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    • 22. 发明申请
    • Antistatic agent, antistatic film and articles coated with antistatic film
    • 抗静电剂,抗静电膜和涂有抗静电膜的物品
    • US20070181857A1
    • 2007-08-09
    • US11657550
    • 2007-01-25
    • Ayako NishiokaTakashi Ohkubo
    • Ayako NishiokaTakashi Ohkubo
    • H01B1/12
    • C09K3/16C08L65/00C09D5/24G03F7/093C08L2666/04C08L2666/22C08L2666/26
    • The object of the invention is to provide an antistatic agent exhibiting an excellent property of preventing film-thinning phenomenon and fogging in chemically amplified resists, an antistatic film using the antistatic agent and a product coated therewith.The antistatic agent comprising the water-soluble electroconductive polymer, the solvent and the water-soluble polymer. By using a water-soluble polymer, especially a water-soluble polymer compound having a polypeptide bond or a specific water-soluble polymer compound having a polyvinyl structure in combination with a water-soluble electroconductive polymer in an antistatic agent, influences on resist (such as fogging, film-thinning phenomenons and dissolution of resist after developing of resist) can be suppressed even when surfactant is added into the antistatic agent for the purpose of imparting coatability inexpensively and easily, while maintaining coatability of the agent. An antistatic agent having improved coatability by comprising surfactant may cause mixing, which leads to development defects and changes in the developing time, not only in chemically amplified resist but also in non-chemically amplified resist used for microfabrication.
    • 本发明的目的是提供一种抗静电剂,其具有防止化学放大抗蚀剂中的薄膜化现象和起雾的优异性能,使用该抗静电剂的抗静电膜和涂覆该产品的产品。 包含水溶性导电聚合物,溶剂和水溶性聚合物的抗静电剂。 通过使用水溶性聚合物,特别是具有多肽键的水溶性高分子化合物或具有聚乙烯基结构的特定水溶性高分子化合物与抗静电剂中的水溶性导电聚合物组合,对抗蚀剂(如 即使将表面活性剂添加到抗静电剂中,为了廉价且容易地赋予涂布性,同时保持试剂的涂布性,也可以抑制雾化,薄膜变稀现象和抗蚀剂显影后抗蚀剂的溶解。 通过包含表面活性剂具有改善的涂布性的抗静电剂可能引起混合,这导致显影缺陷和显影时间的变化,不仅在化学增强的抗蚀剂中,而且在用于微细加工的非化学放大抗蚀剂中。
    • 27. 发明授权
    • Method for making lithographic plates using an ink-jet printer
    • 使用喷墨打印机制造平版印刷版的方法
    • US5852975A
    • 1998-12-29
    • US701166
    • 1996-08-21
    • Masamitsu MiyabeTakashi Ohkubo
    • Masamitsu MiyabeTakashi Ohkubo
    • B41J2/015B41C1/10B41N1/14C23F1/00
    • B41C1/1066
    • The present invention provides a lithographic plate material for a hot-melt type ink-jet printer, characterized in that it comprises an image receiving layer provided on a surface of a flexible plastic film, the image receiving layer being receptive of hot-melt compounds constituting a hot-melt type ink. The image receiving layer, preferably, comprises at least a polymer binder, a pigment becoming hydrophilic upon etching with an etching solution and one or more pigments for imparting unevenness to the surface of the layer. This lithographic plate material is made into a lithographic plate by using the hot-melt type ink-jet printing system. By using this printing system, occurrence of unwanted background image can be completely prevented because there is no possibility of scattering of toner due to electrostatic charging upon peeling.
    • 本发明提供了一种用于热熔型喷墨打印机的平版印刷版材料,其特征在于,其包括设置在柔性塑料膜的表面上的图像接收层,该图像接收层接受构成的热熔化合物 热熔型墨水。 图像接收层优选至少包含聚合物粘合剂,在用蚀刻溶液蚀刻时变得亲水的颜料和用于赋予层的表面不均匀性的一种或多种颜料。 该平版印刷版材料通过使用热熔型喷墨打印系统制成平版印刷版。 通过使用该打印系统,可以完全防止出现不想要的背景图像,因为剥离时由于静电充电而不可能散布调色剂。
    • 29. 发明申请
    • METHOD FOR IMPROVING SENSITIVITY OF RESIST
    • 提高耐药敏感性的方法
    • US20110143283A1
    • 2011-06-16
    • US13059877
    • 2009-08-20
    • Hirofumi OhkiAyako NishiokaTakashi Ohkubo
    • Hirofumi OhkiAyako NishiokaTakashi Ohkubo
    • G03F7/20
    • G03F7/093G03F7/0757G03F7/168G03F7/2059Y10S430/143
    • It is an object of the present invention to improve sensitivity of a resist made from hydrosilsesquioxane when a pattern is formed in the resist by irradiation with a charged particle beam. The method for improving sensitivity of a resist of the present invention is a method to improve sensitivity of a resist formed from hydrosilsesquioxane to a charged particle beam when a pattern is formed in the resist by irradiation with a charged particle beam, and is characterized by including prebaking a resist formed from hydrosilsesquioxane and applied onto a substrate at t° C. (20≦t≦300), applying a composition containing a water-soluble conductive polymer compound to a charged particle beam irradiation surface of the prebaked resist, baking the thus applied composition at T° C. (0≦T
    • 本发明的目的是提高当用带电粒子束照射在抗蚀剂中形成图案时由氢硅倍半氧烷制成的抗蚀剂的灵敏度。 提高本发明的抗蚀剂的灵敏度的方法是当通过照射带电粒子束在抗蚀剂中形成图案时,提高由氢化硅倍半氧烷形成的抗蚀剂对带电粒子束的敏感性的方法,其特征在于包括 预烘烤由氢化倍半硅氧烷形成的抗蚀剂,并在t℃(20℃和100℃; 300℃)下涂布在基材上,将含有水溶性导电聚合物化合物的组合物涂布到预焙抗蚀剂的带电粒子束照射表面上, (0≦̸ T