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21. 发明授权

US08174671B2 Lithographic projection apparatus and method for controlling a support structure 有权
标题翻译：光刻投影装置和控制支撑结构的方法
公开(公告)号：US08174671B2
公开(公告)日：2012-05-08
申请号：US12142271
申请日：2008-06-19
申请人： Erik Roelof Loopstra , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
发明人： Erik Roelof Loopstra , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32 , G01B11/14 , G01B11/00
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70858 , G03F9/7096
摘要： A control system controls a support structure of a lithographic apparatus. A first measurement system measures the position of a substrate supported by the support structure, in a first coordinate system. A second measurement system measures the position of the support structure in a second coordinate system, the first measurement system having a presumed position in the second coordinate system. A controller controls the position of the support structure based on measurements by the second measurement system, to convert the measured position of the substrate into a converted position of the support structure in the second coordinate system, to position the support structure based on the converted position, to receive a position error signal indicative of a difference between the presumed position and an actual position of the first measurement system in the second coordinate system, and to position the support structure dependent upon the position error signal.
摘要翻译：控制系统控制光刻设备的支撑结构。第一测量系统在第一坐标系中测量由支撑结构支撑的基板的位置。第二测量系统测量支撑结构在第二坐标系中的位置，第一测量系统在第二坐标系中具有推测位置。控制器基于第二测量系统的测量来控制支撑结构的位置，将基板的测量位置转换成第二坐标系中的支撑结构的转换位置，以基于转换位置定位支撑结构以接收表示第二坐标系中的第一测量系统的推测位置与实际位置之间的差异的位置误差信号，并且根据位置误差信号定位支撑结构。

22. 发明申请

US20100053586A1 Displacement Measurement Systems, Lithographic Apparatus, and Device Manufacturing Method 有权
标题翻译：位移测量系统，平版印刷设备和设备制造方法
公开(公告)号：US20100053586A1
公开(公告)日：2010-03-04
申请号：US12615685
申请日：2009-11-10
申请人： Renatus Gerardus KLAVER , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Renatus Gerardus KLAVER , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/14 , G03B27/58
CPC分类号： G01D5/38 , G03F7/70775
摘要： A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
摘要翻译：位移测量系统，被配置为提供六个自由度中的两个部件的相对位移的测量，具有改进的一致性并且不需要过多的空间。

23. 发明授权

US07636165B2 Displacement measurement systems lithographic apparatus and device manufacturing method 有权
标题翻译：位移测量系统光刻设备和器件制造方法
公开(公告)号：US07636165B2
公开(公告)日：2009-12-22
申请号：US11384834
申请日：2006-03-21
申请人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Renatus Gerardus Klaver , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B9/02
CPC分类号： G01D5/38 , G03F7/70775
摘要： A displacement measurement system configured to provide measurement of the relative displacement of two components in six degrees of freedom with improved consistency and without requiring excessive space.
摘要翻译：一种位移测量系统，被配置为提供六个自由度中的两个部件的相对位移的测量，具有改进的一致性并且不需要过多的空间。

24. 发明授权

US07230676B1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07230676B1
公开(公告)日：2007-06-12
申请号：US11373529
申请日：2006-03-13
申请人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58
CPC分类号： G03F7/70775 , G03F7/70341
摘要： A lithographic apparatus includes a liquid confinement system to confine liquid in a space between a final element of a projection system and a substrate, and a first and a second substrate stage that are configured to mutually cooperate in order to perform a joint movement for bringing the lithographic apparatus from a first configuration, in which the liquid is confined between a first substrate held by the first substrate stage and the final element, towards a second configuration, in which the liquid is confined between a second substrate held by the second substrate stage and the final element, such that during the joint movement the liquid is essentially confined within the space with respect to the final element. The apparatus also includes a position measurement system configured to at least during the joint movement measure the position of the first and second substrate stages.
摘要翻译：光刻设备包括液体限制系统，用于将液体限制在投影系统的最终元件与基板之间的空间中;以及第一和第二基板台，其被配置为相互配合以执行关节运动，以使光刻设备，其中液体被限制在由第一基板台保持的第一基板和最终元件之间的第一配置朝向第二配置，其中液体被限制在由第二基板台保持的第二基板和最终元件，使得在联合运动期间，液体基本上被限制在相对于最终元件的空间内。该装置还包括位置测量系统，其配置为至少在联合移动期间测量第一和第二基板台的位置。

25. 发明授权

US08988650B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08988650B2
公开(公告)日：2015-03-24
申请号：US13214289
申请日：2011-08-22
申请人： Jan Steven Christiaan Westerlaken , Engelbertus Antonius Fransiscus Van Der Pasch , Peter Paul Steijaert , Franciscus Van De Mast , Gerardus Arnoldus Hendricus Franciscus Janssen
发明人： Jan Steven Christiaan Westerlaken , Engelbertus Antonius Fransiscus Van Der Pasch , Peter Paul Steijaert , Franciscus Van De Mast , Gerardus Arnoldus Hendricus Franciscus Janssen
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70916 , G03F7/70341 , G03F7/70608 , G03F7/70683 , G03F7/70775 , G03F7/7085 , G03F7/70908
摘要： A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.
摘要翻译：一种光刻设备，其具有第一出口以向至少部分传感器光束路径提供具有第一流动特性的热调节流体，以及与第一出口相关联的第二出口并提供具有第二流动特性的热调节流体，与第一流动特性不同，邻近来自第一出口的热调节流体。

26. 发明授权

US09316928B2 Stage apparatus, lithographic apparatus and method of positioning an object table 有权
标题翻译：平台设备，光刻设备和定位对象表的方法
公开(公告)号：US09316928B2
公开(公告)日：2016-04-19
申请号：US13194791
申请日：2011-07-29
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Andre Bernardus Jeunink , Robbert Edgar Van Leeuwen
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Andre Bernardus Jeunink , Robbert Edgar Van Leeuwen
IPC分类号： G03B27/54 , G03B27/58 , G03B27/42 , G03B27/62 , G03F7/20 , G03B27/32
CPC分类号： G03F7/70725 , G03F7/70775 , G03F7/7085
摘要： A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
摘要翻译：一种测量系统，被配置为测量对象台的与位置相关的信号，所述测量系统包括可安装在所述对象台上的至少一个传感器和可安装在基本上固定的框架上的传感器目标对象;以及安装装置，其被配置为安装所述传感器目标物体在基本上固定的框架上，其中测量系统还包括补偿器，其被配置为补偿传感器目标物体相对于基本上固定的框架的运动和/或变形。补偿器可以包括无源或主动阻尼器和/或反馈位置控制器。在替代实施例中，补偿器包括夹持装置，其在可移动物体的高精度运动期间固定传感器目标物体的位置。

27. 发明授权

US08614783B2 Encoder-type measurement system, lithographic apparatus and method to detect an error on or in a grid or grating of an encoder-type measurement system 有权
标题翻译：编码器型测量系统，光刻设备和方法，用于检测编码器型测量系统的栅格或光栅上或之上的误差
公开(公告)号：US08614783B2
公开(公告)日：2013-12-24
申请号：US12392852
申请日：2009-02-25
申请人： Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Renatus Gerardus Klaver , Martijn Robert Hamers
发明人： Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Renatus Gerardus Klaver , Martijn Robert Hamers
IPC分类号： G03B27/52 , G03B27/58
CPC分类号： G03B27/54 , G01D5/24461 , G01D5/347 , G03F7/70775
摘要： An encoder-type measurement system is configured to measure a position dependent signal of a movable object. The measurement system includes a light source and a sensor. The light source and the sensor are mounted on one of the movable object or a substantially stationary frame. The measurement system also includes a reference object that includes a grating or grid mounted on the other of the movable object or the substantially stationary frame. The light source is configured to emit a light beam towards the reference object. The sensor is configured to detect light of the light source reflected by the reference object. The measurement system also includes an error detector capable of detecting errors in or on the grating or grid of the sensor target object during a continuous production process.
摘要翻译：编码器型测量系统被配置为测量可移动物体的位置相关信号。测量系统包括光源和传感器。光源和传感器安装在可移动物体之一或基本上固定的框架上。测量系统还包括参考对象，其包括安装在可移动物体或基本上固定的框架上的另一个上的光栅或栅格。光源被配置为朝向参考对象发射光束。传感器被配置为检测由参考对象反射的光源的光。该测量系统还包括能够在连续生产过程中检测传感器目标物体的光栅或格栅上的误差的误差检测器。

28. 发明授权

US08368868B2 Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless 有权
标题翻译：具有用于控制非接触式图案形成装置的平面位置的气体压力装置的平版印刷装置
公开(公告)号：US08368868B2
公开(公告)日：2013-02-05
申请号：US12627087
申请日：2009-11-30
申请人： Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
发明人： Johannes Petrus Martinus Bernardus Vermeulen , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
摘要翻译：光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置一个非接触的方式。

29. 发明申请

US20110208459A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A STAGE OF A LITHOGRAPHIC APPARATUS 有权
标题翻译：用于校正平面设备阶段的位置的平面设备和方法
公开(公告)号：US20110208459A1
公开(公告)日：2011-08-25
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G06F19/00
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

30. 发明申请

US20100159399A1 LITHOGRAPHIC APPARATUS WITH GAS PRESSURE MEANS FOR CONTROLLING A PLANAR POSITION OF A PATTERNING DEVICE CONTACTLESS 有权
标题翻译：用于控制连续装置的平面位置的气体压力装置的平面设备
公开(公告)号：US20100159399A1
公开(公告)日：2010-06-24
申请号：US12627087
申请日：2009-11-30
申请人： Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
发明人： Johannes Petrus Martinus Bernardus VERMEULEN , Marcel Koenraad Marie Baggen , Hans Butler , Henrikus Herman Marie Cox , Jan Van Eijk , Andre Bernardus Jeunink , Nicolaas Rudolf Kemper , Robert-Han Munnig Schmidt , Engelbertus Antonius Fransiscus Van Der Pasch , Marc Wilhelmus Maria Van Der Wijst , Theodorus Petrus Maria Cadee , Fransiscus Mathijs Jacobs , Christiaan Louis Valentin
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70775 , G03F7/70816 , G03F7/70866
摘要： A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.
摘要翻译：光刻设备包括位置控制器，其被配置为通过选择性地按压图案形成装置的侧面中的至少一个来控制图案形成装置在其平面方向上的位置。位置控制器包括气体压力供给器和朝向图案形成装置的至少一个侧面的一个或多个流出开口，以在该侧面上施加加压气体，以便控制图案形成装置在其平面方向上的位置一个非接触的方式。

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