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21. 发明专利

JP2000314689A METHOD FOR PREPARING SAMPLE FOR ANALYZING IMPURITIES IN DEPTH DIRECTION OF ALUMINA SINTERED BODY AND IMPURITY ANALYZING METHOD USING THE METHOD 失效
公开(公告)号：JP2000314689A
公开(公告)日：2000-11-14
申请号：JP12288999
申请日：1999-04-28
申请人： TOSHIBA CERAMICS CO
发明人： TAKAHASHI MASATO , TOKUTAKE FUMIO
IPC分类号： G01N31/00 , G01N1/28
摘要： PROBLEM TO BE SOLVED: To provide a method for preparing a sample capable of analyzing impurities in the depth direction of an alumina sintered body to easily and highly accurately determine the same without generating pollution and an impurity analyzing method using the same. SOLUTION: In a method for forming a sample for analyzing impurities in the depth direction of an alumina sintered body, an alumina sintered body analyzing sample and sulfuric acid are housed in a pressure decomposing container to etch a predetermined amt. of the analyzing sample by pressure decomposition and sulfuric acid after etching is recovered. The etching of a predetermined amt. of the analyzing sample and the recovery of sulfuric acid after etching are performed repeatedly and this recovered sulfuric acid is used as an impurity analyzing sample. This analyzing sample is used to analyze impurities of the alumina sintered body by a high sensitivity analyzing method.

22. 发明专利

JP2000314034A HIGH PURITY CRYSTALLINE INORGANIC FIBER, ITS FORMED PRODUCT AND PRODUCTION THEREOF 失效
公开(公告)号：JP2000314034A
公开(公告)日：2000-11-14
申请号：JP2000004635
申请日：2000-01-13
申请人： TOSHIBA MONOFRAX , TOSHIBA CERAMICS CO
发明人： MISU YASUO , FUJII MIKIYA , KAWAI KAZUHIDE , TOKUTAKE FUMIO , TAKAHASHI MASATO , MORITA TAKASHI
IPC分类号： C04B35/64 , D01F9/08
摘要： PROBLEM TO BE SOLVED: To produce the subject fiber safely usable for a long period without contaminating a material to be heated, capable of improving the quality and productivity of the material to be heated and useful for a heat insulating material, etc., for an apparatus for producing a semiconductor by heat-treating a crystalline inorganic fiber (formed product) in a gas atmosphere containing chlorine. SOLUTION: A crystalline inorganic fiber consisting essentially of one or more kinds of alumina, silica and zirconia or its formed product is heat-treated at 600-1,500 deg.C temperature, preferably 1,100-1,500 deg.C temperature in a gas atmosphere containing chlorine such as chlorine gas, hydrogen chloride or ammonium chloride to produce a high-purity crystalline inorganic fiber or its formed product having

23. 发明专利

JP2000095534A PURIFICATION OF RAW QUARTZ POWDER 失效
公开(公告)号：JP2000095534A
公开(公告)日：2000-04-04
申请号：JP26987098
申请日：1998-09-24
申请人： TOSHIBA CERAMICS CO
发明人： FUJIWARA MARIKO , TOKUTAKE FUMIO
IPC分类号： C03B20/00 , C03C1/02
摘要： PROBLEM TO BE SOLVED: To rapidly, surely and economically attain a target purity by analyzing a liq. etchant after plural etchings to investigate the degree of contamination of the surface and inside of raw quartz powder and selecting a predetermined purification method based on the degree of contamination to purify the powder. SOLUTION: When the degree of contamination of the surface is higher than a critical degree of contamination and only the degree of internal contamination close to the surface is higher than the critical degree, acid treatment for removing the surface contaminant and etching by hydrofluoric acid are applied. When the internal contaminant is uniformly distributed and the degree of the internal contamination is higher than the critical degree, acid treatment and gas treatment are applied, and, when the degree of the internal contamination is lower than the critical degree, acid treatment is applied. Further, when the degree of the surface contamination is higher than the critical degree and only the degree of the internal contamination close to the surface is higher than the critical degree, etching is conducted by hydrofluoric acid, and gas treatment is applied when the internal contamination is higher than the critical degree.

24. 发明专利

JP2000019084A DROPLET SUPPLY/COLLECTION DEVICE FOR ANALYZING SILICON WAFER SURFACE 失效
公开(公告)号：JP2000019084A
公开(公告)日：2000-01-21
申请号：JP20129598
申请日：1998-07-01
申请人： TOSHIBA CERAMICS CO
发明人： NAGAMINE YOSHINOBU , TANAKA MASAFUMI , TOKUTAKE FUMIO
IPC分类号： G01N1/28 , G01N33/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To automatically supply and collect a droplet by vertically arranging a cylindrical droplet collection pipe with a droplet take-in port at the lower end in the rear side in the rotary direction of a rotary stand vertically at the upper portion of the rotary stand so that it can elevate and move horizontally and incorporating a droplet supply/collection means (capillary) in the collection pipe. SOLUTION: A droplet collection pipe 3 is moved and a lower end is positioned directly above the center part of a silicon wafer 2 on a rotary stand 1, a solenoid valve 10 is switched and a required amount of HF system solution is dropped onto the wafer 2 through a liquid-feeding pipe 7 and a capillary 5, and then the solenoid valve 10 is switched, and the capillary 5 is connected to a breathing pipe 9. A solution dropped onto the wafer 2 reacts with an oxide film and is scattered while taking in impurities, and forms a droplet 12 at various locations. Then, when the collection pipe 3 is moved in the radial direction of the rotary stand 1 while rotating the rotary stand 1, the droplet 12 is taken into the collection pipe 3 from a droplet take-in port 4 and rises in the capillary 5, and is carried to an analysis device via a connection pipe 8. Static electricity being generated in the collection pipe 3 and the capillary 5 is discharged via the grounding wire.

25. 发明专利

JPH11199370A QUARTZ GLASS CRUCIBLE AND ITS PRODUCTION 失效
公开(公告)号：JPH11199370A
公开(公告)日：1999-07-27
申请号：JP392198
申请日：1998-01-12
申请人： TOSHIBA CERAMICS CO
发明人： SHINPO MASARU , TOKUTAKE FUMIO
IPC分类号： C03B20/00 , C30B15/10 , C30B29/06
摘要： PROBLEM TO BE SOLVED: To produce a quartz glass crucible capable of suppressing local corrosion and crystallization of an inner surface, and impurity contamination of a silicon molten liquid, and ensiling the corrective action against deterioration of the surface of the crucible, and overcoming of inconvenience of treatment by forming the inner surface of a crucible wall out of a transparent quartz glass layer covering a layer containing a crystallization improver. SOLUTION: A metal ion (e.g. an alkali ion) is used as a crystallization improver. The concentration to be used is over 0 ppm but not over 500 ppm (e.g. 50 ppm). The thickness of a transparent quartz glass layer is over 0 mm and not over 1 mm (e.t. 6-800 μm). A layer containing the crystallization improver is rapidly crystallized before the pulling-up of the single crystal when a polycrystal silicon is melted at a high temperature of >=1,400 deg.C because of the double layered structure of the inner surface of the crucible. When the single crystal is pulled up thereafter, the transparent quartz glass layer is slowly crystallized on the surface layer side by using such crystallized layer as a nuclear and as a result, the whole surface of the crucible is in a state covered with the crystal.

26. 发明专利

JPH11130591A CZ SINGLE CRYSTAL, ITS PULLING APPARATUS AND PULLING UP OF CZ SINGLE CRYSTAL 失效
公开(公告)号：JPH11130591A
公开(公告)日：1999-05-18
申请号：JP30812897
申请日：1997-10-23
申请人： TOSHIBA CERAMICS CO
发明人： SHIN TAIRA , TOKUTAKE FUMIO
IPC分类号： C30B15/32 , C30B29/06 , H01L21/208
摘要： PROBLEM TO BE SOLVED: To provide a technique for surely carrying out reinforcement of a neck part by online without giving effect (especially vibration) on pulling process. SOLUTION: This pulling apparatus is obtained by providing a neck- reinforcing device 15 in the vicinity of a neck part and blowing slurry-like neck reinforcing material 14a to the neck part 12 in a CZ(Czochralski) single crystal-pulling apparatus for pulling up CZ single crystal by Dash neck method. This method for pulling up CZ single crystal comprises blowing a slurry-like neck reinforcing material 14a to the neck part 12 during the pulling action. This CZ single crystal is produced by the above apparatus and method.

27. 发明专利

JPH02272359A METHOD FOR MEASURING QUANTITY OF IMPURITY ON WAFER SURFACE 失效
公开(公告)号：JPH02272359A
公开(公告)日：1990-11-07
申请号：JP9305189
申请日：1989-04-14
申请人： TOSHIBA CERAMICS CO
发明人： SAITO TAKESHI , TOKUTAKE FUMIO , KON YUKIO
IPC分类号： G01N31/00 , G01N1/28 , G01N33/00 , H01L21/66
摘要： PURPOSE:To easily and accurately measure the quantity of the impurities on the surface of a semiconductor wafer on which an oxide film is formed by dropping an HF soln. onto the wafer and resting the wafer for a specified period of time, then capturing the dropping liquid and analyzing the impurities in the liquid. CONSTITUTION:The HF soln. 3 is dropped onto the semiconductor 1 wafer formed with the oxide film 2 on the cleaned surface and thereafter, the wafer is rested for the specified period of time (about 2 to 5 minutes). As a result, the dropping soln. dropped onto the wafer 1 makes chemical reaction with the oxide film 2 and gradually expands the reaction region thereof until finally the soln. becomes spherical. This spherical soln. 3 is recovered by a pipette or the like and the quantity of the impurities in this soln. 3 is measured by a flame atomic absorption photometer.

28. 发明专利

JP2007014409A Photocatalyst deodorization apparatus 审中-公开
标题翻译：光催化降解装置
公开(公告)号：JP2007014409A
公开(公告)日：2007-01-25
申请号：JP2005196358
申请日：2005-07-05
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： ISHII TATSUYA , SHU CHUKA , TOKUTAKE FUMIO
IPC分类号： A61L9/00 , B01J27/24 , B01J35/02 , B01J38/06
摘要： PROBLEM TO BE SOLVED: To provide a photocatalyst deodorization apparatus capable of easily recovering the photocatalytic capability without periodically taking out a filter, or washing the filter with water or baking the filter, etc.
SOLUTION: The photocatalyst deodorization apparatus recovers the photocatalytic capability by spraying high-temperature steam to the photocatalytic filter through a steam nozzle in a steam washing chamber.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决方案：提供能够在不周期性地取出过滤器的情况下容易地回复光催化性能，或者用水洗涤过滤器或烘烤过滤器等的光催化除臭装置。解决方案：光催化除臭装置通过在蒸汽洗涤室中的蒸汽喷嘴将高温蒸汽喷射到光催化过滤器来恢复光催化能力。版权所有（C）2007，JPO＆INPIT

29. 发明专利

JP2006026507A Photocatalytic filter and photocatalytic deodorization apparatus using the same 审中-公开
标题翻译：光化学过滤器和光化学除臭装置
公开(公告)号：JP2006026507A
公开(公告)日：2006-02-02
申请号：JP2004207999
申请日：2004-07-15
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： ZHOU ZHONGHUA , TOKUTAKE FUMIO , ISHII TATSUYA , YO HIEN , SUZUKI TAKASHI
IPC分类号： B01J35/02 , A61L9/00 , A61L9/01 , A61L9/20 , B01D53/86 , B01J35/10
摘要： PROBLEM TO BE SOLVED: To provide a photocatalytic filter having photocatalysis and consequently excellent deodorizing performance and a photocatalytic deodorization apparatus in which the photocatalytic filter is used and which exhibits a maximum deodorizing result efficiently. SOLUTION: The photocatalytic deodorization apparatus is constituted so that an ultraviolet lamp 2 is put between two pieces of the plate-shaped photocatalytic filters 1 each of which is obtained by forming a titanium oxide film of ≤1 μm film thickness on the surface layer of a ceramic skeleton and has ≥5 m 2 /cm 3 surface area. The optical intensity on the light receiving surface of the photocatalytic filter is ≥0.5 mW/cm 2 when the light having 365 nm wavelength is emitted from the ultraviolet lamp 2. The ratio of the minimum value to the maximum value in an optical intensity distribution on the light receiving surface is controlled to be 0.5 to 1.0. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种具有光催化和因此良好的除臭性能的光催化过滤器和其中使用光催化过滤器的光催化除臭装置，并且其有效地表现出最大的除臭效果。解决方案：光催化除臭装置构成为将紫外线灯2放置在两片板状光催化过滤器1之间，每个板状光催化过滤器1通过在表面上形成厚度≤1μm的氧化钛膜而获得陶瓷骨架层，并具有≥5m 2 / cm 3 表面积。当从紫外线灯2发出365nm波长的光时，光催化滤光片的光接收表面的光强度为≥0.5mW/ cm·SP> 2 。最小值与最大值之比将受光面上的光强度分布的值控制在0.5〜1.0。版权所有（C）2006，JPO＆NCIPI

30. 发明专利

JP2005047786A Titanium dioxide microparticle, method for producing the same, and method for producing visible-ray-activatable photocatalyst 有权
标题翻译：二氧化钛微球，其生产方法和生产可见光活化光催化剂的方法
公开(公告)号：JP2005047786A
公开(公告)日：2005-02-24
申请号：JP2003301137
申请日：2003-08-26
申请人： Toshiba Ceramics Co Ltd , 東芝セラミックス株式会社
发明人： ZHOU ZHONGHUA , TOKUTAKE FUMIO , KONDO HIROYUKI , YAMAGUCHI HIROSHI , ISHII TATSUYA
IPC分类号： B01D53/86 , B01J27/24 , B01J31/38 , B01J35/02 , B01J35/08 , B01J35/10 , B01J37/08 , C01G23/047
摘要： PROBLEM TO BE SOLVED: To provide titanium dioxide microparticles which exhibit higher photocatalysis than the conventional upon being irradiated with visible rays and develop photocatalysis excellent in stability and persistence, to provide a method for producing the same, and to provide a method for producing a visible-ray-activatable photocatalyst. SOLUTION: The titanium dioxide microparticles are obtained by heat-treating titanium dioxide microparticles as a raw material at 500 to 620°C in a reducing gas atmosphere containing a nitrogen-containing gas to dope the titanium dioxide with at least one member selected from C, H, and S and with N. The obtained titanium dioxide microparticles are characterized in that the concentration of the formed acetone gas is at least 500 ppm or higher when the concentration is measured by placing a 10 cm-square uniform layer of 0.2 g of the titanium microparticles in a one-liter gas bag, setting the initial isopropanol gas concentration at 1,500±150 ppm, and irradiating the sample with light from an ultraviolet-filtered fluorescent lamp for 1 hour at an intensity at a wavelength of 420 nm of 0.5 mW/cm 2 . COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：解决的问题：为了提供在照射可见光线时显示比常规光催化更高的二氧化钛微粒，并且开发出稳定性和持久性优异的光催化剂，以提供其制备方法，并提供一种方法产生可见光激活的光催化剂。解决方案：二氧化钛微粒通过在含有含氮气体的还原性气体气氛中在500-620℃下以二氧化钛微粒为原材料进行热处理，以选择至少一种选择的二氧化钛得到的二氧化钛微粒的特征在于，当通过放置10cm 2的均匀的0.2层的0.2倍浓度时，形成的丙酮气体的浓度为至少500ppm以上 g的钛微粒在1升气囊中，将初始异丙醇气体浓度设定在1,500±150ppm，并用来自紫外线过滤的荧光灯的光以420nm的强度照射样品1小时为0.5mW / cm 2 SP / 2。版权所有（C）2005，JPO＆NCIPI

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