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    • 21. 发明授权
    • Object holding apparatus, and inspection apparatus
    • 物体保持装置和检查装置
    • US08686383B2
    • 2014-04-01
    • US13454897
    • 2012-04-24
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • H01L21/68
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。
    • 22. 发明授权
    • Substrate holding apparatus, and inspection or processing apparatus
    • 基板保持装置,检查或处理装置
    • US07999242B2
    • 2011-08-16
    • US12754927
    • 2010-04-06
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • H01L21/68
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。
    • 24. 发明申请
    • Substrate holding apparatus, and inspection or processing apparatus
    • 基板保持装置,检查或处理装置
    • US20080054197A1
    • 2008-03-06
    • US11896291
    • 2007-08-30
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • G01N21/86H01L21/68
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。
    • 25. 发明授权
    • Substrate holding apparatus, and inspection or processing apparatus
    • 基板保持装置,检查或处理装置
    • US08183549B2
    • 2012-05-22
    • US13175429
    • 2011-07-01
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • Kazuhiro ZamaKoichi AsamiYusuke Miyazaki
    • H01L21/68
    • G01N21/9501G01N21/9506H01L21/68728
    • In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
    • 为了实现基板的高精度定位和强压,本发明提供了一种基板保持装置,其包括:旋转台,其具有支撑基板的外周侧表面的下侧的倾斜面,该床在 基板的法线与基板一起作为旋转轴; 位置限制单元,与旋转床一起旋转,并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元,并且通过在旋转期间按压基板的外周侧面的上侧的多个点,将基板压靠在倾斜面上。