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    • 24. 发明授权
    • Method and means of producing cured coating films
    • 生产固化涂膜的方法和方法
    • US06736898B2
    • 2004-05-18
    • US09977163
    • 2001-10-15
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • B05B1700
    • B05D3/061
    • The present invention relates to a method of producing at least one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface. The present invention additionally relates to a corresponding means of producing at least one coating film on at least one area of a substrate surface, having at least the following elements: a) at least one storage container for at least one reactive coating formulation, b) at least one exposure unit, preferably a UV exposure unit, more preferably a UV laser, and c) at least one application unit having a nozzle, in particular a spraying head, and/or d) a bell for electrostatic application (ESTA bell), wherein said at least one exposure unit is designed so that the radiation generated in said at least one exposure unit is brought into contact with said at least one reactive coating formulation in said at least one application unit. Also claimed, finally, is a coating film which can be produced by the method of the invention.
    • 本发明涉及在基材表面的至少一个区域上生产至少一种涂膜的方法,该方法至少包括以下顺序的至少一个步骤:a)在至少一种反应性涂料中引发至少一种交联反应 制剂; b)在所述至少一个交联反应开始之前在所述基材表面的所述至少一个区域上施用所述至少一种反应性涂料制剂。本发明还涉及相应的方法, 至少一个基材表面的区域,至少具有以下元素:a)至少一个用于至少一种反应性涂料配方的储存容器,b)至少一个曝光单元,优选UV曝光单元,更优选UV激光 ,和c)至少一个具有喷嘴,特别是喷头的应用单元和/和用于静电施加的钟(ESTA钟)),其中所述至少一个曝光单元 t被设计成使得在所述至少一个曝光单元中产生的辐射与所述至少一个施加单元中的所述至少一个反应性涂料配方接触。最后还要求一种涂膜,其可以由 本发明的方法。
    • 26. 发明授权
    • Method of producing cured coating films
    • 生产固化涂膜的方法
    • US06344244B1
    • 2002-02-05
    • US09433547
    • 1999-11-04
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • Wolfgang SchrofReinhold SchwalmErich BeckUwe Meisenburg
    • C08F248
    • B05D3/061
    • The present invention relates to a method of producing at cast one coating film on at least one area of a substrate surface, which comprises at least the following steps in the following order: a) initiating at least one crosslinking reaction in at least one reactive coating formulation; b) applying said at least one reactive coating formulation before the onset of said at least one crosslinking reaction on said at least one area of said substrate surface. The present invention additionally relates to a corresponding means of producing at least one coating film on at least one area of a substrate surface, having at least the following elements: a) at least one storage container for at least one reactive coating formulation, b) at least one exposure unit, preferably a UV exposure unit, more preferably a UV laser, and c) at least one application unit having a nozzle, in particular a spraying head, and/or d) a bell for electrostatic application (ESTA bell), wherein said at least one exposure unit is designed so that the radiation generated in said at least one exposure unit is brought into contact with said at least one reactive coating formulation in said at least one application unit. Also claimed, finally, is a coating film which can be produced by the method of the invention.
    • 本发明涉及一种在基材表面的至少一个区域上生产浇铸的一个涂膜的方法,该方法至少包括以下顺序的以下步骤:a)在至少一种反应性涂料中引发至少一种交联反应 制剂; b)在所述至少一个交联反应开始之前,在所述基材表面的所述至少一个区域上施用所述至少一种反应性涂料制剂。 本发明还涉及在衬底表面的至少一个区域上产生至少一个涂膜的相应方法,其至少具有以下元素:a)至少一个用于至少一种反应性涂料配方的储存容器,b) 至少一个曝光单元,优选UV曝光单元,更优选UV激光,以及c)至少一个具有喷嘴,特别是喷头的应用单元和/或用于静电应用的钟(ESTA钟)),其中 所述至少一个曝光单元被设计成使得在所述至少一个曝光单元中产生的辐射与所述至少一个应用单元中的所述至少一个反应性涂料配方接触。 最后还要求的是可以通过本发明的方法生产的涂膜。
    • 28. 发明授权
    • Positive-working radiation-sensitive mixture
    • 正面工作的辐射敏感混合物
    • US5783354A
    • 1998-07-21
    • US711016
    • 1996-09-09
    • Reinhold SchwalmDirk FunhoffHorst Binder
    • Reinhold SchwalmDirk FunhoffHorst Binder
    • G03F7/004G03F7/039H01L21/027
    • G03F7/0045G03F7/039Y10S430/106Y10S430/111
    • A positive-working radiation-sensitive mixture essentially consists of (a.sub.1) at least one water-insoluble, organic polymeric binder which contains acid-labile groups and becomes soluble in aqueous alkaline solutions as a result of the action of acid, or (a.sub.2.1) a polymeric binder which is insoluble in water and soluble in aqueous alkaline solutions and (a.sub.2.2) a low molecular weight organic compound whose solubility and aqueous alkaline developer is increased as a result of the action of acid, and (b) at least one organic compound which produces an acid under the action of actinic radiation, and, if required, (c) one or more further organic compounds which differ from (b), at least one of the components (a.sub.1), (a.sub.2.1), (a.sub.2.2), (b) and (c) containing a bonded group of the general formula (I) --O.sup..crclbar. N.sup..sym. R.sub.4, or component (c) being of the formula (II) ##STR1## The radiation-sensitive mixture is suitable for the production of relief structures.
    • 正面工作的辐射敏感混合物基本上由(a1)至少一种含有酸不稳定基团的水不溶性有机聚合物粘合剂组成,并且由于酸的作用而变得可溶于碱性水溶液,或(a2)。 1)聚合物粘合剂,其不溶于水并且可溶于碱性水溶液,和(a2.2)由于酸的作用,其溶解度和含水碱性显影剂增加的低分子量有机化合物,和(b)在 至少一种在光化辐射的作用下产生酸的有机化合物,如果需要,(c)一种或多种与(b),至少一种组分(a1),(a2.1)不同的其它有机化合物 )(a)-O( - )N(+)R 4,或(c)成分为式(II)的键合基团的化合物(a2.2),(b)和(c) (II)辐射敏感混合物适用于浮雕结构的生产。