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    • 23. 发明授权
    • Manufacturing method of planar optical waveguide device with grating structure
    • 具有光栅结构的平面光波导器件的制造方法
    • US08404133B2
    • 2013-03-26
    • US12547115
    • 2009-08-25
    • Ken SakumaKensuke OgawaKazuhiro GoiYong Tsong TanNing GuanMingbin YuHwee Gee TeoGuo-Qiang Lo
    • Ken SakumaKensuke OgawaKazuhiro GoiYong Tsong TanNing GuanMingbin YuHwee Gee TeoGuo-Qiang Lo
    • C03C15/00
    • G02B6/124
    • A method for manufacturing a planar optical waveguide device of which a core includes a plurality of alternatively arranged fin portions and valley portions to form a grating structure, in which the core widths of the valley portions vary along the longitudinal direction, the method including: a high refractive index material layer forming step of forming a high refractive index material layer; a photoresist layer forming step of forming a photoresist layer on the high refractive index material layer; a first exposure step of forming shaded portions on the photoresist layer using a phase-shifting photomask; a second exposure step of forming shaded portions on the photoresist layer using a binary photomask; a development step of developing the photoresist layer; and an etching step of etching the high refractive index material layer using the photoresist pattern resulted from the development step.
    • 一种平面光波导装置的制造方法,其特征在于,芯体具有多个交替设置的翅片部和谷部,以形成其中谷部的芯宽沿纵向变化的格栅结构,该方法包括: 形成高折射率材料层的高折射率材料层形成步骤; 在高折射率材料层上形成光致抗蚀剂层的光致抗蚀剂层形成步骤; 使用相移光掩模在光致抗蚀剂层上形成阴影部分的第一曝光步骤; 第二曝光步骤,使用二元光掩模在所述光致抗蚀剂层上形成阴影部分; 显影光致抗蚀剂层的显影步骤; 以及使用由显影步骤产生的光致抗蚀剂图案来蚀刻高折射率材料层的蚀刻步骤。