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21. 发明授权

US07436502B2 Illumination beam measurement 失效
标题翻译：照明光束测量
公开(公告)号：US07436502B2
公开(公告)日：2008-10-14
申请号：US11236850
申请日：2005-09-28
申请人： Johannes Jacobus Matheus Baselmans , Henricus Jozef Peter Lenders , Dilek Kaya
发明人： Johannes Jacobus Matheus Baselmans , Henricus Jozef Peter Lenders , Dilek Kaya
IPC分类号： G01J1/00
CPC分类号： G01J1/4257 , G01J1/04 , G01J1/0437 , G03F7/70133
摘要： A method of measuring the angular intensity distribution of an illumination beam produced by an illumination system of a lithographic apparatus includes measuring an angular intensity distribution, placing a first optical element above an object plane of the illumination system which causes light therefrom to be deflected in a first direction, and measuring the intensity distribution at said detector, placing a second optical element above said object plane which cases light from said illumination system to be deflected in a second direction, and measuring the intensity distribution at said detector, determining the change in intensity in said first and second directions, and the angular intensity distribution of said illumination beam from the measurements. There is also provided a mask for use in such a method, the mask comprising a plurality of modules, each module comprising a pinhole and an optical element mounted above the pinhole.
摘要翻译：测量由光刻设备的照明系统产生的照明光束的角度强度分布的方法包括测量角度强度分布，将第一光学元件放置在照明系统的物平面上方，从而使光从其偏转到并且测量所述检测器处的强度分布，将第二光学元件放置在所述物平面之上，所述第二光学元件将来自所述照明系统的光沿第二方向偏转，并且测量所述检测器处的强度分布，确定强度变化在所述第一和第二方向上，以及所述照明光束的所述测量的角度强度分布。还提供了一种用于这种方法的掩模，该掩模包括多个模块，每个模块包括针孔和安装在针孔上方的光学元件。

22. 发明申请

US20080218711A1 Lithographic apparatus and device manufacturing method 失效
公开(公告)号：US20080218711A1
公开(公告)日：2008-09-11
申请号：US12073126
申请日：2008-02-29
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F9/7096 , G03F7/70341
摘要： An immersion lithography apparatus is disclosed having a liquid supply system configured to at least partially fill a space between a final element of a projection system and a substrate table, with a first liquid, and a measurement system configured to measure a location of each of a plurality of points on the substrate, the measurement system being arranged such that measurements take place through a second liquid, the second liquid not being supplied by the liquid supply system.

23. 发明授权

US07391503B2 System and method for compensating for thermal expansion of lithography apparatus or substrate 有权
标题翻译：用于补偿光刻设备或基板的热膨胀的系统和方法
公开(公告)号：US07391503B2
公开(公告)日：2008-06-24
申请号：US11257398
申请日：2005-10-25
申请人： Willem Jurrianus Venema , Johannes Jacobus Matheus Baselmans
发明人： Willem Jurrianus Venema , Johannes Jacobus Matheus Baselmans
IPC分类号： G03B27/32 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/70275 , G03F7/70358 , G03F7/70466 , G03F7/70791 , H01L27/1296
摘要： To prevent a substrate from expanding significantly to generate overlay errors an exposure operation takes place in two parts. A first part exposes boundary areas and a second part exposes the larger, bulk areas. In one example, a portion of the substrate is fixed and the substrate is exposed progressively from parts furthest from the fixed portions towards the fixed portion. In another example, a plurality of high velocity scans take place instead of a single slow scan, and the substrate is allowed to cool between the high velocity scans. In another example, a lithographic apparatus is heated in order to maintain a temperature differential between the apparatus and the surrounding environment, and to minimize any fluctuation due to the exposing radiation.
摘要翻译：为了防止基板显着膨胀以产生覆盖误差，曝光操作分为两部分。第一部分暴露了边界区域，第二部分暴露了较大的主体区域。在一个示例中，基板的一部分被固定，并且基板从最远离固定部分的部分向固定部分逐渐曝光。在另一个示例中，发生多个高速扫描而不是单次慢扫描，并且允许衬底在高速扫描之间冷却。在另一示例中，为了保持设备和周围环境之间的温度差，加热光刻设备，并且使由于曝光辐射引起的任何波动最小化。

24. 发明授权

US07379159B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07379159B2
公开(公告)日：2008-05-27
申请号：US10835856
申请日：2004-05-03
申请人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03B27/52 , G03B27/42 , G01N21/86
CPC分类号： G03F9/7034 , G03F7/70341
摘要： A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which levelling and exposure are performed simultaneously.
摘要翻译：在用于浸没式光刻的实施例中的光刻设备和方法被公开在其中同时执行调平和曝光的单个阶段。

25. 发明授权

US07332733B2 System and method to correct for field curvature of multi lens array 有权
标题翻译：用于校正多透镜阵列的场曲率的系统和方法
公开(公告)号：US07332733B2
公开(公告)日：2008-02-19
申请号：US11243180
申请日：2005-10-05
申请人： Laurentius Catrinus Jorritsma , Johannes Jacobus Matheus Baselmans
发明人： Laurentius Catrinus Jorritsma , Johannes Jacobus Matheus Baselmans
IPC分类号： G01N21/86 , G03B27/52 , G03B27/72 , G03B27/32 , G01J3/28 , G01B11/10
CPC分类号： G02B27/0025 , G02B3/0006 , G03F7/2008 , G03F7/70275 , G03F7/70308
摘要： Focal plane errors across the field of an array of focusing elements are reduced by using a non-planar correction surface, shaped such that focal points of the focusing elements lie closer to a single plane than they would if the correction surface were planar. For example, this can be used when an array of focusing elements is used in a projection system of a lithography system.
摘要翻译：通过使用非平面校正表面来减少聚焦元件阵列的焦平面误差，该非平面校正表面被成形为使得聚焦元件的焦点比如果校正表面是平面的那样更靠近单个平面。例如，当在光刻系统的投影系统中使用聚焦元件的阵列时，可以使用这一点。

26. 发明授权

US07304718B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07304718B2
公开(公告)日：2007-12-04
申请号：US10919530
申请日：2004-08-17
申请人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
发明人： Johannes Jacobus Matheus Baselmans , Arno Jan Bleeker , Pieter Willem Herman De Jager , Kars Zeger Troost
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70383 , G03F7/70291
摘要： An array of individually controllable elements, comprising a plurality of control areas consisting of a plurality of rows of reflectors. Alternate rows of reflectors are actuated in a common manner such that the control areas function as a grating to provide a control element that can be used as a diffractive optical element.
摘要翻译：一组可独立控制的元件，包括由多排反射器组成的多个控制区域。交替的反射体行以常见的方式启动，使得控制区域用作光栅，以提供可用作衍射光学元件的控制元件。

27. 发明授权

US07034917B2 Lithographic apparatus, device manufacturing method and device manufactured thereby 失效
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US07034917B2
公开(公告)日：2006-04-25
申请号：US10814822
申请日：2004-04-01
申请人： Johannes Jacobus Matheus Baselmans , Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
发明人： Johannes Jacobus Matheus Baselmans , Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
IPC分类号： G03D27/42
CPC分类号： G03F9/7096 , G03F7/70341
摘要： A substrate is exposed through immersion liquid supplied by a liquid supply system. Prior to being exposed, a map of the surface of the substrate is generated at a measurement station. A liquid supply system fills the space between a measurement system and the substrate so the measurement takes place through liquid.
摘要翻译：通过由液体供应系统供应的浸没液体暴露基板。在曝光之前，在测量台产生基板表面的图。液体供应系统填充测量系统和基板之间的空间，以便通过液体进行测量。

28. 发明授权

US06809797B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，器件制造方法和由此制造的器件
公开(公告)号：US06809797B2
公开(公告)日：2004-10-26
申请号：US10109038
申请日：2002-03-29
申请人： Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Hugo Augustinus Joseph Cramer , Jozef Maria Finders , Carsten Kohler
发明人： Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Hugo Augustinus Joseph Cramer , Jozef Maria Finders , Carsten Kohler
IPC分类号： G02B2768
CPC分类号： G03F7/705 , G03F7/706
摘要： A device manufacturing method is disclosed in which the aberration of the projection system of a lithographic projection apparatus is obtained in terms of the Zernike expansion. The field distribution of displacement error and focal plane distortion of the projected image are calculated on the basis of the Zernike aberration and sensitivity coefficients which quantify the relationship between Zernike aberration components and the error in the image. A calculation is then performed to determine the compensation to apply to the apparatus in order to minimize the error in the image. The compensation is then applied to the apparatus. The compensation may comprise increasing one component of aberration of the apparatus in order to decrease the effect of another aberration, such that, on balance, the image quality as a whole is improved.
摘要翻译：公开了一种装置制造方法，其中光泽投影装置的投影系统的像差取得Zernike扩展。基于Zernike像差和灵敏度系数计算投影图像的位移误差和焦平面失真的场分布，Zernike像差和灵敏度系数量化了Zernike像差分量与图像中的误差之间的关系。然后执行计算以确定应用于装置的补偿，以使图像中的误差最小化。然后将补偿应用于该装置。补偿可以包括增加装置的像差的一个分量，以便减小另一个像差的影响，从而平衡地改善了整体上的图像质量。

29. 发明授权

US08724084B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US08724084B2
公开(公告)日：2014-05-13
申请号：US13189255
申请日：2011-07-22
申请人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
发明人： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Henrikus Herman Marie Cox , Antonius Theodorus Anna Maria Derksen , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Joeri Lof , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Johannes Catharinus Hubertus Mulkens , Gerardus Petrus Mattijs Van Nunen , Klaus Simon , Bernardus Antonius Slaghekke , Alexander Straaijer , Jan-Gerard Cornelis Van Der Toorn , Martijn Houkes
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70425 , G03F7/70525 , G03F7/709
摘要： In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.

30. 发明授权

US08704998B2 Lithographic apparatus and device manufacturing method involving a barrier to collect liquid 有权
标题翻译：平版印刷设备和装置制造方法涉及到采集液体的屏障
公开(公告)号：US08704998B2
公开(公告)日：2014-04-22
申请号：US13012303
申请日：2011-01-24
申请人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
发明人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC分类号： G03B27/52 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
摘要翻译：公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。屏障围绕基板并与衬底间隔开。以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。

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