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    • 24. 发明申请
    • CIRCUIT STATISTICAL MODELING FOR PARTIALLY CORRELATED MODEL PARAMETERS
    • 部分相关模型参数的电路统计建模
    • US20060100873A1
    • 2006-05-11
    • US10904307
    • 2004-11-03
    • Calvin BittnerSteven GrundonYoo-Mi LeeNing LuJosef Watts
    • Calvin BittnerSteven GrundonYoo-Mi LeeNing LuJosef Watts
    • G10L15/14
    • G06F17/5036
    • A method, system and program product are disclosed for statistical modeling an integrated circuit that provides information about partial correlations between model parameters. The invention determines a variance-covariance matrix for data to be modeled; conducts principal component analysis on the variance-covariance matrix; and creates a statistical model with an independent distribution for each principal component, allowing calculation of each individual model parameter as a weighted sum by a circuit simulator. The statistical model provides information about how well individual transistors will track one another based on layout similarity. This allows the designer to quantify and take advantage of design practices that make all transistors similar, for example, by orienting all gates in the same direction. A method, system and program product for simulating a circuit using the statistical model are also included.
    • 公开了一种用于统计建模集成电路的方法,系统和程序产品,其提供关于模型参数之间的部分相关性的信息。 本发明确定要建模的数据的方差 - 协方差矩阵; 对方差协方差矩阵进行主成分分析; 并为每个主成分创建一个具有独立分布的统计模型,允许通过电路模拟器计算每个单独的模型参数作为加权和。 统计模型提供了有关单个晶体管基于布局相似性将彼此跟踪的信息。 这允许设计者量化并利用使所有晶体管相似的设计实践,例如通过将所有栅极定向在相同的方向。 还包括用于使用统计模型模拟电路的方法,系统和程序产品。
    • 25. 发明申请
    • Color remapping
    • 颜色重映射
    • US20060034509A1
    • 2006-02-16
    • US10943539
    • 2004-09-17
    • Ning LuJemm Liang
    • Ning LuJemm Liang
    • G06K9/00
    • H04N1/603
    • A method and apparatus for gamut color remapping and compensation is provided. In one embodiment, the invention is a method. The method includes receiving input image data. The method further includes determining relationships between the input image data and known correction values. The method also includes interpolating corrections to the image data input based on the known correction values. The method further includes applying interpolated corrections to the input image data to produce normalized image data. In another embodiment, the invention is a method. The method includes measuring color distortion for a video component. The method also includes determining transforms for a set of known correction data points for the video component. The method further includes storing parameters of transforms for the set of known correction data points for the video component.
    • 提供了一种用于色域重新映射和补偿的方法和装置。 在一个实施例中,本发明是一种方法。 该方法包括接收输入图像数据。 该方法还包括确定输入图像数据和已知校正值之间的关系。 该方法还包括基于已知的校正值对输入的图像数据进行内插校正。 该方法还包括将内插校正应用于输入图像数据以产生归一化图像数据。 在另一个实施例中,本发明是一种方法。 该方法包括测量视频分量的颜色失真。 该方法还包括为视频分量的一组已知校正数据点确定变换。 该方法还包括存储用于视频分量的已知校正数据点集合的变换参数。
    • 27. 发明授权
    • Complementary and exchange mask design methodology for optical proximity correction in microlithography
    • 用于微光刻中光学邻近校正的补充和交换掩模设计方法
    • US06280887B1
    • 2001-08-28
    • US09518069
    • 2000-03-02
    • Ning Lu
    • Ning Lu
    • G03F900
    • G03F7/70441G03F1/36
    • A method and structure for performing optical proximity correction in a photolithographic mask to prevent rounding of corners and line end foreshortening of a shape on the photolithographic mask comprises changing a transparency of the photolithographic mask by adding serifs and holes along each edge of the shape intersecting a comer of the shape to establish complementary symmetry along each edge of the shape, changing a transparency of quadrants around each comer of the shape to form mirror image diagonal quadrants centered on corners of the shape, reducing the size of serifs and holes by cutting out unnecessary parts to make the serifs and holes less likely to be printed and exchanging part of the serifs and holes around a comer to make the serifs and holes not printable.
    • 用于在光刻掩模中执行光学邻近校正以防止光刻掩模上的形状的圆角倒圆和线端缩短的方法和结构包括:通过沿着与光刻掩模相交的形状的每个边缘添加衬底和孔来改变光刻掩模的透明度 形状的角形,以沿着形状的每个边缘建立互补的对称性,改变围绕形状的每个角落的象限的透明度,以形成以形状的角为中心的镜像对角象限,通过切除不必要的方式减小衬线和孔的尺寸 部件使得衬线和孔不太可能被打印,并且在拐角周围交换部分衬线和孔,以使衬线和孔不能被打印。
    • 28. 发明授权
    • Serif mask design methodology based on enhancing high spatial frequency contribution for improved printability
    • 基于增强高空间频率贡献以提高可印刷性的Serif掩模设计方法
    • US06214494B1
    • 2001-04-10
    • US09167948
    • 1998-10-07
    • Orest BulaDaniel ColeEdward ConradNing Lu
    • Orest BulaDaniel ColeEdward ConradNing Lu
    • G03F900
    • G03F7/70441G03F1/36
    • A proximity correction serif design methodology is described that provides improved inner and outer corner rounding, line end shortening, as well as improvements in more general undesirable two-dimensional shape distortions introduced into the lithographic printing process due to proximity effects. Using this method, exact solutions are shown for the specialized cases of either coherent or incoherent illumination exposing a hypothetical resist that develops via a simple diffusion like mechanism. The basis of this method for predicting the positions and shapes of serifs is tied to the need to increase the components of high spatial frequency that are essentially lost due to diffraction, diffusion, dissolution, and etching related effects. The correct amount to increase the spatial components is determined in the coordinate space and makes use of an empirical characterization of these physical factors.
    • 描述了接近校正衬线设计方法,其提供改进的内角和外角圆角,线端缩短,以及由于邻近效应而被引入到平版印刷工艺中的更一般的不期望的二维形状变形的改进。 使用这种方法,对于相干或非相干照明的特殊情况,显示了明确的解决方案,暴露了通过简单的扩散机制发展的假想抗蚀剂。 用于预测衬线的位置和形状的这种方法的基础与增加基本上由于衍射,扩散,溶解和蚀刻相关效应而损失的高空间频率的分量的需要相关联。 在坐标空间中确定增加空间分量的正确数量,并利用这些物理因素的经验表征。