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    • 22. 发明授权
    • Fluorescent compositions
    • 荧光组合物
    • US4119562A
    • 1978-10-10
    • US760720
    • 1977-01-19
    • Akiyasu KagamiTakashi HaseYoshiyuki MimuraKinichiro NaritaMinoru Hiraki
    • Akiyasu KagamiTakashi HaseYoshiyuki MimuraKinichiro NaritaMinoru Hiraki
    • C09K11/08C09K11/64C09K11/77C09K11/46
    • C09K11/7731C09K11/0805C09K11/642C09K11/7766C09K11/7767C09K11/7771C09K11/7774
    • Fluorescent compositions which contain zinc oxide and one phosphor selected from the group hereinafter defined in a weight ratio within the range of 1/9 to 9/1, and fluorescent display devices having said fluorescent compositions in the form of a fluorescent screen, which can emit green, blue or red light under low-velocity electron excitation, said group consisting of a copper and aluminium activated zinc cadmium sulfide phosphor [(Zn.sub.1-x, Cd.sub.x)S:Cu, Al, wherein 0.ltoreq.x.ltoreq.0.1], a cerium activated yttrium aluminium gallium oxide phosphor [Y.sub.3 (Al.sub.1-y, Ga.sub.y).sub.5 O.sub.12 :Ce, wherein 0.ltoreq.y.ltoreq.0.5], a manganese activated zinc silicate phosphor (Zn.sub.2 SiO.sub.4 :Mn), a terbium activated yttrium lanthanum oxysulfide phosphor [(Y.sub.1-z, La.sub.z).sub.2 O.sub.2 S:Tb, wherein 0.ltoreq.z.ltoreq.1], a europium activated strontium gallium sulfide phosphor (SrGa.sub.2 S.sub.4 :Eu.sup.2+), a silver activated zinc sulfide phosphor (ZnS:Ag), and a europium activated yttrium oxysulfide phosphor (Y.sub.2 O.sub.2 S:Eu).
    • 荧光组合物,其含有氧化锌和一种荧光体,其选自下文所定义的重量比在1/9至9/1的范围内,荧光显示装置具有荧光屏形式的荧光组合物,其可以发射 绿色,蓝色或红色光在低速电子激发下,所述组由铜和铝活化的硫化镉锌荧光体[(Zn1-x,Cdx)S:Cu,Al)组成,其中0≤x≤0.1 ],铈活化的钇铝镓氧化物荧光体[Y3(Al1-y,Gay)5O12:Ce,其中0≤y≤0.5],锰活化的硅酸锌磷光体(Zn2SiO4:Mn),铽激活 钇氧化硫化镧荧光体[(Y1-z,Laz)2O2S:Tb,其中0≤z≤1],铕活化锶硫化镓荧光体(SrGa2S4:Eu2 +),银活化硫化锌荧光体(ZnS: Ag)和铕活化的氧硫化钇荧光体(Y 2 O 2 S:Eu)。
    • 25. 发明授权
    • Semiconductor device and manufacturing process therefor
    • 半导体器件及其制造工艺
    • US07968947B2
    • 2011-06-28
    • US12086435
    • 2006-12-26
    • Takashi Hase
    • Takashi Hase
    • H01L27/092H01L21/70
    • H01L21/823871H01L21/28097H01L21/823835H01L21/823842H01L29/4975H01L29/517H01L29/66545
    • This invention provides a semiconductor device that can prevent a deviation of work function by adopting a gate electrode having a uniform composition and exhibits excellent operating characteristics by virtue of effective control of a Vth. The semiconductor device is characterized by comprising a PMOS transistor, an NMOS transistor, a gate insulating film comprising an Hf-containing insulating film with high permittivity, a line electrode comprising a silicide region (A) and a silicide region (B), one of the silicide regions (A) and (B) comprising a silicide (a) of a metal M, which serves as a diffusing species in a silicidation reaction, the other silicide region comprising a silicide layer (C) in contact with a gate insulating film, the silicide layer (C) comprising a silicide (b) of a metal M, which has a smaller atom composition ratio of the metal M than the silicide (a), and a dopant which can substantially prevent diffusion of the metal M in the silicide (b).
    • 本发明提供一种能够通过采用具有均匀组成的栅电极来防止功函偏差的半导体器件,并且由于有效的Vth控制而具有优异的工作特性。 半导体器件的特征在于包括PMOS晶体管,NMOS晶体管,包括具有高介电常数的含Hf绝缘膜的栅极绝缘膜,包括硅化物区域(A)和硅化物区域(B)的线电极, 硅化物区域(A)和(B)包括在硅化反应中用作扩散物质的金属M的硅化物(a),另一个硅化物区域包括与栅极绝缘膜接触的硅化物层(C) 包含金属M的硅化物(b)的硅化物层(C),其具有比硅化物(a)更小的金属M的原子组成比,以及可以基本上防止金属M扩散的掺杂​​剂 硅化物(b)。
    • 26. 发明授权
    • Semiconductor device and method of manufacturing the same
    • 半导体装置及其制造方法
    • US07883983B2
    • 2011-02-08
    • US12467519
    • 2009-05-18
    • Takashi Hase
    • Takashi Hase
    • H01L21/768
    • H01L29/7843H01L27/0629H01L28/20H01L29/4966H01L29/7833
    • A method of manufacturing a semiconductor device, includes: forming a gate insulating film on a semiconductor substrate; forming a first metal film on the gate insulating film; forming a second metal film on the first metal film; and patterning a stacked film of the first and second metal films such that the stacked film is left in a gate electrode formation region and a resistive element formation region. The method further includes: removing the second metal film in the resistive element formation region with protecting a contact hole formation region. The method further includes: forming an interlayer insulating film so as to cover the stacked film; and removing the interlayer insulating film formed in the contact hole formation region to form a contact hole leading to the second metal film.
    • 一种制造半导体器件的方法,包括:在半导体衬底上形成栅极绝缘膜; 在栅极绝缘膜上形成第一金属膜; 在所述第一金属膜上形成第二金属膜; 以及图案化第一和第二金属膜的堆叠膜,使得堆叠的膜留在栅电极形成区域和电阻元件形成区域中。 该方法还包括:通过保护接触孔形成区域来去除电阻元件形成区域中的第二金属膜。 该方法还包括:形成层间绝缘膜以覆盖层叠膜; 以及去除形成在接触孔形成区域中的层间绝缘膜,以形成通向第二金属膜的接触孔。
    • 29. 发明授权
    • Energy trap piezoelectric resonator
    • 能量陷阱压电谐振器
    • US07567014B2
    • 2009-07-28
    • US10559240
    • 2005-04-20
    • Hitoshi SakaguchiHiroaki KaidaTakashi Hase
    • Hitoshi SakaguchiHiroaki KaidaTakashi Hase
    • H01L41/047
    • H03H9/0207H03H9/177
    • An energy trap piezoelectric resonator makes use of a harmonic wave in a thickness longitudinal vibration mode and can effectively suppress a spurious fundamental wave in a thickness longitudinal vibration mode without significantly suppressing the harmonic wave that is used for the resonator. The energy trap piezoelectric resonator has a first excitation electrode disposed at an upper surface of a piezoelectric substrate polarized in a thickness direction and a second excitation electrode disposed at a lower surface, and a floating electrode disposed at at least one of the upper surface and/or the lower surface of the piezoelectric substrate so as to extend towards and away from the first excitation electrode with respect to a node of an electric potential distribution based on electric charges generated by the fundamental wave that is propagated when an energy trap vibration portion where the excitation electrodes oppose each other is excited.
    • 能量阱压电谐振器利用厚度纵向振动模式的谐波,并且可以有效地抑制厚度纵向振动模式中的杂波基波,而不会显着地抑制用于谐振器的谐波。 能量阱压电谐振器具有设置在厚度方向偏振的压电基板的上表面的第一激励电极和设置在下表面的第二激励电极,以及设置在上表面和/ 或者压电基板的下表面相对于基于由基波产生的电荷而相对于电位分布的节点朝向和远离第一激励电极延伸,当基本波产生的电荷是在能量陷阱振动部分 激发电极彼此相对激发。
    • 30. 发明授权
    • Thickness extensional piezoelectric resonator
    • 厚度拉伸压电谐振器
    • US07446454B2
    • 2008-11-04
    • US11605412
    • 2006-11-29
    • Hiroaki KaidaHitoshi SakaguchiTakashi HaseJiro Inoue
    • Hiroaki KaidaHitoshi SakaguchiTakashi HaseJiro Inoue
    • H01L41/08
    • H03H9/177H03H9/02102
    • An energy-trapping-type thickness extensional piezoelectric resonator using a thickness extensional vibration mode having first and second resonance electrodes formed on portions of the top surface and the bottom surface of a piezoelectric substrate that is polarized in the thickness direction thereof, respectively, in which a portion where the first and second resonance electrodes oppose each other is formed as an energy-trapping-type vibration section, wherein, in order to suppress frequency changes of the thickness extensional vibration mode due to temperature, which is a main response using resonance characteristics, a suppression response having a frequency-temperature-change tendency for suppressing frequency changes of the main response due to temperature is brought into close proximity with the main response.
    • 一种使用厚度延伸振动模式的能量捕获型厚度延伸压电谐振器,其具有分别在其厚度方向上被偏振的压电基板的顶表面和底表面的部分上形成的第一和第二谐振电极,其中, 第一和第二谐振电极彼此相对的部分形成为能量捕获型振动部分,其中为了抑制作为使用谐振特性的主要响应的温度引起的厚度延伸振动模式的频率变化 具有用于抑制由于温度导致的主响应的频率变化的频率 - 温度变化趋势的抑制响应与主要响应紧密相关。