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    • 25. 发明授权
    • Modified coagulation factors with prolonged in vivo half-life
    • 改性凝血因子具有延长的体内半衰期
    • US08754194B2
    • 2014-06-17
    • US12520840
    • 2007-12-21
    • Stefan SchulteThomas WeimerHubert Metzner
    • Stefan SchulteThomas WeimerHubert Metzner
    • A61K38/37C07K1/00
    • C07K14/755C07K14/745C07K14/765C07K16/18C07K2319/31
    • The present invention relates to nucleic acid sequences coding for modified coagulation factors, preferably coagulation factor VIII, and their derivatives; recombinant expression vectors containing such nucleic acid sequences; host cells transformed with such recombinant expression vectors; and recombinant polypeptides and derivatives coded for by said nucleic acid sequences, whereby said recombinant polypeptides and derivatives have biological activities and prolonged in vivo half-lives compared to the unmodified wild-type proteins. The invention also relates to corresponding sequences that result in improved in vitro stability. The present invention further relates to processes for the manufacture of such recombinant proteins and their derivatives. The invention also relates to a transfer vector for use in human gene therapy, which comprises such nucleic acid sequences.
    • 本发明涉及编码改性凝血因子,优选凝血因子VIII及其衍生物的核酸序列; 含有该核酸序列的重组表达载体; 用这些重组表达载体转化的宿主细胞; 和由所述核酸序列编码的重组多肽和衍生物,其中与未修饰的野生型蛋白相比,所述重组多肽和衍生物具有生物活性和延长的体内半衰期。 本发明还涉及导致体外稳定性改善的相应序列。 本发明还涉及制备这些重组蛋白及其衍生物的方法。 本发明还涉及用于人基因治疗的转移载体,其包含这样的核酸序列。
    • 28. 发明授权
    • Method of measuring a deviation of an optical surface from a target shape
    • 测量光学表面与目标形状的偏差的方法
    • US08264695B2
    • 2012-09-11
    • US13030748
    • 2011-02-18
    • Ralf ArnoldStefan SchulteBernd Doerband
    • Ralf ArnoldStefan SchulteBernd Doerband
    • G01B11/02
    • G01B9/021G01B9/02039G01B11/2441G01M11/025G01M11/0271Y10T29/49771
    • A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
    • 对准至少两个波形整形元件的方法,测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法,其中每个波形整形元件具有衍射测量结构,用于将入射光的一部分波前适应到目标形状的相应部分,包括:提供第一波 具有衍射对准结构的成形元件,将波形整形元件相对于彼此布置,使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过,并且对准第一波形整形 元件和第二波形成形元件相对于彼此,通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。
    • 30. 发明授权
    • Method of measuring a deviation of an optical surface from a target shape
    • 测量光学表面与目标形状的偏差的方法
    • US07936521B2
    • 2011-05-03
    • US12684600
    • 2010-01-08
    • Ralf ArnoldStefan SchulteBernd Doerband
    • Ralf ArnoldStefan SchulteBernd Doerband
    • G02B13/18
    • G01B9/021G01B9/02039G01B11/2441G01M11/025G01M11/0271Y10T29/49771
    • A method of aligning at least two wave shaping elements, a method of measuring a deviation of an optical surface from a target shape and a measuring apparatus for interferometrically measuring a deviation of an optical surface from a target shape. The method of aligning at least two wave shaping elements, each of which wave shaping elements has a diffractive measurement structure for adapting part of a wave front of incoming light to a respective portion of the target shape, includes: providing a first one of the wave shaping elements with a diffractive alignment structure, arranging the wave shaping elements relative to each other such that each of the diffractive measurement structures is traversed by a separate subset of rays of the incoming light during operation of the measuring apparatus, and aligning the first wave shaping element and a second one of the wave shaping elements relative to each other by evaluating alignment light having consecutively interacted with the diffractive alignment structure and with the second wave shaping element.
    • 对准至少两个波形整形元件的方法,测量光学表面与目标形状的偏差的方法和用于干涉测量光学表面与目标形状的偏差的测量装置。 对准至少两个波形整形元件的方法,其中每个波形整形元件具有衍射测量结构,用于将入射光的一部分波前适应到目标形状的相应部分,包括:提供第一波 具有衍射对准结构的成形元件,将波形整形元件相对于彼此布置,使得每个衍射测量结构在测量设备的操作期间被入射光的单独的子集子穿过,并且对准第一波形整形 元件和第二波形成形元件相对于彼此,通过评估与衍射对准结构和第二波形整形元件连续相互作用的对准光。