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21. 发明授权

US07513971B2 Flat style coil for improved precision etch uniformity 有权
标题翻译：扁平型线圈，可提高精密蚀刻均匀性
公开(公告)号：US07513971B2
公开(公告)日：2009-04-07
申请号：US10387948
申请日：2003-03-12
申请人： Karl Brown , Vineet Mehta , See-Eng Phan
发明人： Karl Brown , Vineet Mehta , See-Eng Phan
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： H01J37/321
摘要： An RF coil for a plasma etch chamber is provided in which the RF coil is substantially flat over a portion of at least one turn of the coil. In one embodiment, each turn of the coil is substantially flat over a majority of each turn. In one embodiment of the present inventions, each turn of the coil is substantially flat over approximately 300 degrees of the turn. In the final approximate 60 degrees of the turn, the coil is sloped down to the next turn. Each turn thus comprises a substantially flat portion in combination with a sloped portion interconnecting the turn to the next adjacent turn. In one embodiment, the RF coil having turns with substantially flat portions is generally cylindrical. Other shapes are contemplated such as a dome shape. In some applications such as an RF plasma etch reactor, it is believed that providing an RF coil having turns comprising flat portions with sloped portions interconnecting the flat portions can improve uniformity of the etch process.
摘要翻译：提供了一种用于等离子体蚀刻室的RF线圈，其中RF线圈在线圈的至少一圈的一部分上基本上是平坦的。在一个实施例中，线圈的每个匝在每匝的大部分上基本平坦。在本发明的一个实施例中，线圈的每一圈在转弯的大约300度处基本平坦。在最终大约60度的转弯中，线圈向下倾斜到下一回合。因此，每个转弯包括基本平坦的部分，与将转弯相互连接到下一个相邻转弯的倾斜部分组合。在一个实施例中，具有基本平坦部分的匝的RF线圈通常为圆柱形。可以想到其它形状，例如圆顶形状。在诸如RF等离子体蚀刻反应器的一些应用中，据信提供具有包括平坦部分的匝的RF线圈，其具有互连平坦部分的倾斜部分可以提高蚀刻工艺的均匀性。

22. 发明授权

US07480129B2 Detachable electrostatic chuck for supporting a substrate in a process chamber 有权
标题翻译：用于在处理室中支撑基板的可拆卸静电卡盘
公开(公告)号：US07480129B2
公开(公告)日：2009-01-20
申请号：US11221169
申请日：2005-09-07
申请人： Karl Brown , Semyon Sherstinsky , Wei W. Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
发明人： Karl Brown , Semyon Sherstinsky , Wei W. Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , Y10T279/23
摘要： A detachable electrostatic chuck can be attached to a pedestal in a process chamber. The electrostatic chuck has an electrostatic puck comprising a dielectric covering at least one electrode and a frontside surface to receive a substrate. A backside surface of the chuck has a central protrusion that can be a D-shaped mesa to facilitate alignment with a mating cavity in the pedestal. The protrusion can also have asymmetrically offset apertures, which further assist alignment, and also serve to receive electrode terminal posts and a gas tube. A heat transfer plate having an embedded heat transfer fluid channel is spring loaded on the pedestal to press against the chuck for good heat transfer.
摘要翻译：可拆卸的静电卡盘可以附接到处理室中的基座。静电吸盘具有包括覆盖至少一个电极和前侧表面的电介质的静电压盘，用于接收衬底。卡盘的背面具有可以是D形台面的中心突起，以便于与基座中的配合腔体对准。突起还可以具有不对称偏移的孔，其进一步辅助对准，并且还用于接收电极端子柱和气体管。具有嵌入式传热流体通道的传热板弹簧加载在基座上以压靠卡盘以获得良好的热传递。

23. 发明授权

US07252737B2 Pedestal with integral shield 有权
标题翻译：带整体护罩的基座
公开(公告)号：US07252737B2
公开(公告)日：2007-08-07
申请号：US10819891
申请日：2004-04-06
申请人： Karl Brown , Vineet Mehta , See-Eng Phan , Semyon Sherstinsky , Allen Lau
发明人： Karl Brown , Vineet Mehta , See-Eng Phan , Semyon Sherstinsky , Allen Lau
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01L21/67069 , H01J37/321 , H01J37/32623
摘要： Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The body has an upper surface adapted to support the substrate and a lower surface. The lower shield has a center portion and a lip. The lip is disposed radially outward of the body and projects towards a plane defined by the first surface. The lip is disposed in a spaced-apart relation from the body. The lower shield is adapted to interface with an upper shield disposed in a processing chamber to define a labyrinth gap that substantially prevents plasma from migrating below the member. The lower shield, in another embodiment, provides the plasma with a short RF ground return path.
摘要翻译：通常，提供了用于支撑衬底的衬底支撑构件。在一个实施例中，用于支撑衬底的衬底支撑构件包括联接到下屏蔽的主体。主体具有适于支撑基板和下表面的上表面。下屏蔽件具有中心部分和唇部。唇缘设置在身体的径向外侧并朝向由第一表面限定的平面突出。唇缘与身体间隔开设置。下屏蔽适于与设置在处理室中的上屏蔽接口以限定基本上防止等离子体迁移到构件下方的迷宫间隙。在另一个实施例中，下屏蔽为等离子体提供短的RF接地返回路径。

24. 发明授权

US06620296B2 Target sidewall design to reduce particle generation during magnetron sputtering 有权
公开(公告)号：US06620296B2
公开(公告)日：2003-09-16
申请号：US09905263
申请日：2001-07-13
申请人： James Van Gogh , Jim Thompson , Marc Schweitzer , Yoichiro Tanaka , Alan Liu , Anthony CT Chan , Karl Brown , John C. Forster
发明人： James Van Gogh , Jim Thompson , Marc Schweitzer , Yoichiro Tanaka , Alan Liu , Anthony CT Chan , Karl Brown , John C. Forster
IPC分类号： C23C1434
CPC分类号： H01J37/3423 , C23C14/3407 , C23C14/564
摘要： An apparatus for a physical vapor deposition system includes a target having a sidewall having an undercut thereon defining a net erosion area and a net redeposition area.

25. 发明授权

US08301452B2 Voice activated application service architecture and delivery 有权
标题翻译：语音激活的应用服务架构和交付
公开(公告)号：US08301452B2
公开(公告)日：2012-10-30
申请号：US12540258
申请日：2009-08-12
申请人： Todd Simpson , Nathan Chandler , Alan Hawrylyshen , Chad Madison , Mike Lambert , Karl Brown
发明人： Todd Simpson , Nathan Chandler , Alan Hawrylyshen , Chad Madison , Mike Lambert , Karl Brown
IPC分类号： G10L21/00
CPC分类号： H04M3/4938 , G10L15/30 , H04M3/42204 , H04M2201/40
摘要： A system and method for retrieving distributed content responsive to voice data are disclosed. Voice data is transmitted from a source client device to media server which applies a mixing table to route the voice data to one or more destinations described by the mixing table. The media server also analyzes the received voice data for one or more events. Responsive to detecting an event, the media server communicates with an application server, which modifies the mixing table so that subsequent data is also routed to a media generator which analyzes voice data received after detection of the event for a command. The media generator communicates with the application server to retrieve data from a user data source, such as a website, associated with a detected command. The media generator produces an audio representation of the retrieved data which is communicated to the source client device via the media server.
摘要翻译：公开了一种用于响应于语音数据检索分布式内容的系统和方法。语音数据从源客户端设备发送到媒体服务器，媒体服务器应用混合表将语音数据路由到由混合表描述的一个或多个目的地。媒体服务器还分析接收到的一个或多个事件的语音数据。响应于检测事件，媒体服务器与应用服务器进行通信，该应用服务器修改混合表，使得后续数据也被路由到媒体生成器，该媒体生成器在检测到用于命令的事件之后接收到的语音数据。媒体生成器与应用服务器通信以从与检测到的命令相关联的用户数据源（例如网站）检索数据。媒体生成器产生经由媒体服务器传送到源客户端设备的检索数据的音频表示。

26. 发明授权

US08221602B2 Non-contact process kit 有权
标题翻译：非接触式工艺套件
公开(公告)号：US08221602B2
公开(公告)日：2012-07-17
申请号：US11954270
申请日：2007-12-12
申请人： Karl Brown , Puneet Bajaj
发明人： Karl Brown , Puneet Bajaj
IPC分类号： C23C14/34
CPC分类号： C23C14/564 , H01L21/67069 , H01L21/68735
摘要： A process kit for use in a physical vapor deposition (PVD) chamber, along with a PVD chamber having a non-contact process kit are provided. In one embodiment, a process kit includes a generally cylindrical shield that has a substantially flat cylindrical body, at least one elongated cylindrical ring extending downward from the body, and a mounting portion extending upwards from an upper surface of the body. In another embodiment, a process kit includes a generally cylindrical deposition ring. The deposition ring includes a substantially flat cylindrical body, at least one downwardly extending u-channel coupled to an outer portion of the body, an inner wall extending upward from an upper surface of an inner region of the body, and a substrate support ledge extending radially inward from the inner wall.
摘要翻译：提供了一种用于物理气相沉积（PVD）室的工艺试剂盒，以及具有非接触式工艺试剂盒的PVD室。在一个实施例中，处理套件包括大致圆柱形的屏蔽件，其具有基本平坦的圆柱形主体，从主体向下延伸的至少一个细长圆柱形环以及从主体的上表面向上延伸的安装部分。在另一个实施例中，处理套件包括大致圆柱形的沉积环。沉积环包括基本上平坦的圆柱体，至少一个向下延伸的u通道，其耦合到主体的外部部分，从主体的内部区域的上表面向上延伸的内壁，以及基板支撑凸缘从内壁径向向内。

27. 发明申请

US20080141942A1 NON-CONTACT PROCESS KIT 有权
标题翻译：非接触式工艺包
公开(公告)号：US20080141942A1
公开(公告)日：2008-06-19
申请号：US11954270
申请日：2007-12-12
申请人： Karl Brown , Puneet Bajaj
发明人： Karl Brown , Puneet Bajaj
IPC分类号： C23C14/30
CPC分类号： C23C14/564 , H01L21/67069 , H01L21/68735
摘要： A process kit for use in a physical vapor deposition (PVD) chamber, along with a PVD chamber having a non-contact process kit are provided. In one embodiment, a process kit includes a generally cylindrical shield that has a substantially flat cylindrical body, at least one elongated cylindrical ring extending downward from the body, and a mounting portion extending upwards from an upper surface of the body. In another embodiment, a process kit includes a generally cylindrical deposition ring. The deposition ring includes a substantially flat cylindrical body, at least one downwardly extending u-channel coupled to an outer portion of the body, an inner wall extending upward from an upper surface of an inner region of the body, and a substrate support ledge extending radially inward from the inner wall.
摘要翻译：提供了一种用于物理气相沉积（PVD）室的工艺试剂盒，以及具有非接触式工艺试剂盒的PVD室。在一个实施例中，处理套件包括大致圆柱形的屏蔽件，其具有基本平坦的圆柱形主体，从主体向下延伸的至少一个细长圆柱形环以及从主体的上表面向上延伸的安装部分。在另一个实施例中，处理套件包括大致圆柱形的沉积环。沉积环包括基本上平坦的圆柱体，至少一个向下延伸的u通道，其耦合到主体的外部部分，从主体的内部区域的上表面向上延伸的内壁，以及基板支撑凸缘从内壁径向向内。

28. 发明申请

US20060002053A1 Detachable electrostatic chuck for supporting a substrate in a process chamber 有权
公开(公告)号：US20060002053A1
公开(公告)日：2006-01-05
申请号：US11221169
申请日：2005-09-07
申请人： Karl Brown , Semyon Sherstinsky , Wei Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
发明人： Karl Brown , Semyon Sherstinsky , Wei Wang , Cheng-Hsiung Tsai , Vineet Mehta , Allen Lau , Steve Sansoni
IPC分类号： H01T23/00
CPC分类号： H01L21/6831 , Y10T279/23
摘要： A detachable electrostatic chuck can be attached to a pedestal in a process chamber. The electrostatic chuck has an electrostatic puck comprising a dielectric covering at least one electrode and a frontside surface to receive a substrate. A backside surface of the chuck has a central protrusion that can be a D-shaped mesa to facilitate alignment with a mating cavity in the pedestal. The protrusion can also have asymmetrically offset apertures, which further assist alignment, and also serve to receive electrode terminal posts and a gas tube. A heat transfer plate having an embedded heat transfer fluid channel is spring loaded on the pedestal to press against the chuck for good heat transfer.

29. 发明授权

US06875927B2 High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications 有权
标题翻译：高温直流夹紧和高压绝缘的RF偏置电缆，用于可偏置静电卡盘应用
公开(公告)号：US06875927B2
公开(公告)日：2005-04-05
申请号：US10095351
申请日：2002-03-08
申请人： Karl Brown , Cheng-Hsiung (Matt) Tsai , Donny Young , Vineet Mehta , David Loo
发明人： Karl Brown , Cheng-Hsiung (Matt) Tsai , Donny Young , Vineet Mehta , David Loo
IPC分类号： H01L21/683 , H02N13/00 , H01B7/00
CPC分类号： H02N13/00 , H01L21/6833
摘要： A high temperature cable includes wire bundle having a plurality of copper strands, where each copper strand has a barrier coating and an anti-oxidation coating disposed thereon. A mica-based layer is wrapped around a length of the wire bundle and a fiberglass layer is disposed over the mica-based layer.
摘要翻译：高温电缆包括具有多个铜绞线的线束，其中每根铜绞线具有阻挡涂层和设置在其上的抗氧化涂层。云母层围绕线束的长度缠绕，并且玻璃纤维层设置在云母基层之上。

30. 发明授权

US06652713B2 Pedestal with integral shield 有权
公开(公告)号：US06652713B2
公开(公告)日：2003-11-25
申请号：US09927747
申请日：2001-08-09
申请人： Karl Brown , Vineet Mehta , See-Eng Phan , Semyon Sherstinsky , Allen Lau
发明人： Karl Brown , Vineet Mehta , See-Eng Phan , Semyon Sherstinsky , Allen Lau
IPC分类号： H05H100
CPC分类号： H01L21/67069 , H01J37/321 , H01J37/32623
摘要： Generally, a substrate support member for supporting a substrate is provided. In one embodiment, a substrate support member for supporting a substrate includes a body coupled to a lower shield. The body has an upper surface adapted to support the substrate and a lower surface. The lower shield has a center portion and a lip. The lip is disposed radially outward of the body and projects towards a plane defined by the first surface. The lip is disposed in a spaced-apart relation from the body. The lower shield is adapted to interface with an upper shield disposed in a processing chamber to define a labyrinth gap that substantially prevents plasma from migrating below the member. The lower shield, in another embodiment, provides the plasma with a short RF ground return path.

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