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    • 23. 发明专利
    • OPTOELECTRONIC TRANSDUCER
    • JPS63233574A
    • 1988-09-29
    • JP6563487
    • 1987-03-23
    • HITACHI LTDJAPAN BROADCASTING CORP
    • TAKASAKI YUKIOTSUJI KAZUTAKAMAKISHIMA TATSUOHIRAI TADAAKIISHIOKA YOSHIOKAWAMURA TATSUROSHIDARA KEIICHIHIRUMA SHIGEHISATANIOKA KENKICHIYAMAZAKI JUNICHI
    • H01L31/107H01L31/0248H01L31/08H01L31/10
    • PURPOSE:To increase the gain of photoelectric conversion larger than one and to make an optical response characteristic excellent, by causing charge multiplying action in an amorphous semiconductor layer, in which a compound of silicon and carbon including one of a hydrogen or halogen element is a main body, at a part of a photoconductive layer. CONSTITUTION:An electrode 2, whose main body is Cr, is formed on a semi-insulating semiconductor substrate 1. An a-SiN:H film having a thickness of 10 nm is deposited as a hole injection blocking layer 3 on the electrode 2. Then, as a photoconductive layer, an a-Si80C20:H film having a thickness of 0.5-10mum is deposited. Then, as an electron injection blocking layer, a thin silicon oxide film is deposited to a thickness of 8 nm. A transparent electrode 6, whose main body is tin oxide, is formed. An electric field, which causes avalanche multiplication in an amorphous semiconductor layer, is applied. When light is projected from the side of a light transmitting film, the incident light is absorbed in the photoconductive layer including the amorphous semiconductor layer, and electron-hole pairs are generated. Said pairs run in the reverse direction determined by the direction of the applied voltage. Therefore, the thickness of the amorphous layer and the direction of the electric field are set so that the electric field multiplying action occurs effectively when the electric charge having a high ionization rate runs in the amorphous layer under the high electric field within the adopted amorphous material.
    • 26. 发明专利
    • IMAGE INPUT DEVICE
    • JPH08265645A
    • 1996-10-11
    • JP6554495
    • 1995-03-24
    • HITACHI LTD
    • NAKANO YASUSHITSUJI KAZUTAKAMAKISHIMA TATSUO
    • H04N5/32H04N5/335H04N5/353H04N5/355H04N5/378H04N7/18
    • PURPOSE: To obtain image information having a wider dynamic range than a dynamic range of a single image pickup element as a signal of an image by synthesizing plural signals obtained under different sensitivity setting conditions with one and same image pickup element. CONSTITUTION: In the image input device, an incident light 101 is converted into an electric signal by an accumulation image pickup element 102 using charge amplification in the inside of a semiconductor such as avalanche phenomenon. The sensitivity of the image pickup element 102 is variable by a sensitivity controller 103. A signal correction device 104 decides an output signal level for each picture element proportional to an incident luminous quantity based on an output of the image pickup element 102 and the sensitivity setting condition of the sensitivity controller 103 and stores it to a frame memory 105. Then signals obtained by picking up an object under different sensitivity setting conditions are synthesized by an image processing circuit 106 to form a video signal by one picture element and the signal is outputted to a monitor 107 and a storage device 108 or the like.
    • 30. 发明专利
    • IMAGE PICKUP TUBE TARGET
    • JPS63174245A
    • 1988-07-18
    • JP486987
    • 1987-01-14
    • HITACHI LTDJAPAN BROADCASTING CORP
    • ISHIOKA YOSHIOTAKASAKI YUKIOTSUJI KAZUTAKAMAKISHIMA TATSUOYAMASHITA TAKASHIKAWAMURA TATSUROTANIOKA KENKICHIAIBA MASAAKI
    • H01J29/45
    • PURPOSE:To obtain the low afterimage and high resolution and improve sensitivity by applying the electric field multiplying charges in a semiconductor layer to a photoconductive target having a blocking type structure and operating it at the preset temperature or below. CONSTITUTION:The electric field is applied to a pickup tube target having a translucent substrate 1, a transparent conductive film 2, an amorphous Se photoconductive layer 4, and an electron injection blocking layer 5 as basic portions with a preset signal current. Under this condition, when the light is radiated from the glass substrate side, most of the incident light is absorbed mainly by the transparent electrode side of the amorphous Se layer to generate a pair of electrons and positive holes. Among them, electrons run to the transparent electrode side, and posive holes run to the electron injection blocking layer through the amorphous Se layer. Therefore, a charge multiplying action occurs when the positive holes run through the amorphous Se layer in the high electric field, if the amorphous is made thick enough to get the desired characteristic, electric charges are multiplied, and high sensitivity having a gain larger than 1 can be obtained, with the low-afterimage property of a blocking type target maintained. Furthermore, if the temperature of the target is made 40 deg.C or below, highlight burning is quickly eliminated, and a good image can be obtained.