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    • 26. 发明授权
    • Method for triggering a regeneration event in a particulates filter of an internal combustion engine
    • 用于在内燃机的微粒过滤器中触发再生事件的方法
    • US07930880B2
    • 2011-04-26
    • US12011535
    • 2008-01-28
    • John D. WilliamsTanto SugiartoThomas M. HarrisGeorge N. Simopoulos
    • John D. WilliamsTanto SugiartoThomas M. HarrisGeorge N. Simopoulos
    • F01N3/00
    • F01N3/023
    • A method for triggering a new regeneration event in a soot-trapping particulates filter disposed in an exhaust gas stream of an internal combustion engine, comprising the steps of determining instantaneous engine speed and engine load; determining instantaneous mass fractions for wet soot and for dry soot in the exhaust gas stream for the instantaneous engine speed and load; determining instantaneous concentrations of wet and dry soot particles in the exhaust gas; determining the rates of accumulation of wet soot and dry soot in the particulates filter; determining the total amounts of wet soot and dry soot accumulated in said soot-trapping device during all engine operation conditions since the latest previous regeneration event; and triggering the new regeneration event when the total amount of wet soot and dry soot exceeds a permissible value.
    • 一种用于在布置在内燃机的废气流中的烟尘捕集微粒过滤器中触发新的再生事件的方法,包括以下步骤:确定瞬时发动机转速和发动机负荷; 确定用于瞬时发动机转速和负载的废烟气中的湿煤烟和干煤烟的瞬时质量分数; 确定废气中湿和干烟灰颗粒的瞬时浓度; 确定颗粒过滤器中湿烟灰和干烟灰的积累速率; 确定在所述发动机运行条件之后所述烟灰捕集装置中累积的湿烟灰和干烟灰的总量,因为最近的先前再生事件; 并且当湿烟灰和干烟灰的总量超过允许值时触发新的再生事件。
    • 27. 发明授权
    • Method to fabricate a tilted logpile photonic crystal
    • 制造倾斜对数光子晶体的方法
    • US07820365B1
    • 2010-10-26
    • US11779605
    • 2007-07-18
    • John D. WilliamsWilliam C. Sweatt
    • John D. WilliamsWilliam C. Sweatt
    • G03F7/26
    • G03F7/0005B82Y10/00B82Y20/00B82Y40/00G02B6/1225G03F7/201G03F7/2022G03F7/2039G03F7/70008G03F7/70283G03F7/7035G03F7/70725H01J37/3174
    • A method to fabricate a tilted logpile photonic crystal requires only two lithographic exposures and does not require mask repositioning between exposures. The mask and photoresist-coated substrate are spaced a fixed and constant distance apart using a spacer and the stack is clamped together. The stack is then tilted at a crystallographic symmetry angle (e.g., 45 degrees) relative to the X-ray beam and rotated about the surface normal until the mask is aligned with the X-ray beam. The stack is then rotated in plane by a small stitching angle and exposed to the X-ray beam to pattern the first half of the structure. The stack is then rotated by 180° about the normal and a second exposure patterns the remaining half of the structure. The method can use commercially available DXRL scanner technology and LIGA processes to fabricate large-area, high-quality tilted logpile photonic crystals.
    • 制造倾斜对数光子晶体的方法仅需要两次光刻曝光,并且不需要曝光之间的掩模重新定位。 掩模和光致抗蚀剂涂覆的基板使用间隔物间隔开固定和恒定的距离,并且将堆叠夹在一起。 然后将叠层相对于X射线束以结晶对称角度(例如45度)倾斜,并围绕表面法线旋转,直到掩模与X射线束对准。 然后将该堆叠在平面中以小的缝合角旋转并暴露于X射线束以对结构的前半部进行图案化。 然后将堆叠围绕正常方向旋转180°,并且第二次曝光模拟结构的剩余一半。 该方法可以使用市售的DXRL扫描仪技术和LIGA工艺来制造大面积,高质量的倾斜对数光子晶体。