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21. 发明授权

US08786833B2 Lithographic method and arrangement for manufacturing a spacer 失效
标题翻译：用于制造间隔物的平版印刷方法和布置
公开(公告)号：US08786833B2
公开(公告)日：2014-07-22
申请号：US12760983
申请日：2010-04-15
申请人： Pioter Nikolsky , Jozef Maria Finders , Remco Jochem Sebastiaan Groenendijk
发明人： Pioter Nikolsky , Jozef Maria Finders , Remco Jochem Sebastiaan Groenendijk
IPC分类号： G03B27/32 , G03B27/52
CPC分类号： G03F7/70641 , G03F7/40 , G03F7/70533 , H01L21/0274 , H01L21/0337 , H01L21/0338
摘要： A lithographic method includes exposing a first layer of material to a radiation beam to form a first pattern feature in the first layer, the first pattern feature having sidewalls, and a focal property of the radiation beam being controlled to control a sidewall angle of the sidewalls; providing a second layer of material over the first pattern feature to provide a coating on sidewalls of the first pattern; removing a portion of the second layer, leaving a coating of the second layer of material on sidewalls of the first pattern; removing the first pattern formed from the first layer, leaving on the substrate at least a part of the second layer that formed a coating on sidewalls of that first pattern, the part of the second layer left forming second pattern features in locations adjacent to the locations of sidewalls of the removed first pattern feature.
摘要翻译：光刻方法包括将第一层材料暴露于辐射束以在第一层中形成第一图案特征，第一图案特征具有侧壁，并且辐射束的焦点特性被控制以控制侧壁的侧壁角 ; 在所述第一图案特征上提供第二层材料以在所述第一图案的侧壁上提供涂层; 去除所述第二层的一部分，在所述第一图案的侧壁上留下所述第二材料层的涂层; 去除由第一层形成的第一图案，在衬底上留下在第一图案的侧壁上形成涂层的第二层的至少一部分，第二层的部分在与位置相邻的位置中形成第二图案的去除的第一图案特征的侧壁。

22. 发明授权

US08711330B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08711330B2
公开(公告)日：2014-04-29
申请号：US13102620
申请日：2011-05-06
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
摘要翻译：在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。

23. 发明授权

US08300212B2 Device manufacturing method and lithographic apparatus 有权
标题翻译：器件制造方法和光刻设备
公开(公告)号：US08300212B2
公开(公告)日：2012-10-30
申请号：US12760247
申请日：2010-04-14
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70308 , G03F7/70258 , G03F7/70266 , G03F7/70283
摘要： A mask can be used to print a pattern. Due to mask pattern surface topography, an image error may occur, such as an intensity imbalance between adjacent bright lines in the projected pattern. To help alleviate or eliminate the problem of intensity imbalance, the projection system may include an optical phase adjuster constructed and arranged to adjust a phase of an electric field of optical beams of radiation beam traversing the adjuster. A reduction of intensity imbalance is achieved by suitably adjusting the phases of the zeroth, plus first and minus first-order diffracted radiation emanating from the mask pattern. By adjusting the phase differently for different portions of the illumination, the method can be applied such that no decrease of depth of focus due, for example, the 0th order is occurring.
摘要翻译：可以使用掩码打印图案。由于掩模图案表面形貌，可能会出现图像错误，例如投影图案中相邻亮线之间的强度不平衡。为了帮助减轻或消除强度不平衡的问题，投影系统可以包括光学相位调节器，其被构造和布置成调节穿过调节器的辐射束的光束的电场的相位。强度不平衡的减少是通过适当地调整第零阶相加加掩模图形发出的第一和第一级衍射辐射来实现的。通过对照明的不同部分不同地调整相位，可以应用该方法，使得不会发生例如第0次的焦点的降低。

24. 发明授权

US08178263B2 Method for a lithographic apparatus 失效
标题翻译：光刻设备的方法
公开(公告)号：US08178263B2
公开(公告)日：2012-05-15
申请号：US12625063
申请日：2009-11-24
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G06F9/00 , G03C5/00
CPC分类号： G03B27/42 , G03F7/70308
摘要： A method of increasing a depth of focus of a lithographic apparatus is disclosed. The method includes forming diffracted beams of radiation using a patterning device pattern; and transforming a phase-wavefront of a portion of the diffracted beams into a first phase-wavefront having a first focal plane for the lithographic apparatus, and a second phase-wavefront having a second, different focal plane, wherein the transforming comprises: subjecting a phase of a first portion of a first diffracted beam and a phase of a corresponding first portion of a second diffracted beam to a phase change which results in an at least partial formation of the first phase-wavefront, and subjecting a phase of a second portion of the first diffracted beam and a phase of a corresponding second portion of the second diffracted beam to a phase change which results in an at least partial formation of the second phase-wavefront.
摘要翻译：公开了增加光刻设备的焦深的方法。该方法包括使用图案形成装置图案形成衍射的辐射束; 以及将衍射光束的一部分的相位波前变换为具有用于所述光刻设备的第一焦平面的第一相位波前，以及具有第二不同焦平面的第二相位波前，其中所述变换包括：对将第一衍射光束的第一部分的相位和第二衍射光束的对应的第一部分的相位相位改变为导致第一相位波段的至少部分形成，并且使第二部分的相位并且所述第二衍射光束的对应的第二部分的相位变为导致第二相位波前的至少部分形成的相位变化。

25. 发明授权

US07824842B2 Method of patterning a positive tone resist layer overlaying a lithographic substrate 有权
标题翻译：图案化叠加光刻基板的正色调抗蚀剂层的方法
公开(公告)号：US07824842B2
公开(公告)日：2010-11-02
申请号：US11243190
申请日：2005-10-05
申请人： Jozef Maria Finders
发明人： Jozef Maria Finders
IPC分类号： H01L21/00 , G03C5/00
CPC分类号： G03F7/70466 , G03F1/36 , G03F1/70 , G03F7/70433
摘要： A single exposure method and a double exposure method for reducing mask error factor and for enhancing lithographic printing-process resolution is presented. The invention comprises decomposing a desired pattern of dense lines and spaces in two sub patterns of semi dense spaces that are printed in interlaced position with respect to each other, using positive tone resist. Each of the exposures is executed after applying a relative space-width widening to the spaces of two corresponding mask patterns of semi dense spaces. A factor representative for the space-width widening has a value between 1 and 3, thereby reducing mask error factor and line edge roughness.
摘要翻译：提出了一种减少掩模误差因子和增强平版印刷工艺分辨率的单一曝光方法和双曝光方法。本发明包括使用正色调抗蚀剂分解彼此相互打印的两个半密集空间的两个子图案中的期望图案的致密线和间隔。在将相对空格宽度加宽到半密集空间的两个对应的掩模图案的空间之后执行每个曝光。代表空间宽度加宽的因子具有1到3之间的值，从而减少掩模误差因子和线边缘粗糙度。

26. 发明申请

US20100149508A1 METHOD FOR A LITHOGRAPHIC APPARATUS 有权
标题翻译：一种平面设备的方法
公开(公告)号：US20100149508A1
公开(公告)日：2010-06-17
申请号：US12635933
申请日：2009-12-11
申请人： Luis Alberto Colina Santamaria , Jozef Maria Finders , Laurentius Cornelius De Winter
发明人： Luis Alberto Colina Santamaria , Jozef Maria Finders , Laurentius Cornelius De Winter
IPC分类号： G03B27/54 , G01B11/00
CPC分类号： G03F7/70266 , G03B27/54 , G03F7/70308 , G03F7/70525 , G03F7/70833 , G03F7/70891
摘要： In an embodiment, there is provided a method of at least partially compensating for a deviation in a property of a pattern feature to be applied to a substrate using a lithographic apparatus. The method includes determining a desired phase change to be applied to at least a portion of a radiation beam that is to be used to apply the pattern feature to the substrate and which would at least partially compensate for the deviation in the property. The determination of the desired phase change includes determining a desired configuration of a phase modulation element. The method further includes implementing the desired phase change to the portion of the radiation beam when applying the pattern feature to the substrate, the implementation of the desired phase change comprising illuminating the phase modulation element with the portion of the radiation beam when the phase modulation element is in the desired configuration.
摘要翻译：在一个实施例中，提供了一种至少部分地补偿使用光刻设备施加到基板的图案特征的特性的偏差的方法。该方法包括确定要应用于要用于将图案特征应用于衬底的辐射束的至少一部分的期望相位变化，并且将至少部分地补偿该特性的偏差。所需相位变化的确定包括确定相位调制元件的期望配置。该方法还包括当将图案特征应用于衬底时，实现对辐射束的该部分的期望的相位变化，所述相位变化的实现包括当相位调制元件处于所需的配置。

27. 发明申请

US20100123887A1 METHOD FOR A LITHOGRAPHIC APPARATUS 有权
标题翻译：一种平面设备的方法
公开(公告)号：US20100123887A1
公开(公告)日：2010-05-20
申请号：US12617855
申请日：2009-11-13
申请人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
发明人： Laurentius Cornelius DE WINTER , Jozef Maria Finders
IPC分类号： G03B27/52
CPC分类号： G03F7/70641 , G03F7/70125 , G03F7/70308 , G03F7/70591 , G03F7/70891
摘要： A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.
摘要翻译：描述了一种方法，其包括用具有对称照明模式的辐射束照射图案形成装置图案，图案形成装置图案包括基本上衍射辐射束的辐射的第一图案特征，以及基本上不辐射辐射的第二图案特征使用相位调制元件在基本上衍射的辐射中引入相对于光轴的不对称性，用相位调制元件发射的辐射照射辐射束接收元件，以形成与图案形成装置图案，接收元件图案具有分别与第一和第二图案特征相关的第一和第二接收元件图案特征，以及根据关于第一和第二图案特征的相对位置的位置信息来确定至少指示焦点特性的信息 g元素图案特征。

28. 发明授权

US07491478B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07491478B2
公开(公告)日：2009-02-17
申请号：US10897398
申请日：2004-07-23
申请人： Erik Petrus Buurman , Jozef Maria Finders , Alexander Straaijer , J. W. De Klerk
发明人： Erik Petrus Buurman , Jozef Maria Finders , Alexander Straaijer , J. W. De Klerk
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70575 , G03F7/70091
摘要： Control of exposures is based at least in part on the relative contrast loss for a source spectrum and an pattern to be projected or an average absolute detuning of the source.
摘要翻译：曝光的控制至少部分地基于源光谱的相对对比度损失和要投影的图案或源的平均绝对失谐。

29. 发明申请

US20080170215A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20080170215A1
公开(公告)日：2008-07-17
申请号：US12076307
申请日：2008-03-17
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Pechelmus Van Schoot
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Fransiscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Pechelmus Van Schoot
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70333
摘要： In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.

30. 发明授权

US09535341B2 Method for a lithographic apparatus 有权
标题翻译：光刻设备的方法
公开(公告)号：US09535341B2
公开(公告)日：2017-01-03
申请号：US12617855
申请日：2009-11-13
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70641 , G03F7/70125 , G03F7/70308 , G03F7/70591 , G03F7/70891
摘要： A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.
摘要翻译：描述了一种方法，其包括用具有对称照明模式的辐射束照射图案形成装置图案，图案形成装置图案包括基本上衍射辐射束的辐射的第一图案特征，以及基本上不辐射辐射的第二图案特征使用相位调制元件在基本上衍射的辐射中引入相对于光轴的不对称性，用相位调制元件发射的辐射照射辐射束接收元件，以形成与图案形成装置图案，接收元件图案具有分别与第一和第二图案特征相关的第一和第二接收元件图案特征，以及根据关于第一和第二图案特征的相对位置的位置信息来确定至少指示焦点特性的信息 g元素图案特征。

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