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    • 22. 发明申请
    • EXHAUST GAS PROCESSING DEVICE
    • 排气加工装置
    • US20120177540A1
    • 2012-07-12
    • US13282527
    • 2011-10-27
    • Fumiyuki MUTSUDAYoshitaka Fujita
    • Fumiyuki MUTSUDAYoshitaka Fujita
    • B01D53/34
    • B01D53/565B01D53/62B01D53/72B01D53/8631B01D53/864F01N3/2026F01N3/2871F01N2260/10F01N2510/00Y02T10/26
    • An exhaust gas processing device includes a honeycomb structure in a pillar shape including a honeycomb unit, a catalytic agent, an inorganic mat member, a cylindrical metallic member and an insulating layer. The honeycomb unit includes cell walls to define a plurality of cells which extend from a first end of the honeycomb unit to a second end of the honeycomb unit along a longitudinal direction. The catalytic agent is provided on the cell walls. The inorganic mat member is wound around an outer peripheral surface of the honeycomb structure. The cylindrical metallic member accommodates the honeycomb structure around which the inorganic mat member is wound. The insulating layer has a thickness of about 20 μm to about 400 μm and is densely formed. The insulating layer is provided between an inner surface of the cylindrical metallic member and the inorganic mat member.
    • 废气处理装置包括具有蜂窝单元,催化剂,无机垫构件,圆筒状的金属构件和绝缘层的柱状的蜂窝结构体。 蜂窝单元包括限定从蜂窝单元的第一端沿着长度方向延伸到蜂窝单元的第二端的多个单元的单元壁。 催化剂设置在细胞壁上。 无机垫材缠绕在蜂窝结构体的外周面上。 圆筒状金属构件容纳无机垫构件所缠绕的蜂窝结构体。 绝缘层的厚度为约20μm至约400μm并且密集地形成。 绝缘层设置在圆筒形金属构件的内表面和无机垫构件之间。
    • 24. 发明申请
    • METHOD FOR FORMING ORGANIC THIN FILM
    • 形成有机薄膜的方法
    • US20090281238A1
    • 2009-11-12
    • US12312096
    • 2007-11-13
    • Tomoya HidakaYoshitaka FujitaNorifumi NakamotoKazuhisa KumazawaEiji Hoshi
    • Tomoya HidakaYoshitaka FujitaNorifumi NakamotoKazuhisa KumazawaEiji Hoshi
    • C09D5/00
    • C09D7/1233B05D1/185B05D7/24B05D2202/00B05D2203/35C03C17/30C03C2217/76C03C2218/113C08K5/01C08K5/04C08K5/05C08K5/5419C09D7/63C09K3/18
    • The object is to provide a method for forming an organic thin film which enables to form quickly a dense monomolecular film with less impurity. It is a method for forming an organic thin film which comprises:1) a step of preparing a hydroxyl group-containing solution by mixing the following (a), (b) and (c) so that the total amount of (A) and (B) in the hydroxyl group-containing solution becomes 0.1 wt % to 80 wt %, and conducting hydrolysis to generate a hydroxyl group-containing compound; a) an adjuvant for forming an organic thin film comprising a metal surfactant (A) having at least one or more hydrolysable group, and a compound (C) that can interact with the metal surfactant in an organic solvent b) a metal surfactant having at least one or more hydrolysable group (B), and c) water 2) a step of preparing a solution for forming an organic thin film by mixing an organic solvent and the hydroxyl group-containing solution obtained in the above step 1); and 3) a step of allowing the substrate to contact with the solution for forming an organic thin film obtained in the above step 2).
    • 本发明的目的是提供一种形成有机薄膜的方法,其能够快速形成具有较少杂质的致密单分子膜。 形成有机薄膜的方法包括:1)通过混合以下(a),(b)和(c)制备含羟基溶液的步骤,使得(A)和 含羟基溶液中的(B)成为0.1重量%〜80重量%,进行水解生成含羟基化合物; a)用于形成包含具有至少一个或多个可水解基团的金属表面活性剂(A)的有机薄膜的助剂和可在有机溶剂中与金​​属表面活性剂相互作用的化合物(C)b)具有 至少一个或多个可水解基团(B)和c)水2)通过混合有机溶剂和在上述步骤1)中获得的含羟基溶液来制备用于形成有机薄膜的溶液的步骤; 和3)允许基板与用于形成上述步骤2)中获得的有机薄膜的溶液接触的步骤。
    • 25. 发明申请
    • Novel compounds capable of forming photoconvertible organic thin film and articles having organic thin film
    • 能够形成可转换有机薄膜的新型化合物和具有有机薄膜的制品
    • US20060138400A1
    • 2006-06-29
    • US10543823
    • 2004-01-30
    • Haruo SasoYoshitaka FujitaToshiaki Takahashi
    • Haruo SasoYoshitaka FujitaToshiaki Takahashi
    • H01L29/08
    • G03F7/0045C07F7/12C07F7/1804C07F9/3808C07F9/4006
    • The present invention relates to a compound which is flexibly amenable to the alteration, without impairing its photosensitivity, of its structural moiety which affects film forming ability and the resulting surface properties, the compound being capable of undergoing surface alteration by irradiation with relatively low energy wavelength, and of forming an organic thin film on a substrate with good reproducibility, and an organic thin film formed body, the compound being represented by formula (1). (In the formula, X represents a heteroatom-containing functional group capable of interacting with a surface of a metal or a metallic oxide, R represents a C1 to C20 alkyl group, a C1 to C20 alkoxy group, an aryl group, or a C1 to C20 alkoxycarbonyl group; n represents an integer of 1 to 30, and m represents an integer of 0 to 5; G1 represents a single bond or a bivalent hydrocarbon radical having carbon atoms of 1 to 3; Ar represents an aromatic group which may have a substituent; G2 represents O, S, or Nr.)
    • 本发明涉及一种化合物,该化合物可柔性地适应于改变而不损害其影响成膜能力的结构部分的光敏性和所得的表面性质,该化合物能够通过相对较低的能量波长的照射进行表面改性 并且在具有良好重复性的基板上形成有机薄膜,和有机薄膜形成体,该化合物由式(1)表示。 (式中,X表示与金属或金属氧化物的表面相互作用的含杂原子的官能团,R表示C1〜C20烷基,C1〜C20烷氧基,芳基或C1 C20烷氧基羰基; n表示1〜30的整数,m表示0〜5的整数,G1表示单键或碳原子数为1〜3的二价烃基; Ar表示可具有 取代基; G 2表示O,S或Nr)
    • 26. 发明授权
    • Method and apparatus for controlling motor-driven let-off motion for
looms
    • US4513790A
    • 1985-04-30
    • US579248
    • 1984-02-13
    • Tsutomu SainenToshiyuki SakanoYoshitaka FujitaToshiki Imai
    • Tsutomu SainenToshiyuki SakanoYoshitaka FujitaToshiki Imai
    • H02P1/16D03D49/10D03D51/02D03D51/12
    • D03D49/10
    • A method of controlling a motor-driven let-off motion in a loom including a system for controlling a let-off motion motor includes the steps of sampling a variation of warp tension during each revolution of a main shaft of the loom, effecting at least proportional and integral control modes on the average of sampled values, adding a proportional and integral output to a basic speed signal at a prescribed ratio, and applying a sum signal to the system for controlling the let-off motion motor. An apparatus for controlling a motor-driven let-off motion in a loom including a system for controlling a let-off motion motor includes an average computing unit for computing the average of warp tension variations detected at a plurality of sampling times while a main shaft of the loom revolves, a control unit for effecting at least a proportional and integral computation on the average to produce a proportional and integral output, a basic speed computing unit responsive to information indicative of the number of RPM of the main shaft of the loom, the diameter of warp coils on beams, and the number of beatings for computing a basic speed, and a speed command computing unit responsive to the proportional and integral output and the basic speed for adding the proportional and integral output to the basic speed at a prescribed ratio to generate a speed command signal and for applying the speed command signal to the system for controlling the let-off motion motor. With this arrangement, there is no time-delay element in the control system and hence any tension variations can be detected quickly. When the loom is stopped in operation, the integral of a warp tension prior to the stoppage of the loom is stored. When the loom is restarted, the stored integral is issued to suppress any unwanted tension variations of the warp yarns. Since a tension compensation gain is not relatively varied when the diameter of a warp coil is changed, the control system can provide ideal control characteristics.