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1. 发明授权

US5914219A Radiation-sensitive mixture and the production of relief structures having improved contrast 失效
标题翻译：辐射敏感的混合物和具有改善的对比度的浮雕结构的生产
公开(公告)号：US5914219A
公开(公告)日：1999-06-22
申请号：US735114
申请日：1996-10-22
申请人： Dirk Funhoff , Reinhold Schwalm , Horst Binder
发明人： Dirk Funhoff , Reinhold Schwalm , Horst Binder
IPC分类号： C08K5/375 , C08K5/42 , C09D125/02 , C09D125/18 , C09D143/04 , G03F7/004 , G03F7/029 , G03F7/032 , G03F7/039 , H01L21/027 , G03F7/38 , G03F7/40
CPC分类号： G03F7/039 , C08K5/375 , C08K5/42 , C09D125/02 , C09D125/18 , C09D143/04 , G03F7/0045 , Y10S430/111 , Y10S430/122
摘要： Positive-working radiation-sensitive mixtures, essentially consisting of(a1) a water-insoluble organic binder which contains acid-labile groups and is rendered soluble in aqueous alkaline solutions by the action of an acid, or(a2.1) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, and(b) an organic compound which produces an acid under the action of actinic radiation, which additionally contain(c) a strongly basic organic compound having hydroxide, alkoxide or phenoxide anions, are suitable for the production of relief structures having improved contrast.
摘要翻译：正面工作的辐射敏感混合物，主要由（a1）含有酸不稳定基团的水不溶性有机粘合剂组成，并且通过酸的作用使其溶于碱性水溶液，或（a2.1）聚合物粘合剂其不溶于水但可溶于碱性水溶液，（a2.2）其在碱性显影液中的溶解度由于酸的作用而增加的有机化合物，和（b）在作用下产生酸的有机化合物另外含有（c）具有氢氧化物，醇盐或酚盐阴离子的强碱性有机化合物的光化辐射适用于生产具有改善的对比度的浮雕结构。

2. 发明授权

US5318876A Radiation-sensitive mixture containing acid-labile groups and production of relief patterns 失效
标题翻译：含有酸不稳定组的辐射敏感混合物和浮雕图案的生成
公开(公告)号：US5318876A
公开(公告)日：1994-06-07
申请号：US862949
申请日：1992-04-03
申请人： Reinhold Schwalm , Horst Binder , Dirk Funhoff
发明人： Reinhold Schwalm , Horst Binder , Dirk Funhoff
IPC分类号： C08K5/42 , C08K5/51 , G03F7/004 , G03F7/039 , H01L21/027 , G03G1/73 , G03G5/56
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： A radiation-sensitive mixture which contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more groups cleavable by an acid and in addition a group which forms a strong acid under the action of radiation, and additionally(c) an alkyl- or arylsulfonate of a hydroxyaromatic, is suitable for the production of relief patterns.
摘要翻译：一种辐射敏感性混合物，其包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）通过酸的作用使其在碱性显影剂中的溶解度增加的有机化合物，并含有一种或更多的基团，并且另外在辐射作用下形成强酸的基团，另外（c）羟基芳族化合物的烷基或芳基磺酸盐适用于产生浮雕图案。

3. 发明授权

US5846689A Positive-working radiation-sensitive mixture and production of relief structures 失效
标题翻译：积极工作的辐射敏感混合物和浮雕结构的生产
公开(公告)号：US5846689A
公开(公告)日：1998-12-08
申请号：US708818
申请日：1996-09-09
申请人： Reinhold Schwalm , Dirk Funhoff , Horst Binder
发明人： Reinhold Schwalm , Dirk Funhoff , Horst Binder
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106
摘要： A positive-working radiation-sensitive mixture essentially consists of (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid, (b) at least one organic compound which produces an acid under the action of actinic radiation and (c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR1## and the organic compound (b) is a sulfonium salt of the formula (IV) ##STR2## The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.
摘要翻译：正面工作的辐射敏感混合物基本上由（a）至少一种含有酸不稳定基团并且不溶于水但由于酸的作用而变得可溶于碱性水溶液的聚合物，（b）至少一种在光化辐射作用下产生酸的有机化合物和（c）至少一种与（b）不同的另外的有机化合物，其中聚合物（a）含有式（I），（II）和（ III）和有机化合物（b）是式（IV）的锍盐。（IV）辐射敏感性混合物适用于生产具有改善的对比度的浮雕结构。

4. 发明授权

US5783354A Positive-working radiation-sensitive mixture 失效
标题翻译：正面工作的辐射敏感混合物
公开(公告)号：US5783354A
公开(公告)日：1998-07-21
申请号：US711016
申请日：1996-09-09
申请人： Reinhold Schwalm , Dirk Funhoff , Horst Binder
发明人： Reinhold Schwalm , Dirk Funhoff , Horst Binder
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A positive-working radiation-sensitive mixture essentially consists of (a.sub.1) at least one water-insoluble, organic polymeric binder which contains acid-labile groups and becomes soluble in aqueous alkaline solutions as a result of the action of acid, or (a.sub.2.1) a polymeric binder which is insoluble in water and soluble in aqueous alkaline solutions and (a.sub.2.2) a low molecular weight organic compound whose solubility and aqueous alkaline developer is increased as a result of the action of acid, and (b) at least one organic compound which produces an acid under the action of actinic radiation, and, if required, (c) one or more further organic compounds which differ from (b), at least one of the components (a.sub.1), (a.sub.2.1), (a.sub.2.2), (b) and (c) containing a bonded group of the general formula (I) --O.sup..crclbar. N.sup..sym. R.sub.4, or component (c) being of the formula (II) ##STR1## The radiation-sensitive mixture is suitable for the production of relief structures.
摘要翻译：正面工作的辐射敏感混合物基本上由（a1）至少一种含有酸不稳定基团的水不溶性有机聚合物粘合剂组成，并且由于酸的作用而变得可溶于碱性水溶液，或（a2）。 1）聚合物粘合剂，其不溶于水并且可溶于碱性水溶液，和（a2.2）由于酸的作用，其溶解度和含水碱性显影剂增加的低分子量有机化合物，和（b）在至少一种在光化辐射的作用下产生酸的有机化合物，如果需要，（c）一种或多种与（b），至少一种组分（a1），（a2.1）不同的其它有机化合物）（a）-O（ - ）N（+）R 4，或（c）成分为式（II）的键合基团的化合物（a2.2），（b）和（c）（II）辐射敏感混合物适用于浮雕结构的生产。

5. 发明授权

US5563022A Positive-working radiation-sensitive mixture and the production of relief patterns 失效
标题翻译：正面工作的辐射敏感混合物和浮雕图案的制作
公开(公告)号：US5563022A
公开(公告)日：1996-10-08
申请号：US968408
申请日：1992-10-29
申请人： Horst Binder , Reinhold Schwalm , Dirk Funhoff
发明人： Horst Binder , Reinhold Schwalm , Dirk Funhoff
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03C1/492 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A positive-working UV-sensitive mixture containing(a1) an organic binder containing acid-labile ether, ester or carbonate groups or(a2) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(a2.1) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid, or(a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups and in addition a group which forms an acid under the action of radiation, or a mixture of the organic compounds (a2.1) and (a2.2) and(b) an arylsulfonic ester, is suitable for the production of relief patterns.
摘要翻译：含有（a1）含酸不稳定醚，酯或碳酸酯基团的有机粘合剂或（a2）不溶于水但可溶于碱性水溶液的聚合物粘合剂的正性UV敏感性混合物，（a2.1）在水性碱性显影剂中的溶解度由酸的作用而增加的有机化合物，或（a2.2）其在碱性显影液中的溶解度在酸的作用下增加并且含有一种或多种酸 - 可裂解基团，另外还有在辐射作用下形成酸的基团，或有机化合物（a2.1）和（a2.2）和（b）芳基磺酸酯的混合物，适于生产浮雕模式。

6. 发明授权

US5759750A Radiation-sensitive mixture 失效
标题翻译：辐射敏感混合物
公开(公告)号：US5759750A
公开(公告)日：1998-06-02
申请号：US839938
申请日：1997-04-18
申请人： Horst Binder , Reinhold Schwalm , Dirk Funhoff
发明人： Horst Binder , Reinhold Schwalm , Dirk Funhoff
IPC分类号： G03F7/004 , C08L61/10 , G03F7/039 , H01L21/027 , G03F7/30 , G03F7/40
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/11 , Y10S430/115 , Y10S430/122
摘要： A radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture and (b) a compound which forms a strong acid on exposure to radiation, component (a) being a phenolic resin in which some or all of the phenolic hydroxyl groups have been replaced with groups (IA) or (IB) ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are each alkyl or R.sup.1 together with R.sup.2 forms a ring and X is CH.sub.2, O, S, SO.sub.2 or NR.sup.4, is suitable for the production of relief structures.
摘要翻译：辐射敏感性混合物，主要由（a）水不溶性粘合剂或粘合剂混合物组成，和（b）在暴露于辐射时形成强酸的化合物，组分（a）是酚醛树脂，其中部分或全部酚羟基已被基团（IA）或（IB）替代，其中R 1，R 2和R 3各自为烷基或R 1与R 2一起形成环，X为CH 2，O ，S，SO2或NR4，适用于生产浮雕结构。

7. 发明授权

US5300400A Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound 失效
标题翻译：使用具有至少一个酸可分解基团的有机化合物和第二有机化合物的储存稳定性改进量来生产浮雕图案和图像的方法
公开(公告)号：US5300400A
公开(公告)日：1994-04-05
申请号：US91089
申请日：1993-07-14
申请人： Reinhold Schwalm , Horst Binder
发明人： Reinhold Schwalm , Horst Binder
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/039
摘要： A radiation-sensitive mixture suitable for producing relief patterns comprises(a) a water-insoluble but alkali-soluble polymeric binder,(b) an organic compound whose solubility in an alkaline developer is increased by the action of acid and which contains at least one acid-cleavable group and additionally a group which forms a strong acid on irradiation, and additionally(c) an organic compound which reacts with water or stronger nucleophiles at up to 120.degree. C.
摘要翻译：适用于生产浮雕图案的辐射敏感混合物包括（a）不溶于水的碱溶性聚合物粘合剂，（b）其在碱性显影剂中的溶解度通过酸的作用而增加并且含有至少一种酸可裂解基团，另外是在照射下形成强酸的基团，另外（c）在120℃下与水或更强的亲核试剂反应的有机化合物。

8. 发明授权

US5252436A Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds 失效
标题翻译：用含有碱性有机化合物的含水显影剂开发含有聚（对羟基苯乙烯）和锍盐的正性光致抗蚀剂的方法
公开(公告)号：US5252436A
公开(公告)日：1993-10-12
申请号：US976004
申请日：1992-11-13
申请人： Horst Binder , Reinhold Schwalm
发明人： Horst Binder , Reinhold Schwalm
IPC分类号： G03F7/32 , G03F7/30
CPC分类号： G03F7/322
摘要： An aqueous developer suitable in particular for developing photoresists which contain a phenolic resin and an onium salt contains from 0.5 to 5 % by weight of a tetraalkylammonium hydroxide and from 5 to 25% by weight of at least one amine of the general formula ##STR1## where R.sup.1, R.sup.2 and R.sup.3 are identical or different and each is hydrogen, alkyl, hydroxyalkyl or aminoalkyl, or two of R.sup.1 to R.sup.3 combine to form a N-containing ring, with at least one of R.sup.1 to R.sup.3 being hydroxyalkyl or aminoalkyl.
摘要翻译：特别适用于显影含有酚醛树脂和鎓盐的光致抗蚀剂的水性显影剂含有0.5-5重量％的四烷基氢氧化铵和5-25重量％的至少一种通式为“IMAGE”的胺，其中R 1，R 2和R 3相同或不同并且各自为氢，烷基，羟基烷基或氨基烷基，或者R 1至R 3中的两个结合形成含N的环，其中至少一个R 1至R 3为羟烷基或氨基烷基。

9. 发明授权

US5073474A Radiation-sensitive mixture containing acid labile groups and production of relief patterns 失效
标题翻译：含有酸性可溶性组合物的辐射敏感性混合物和生产消除形式的辐射敏感性混合物
公开(公告)号：US5073474A
公开(公告)日：1991-12-17
申请号：US352415
申请日：1989-05-16
申请人： Reinhold Schwalm , Horst Binder , Andreas Boettcher
发明人： Reinhold Schwalm , Horst Binder , Andreas Boettcher
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/168
摘要： A radiation sensitive mixture suitable for producing relief patterns contains(a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and(b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of acid and which contains at least one acid cleavable group and additionally a group which forms a strong acid on irradiation,wherein the polymeric binder (a) contains from 5 to 35 mol % of monomer units having acid labile groups as copolymerized or cocondensed units or acid labile groups introduced by polymer analaogous reaction.
摘要翻译：适用于产生浮雕图案的辐射敏感性混合物包含（a）不溶于水但可溶于碱性水溶液的聚合物粘合剂，和（b）其在碱性显影液中的溶解度通过酸的作用而增加的有机化合物，含有至少一个酸可裂解基团，另外是在照射时形成强酸的基团，其中聚合物粘合剂（a）含有5至35摩尔％的具有酸不稳定基团的单体单元作为共聚或缩聚单元或酸不稳定基团引入通过聚合物分析反应。

10. 发明授权

US06780897B1 Solid substance mixture containing bonds that can be activated by actinic radiation and the use thereof 失效
标题翻译：含有可被光化辐射活化的键的固体物质混合物及其用途
公开(公告)号：US06780897B1
公开(公告)日：2004-08-24
申请号：US10089173
申请日：2002-03-27
申请人： Rainer Blum , Reinhold Schwalm , Horst Hintze-Bruening , Horst Binder , Wolfgang Paulus , Bernd Bruchmann
发明人： Rainer Blum , Reinhold Schwalm , Horst Hintze-Bruening , Horst Binder , Wolfgang Paulus , Bernd Bruchmann
IPC分类号： C08F830
CPC分类号： C09D133/062 , B05D3/0209 , B05D3/0254 , B05D3/0263 , B05D3/067 , C08G18/3206 , C08G18/3253 , C08G18/4277 , C08G18/672 , C08G2150/20 , C08L33/062 , C08L75/14 , C08L2666/02 , C09J133/062 , Y10T428/31551 , Y10T428/31935
摘要： Solid compositions comprising (A) at least one solid (meth)acrylate copolymer with a number-average molecular weight of from 850 to 10 000 and a molecular weight polydispersity Mw/Mn of from 1.0 to 5.0, containing at least one group (a) having at least one bond which can be activated with actinic radiation; and (B) at least one solid compound comprising a parent structure and, attached thereto, on average per molecule more than one group (a) having at least one bond which can be activated with actinic radiation; and their use as coating materials, adhesives or sealing compounds which can be crosslinked thermally and/or with actinic radiation, or for preparing coating materials, adhesives or sealing compounds which can be crosslinked thermally and/or with actinic radiation.
摘要翻译：包含（A）至少一种数均分子量为850至10000的分子量多分散性Mw / Mn为1.0至5.0的至少一种固体（甲基）丙烯酸酯共聚物的固体组合物，其含有至少一个基团（a）具有至少一个可以用光化辐射活化的键; 和（B）包含母体结构的至少一种固体化合物，并且每分子平均连接多于一个具有至少一个可以用光化辐射活化的键的组（a）;以及它们作为涂层材料，粘合剂或可以热和/或用光化辐射交联的密封化合物，或用于制备可以热和/或用光化辐射交联的涂料，粘合剂或密封化合物。

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