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21. 发明授权

US08110815B2 Vapor delivery to devices under vacuum 失效
标题翻译：在真空下蒸气输送到设备
公开(公告)号：US08110815B2
公开(公告)日：2012-02-07
申请号：US12299702
申请日：2007-06-11
申请人： Frank Sinclair , Douglas R. Adams , Brent M. Copertino
发明人： Frank Sinclair , Douglas R. Adams , Brent M. Copertino
IPC分类号： H01J37/08
CPC分类号： C23C14/48 , C23C14/228 , H01J37/02 , H01J37/32412 , H01J2237/006 , H01J2237/022 , H01J2237/08 , H01J2237/31701
摘要： Providing vapor to a vapor-receiving device housed in a high vacuum chamber. An ion beam implanter, as an example, has a removable high voltage ion source within a high vacuum chamber and a vapor delivery system that delivers vapor to the ion source and does not interfere with removal of the ion source for maintenance. For delivering vapor to a vapor-receiving device, such as the high voltage ion source under vacuum, a flow interface device is in the form of a thermally conductive valve block. A delivery extension of the interface device automatically connects and disconnects within the high vacuum chamber with the removable vapor receiving device by respective installation and removal motions. In an ion implanter, the flow interface device or valve block and source of reactive cleaning gas are mounted in a non-interfering way on the electrically insulating bushing that insulates the ion source from the vacuum housing and the ion source may be removed without disturbing the flow interface device. Multiple vaporizers for solid material, provisions for reactive gas cleaning, and provisions for controlling flow are provided in the flow interface device.
摘要翻译：向容纳在高真空室中的蒸汽接收装置提供蒸汽。作为示例，离子束注入机在高真空室内具有可移除的高电压离子源，以及将蒸气输送到离子源并且不干扰离子源的去除以进行维护的蒸气输送系统。为了将蒸汽输送到蒸汽接收装置，例如在真空下的高压离子源，流动接口装置是导热阀块的形式。接口设备的传送延伸部通过相应的安装和移除动作，利用可移除的蒸气接收装置自动地在高真空室内连接和断开。在离子注入机中，流动界面装置或阀块和反应性清洁气体源以非干扰的方式安装在电绝缘衬套上，该电绝缘衬套使离子源与真空壳体绝缘，并且离子源可被去除而不会干扰流接口设备。在流体接口装置中提供了用于固体材料的多个蒸发器，用于反应性气体清洁的设备和用于控制流量的设备。

22. 发明授权

US08064071B2 Floating sheet measurement apparatus and method 有权
标题翻译：浮动片测量装置及方法
公开(公告)号：US08064071B2
公开(公告)日：2011-11-22
申请号：US12403200
申请日：2009-03-12
申请人： Christopher A. Rowland , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P. T. Bateman
发明人： Christopher A. Rowland , Peter L. Kellerman , Frank Sinclair , Julian G. Blake , Nicholas P. T. Bateman
IPC分类号： G01B11/14
CPC分类号： G01B21/12
摘要： A sheet measurement apparatus has a sheet disposed in a melt. The measurement system uses a beam to determine a dimension of the sheet. This dimension may be, for example, height or width. The beam may be, for example, collimated light, a laser, x-rays, or gamma rays. The production of the sheet may be altered based on the measurements.
摘要翻译：片材测量装置具有设置在熔体中的片材。测量系统使用光束来确定纸张的尺寸。该尺寸可以是例如高度或宽度。光束可以是例如准直光，激光，X射线或γ射线。可以基于测量来改变片材的生产。

23. 发明申请

US20110240847A1 TRANSMISSION ENERGY CONTAMINATION DETECTOR 有权
标题翻译：传输能源污染检测器
公开(公告)号：US20110240847A1
公开(公告)日：2011-10-06
申请号：US12750893
申请日：2010-03-31
申请人： Frank Sinclair
发明人： Frank Sinclair
IPC分类号： H01J49/00
CPC分类号： H01J37/244 , H01J37/304 , H01J37/3171 , H01J2237/24507 , H01J2237/24585 , H01J2237/30472 , H01J2237/31703
摘要： An energy contamination detection apparatus includes a membrane and a charge collection plate disposed at a distance from the membrane. The membrane is configured to receive an ion beam and allow a portion of the ion beam having energy levels above a desired energy level to pass therethrough toward the charge collection plate and absorb or reflect portions of the ion beam having energy levels at or below the desired energy level. A voltage source is electrically coupled to the charge collection plate for providing a bias voltage to the charge collection plate. A detection circuit is coupled to the charge collection plate and is configured to detect energy contamination based on an amount of charge collected on the charge collection plate.
摘要翻译：能量污染检测装置包括设置在与膜隔开一定距离处的膜和电荷收集板。膜被配置为接收离子束并且允许具有高于期望能级的能量级的一部分离子束通过其中朝向电荷收集板，并吸收或反射具有等于或低于期望值的能级的离子束的部分能级。电压源电耦合到电荷收集板，用于向电荷收集板提供偏置电压。检测电路耦合到电荷收集板，并且被配置为基于在电荷收集板上收集的电荷量来检测能量污染。

24. 发明申请

US20110114849A1 SYSTEM AND METHOD FOR MANIPULATING AN ION BEAM 有权
标题翻译：用于操纵离子束的系统和方法
公开(公告)号：US20110114849A1
公开(公告)日：2011-05-19
申请号：US12944537
申请日：2010-11-11
申请人： Frank Sinclair , Victor M. Benveniste , Svetlana Radovanov , James S. Buff
发明人： Frank Sinclair , Victor M. Benveniste , Svetlana Radovanov , James S. Buff
IPC分类号： H01J1/50
CPC分类号： H01J37/3171 , H01J37/153 , H01J2237/1532
摘要： A system for manipulating an ion beam having a principal axis includes an upper member having a first and a second coil generally disposed in different regions of the upper member and configured to conduct, independently of each other, a first and a second current, respectively. A lower member includes a third and a fourth coil that are generally disposed opposite to respective first and second coils and are configured to conduct, independently of each other, a third and a fourth current, respectively. A lens gap is defined between the upper and lower members, and configured to transmit the ion beam, wherein the first through fourth currents produce a 45 degree quadrupole field that exerts a rotational force on the ion beam about its principal axis.
摘要翻译：用于操纵具有主轴的离子束的系统包括具有通常设置在上部构件的不同区域中的第一和第二线圈的上部构件，并且被配置为分别彼此独立地导通第一和第二电流。下部构件包括通常与相应的第一和第二线圈相对设置的第三和第四线圈，并且被配置为分别彼此导通第三和第四电流。在上部和下部构件之间限定透镜间隙，并且构造成透射离子束，其中第一至第四电流产生45度的四极场，其在离子束的主轴上施加旋转力。

25. 发明申请

US20100221142A1 REMOVAL OF A SHEET FROM A PRODUCTION APPARATUS 有权
标题翻译：从生产设备中取出一张纸
公开(公告)号：US20100221142A1
公开(公告)日：2010-09-02
申请号：US12580719
申请日：2009-10-16
申请人： Peter L. KELLERMAN , Frederick Carlson , Frank Sinclair
发明人： Peter L. KELLERMAN , Frederick Carlson , Frank Sinclair
IPC分类号： C22C28/00 , C30B11/02 , C01B33/021 , C01B33/06 , C01B21/06 , B28B13/00
CPC分类号： C30B11/003 , C30B11/001 , C30B28/06 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/403 , C30B29/64 , H01L31/182 , Y02E10/546 , Y02P70/521 , Y10S588/90 , Y10T117/1024 , Y10T117/1092
摘要： A melt of a material is cooled and a sheet of the material is formed in the melt. This sheet is transported, cut into at least one segment, and cooled in a cooling chamber. The material may be Si, Si and Ge, Ga, or GaN. The cooling is configured to prevent stress or strain to the segment. In one instance, the cooling chamber has gas cooling.
摘要翻译：将材料的熔体冷却，并在熔体中形成一片材料。将该片材运输，切割成至少一个片段，并在冷却室中冷却。该材料可以是Si，Si和Ge，Ga或GaN。冷却配置为防止应力或应变。在一种情况下，冷却室具有气体冷却。

26. 发明申请

US20100184243A1 MASK APPLIED TO A WORKPIECE 失效
标题翻译： MASK应用于工作
公开(公告)号：US20100184243A1
公开(公告)日：2010-07-22
申请号：US12689605
申请日：2010-01-19
申请人： Russell J. LOW , Julian G. Blake , Frank Sinclair
发明人： Russell J. LOW , Julian G. Blake , Frank Sinclair
IPC分类号： H01L31/18 , C23C14/48 , C23C16/44 , B05D3/00
CPC分类号： H01L31/18 , C23C14/042 , C23C14/48
摘要： A method of fabricating a workpiece is disclosed. A material defining apertures is applied to a workpiece. A species is introduced to the workpiece through the apertures and the material is removed. For example, the material may be evaporated, may form a volatile product with a gas, or may dissolve when exposed to a solvent. The species may be introduced using, for example, ion implantation or gaseous diffusion.
摘要翻译：公开了一种制造工件的方法。将定义孔的材料施加到工件上。通过孔将物质引入工件，并且去除材料。例如，该材料可能被蒸发，可能与气体形成挥发性产物，或者当暴露于溶剂时可能会溶解。可以使用例如离子注入或气体扩散来引入物种。

27. 发明申请

US20090124066A1 PARTICLE BEAM ASSISTED MODIFICATION OF THIN FILM MATERIALS 有权
公开(公告)号：US20090124066A1
公开(公告)日：2009-05-14
申请号：US12269344
申请日：2008-11-12
申请人： Jonathan G. ENGLAND , Frank Sinclair , John (Bon-Woong) Koo , Rajesh Dorai , Ludovic Godet
发明人： Jonathan G. ENGLAND , Frank Sinclair , John (Bon-Woong) Koo , Rajesh Dorai , Ludovic Godet
IPC分类号： H01L21/20
CPC分类号： H01L21/02689 , C30B1/023 , C30B29/06 , H01L21/0237 , H01L21/02422 , H01L21/02532 , H01L21/268 , H01L31/0747 , H01L31/182 , H01L31/202 , Y02E10/546 , Y02P70/521
摘要： Several examples of a method for processing a substrate are disclosed. In a particular embodiment, the method may include: disposing a substrate having an upper surface and a lower surface on a platen contained in a chamber; generating a plasma containing a plurality of charged particles above the upper surface of the substrate, the plasma having a cross sectional area equal to or greater than a surface area of the upper surface of the substrate; applying a first bias voltage to the substrate to attract the charged particles toward the upper surface of the substrate; introducing the charged particles to a region extending under entire upper surface of the substrate; and initiating, concurrently, a first phase transformation in the region from the amorphous phase to a crystalline phase.

28. 发明申请

US20090121122A1 TECHNIQUES FOR MEASURING AND CONTROLLING ION BEAM ANGLE AND DENSITY UNIFORMITY 审中-公开
标题翻译：测量和控制离子束角度和密度均匀性的技术
公开(公告)号：US20090121122A1
公开(公告)日：2009-05-14
申请号：US11939173
申请日：2007-11-13
申请人： Peter L. Kellerman , Kenneth Purser , Svetlana Radovanov , Victor M. Benveniste , Frank Sinclair , John Slocum
发明人： Peter L. Kellerman , Kenneth Purser , Svetlana Radovanov , Victor M. Benveniste , Frank Sinclair , John Slocum
IPC分类号： H01J37/08 , G01D18/00
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/024 , H01J2237/24405 , H01J2237/24507 , H01J2237/24528 , H01J2237/30472 , H01J2237/31703
摘要： Techniques for measuring and controlling ion beam angle and density uniformity are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for measuring and controlling ion beam angle and density uniformity. The apparatus may include a measuring assembly having an opening, a cup, and at least one collector at the rear of the cup. The apparatus may further include an actuator to move the measuring assembly along an actuation path to scan an ion beam to measure and control ion beam uniformity.
摘要翻译：公开了用于测量和控制离子束角度和密度均匀性的技术。在一个特定的示例性实施例中，技术可以被实现为用于测量和控制离子束角度和密度均匀性的装置。该装置可以包括具有开口，杯子和在杯后部的至少一个收集器的测量组件。该装置还可以包括致动器，以沿着致动路径移动测量组件以扫描离子束以测量和控制离子束均匀性。

29. 发明申请

US20090095894A1 TECHNIQUES FOR COMMENSURATE CUSP-FIELD FOR EFFECTIVE ION BEAM NEUTRALIZATION 有权
标题翻译：用于有意义的离子束中和的通用现场技术
公开(公告)号：US20090095894A1
公开(公告)日：2009-04-16
申请号：US11872576
申请日：2007-10-15
申请人： Bon Woong Koo , Frank Sinclair
发明人： Bon Woong Koo , Frank Sinclair
IPC分类号： H05H3/02
CPC分类号： H01J37/026 , H01J37/3171 , H01J2237/0042 , H01J2237/04 , H01J2237/05
摘要： Techniques for commensurate cusp-field for effective ion beam neutralization are disclosed. In one particular exemplary embodiment, the techniques may be realized as a charged particle injection system comprising a beamguide configured to transport an ion beam through a dipole field. The charged particle injection system may also comprise a first array of magnets and a second array of magnets configured to generate a multi-cusp magnetic field, positioned along at least a portion of an ion beam path, the first array of magnets being on a first side of the ion beam path and the second array of magnets being on a second side of the ion beam path. The charged particle injection system may further comprise a charged particle source having one or more apertures configured to inject charged particles into the ion beam path. The charged particle injection system may furthermore align the one or more apertures with at least one of the first array of magnets and the second array of magnets to align the injected charged particles from the charged particle source with one or more magnetic regions for an effective charged particle diffusion into the ion beam path.
摘要翻译：公开了用于有效离子束中和的相应尖点的技术。在一个特定的示例性实施例中，技术可以被实现为带电粒子注入系统，其包括配置成将离子束传送通过偶极子场的波导。带电粒子注入系统还可以包括第一磁体阵列和配置成产生沿离子束路径的至少一部分定位的多尖点磁场的第二磁体阵列，第一磁体阵列位于第一离子束路径的一侧和第二磁体阵列位于离子束路径的第二侧上。带电粒子注入系统还可以包括具有一个或多个孔的带电粒子源，其被配置为将带电粒子注入到离子束路径中。带电粒子注入系统还可以将一个或多个孔与第一磁体阵列和第二磁体阵列中的至少一个对准，以将来自带电粒子源的注入的带电粒子与一个或多个磁性区域对准，用于有效带电粒子扩散入离子束路径。

30. 发明申请

US20090078883A1 TECHNIQUES FOR OPTICAL ION BEAM METROLOGY 有权
标题翻译：光离子束计量技术
公开(公告)号：US20090078883A1
公开(公告)日：2009-03-26
申请号：US11859219
申请日：2007-09-21
申请人： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
发明人： Alexander S. Perel , Wilhelm Platow , Craig Chaney , Frank Sinclair , Tyler Rockwell
IPC分类号： G21K1/00
CPC分类号： H01J37/3171 , H01J37/244 , H01J37/304 , H01J2237/2445 , H01J2237/24507 , H01J2237/24542 , H01J2237/2482 , H01J2237/30472
摘要： Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.
摘要翻译：公开了提供光学离子束计量的技术。在一个特定的示例性实施例中，技术可以被实现为用于控制光束密度分布的装置，该装置可以包括一个或多个相机系统以捕获离子束的至少一个图像和耦合到一个或多个相机的控制系统用于控制离子束的束密度分布的系统。控制系统还可以包括剂量分析器，以在反馈环路和前馈环路中的至少一个中向一个或多个离子注入组件提供信息，以改善剂量和角度均匀性。

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