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21. 发明申请

US20100053841A1 WAFER PROCESSING APPARATUS HAVING A TUNABLE ELECTRICAL RESISTIVITY 有权
标题翻译：具有可调节电阻率的加工装置
公开(公告)号：US20100053841A1
公开(公告)日：2010-03-04
申请号：US12204079
申请日：2008-09-04
申请人： David Michael Rusinko, JR. , Marc Schaepkens , Wanxue Zeng
发明人： David Michael Rusinko, JR. , Marc Schaepkens , Wanxue Zeng
IPC分类号： H01L21/683
CPC分类号： H01L21/683 , H01L21/6831 , H01L21/6833
摘要： An article with an etch resistant coating is disclosed. The article is a heating element, wafer carrier, or electrostatic chuck. The article has a base substrate made of a ceramic or other material, and further has one or more electrodes for resistance heating or electromagnetic chucking or both. The eth resistant coating has a plurality of regions made from materials having different electrical volume resistivities, such that the overall coating has a bulk resistivity that can be tailored by varying the relative size of each region.
摘要翻译：公开了具有耐蚀刻涂层的物品。该物品是加热元件，晶片载体或静电卡盘。该制品具有由陶瓷或其他材料制成的基底，并且还具有用于电阻加热或电磁夹持的两个或更多个电极。耐腐蚀涂层具有由具有不同电体积电阻率的材料制成的多个区域，使得整个涂层具有可以通过改变每个区域的相对尺寸来调整的体电阻率。

22. 发明申请

US20080009417A1 COATING COMPOSITION, ARTICLE, AND ASSOCIATED METHOD 审中-公开
标题翻译：涂料组合物，制品及相关方法
公开(公告)号：US20080009417A1
公开(公告)日：2008-01-10
申请号：US11560953
申请日：2006-11-17
申请人： Victor Lienkong Lou , George Theodore Dalakos , Marc Schaepkens
发明人： Victor Lienkong Lou , George Theodore Dalakos , Marc Schaepkens
IPC分类号： H01L39/24
CPC分类号： H01L21/68757 , C03C3/062 , C03C3/095 , C03C4/20
摘要： A processing apparatus for use in a corrosive operating environment at a temperature range of 25-1500° C. is provided. The apparatus has protective coating structure that includes a glassy material. The glassy material includes at least one of yttrium, cerium, or gadolinium; and aluminum and silicon. The coating composition resists etching by a harsh environment.
摘要翻译：提供一种用于在25-1500℃的温度范围内的腐蚀性操作环境中的加工设备。该装置具有包括玻璃状材料的保护涂层结构。玻璃状材料包括钇，铈或钆中的至少一种; 和铝和硅。涂料组合物可以抵抗恶劣环境的蚀刻。

23. 发明申请

US20070053168A1 ADVANCED HEAT SINKS AND THERMAL SPREADERS 审中-公开
标题翻译：先进的散热器和热膨胀器
公开(公告)号：US20070053168A1
公开(公告)日：2007-03-08
申请号：US11555681
申请日：2006-11-01
申请人： Haluk Sayir , Arik Mehmet , Evan Cooper , Tunc Icoz , Marc Schaepkens , Xiang Liu
发明人： Haluk Sayir , Arik Mehmet , Evan Cooper , Tunc Icoz , Marc Schaepkens , Xiang Liu
IPC分类号： H05K7/20
CPC分类号： H01L23/3672 , B32B18/00 , B32B2315/02 , C04B35/522 , C04B35/645 , C04B2235/9607 , C04B2237/086 , C04B2237/32 , C04B2237/363 , C04B2237/66 , C04B2237/704 , C04B2237/82 , C04B2237/84 , F28F3/02 , F28F3/022 , F28F3/025 , F28F13/18 , F28F21/02 , G06F1/20 , H01L23/367 , H01L23/3677 , H01L23/373 , H01L23/3735 , H01L23/467 , H01L2924/0002 , H01L2924/00
摘要： A heat sink assembly for an electronic device or a heat generating device(s) is constructed from an ultra-thin graphite layer. The ultra-thin graphite layer exhibits thermal conductivity which is anisotropic in nature and is greater than 500 W/m° C. in at least one plane and comprises at least a graphene layer. The ultra-thin graphite layer is structurally supported by a layer comprising at least one of a metal, a polymeric resin, a ceramic, and a mixture thereof, which is disposed on at least one surface of the graphite layer.
摘要翻译：用于电子装置或发热装置的散热器组件由超薄石墨层构成。超薄石墨层本质上具有各向异性的热导率，并且在至少一个平面中大于500W / m℃，并且至少包括石墨烯层。超薄石墨层在结构上由包含金属，聚合物树脂，陶瓷及其混合物中的至少一种的层支撑，该层设置在石墨层的至少一个表面上。

24. 发明申请

US20060208634A1 Diffusion barrier coatings having graded compositions and devices incorporating the same 审中-公开
标题翻译：具有分级组成的扩散阻隔涂层和包含其的装置
公开(公告)号：US20060208634A1
公开(公告)日：2006-09-21
申请号：US11378480
申请日：2006-03-20
申请人： Marc Schaepkens , Kevin Flanagan
发明人： Marc Schaepkens , Kevin Flanagan
IPC分类号： H01J1/62
CPC分类号： H01L51/5268 , B82Y20/00 , B82Y30/00 , C23C16/30 , C23C16/45523 , C23C16/50 , G02F1/133305 , G02F2201/50 , H01L51/5036 , H01L51/5253 , H01L2251/5338 , H01L2251/5346 , H01L2251/5369
摘要： Disclosed is a composite article and methods for making a composite article where the composite article includes a coating material formed from an organic material having a first refractive index and an inorganic material having a second refractive index where the refractive indexes match. The methods may include depositing the coating using a plasma-enhanced chemical-vapor deposition technique. The methods may further include varying the deposition rate of one or both of the organic and inorganic material so as to match the refractive indexes.
摘要翻译：公开了一种复合制品和复合制品的制造方法，其中复合制品包括由具有第一折射率的有机材料形成的涂层材料和具有折射率匹配的第二折射率的无机材料。所述方法可以包括使用等离子体增强化学气相沉积技术沉积涂层。所述方法还可以包括改变有机材料和无机材料中的一种或两种的沉积速率，以便匹配折射率。

25. 发明申请

US20060096946A1 Encapsulated wafer processing device and process for making thereof 审中-公开
标题翻译：封装晶片处理装置及其制造方法
公开(公告)号：US20060096946A1
公开(公告)日：2006-05-11
申请号：US11262279
申请日：2005-10-28
申请人： Marc Schaepkens , Takayuki Togawa
发明人： Marc Schaepkens , Takayuki Togawa
IPC分类号： H01B13/00 , C23C16/00 , C23F1/00
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/67109 , H01L21/6831
摘要： A wafer processing device for use in semiconductor wafer processing applications as an Electro-Static Chuck (ESC) comprising a graphite substrate and at least one electrode pattern, wherein the grooves in the electrode pattern are filled with insulating or semiconducting material selected from a group consisting of B, Al, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and/or combinations thereof, forming a substantially planar surface. The substantially planar surface is then coated with at least a semiconducting layer comprising at least one of a nitride, carbide, carbonitride or oxynitride of elements selected from a group consisting of B, Al, Si, Ga, refractory hard metals, transition metals, and rare earth metals, or complexes and/or combinations thereof.
摘要翻译：一种晶片处理装置，用于半导体晶片处理应用中，作为包含石墨基片和至少一个电极图案的静电卡盘（ESC），其中电极图案中的凹槽填充有绝缘或半导体材料，绝缘或半导体材料选自 B，Al，Si，Ga，难熔硬金属，过渡金属和稀土金属，或其复合物和/或其组合，形成基本平坦的表面。然后用至少一个半导体层涂覆基本平坦的表面，该半导体层包括选自由B，Al，Si，Ga，耐火硬金属，过渡金属和过渡金属组成的组中的元素的氮化物，碳化物，碳氮化物或氮氧化物中的至少一种稀土金属或其配合物和/或其组合。

26. 发明授权

US06969953B2 System and method for inductive coupling of an expanding thermal plasma 有权
标题翻译：膨胀热等离子体的感应耦合系统和方法
公开(公告)号：US06969953B2
公开(公告)日：2005-11-29
申请号：US10609958
申请日：2003-06-30
申请人： Marc Schaepkens
发明人： Marc Schaepkens
IPC分类号： C23C16/00 , H01J7/24 , H01J37/32 , H05H1/46
CPC分类号： H01J37/321 , H01J37/32357 , H05H1/46
摘要： A method is provided for generating plasma using a plasma generator system. The method includes the steps of introducing energy and a reactant to a plasma generation apparatus of the plasma generator system for generating plasma, and expanding and inductively coupling the generated plasma. In another embodiment a plasma generation system is provided including a plasma generation apparatus for generating thermal plasma. The thermal plasma is received by a plasma treatment chamber external to the plasma generation apparatus. A pressure control system maintains a lower pressure in the plasma treatment chamber than in the plasma generation apparatus during plasma generation for causing the thermal plasma to expand within the plasma treatment chamber. An inductor system inductively couples the thermal plasma.
摘要翻译：提供了一种使用等离子体发生器系统产生等离子体的方法。该方法包括以下步骤：将能量和反应物引入到等离子体发生器系统的等离子体发生装置中，用于产生等离子体，以及膨胀和感应耦合产生的等离子体。在另一个实施例中，提供了一种等离子体发生系统，其包括用于产生热等离子体的等离子体产生装置。热等离子体由等离子体发生装置外部的等离子体处理室接收。压力控制系统在等离子体发生装置期间等离子体处理室中的等离子体处理室中保持较低的压力，以使等离子体处理室内的热等离子体膨胀。电感系统感应耦合热等离子体。

27. 发明授权

US06952079B2 Luminaire for light extraction from a flat light source 有权
标题翻译：用于从平坦光源进行光提取的灯具
公开(公告)号：US06952079B2
公开(公告)日：2005-10-04
申请号：US10323448
申请日：2002-12-18
申请人： Joseph John Shiang , Marc Schaepkens , Larry Gene Turner
发明人： Joseph John Shiang , Marc Schaepkens , Larry Gene Turner
IPC分类号： H01L51/50 , F21V7/22 , F21V13/02 , F21V15/01 , F21Y105/00 , H01L51/52 , H01J1/62
CPC分类号： F21V15/01 , F21S2/00 , F21Y2105/00 , F21Y2115/15 , H01L51/52 , H01L51/5268 , H01L51/5271 , H01L2251/5361 , Y02B20/36
摘要： A shaped light extraction luminaire to gather light from an organic light emitting diode (OLED). Specifically, an inverted and truncated pyramid structure having a recessed area configured to receive an OLED is provided. The luminaire is structured to increase the light emission of the OLED by capturing light emissions that would typically be lost by absorption within the OLED. The luminaire includes angled sides having a reflective material disposed thereon. The luminaire increases the light output of the OLED such that it may be implemented in area lighting applications. Further, an array comprising a plurality of recessed areas and a plurality of angled sides for each of the recessed areas may be implemented.
摘要翻译：用于收集来自有机发光二极管（OLED）的光的成形光提取灯具。具体地，提供了具有被配置为接收OLED的凹陷区域的倒置和截头棱锥结构。该灯具的结构是通过捕获通常由OLED内的吸收而损失的光发射来增加OLED的发光。灯具包括设置在其上的反射材料的成角度的侧面。灯具增加了OLED的光输出，使得其可以在区域照明应用中实现。此外，可以实现包括用于每个凹陷区域的多个凹陷区域和多个成角度的边缘的阵列。

28. 发明授权

US06951400B2 High index coated light management films 失效
标题翻译：高折射率涂层光管理膜
公开(公告)号：US06951400B2
公开(公告)日：2005-10-04
申请号：US10248129
申请日：2002-12-19
申请人： Bret Chisholm , Eugene Olczak , Marc Schaepkens , Dennis Coyle
发明人： Bret Chisholm , Eugene Olczak , Marc Schaepkens , Dennis Coyle
IPC分类号： F21V8/00 , G02B5/20 , G02B5/28 , G02B5/30 , G02F1/13357 , G01D11/28
CPC分类号： G02B5/287 , G02B5/045 , G02B5/20 , G02B5/3041 , G02B6/0031 , G02B6/0038 , G02B6/0046 , G02B6/005 , G02B6/0053 , G02B6/0055 , G02B6/0071 , G02F1/13362 , Y10T428/265
摘要： There is provided an optical structure. The optical structure includes a light source. The optical structure also includes an organic light management film having an index of refraction of less than 1.7 disposed above the light source, and a transparent inorganic film having an index of refraction of greater than 1.7 disposed adjacent the organic light management film. A optical device is also provided including the organic light management film and the transparent inorganic film. A method of forming the optical structure is also provided. The method includes depositing the transparent inorganic film under vacuum.
摘要翻译：提供了一种光学结构。光学结构包括光源。该光学结构还包括在光源上方具有小于1.7的折射率的有机光管理膜和邻近有机光管理膜设置的折射率大于1.7的透明无机膜。还提供了包括有机光管理膜和透明无机膜的光学装置。还提供了一种形成光学结构的方法。该方法包括在真空下沉积透明无机膜。

29. 发明申请

US20050181212A1 Composite articles having diffusion barriers and devices incorporating the same 审中-公开
标题翻译：具有扩散阻挡层的复合制品及其结合物
公开(公告)号：US20050181212A1
公开(公告)日：2005-08-18
申请号：US10779373
申请日：2004-02-17
申请人： Marc Schaepkens , Hua Wang , Christian Heller , Kevin Flanagan , Paul McConnelee
发明人： Marc Schaepkens , Hua Wang , Christian Heller , Kevin Flanagan , Paul McConnelee
IPC分类号： H05B33/02 , B32B7/02 , H01L51/50 , H01L51/52 , H05B33/10 , H05B33/22 , B32B15/04 , B32B27/06 , B32B27/30 , B32B27/32 , B32B27/34 , B32B27/36 , B32B27/38 , B32B27/40 , B32B31/00
CPC分类号： H01L51/5256 , Y10T428/31504 , Y10T428/31507 , Y10T428/31511 , Y10T428/31551 , Y10T428/31678 , Y10T428/31721 , Y10T428/31725 , Y10T428/31931 , Y10T428/31935 , Y10T428/31938
摘要： A composite article comprises two polymeric substrate layers, each of which has at least a diffusion-inhibiting barrier on one of the surfaces. The diffusion-inhibiting barriers are disposed such that they face each other within the composite articles. Electronic devices are disposed on such composite articles to reduce the rate of diffusion of chemical species in the environment into the devices.
摘要翻译：复合制品包括两个聚合物基底层，每个基底层在其中一个表面上至少具有扩散抑制屏障。扩散抑制屏障被布置成使得它们在复合制品内相互面对。电子设备被布置在这样的复合制品上以降低化学物质在环境中扩散到装置中的速度。

30. 发明申请

US20050079295A1 Apparatus and method for depositing large area coatings on planar surfaces 有权
标题翻译：用于在平坦表面上沉积大面积涂层的装置和方法
公开(公告)号：US20050079295A1
公开(公告)日：2005-04-14
申请号：US10626253
申请日：2003-07-23
申请人： Marc Schaepkens
发明人： Marc Schaepkens
IPC分类号： C23C16/32 , C23C16/40 , C23C16/50 , H01J37/32 , H05H1/24
CPC分类号： H01J37/32009 , C23C16/325 , C23C16/401 , C23C16/50
摘要： A method and apparatus for depositing a uniform coating on a large area, planar surface using an array of multiple plasma sources and a common reactant gas injector. The apparatus includes at least one array of a plurality of plasma sources, wherein each of the plurality of plasma sources includes a cathode, an anode, and an inlet for a non-reactive plasma source gas disposed in a plasma chamber, and a common reactant gas injector disposed in a deposition chamber that contains the substrate. The common reactant gas injector provides a uniform flow of at least one reactant gas to each of the multiple plasmas generated the multiple plasma sources through a single delivery system. The at least one reactant gas reacts with the plurality of plasmas to form a uniform coating on a substrate.
摘要翻译：一种用于使用多个等离子体源阵列和普通反应气体注入器在大面积平坦表面上沉积均匀涂层的方法和装置。该装置包括多个等离子体源的至少一个阵列，其中多个等离子体源中的每一个包括阴极，阳极和设置在等离子体室中的非反应性等离子体源气体的入口，以及常见的反应物气体注入器设置在包含基板的沉积室中。常见的反应气体注射器通过单个输送系统提供均匀流动的至少一种反应气体至多个等离子体中的每一个，从而产生多个等离子体源。至少一种反应物气体与多个等离子体反应以在基底上形成均匀的涂层。

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