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21. 发明专利

JPH01184823A PROJECTING AND EXPOSING DEVICE 失效
公开(公告)号：JPH01184823A
公开(公告)日：1989-07-24
申请号：JP473088
申请日：1988-01-14
申请人： HITACHI LTD
发明人： KANEKO NORIO
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30
摘要： PURPOSE:To suppress the amount of fuzz of the transfer image on the wafer of a masking blade and to cut down the cost of a reticle by a method wherein the masking blade is brought close to the reticle as much as possible when an exposure and transfer operation is conducted on a circuit pattern. CONSTITUTION:The reticle 2 attracted to reticle chuck is illuminated by an optical system of illumination, and it is transferred to a wafer through the intermediary of a projecting lens 4. A plurality of guides 7 are provided between the column 5 supporting the chuck 1 and the flange 6 supporting the optical system 3, and a masking blade system 8 is moved up and down along the guides 7. Four masking blades 9 are built-in in the system 8. A shifting mechanism 10, with which the entire system 8 will be moved up and down, is formed by a pulley or a gear and a motor, and its movement is controlled by the instructions given by a computer. As a result, the degree of fuzz of the transferred image on the wafer of the blade 9 can be suppressed low, and the cost of the reticle 2 can be cut down.

22. 发明专利

JPS6449227A STEPPER 失效
公开(公告)号：JPS6449227A
公开(公告)日：1989-02-23
申请号：JP20600587
申请日：1987-08-19
申请人： HITACHI LTD
发明人： KANEKO NORIO
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68
摘要： PURPOSE:To make corrections following the change of environmental conditions by a method wherein an X-Y stage aligning light axis moving apparatus is so controlled as to make a reference pattern detection value conform to a 1st reference by a focus adjusting and controlling means. CONSTITUTION:A reference pattern is lit by a lighting source provided in a pattern detection optical system 9 and its image is projected and focused onto the original picture of a reticle 11 through a contraction lens 10. The reference pattern image and a reticle window pattern are enlarged together by the optical system 9 and re-forcused on a photosensor 13. The output signal of the sensor 13 is digitized by an A/D converter 14 and introduced to a computer system 15. The reticle 11 can be moved along the Z-direction by a mechanism 16 and a motor 17. The moved distance is detected by an encoder 18. With this constitution, correction following the change of environmental conditions can be made.

23. 发明专利

JPS60189935A Projecting exposure device 失效
标题翻译：投影曝光装置
公开(公告)号：JPS60189935A
公开(公告)日：1985-09-27
申请号：JP4674184
申请日：1984-03-12
申请人： Hitachi Ltd
发明人： KANEKO NORIO , SASE YOSHIMITSU , KURIMOTO KOUZOU , MATSUMOTO KOUICHI
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/70
摘要： PURPOSE:To enable positioning and the baking of a circuit pattern by beams different from exposure wavelength by inserting one or a plurality of optical systems compensating the chromatic aberration of a projection lens such as a compensating lens into luminous flux for aligning a mark and changing over them. CONSTITUTION:A compensating lens optical system 10 is inserted into luminous flux 8 for mark alignment for aligning a wafer target mark 2b on a wafer 2 with a reticle target mark 6b on a reticle 6. Compensating lenses are manufactured so that the wafer target mark 2b is image-formed accurately to a section in the vicinity of the upper section of the reticle target mark 6b through a projection lens 3 to a wavelength for mark alignment, and arranged so as not to be superposed on luminous flux 5 for baking a circuit pattern. The compensating lenses 11 and 12 are fixed to the compensating lens optical system 10, and a hole 15 in size in which luminous flux for mark alignment can pass without being interrupted is formed.
摘要翻译：目的：通过将补偿透镜等投影透镜的像差补偿的一个或多个光学系统插入用于对准标记和切换的光通量，以使得能够通过不同于曝光波长的光束对电路图案进行定位和烘烤他们。构成：将补偿透镜光学系统10插入用于标记对准的光束8中，用于将晶片2上的晶片靶标记2b与标线片6上的标线标靶6b对准。补偿透镜被制造成使得晶片靶标记2b 通过投影透镜3对标线对准标记6b的上部附近的截面进行图像形成，成为标记对准的波长，并且配置成不重叠在用于烘烤电路图案的光束5上。补偿透镜11和12固定到补偿透镜光学系统10，并且形成尺寸的孔15，其中用于标记对准的光通量可以不中断地通过。

24. 发明专利

JPS599525A Temperature controlling device 失效
标题翻译：温度控制装置
公开(公告)号：JPS599525A
公开(公告)日：1984-01-18
申请号：JP11673282
申请日：1982-07-07
申请人： Hitachi Ltd
发明人： KANEKO NORIO , MINAGAWA SADAO
IPC分类号： G01J5/10 , G05D23/20 , G05D23/24
CPC分类号： G05D23/24 , G05D23/1919
摘要： PURPOSE:To make it possible to perform highly stabilized temperature control, by utilizing functional relationship of the temperature and the resistance value of a temperature sensitive element, and making it possible to perform control and detection by one element. CONSTITUTION:When the value of an arbitrary temperature is set by an input part 5, the resistance value corresponding to the temperature value is computed by a function operator 6. Said resistance value and the actual resistance value of a thermistor 4 are inputted to a differential operator 7. A current is supplied to a Peltier element 3 through a control circuit 8 so that the difference between said resistance values becomes zero. The actual resistance value of the thermistor 4 is obtained by a constant current circuit 9 and an A/D converter 10, which converts the voltage output of the circuit 9 into a digital quantity. A feedback loop of l4 9 10 7 8 4 is operated until the balance to the preset temperature is obtained. The resistance value of the thermistor 4 ( the output of the A/D converter 10) is directly converted into the temperature by a function operator 11. Thus the highly stabilized temperature control can be performed.
摘要翻译：目的：通过利用温度和温度敏感元件的电阻值的功能关系，可以进行高度稳定的温度控制，并且可以通过一个元件进行控制和检测。构成：当通过输入部5设定任意温度的值时，通过功能运算器6计算与温度值对应的电阻值。将热敏电阻4的所述电阻值和实际电阻值输入到差分电流通过控制电路8提供给珀耳帖元件3，使得所述电阻值之间的差变为零。热敏电阻4的实际电阻值是通过将电路9的电压输出转换为数字量的恒流电路9和A / D转换器10来获得的。操作l4 9 10 7 8 4的反馈回路，直到获得与预设温度的平衡为止。热敏电阻4的电阻值（A / D转换器10的输出）通过功能运算器11直接转换为温度。因此，可以进行高度稳定的温度控制。

25. 发明专利

JPS57197448A ANALYSIS TREATING SYSTEM OF SPECTROPHOTOMETER 失效
公开(公告)号：JPS57197448A
公开(公告)日：1982-12-03
申请号：JP8095681
申请日：1981-05-29
申请人： HITACHI LTD
发明人： KOMATSU HITOSHI , KANEKO NORIO , YOSHIDA KASUMI , SUZUKI TADASHI
IPC分类号： G01N21/01 , G01N21/25
摘要： PURPOSE:To simplify a change of analizing items and to obtain a measuring result with high accuracy with a small amount of sample, by dividng several functioning parts into blocks and enabling to remove each block. CONSTITUTION:A spectrophotometer 1 is provided with a zipper mechanism 3 which conducts a sample in a spectrophotometer 1 and an analysis treating part 4 which operates an analysis of a conducted sample and treats data by CRT conversational system. The spectrophotometer 1 is placed removably on the upper part of the part 4, and a cell chamber 2 of the meter 1 has a cap 7 which is able to open and close at its upper part, and has a take-out hole of a sample conducting pipe of flow-cell at the lower part of the chamber 2, and the mechanism 3 disposed right under the hole is connected with the flow-cell conducting pipe.

26. 发明专利

JPS54123085A SPECTROPHOTOMETER 失效
公开(公告)号：JPS54123085A
公开(公告)日：1979-09-25
申请号：JP2992978
申请日：1978-03-17
申请人： HITACHI LTD
发明人： KOMATSU HITOSHI , KANEKO NORIO
IPC分类号： G01J3/18 , G01J3/02 , G01J3/42
摘要： PURPOSE:To give an optical system having little stray light to a photometer having vertically split slits by shifting been light incident upon a concave diffraction grating out of the direct incident point, while imparting fine rotations to the grating, so that the light of zero order is shifted from the slit. CONSTITUTION:The light from a lamp 1 is divided by a split lens 2 into two beams, which are guided through sample reference calls 3 and 4 and a holed slit 5 having vertically split portions into a photometer chamber. The respective beams are dispersed by a concave diffraction grating 6 and are reflected by a mirror 9 so that the absorptivity is metered by a detector 7. At this time, the grating 6 is slightly turned, as shown in arrow, to return the light of zero order onto the surface of the slit 5 thereby to eliminate the reflections at the end faces of the cells 3 and 4. The portion of the zero order light returned is further guided into an optical trap 8 to prevent the stary light due to the random reflections at the slit 5 so that a spectrophotometer having little stray light can be produced without deteriorating the brightness of the photometer.

27. 发明专利

JPS51146197A PHOTOOELECTRIC INVERTER 失效
公开(公告)号：JPS51146197A
公开(公告)日：1976-12-15
申请号：JP6435175
申请日：1975-05-30
申请人： HITACHI LTD
发明人： TANNO KIYOHIKO , FUKUDA KENJI , INOUE TSUYOSHI , KANEKO NORIO
IPC分类号： H04N1/028 , G06K7/10 , G06T1/00 , H01L31/02 , H01L31/16
摘要： PURPOSE:A photo-electric inverter, that efficiently inverts necessary informations contained in video information source to photo-electric current.

28. 发明专利

JPH06232033A SIMULATED OPERATING DEVICE 失效
公开(公告)号：JPH06232033A
公开(公告)日：1994-08-19
申请号：JP1523993
申请日：1993-02-02
申请人： HITACHI LTD
发明人： OKAMOTO YOSHIHIKO , SHIBATA YUKINOBU , TAKADA IKUO , KANEKO NORIO
IPC分类号： H01L21/027
摘要： PURPOSE:To reduce the misoperation of a semiconductor manufacturing device by providing a central processing section which controls the simulated operations of the manufacturing device based on a control program, input section which designates the contents of the simulated operations of the manufacturing device, and output device which displays the state of the simulated operations. CONSTITUTION:A CPU 4 reads the picture and character information corresponding to the processing state of a dummy load file section 2 for devices to be controlled through a system bus 7 based on a command from a control program read from a control file section 3 and outputs the read information to the control screen of an output device 5. When an operator makes such an operation that may result in a trouble when the operator operates an electron beam plotting device in a simulated state, the pattern of an alarm lamp, etc., is displayed on an abnormality displaying section and, at the same time, the pattern is blinked in yellow, red, etc. Therefore, the operator can easily identifies the misoperation.

29. 发明专利

JPH0548931B2 失效
公开(公告)号：JPH0548931B2
公开(公告)日：1993-07-22
申请号：JP20600587
申请日：1987-08-19
申请人： HITACHI LTD
发明人： KANEKO NORIO
IPC分类号： H01L21/30 , G03F7/20 , G03F9/00 , H01L21/027 , H01L21/68

30. 发明专利

JPH04302133A SPECIMEN POSITION MEASURING DEVICE IN ELECTRON BEAM EXPOSURE SYSTEM 失效
公开(公告)号：JPH04302133A
公开(公告)日：1992-10-26
申请号：JP6597391
申请日：1991-03-29
申请人： HITACHI LTD
发明人： MATSUOKA GENYA , OSHIDA YOSHITADA , IWASAKI TERUO , KANEKO NORIO
IPC分类号： H01L21/027
摘要： PURPOSE:To make the measurements with high precision in relation to the title specimen position measuring device. CONSTITUTION:A circuit 220 correcting the measurement results and a correction data storing circuit 221 are made so as to correct the measurement results depending upon the specimen surface state. The measurement is made with high precision by irradiating the specimen surface with multiple beams or by changing the incident light by the irradiation. Furthermore, the effects such as the multiple interference in the resist coated on a specimen, the irrgular reflection of irradiated beams by fine patterns can be minimized thereby enabling the reliable specimen position measurement to be made with high precision.

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