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21. 发明授权

US08243350B2 Apparatus with image reading units arranged in zigzag manner for obtaining digital data to generate one-line image data 有权
标题翻译：具有以锯齿形排列的图像读取单元以获得数字数据以产生单行图像数据的装置
公开(公告)号：US08243350B2
公开(公告)日：2012-08-14
申请号：US12291093
申请日：2008-11-06
申请人： Masaaki Yoshida
发明人： Masaaki Yoshida
IPC分类号： H04N1/46
CPC分类号： H04N1/1912 , H04N1/1917 , H04N1/484
摘要： In a color reading apparatus for successively reading respective red, green, and blue colors in each line while a document is continuously conveyed to a plurality of line sensor units arranged in a zigzag manner, the line sensor units are arranged with a distance equal to or shorter than a unit of line to prevent a color shift. When read data of the plurality of line sensor units in a conveying direction are to be combined, image data shifted by the number of lines corresponding to distances between the line sensor units in the conveying direction are set as first combination candidates. A color code and a line code are added to each of the data. Image data having the same color code and the same line code are combined. According to the image reading apparatus structured as described above, it is possible to obtain data capable of reproducing read data for each color on the same line without errors.
摘要翻译：在将文件连续传送到以Z字形排列的多个线传感器单元的情况下，连续读取各行的红色，绿色，蓝色的彩色读取装置中，线传感器单元的距离等于或等于短于单位线以防止颜色偏移。当组合传送方向上的多个行传感器单元的读取数据时，将与传送方向上的行传感器单元之间的距离相对应的行数移位的图像数据设置为第一组合候选。每个数据都添加一个颜色代码和一行代码。具有相同颜色代码和相同行代码的图像数据被组合。根据如上所述构造的图像读取装置，可以获得能够在同一行上再现用于每个颜色的读取数据的数据而无误差的数据。

22. 发明授权

US08198004B2 Resist composition 有权
标题翻译：抗蚀组成
公开(公告)号：US08198004B2
公开(公告)日：2012-06-12
申请号：US12252319
申请日：2008-10-15
申请人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
发明人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
IPC分类号： G03F7/00 , G03F7/004 , G03F7/20
CPC分类号： G03F7/70616 , G03F7/0382 , G03F7/0397 , G03F7/70341 , Y10S430/106 , Y10S430/111
摘要： A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.
摘要翻译：提供了相对于在浸没式光刻工艺中使用的溶剂是稳定的并且显示出优异的灵敏度和抗蚀剂图案轮廓的抗蚀剂组合物，以及形成使用这种抗蚀剂组合物的抗蚀剂图案的方法。抗蚀剂组合物是根据预定参数，或是包含含有酸解离的溶解抑制基团并在酸的作用下显示增加的碱溶性的树脂组分（A）的阳性抗蚀剂组合物，酸产生剂组分（B）和有机溶剂（C），其中，成分（A）含有来自含有酸解离性，溶解抑制基团但不含结构单元（a0）的（甲基）丙烯酸酯的结构单元（a1）含有二羧酸的酸酐的单元（a0-1）和含有酚羟基的结构单元（a0-2）。

23. 发明申请

US20100151395A1 Protective film-removing solvent and method of photoresist patterning with it 审中-公开
标题翻译：保护膜去除溶剂及其光刻胶图案化方法
公开(公告)号：US20100151395A1
公开(公告)日：2010-06-17
申请号：US12656768
申请日：2010-02-16
申请人： Keita Ishiduka , Masaaki Yoshida , Satoshi Maemori
发明人： Keita Ishiduka , Masaaki Yoshida , Satoshi Maemori
IPC分类号： G03F7/20 , C07C43/12
CPC分类号： G03F7/11 , G03F7/2041 , G03F7/422
摘要： Disclosed are a protective film-removing solvent for re-moving a protective film laminated on a photoresist film, which contains at least a hydrofluoroether; and a method of photoresist patterning in liquid immersion lithography, using the protective film-removing solvent.
摘要翻译：公开了一种用于重新移动层压在光致抗蚀剂膜上的保护膜的保护膜去除溶剂，其至少含有氢氟醚; 以及使用保护膜除去溶剂的液浸光刻中的光致抗蚀剂图案化方法。

24. 发明授权

US07700257B2 Photoresist composition and resist pattern formation method by the use thereof 失效
标题翻译：光刻胶组合物和抗蚀剂图案形成方法
公开(公告)号：US07700257B2
公开(公告)日：2010-04-20
申请号：US10547427
申请日：2004-03-24
申请人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida
发明人： Toshiyuki Ogata , Kotaro Endo , Hiromitsu Tsuji , Masaaki Yoshida
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0046 , G03F7/0395 , Y10S430/108
摘要： A photoresist composition containing a polymer (A) containing an alkali-soluble constituent unit (a1) containing an alicyclic group having both a fluorine atom or a fluorinated alkyl group (i) and an alcoholic hydroxyl group (ii), whose alkali-solubility is changeable by an action of an acid; an acid generator (B) which generates an acid by light irradiation; and a dissolution inhibitor (C) having a fluorine atom(s) and/or a nitrogen-containing compound (D) selected from a tertiary amine (d1) having a polar group, a tertiary alkylamine (d2) having 7 or more and 15 or less of carbon atoms or an ammonium salt (d3). The composition has a resist property capable of accomplishing line and space (1:1) of 90 nm or less in good shape as a pattern processing accuracy of a semiconductor integrated circuit by lithography.
摘要翻译： 1.一种光致抗蚀剂组合物，其含有含有具有氟原子或氟代烷基（i）和醇羟基（ii）的脂环族基团的碱溶性结构单元（a1）的聚合物（A），其碱溶性为可以通过酸的作用而变化; 通过光照射产生酸的酸产生剂（B）; 和具有氟原子的溶解抑制剂（C）和/或选自具有极性基团的叔胺（d1），具有7以上的叔烷基胺（d2）和15以上的含氮化合物（D）或更少的碳原子或铵盐（d3）。该组合物具有能够通过光刻作为半导体集成电路的图案处理精度而实现90nm或更小的线和空间（1：1）的良好形状的抗蚀剂性质。

25. 发明申请

US20090268173A1 METHOD FOR MEASURING LIQUID IMMERSION LITHOGRAPHY SOLUBLE FRACTION IN ORGANIC FILM 有权
标题翻译：用于测量有机膜中液体溶解光刻溶液的方法
公开(公告)号：US20090268173A1
公开(公告)日：2009-10-29
申请号：US12067925
申请日：2006-09-25
申请人： Nobuyuki Kohda , Masaaki Yoshida , Takayuki Yajima , Hiromitsu Tsuji
发明人： Nobuyuki Kohda , Masaaki Yoshida , Takayuki Yajima , Hiromitsu Tsuji
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G01N1/02 , G01N2001/028 , G01N2013/003 , G03F7/2041 , G03F7/70341 , G03F7/70608
摘要： A method for measuring a liquid immersion lithography soluble fraction in an organic film including a mounting step of mounting a droplet of a liquid immersion medium for liquid immersion lithography on a surface of an organic film formed on a substrate and a transfer step of transferring a component in the organic film into the droplet.
摘要翻译：一种用于测量有机膜中的液浸光刻可溶性部分的方法，包括将用于液浸光刻的液浸介质的液滴安装在形成在基板上的有机膜的表面上的安装步骤和转印步骤在有机薄膜中进入液滴。

26. 发明申请

US20090146731A1 REFERENCE VOLTAGE GENERATING CIRCUIT AND POWER SUPPLY DEVICE USING THE SAME 有权
标题翻译：参考电压发生电路和使用该电路的电源装置
公开(公告)号：US20090146731A1
公开(公告)日：2009-06-11
申请号：US11915440
申请日：2007-03-20
申请人： Masaaki Yoshida , Hiroaki Nakanishi
发明人： Masaaki Yoshida , Hiroaki Nakanishi
IPC分类号： G05F1/56
CPC分类号： H01L27/0883
摘要： A disclosed reference voltage generating circuit for generating a reference voltage includes MOSFETs connected in series or in parallel. At least one of the MOSFETs includes a control gate and a floating gate that is made hole-rich or discharged by ultraviolet irradiation, and the reference voltage generating circuit is configured to output the difference between threshold voltages of a pair of the MOSFETs as the reference voltage.
摘要翻译：公开的用于产生参考电压的参考电压产生电路包括串联或并联连接的MOSFET。 MOSFET中的至少一个包括通过紫外线照射使空穴富集或放电的控制栅极和浮置栅极，并且参考电压产生电路被配置为输出一对MOSFET的阈值电压之间的差作为参考电压。

27. 发明授权

US07541138B2 Resist composition 有权
公开(公告)号：US07541138B2
公开(公告)日：2009-06-02
申请号：US11621895
申请日：2007-01-10
申请人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
发明人： Taku Hirayama , Hideo Hada , Satoshi Fujimura , Takeshi Iwai , Mitsuru Sato , Ryoichi Takasu , Toshikazu Tachikawa , Jun Iwashita , Keita Ishiduka , Tomotaka Yamada , Toshikazu Takayama , Masaaki Yoshida
IPC分类号： G03F7/30
CPC分类号： G03F7/70616 , G03F7/0382 , G03F7/0397 , G03F7/70341 , Y10S430/106 , Y10S430/111
摘要： A resist composition which is stable relative to solvents used in immersion lithography processes and displays excellent sensitivity and resist pattern profile, and a method of forming a resist pattern that uses such a resist composition are provided. The resist composition is in accordance with predetermined parameters, or is a positive resist composition comprising a resin component (A) which contains an acid dissociable, dissolution inhibiting group and displays increased alkali solubility under the action of acid, an acid generator component (B), and an organic solvent (C), wherein the component (A) contains a structural unit (a1) derived from a (meth)acrylate ester containing an acid dissociable, dissolution inhibiting group, but contains no structural units (a0), including structural units (a0-1) containing an anhydride of a dicarboxylic acid and structural units (a0-2) containing a phenolic hydroxyl group.

28. 发明授权

US07371510B2 Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern 有权
标题翻译：用于在液浸光刻工艺中使用的用于形成抗蚀剂保护膜的材料，复合膜和形成抗蚀剂图案的方法
公开(公告)号：US07371510B2
公开(公告)日：2008-05-13
申请号：US11702602
申请日：2007-02-06
申请人： Taku Hirayama , Ryoichi Takasu , Mitsuru Sato , Kazumasa Wakiya , Masaaki Yoshida , Koki Tamura
发明人： Taku Hirayama , Ryoichi Takasu , Mitsuru Sato , Kazumasa Wakiya , Masaaki Yoshida , Koki Tamura
IPC分类号： G03F7/11 , G03F7/20 , G03F7/207
CPC分类号： G03F7/2041 , G03F7/11
摘要： Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; having substantially no compatibility with a liquid for liquid immersion lithography; and causing no mixing with the resist film, a composite film comprising a protective film formed from the material and a resist film, and a method for forming a resist pattern using them. These can prevent both the resist film and the liquid used from changing in properties during the liquid immersion lithography, so that a resist pattern with high resolution can be formed using the liquid immersion lithography.
摘要翻译：提供一种用于形成抗蚀剂保护膜的材料，其用于液浸光刻工艺，并形成在抗蚀剂膜上，其中该材料具有以下特性：相对于曝光光是透明的; 基本上不与用于液浸光刻的液体相容; 并且不与抗蚀剂膜混合，包含由该材料形成的保护膜和抗蚀剂膜的复合膜以及使用它们形成抗蚀剂图案的方法。这些可以防止在液浸光刻期间使用的抗蚀剂膜和液体的性质改变，使得可以使用液浸光刻法形成具有高分辨率的抗蚀剂图案。

29. 发明授权

US07335557B2 Semiconductor device of non-volatile memory 有权
标题翻译：非易失性存储器半导体器件
公开(公告)号：US07335557B2
公开(公告)日：2008-02-26
申请号：US11185006
申请日：2005-07-20
申请人： Masaaki Yoshida , Hiroaki Nakanishi
发明人： Masaaki Yoshida , Hiroaki Nakanishi
IPC分类号： H01L21/336 , H01L21/8238
CPC分类号： H01L27/11521 , H01L27/115 , H01L27/11524 , H01L29/42328 , H01L29/66825 , H01L29/7883
摘要： A non-volatile memory semiconductor device includes a first insulation layer, two diffusion regions, a memory gate oxide layer, a first control gate, a second insulation layer, a floating gate of polysilicon, a third insulation layer and a second control gate. The first insulation layer is formed on a semiconductor substrate. The two diffusion regions are formed on a surface of the substrate. The memory gate oxide layer is formed over the two diffusion regions on the substrate. The first control gate including a diffusion region is formed on the surface of the substrate. The second insulation layer is formed on the first control gate. The floating gate of polysilicon is formed over the memory gate oxide layer, the first insulation layer, and the second insulation layer. The third insulation layer is formed on the floating gate. The second control gate is disposed on the floating gate.
摘要翻译：非易失性存储器半导体器件包括第一绝缘层，两个扩散区，存储栅极氧化层，第一控制栅极，第二绝缘层，多晶硅浮置栅极，第三绝缘层和第二控制栅极。第一绝缘层形成在半导体衬底上。两个扩散区形成在基板的表面上。存储栅极氧化层形成在衬底上的两个扩散区上。包括扩散区域的第一控制栅极形成在基板的表面上。第二绝缘层形成在第一控制栅极上。多晶硅的浮栅形成在存储栅极氧化物层，第一绝缘层和第二绝缘层上。第三绝缘层形成在浮动栅上。第二控制栅极设置在浮动栅极上。

30. 发明申请

US20070285730A1 Document Reading Method, Document Reader, Image Forming Device, And Image Scanner 有权
标题翻译：文件阅读方法，文件阅读器，图像形成装置和图像扫描仪
公开(公告)号：US20070285730A1
公开(公告)日：2007-12-13
申请号：US11665202
申请日：2005-09-30
申请人： Makoto Suzuki , Masaaki Yoshida
发明人： Makoto Suzuki , Masaaki Yoshida
IPC分类号： G06K15/00
CPC分类号： H04N1/4076 , H04N1/00002 , H04N1/00013 , H04N1/00031 , H04N1/00045 , H04N1/0005 , H04N1/00063 , H04N1/00068 , H04N1/00087 , H04N1/1912 , H04N1/1918 , H04N1/401 , H04N2201/044
摘要： Photoelectric conversion elements of line sensors (CIS22 to CIS26) arranged in a zigzag manner read a white reference plate to acquire a white reference read value A, and a white reference read average value AA is determined from the white reference read value A for each line sensor. Further, the photoelectric conversion elements read another white reference plate placed on a document support plate to acquire a white reference read value B, and a white reference read average value BB is determined from the white reference read value B for each of the line sensors (CIS22 to CIS26). By using the white reference read average values AA and BB, a sensitivity effect coefficient C used for uniforming the sensitivities different because of the variation of the distances from the line sensors (CIS22 to CIS26) to the document support plate is determined by dividing the average value BB by a data processing section for each of the photoelectric conversion element of the line sensors. By using a white reference read value Aa acquired by reading a white reference plate immediately before reading a document and a black reference read value, a white reference read value Aa for shading correction for correcting a document read value E is corrected with the sensitivity offset coefficient C. In this way, irrespective of the variation of the distances from the line sensors to the document support plate, the variation of the document read values read from the photoelectric conversion element of the line sensors can be suppressed.
摘要翻译：以Z字形排列的线传感器（CIS22〜CIS26）的光电转换元件读取白色基准板以获取白色基准读取值A，并且从白色基准读取值A确定白色基准读取平均值AA，每行传感器。此外，光电转换元件读取放置在原稿支撑板上的另一个白色参考板以获取白色基准读取值B，并且从每个行传感器的白色基准读取值B确定白色基准读取平均值BB（ CIS 22至CIS 26）。通过使用白色参考读取平均值AA和BB，用于使由于从线路传感器（CIS 22至CIS 26）到文档支撑板的距离的变化而不同的灵敏度的均匀化的灵敏度效应系数C通过分割平均值BB由行传感器的每个光电转换元件的数据处理部分。通过使用在读取文档之前通过读取白色参考板获得的白色基准读取值Aa和黑色参考读取值，用灵敏度偏移系数校正用于校正文档读取值E的阴影校正的白色基准读取值Aa 以这种方式，不管从线传感器到文件支撑板的距离的变化如何，可以抑制从线传感器的光电转换元件读取的原稿读取值的变化。

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