置浸入装置，用于将浸没液（34）引入到浸没室（50））。所述浸渍装置包括能够防止浸没液体（34）中的气泡（48）出现的装置（44; 66），影响成像质量，和/或可以去除现有的气泡（48）。所述装置可以是例如超声源（66）或脱气器（44）。

24. 发明授权

US09046795B2 Optical element unit for exposure processes having sealing element 有权
标题翻译：用于具有密封元件的曝光工艺的光学元件单元
公开(公告)号：US09046795B2
公开(公告)日：2015-06-02
申请号：US12046186
申请日：2008-03-11
申请人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
发明人： Tilman Schwertner , Ulrich Bingel , Guido Limbach , Julian Kaller , Hans-Juergen Scherle , Jens Kugler , Dirk Schaffer , Bernhard Gellrich
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G02B27/0006 , G03F7/70808 , G03F7/70825 , G03F7/70883 , G03F7/70908 , G03F7/70916 , G03F7/70933 , Y10T29/49
摘要： An optical element unit includes a first optical element module and a sealing arrangement. The first optical element module occupies a first module space and includes a first module component of a first component type and an associated second module component of a second component type. The first component type is optical elements and the second component type being different from the first component type. The sealing arrangement separates the first module space into a first space and a second space and substantially pre-vents, at least in a first direction, the intrusion of substances from one of the first space and the second space into the other one of the first space and the second space. The first module component at least partially contacts the first space and, at least in its area optically used, not contacting the second space. The second module component at least partially contacts the second space.
摘要翻译：光学元件单元包括第一光学元件模块和密封装置。第一光学元件模块占据第一模块空间并且包括第一组件类型的第一模块组件和第二组件类型的相关联的第二模块组件。第一部件类型是光学元件，第二部件类型与第一部件类型不同。密封装置将第一模块空间分隔成第一空间和第二空间，并且至少在第一方向上基本上预先将物质从第一空间和第二空间中的一个进入另一个第一空间空间和第二空间。第一模块部件至少部分地接触第一空间，并且至少在其光学使用的区域中不接触第二空间。第二模块组件至少部分地接触第二空间。

25. 发明授权

US08300210B2 Optical projection system 有权
标题翻译：光学投影系统
公开(公告)号：US08300210B2
公开(公告)日：2012-10-30
申请号：US11664896
申请日：2005-10-01
申请人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
发明人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
IPC分类号： G03B27/54 , G03B27/42 , G02B7/02
CPC分类号： G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
摘要翻译：提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。此外，第一壳体轴线与第二光轴基本共线。

26. 发明申请

US20080013063A1 Optical imaging device 审中-公开
标题翻译：光学成像装置
公开(公告)号：US20080013063A1
公开(公告)日：2008-01-17
申请号：US11804632
申请日：2007-05-18
申请人： Stefan Hembacher , Bernhard Gellrich , Jens Kugler
发明人： Stefan Hembacher , Bernhard Gellrich , Jens Kugler
IPC分类号： G02B7/04 , G03B27/68
CPC分类号： G03F7/7015 , G03F7/70241 , G03F7/70341 , G03F7/70825 , G03F7/70883
摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.
摘要翻译：提供了一种光学成像装置，特别是用于微光刻，包括至少一个光学元件和与光学元件（109）相关联的至少一个保持装置，其中保持装置保持光学元件和第一部分（109.1）光学元件接触第一大气，并且光学元件的第二部分（109.2）至少临时接触第二气氛。提供一种还原装置，至少减少第一大气和第二气氛之间的压差的动态波动。

27. 发明授权

US08027023B2 Optical imaging device and method for reducing dynamic fluctuations in pressure difference 有权
标题翻译：光学成像装置和降低压差动态波动的方法
公开(公告)号：US08027023B2
公开(公告)日：2011-09-27
申请号：US11985884
申请日：2007-11-19
申请人： Stefan Hembacher , Bernhard Gellrich , Jens Kugler , Sascha Bleidistel
发明人： Stefan Hembacher , Bernhard Gellrich , Jens Kugler , Sascha Bleidistel
IPC分类号： G03B27/52 , G03B27/42 , G03B27/68 , G03B27/60
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70341 , G03F7/70825
摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.
摘要翻译：提供了一种光学成像装置，特别是用于微光刻，包括至少一个光学元件和与光学元件（109）相关联的至少一个保持装置，其中保持装置保持光学元件和第一部分（109.1）光学元件接触第一大气，并且光学元件的第二部分（109.2）至少临时接触第二气氛。提供一种还原装置，至少减少第一大气和第二气氛之间的压差的动态波动。

28. 发明申请

US20090174874A1 Optical Projection System 有权
标题翻译：光学投影系统
公开(公告)号：US20090174874A1
公开(公告)日：2009-07-09
申请号：US11664896
申请日：2005-10-01
申请人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
发明人： Johannes Rau , Armin Schoeppach , Bernhard Gellrich , Jens Kugler , Martin Mahlmann , Bernhard Geuppert , Thomas Petasch , Gerhard Fuerter
IPC分类号： G03B27/54 , G03B27/62
CPC分类号： G03F7/7015 , G02B7/00 , G02B7/008 , G02B7/021 , G02B7/028 , G02B7/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G03F7/70808 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical projection unit comprising a first optical element module and at least one second optical element module is provided. The first optical element module comprises a first housing unit and at least a first optical element, the first optical element being received within the first housing unit and having an optically used first region defining a first optical axis. The at least one second optical element module is located adjacent to the first optical element module and comprises at least one second optical element, the second optical element defining a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is at least one of laterally offset and inclined with respect to the first housing axis. Furthermore, the first housing axis is substantially collinear with the second optical axis.
摘要翻译：提供了包括第一光学元件模块和至少一个第二光学元件模块的光学投影单元。第一光学元件模块包括第一壳体单元和至少第一光学元件，第一光学元件被接收在第一壳体单元内并且具有限定第一光轴的光学使用的第一区域。所述至少一个第二光学元件模块位于与所述第一光学元件模块相邻并且包括至少一个第二光学元件，所述第二光学元件限定所述光学投影单元的第二光轴。第一壳体单元具有中心的第一壳体轴线和围绕第一壳体轴线在圆周方向上延伸的外壁。第一光轴是相对于第一壳体轴线的横向偏移和倾斜中的至少一个。此外，第一壳体轴线与第二光轴基本共线。

29. 发明授权

US09817322B2 Optical imaging device and method for reducing dynamic fluctuations in pressure difference 有权
公开(公告)号：US09817322B2
公开(公告)日：2017-11-14
申请号：US13229114
申请日：2011-09-09
申请人： Stefan Hembacher , Bernhard Gellrich , Jens Kugler , Sascha Bleidistel
发明人： Stefan Hembacher , Bernhard Gellrich , Jens Kugler , Sascha Bleidistel
IPC分类号： G03B27/68 , G03F7/20
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70341 , G03F7/70825
摘要： There is provided an optical imaging device, in particular for microlithography, comprising at least one optical element and at least one holding device associated to the optical element (109), wherein the holding device holds the optical element and a first part (109.1) of the optical element contacts a first atmosphere and a second part (109.2) of the optical element at least temporarily contacts a second atmosphere. There is provided a reduction device at least reducing dynamic fluctuations in the pressure difference between the first atmosphere and the second atmosphere.

30. 发明授权

US08854602B2 Holding device for an optical element in an objective 有权
标题翻译：物镜中光学元件的保持装置
公开(公告)号：US08854602B2
公开(公告)日：2014-10-07
申请号：US10580179
申请日：2004-11-22
申请人： Bernhard Gellrich , Andreas Wurmbrand , Jens Kugler , Armin Schoeppach , Christian Zengerling , Stephane Bruynooghe
发明人： Bernhard Gellrich , Andreas Wurmbrand , Jens Kugler , Armin Schoeppach , Christian Zengerling , Stephane Bruynooghe
IPC分类号： G03B27/54 , G03B27/68 , G03F7/20 , G03B27/52 , G03B27/42
CPC分类号： G03F7/70341 , G03F7/70808 , G03F7/70825 , G03F7/70891
摘要： A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of thermal expansion corresponds substantially to the coefficient of thermal expansion of the optical element.
摘要翻译：另一方面，用于目标中的光学元件的保持装置具有一方面连接到物镜并且至少间接连接到光学元件的安装座。在安装件和光学元件之间布置的是其热膨胀系数基本上对应于光学元件的热膨胀系数的增强元件。

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