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21. 发明授权

US08705007B2 Inspection apparatus, lithographic apparatus, lithographic processing cell and inspection method 有权
标题翻译：检验仪器，光刻设备，平版印刷加工电池及检验方法
公开(公告)号：US08705007B2
公开(公告)日：2014-04-22
申请号：US12690221
申请日：2010-01-20
申请人： Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers , Henricus Petrus Maria Pellemans
发明人： Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers , Henricus Petrus Maria Pellemans
IPC分类号： G01B11/00 , G01N21/86 , G03B27/32 , G03B27/42 , G03B27/74
CPC分类号： G01N21/956 , G01J3/18 , G01J3/2803 , G01J3/4412 , G01N21/4788 , G01N21/9501 , G03F7/70191 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7088 , G03F9/7092
摘要： For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.
摘要翻译：对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。第一和第三象限被照亮，而第二和第四象限不被照亮。因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。

22. 发明授权

US08685626B2 Method of measuring a characteristic 有权
标题翻译：测量特性的方法
公开(公告)号：US08685626B2
公开(公告)日：2014-04-01
申请号：US12711176
申请日：2010-02-23
申请人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
发明人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
IPC分类号： G03F7/26
CPC分类号： G03F7/0035 , G03F7/70466
摘要： During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
摘要翻译：在多次图案化处理期间，除去图案的每个第n个元素。在将图案印刷到辐射敏感材料中或蚀刻到基底中之后，去除图案的元素。有利地，原始掩模不变，并且使用另一曝光步骤来去除图案的元件。

23. 发明授权

US08233155B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US08233155B2
公开(公告)日：2012-07-31
申请号：US11580246
申请日：2006-10-13
申请人： Antoine Gaston Marie Kiers , Theodorus Lambertus Marinus Der Kinderen , Vidya Vaenkatesan , Patrick Charles Maria Melis
发明人： Antoine Gaston Marie Kiers , Theodorus Lambertus Marinus Der Kinderen , Vidya Vaenkatesan , Patrick Charles Maria Melis
IPC分类号： G01B11/30
CPC分类号： G03B27/42 , G01B11/303 , G03F7/705 , G03F7/70616 , G03F7/70991
摘要： In a scatterometric method, a roughness value can be obtained by using a model including a surface layer having a variable parameter relating to its refractive index.
摘要翻译：在散射方法中，通过使用包括具有与其折射率相关的可变参数的表面层的模型，可以获得粗糙度值。

24. 发明授权

US07916927B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US07916927B2
公开(公告)日：2011-03-29
申请号：US11653441
申请日：2007-01-16
申请人： Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers , Durk Oeds Van Der Ploeg , Goce Naumoski , Roland Mark Van Weel
发明人： Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers , Durk Oeds Van Der Ploeg , Goce Naumoski , Roland Mark Van Weel
IPC分类号： G06K9/00 , G06K9/62
CPC分类号： G03F7/70625
摘要： Building of a model profile for a target is disclosed. An embodiment of the method includes importing an image of a known object and superimposing, on this image, either by hand or automatically, an estimated profile. The estimated profile is defined mathematically and adjusted segment by segment in order to match the image such that the adjusted estimated profile may be stored alongside a diffraction spectrum associated with the image. Alternatively or additionally, a user may trace (or free-draw) the profile of a known image and subsequently map a shape-definer of a mathematical function such as a polynomial equation, a spline or a vector onto the estimated profile in order to obtain a profile and one or more variables of that profile that may be used to reconstruct the profile of an unknown object from its diffraction pattern.
摘要翻译：披露了目标的模型配置文件的构建。该方法的一个实施例包括导入已知对象的图像并且在该图像上手动或自动地叠加估计的轮廓。估计轮廓被数学地定义并且逐段地调整，以便匹配图像，使得调整的估计轮廓可以与与图像相关联的衍射谱一起存储。或者或另外，用户可以跟踪（或自由绘制）已知图像的轮廓，并且随后将诸如多项式方程，样条或矢量的数学函数的形状定义器映射到估计轮廓上，以获得该轮廓的轮廓和一个或多个变量可用于从其衍射图案重建未知物体的轮廓。

25. 发明申请

US20100227280A1 Method of Measuring a Characteristic 有权
标题翻译：测量特性的方法
公开(公告)号：US20100227280A1
公开(公告)日：2010-09-09
申请号：US12711176
申请日：2010-02-23
申请人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
发明人： Johannes Anna Quaedackers , Paul Christiaan Hinnen , Antoine Gaston Marie Kiers , Christian Marinus Leewis
IPC分类号： G03F7/20
CPC分类号： G03F7/0035 , G03F7/70466
摘要： During a multiple patterning process every nth element of the pattern is removed. The removal of the elements of the patterns happens after the pattern has been printed into the radiation sensitive material or etched into substrate. Advantageously, the original mask is not varied, and another exposure step is used to remove the elements of the pattern.
摘要翻译：在多次图案化处理期间，除去图案的每个第n个元素。在将图案印刷到辐射敏感材料中或蚀刻到基底中之后，去除图案的元素。有利地，原始掩模不变，并且使用另一曝光步骤来去除图案的元件。

26. 发明申请

US20100201963A1 Inspection Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Inspection Method 有权
标题翻译：检验仪器，平版印刷设备，平版印刷加工单元及检验方法
公开(公告)号：US20100201963A1
公开(公告)日：2010-08-12
申请号：US12690221
申请日：2010-01-20
申请人： Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers , Henricus Petrus Maria Pellemans
发明人： Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers , Henricus Petrus Maria Pellemans
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G01N21/956 , G01J3/18 , G01J3/2803 , G01J3/4412 , G01N21/4788 , G01N21/9501 , G03F7/70191 , G03F7/70633 , G03F9/7049 , G03F9/7065 , G03F9/7088 , G03F9/7092
摘要： For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.
摘要翻译：对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。第一和第三象限被照亮，而第二和第四象限不被照亮。因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。

27. 发明申请

US20080088832A1 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US20080088832A1
公开(公告)日：2008-04-17
申请号：US11580265
申请日：2006-10-13
申请人： Hugo Angustinus Joseph Cramer , Antoine Gaston Marie Kiers
发明人： Hugo Angustinus Joseph Cramer , Antoine Gaston Marie Kiers
IPC分类号： G01N21/00 , G01B11/00
CPC分类号： G01N21/47 , G01N21/9501 , G01N21/956 , G03F7/70516 , G03F7/70625 , G03F7/70633
摘要： In a scatterometric method, different targets with different sensitivities to a parameter of interest are printed in a calibration matrix and different spectra obtained. Principal component analysis is applied to the different spectra to obtain a calibration function that is less sensitive to variation in the underlying structure than a calibration function obtained from spectra obtained from a single target.
摘要翻译：在散射测量方法中，将不同的感兴趣参数的目标印刷在校准矩阵中，并获得不同的光谱。将主成分分析应用于不同的光谱，以获得对从单个目标获得的光谱获得的校准函数对底层结构的变化较不敏感的校准函数。

28. 发明授权

US08773657B2 Method to determine the value of process parameters based on scatterometry data 有权
标题翻译：基于散点数据确定过程参数值的方法
公开(公告)号：US08773657B2
公开(公告)日：2014-07-08
申请号：US10590352
申请日：2005-02-22
申请人： Hans Van Der Laan , Rene Hubert Jacobus Carpaij , Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers
发明人： Hans Van Der Laan , Rene Hubert Jacobus Carpaij , Hugo Augustinus Joseph Cramer , Antoine Gaston Marie Kiers
IPC分类号： G01J1/10
CPC分类号： G01N21/278 , G01N21/274 , G01N21/4785 , G01N21/4788 , G01N2021/95615 , G03F7/705 , G03F7/70508 , G03F7/70516 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G03F7/70683
摘要： A method according to an embodiment includes obtaining calibration measurement data, with an optical detection apparatus, from a plurality of marker structure sets provided on a calibration substrate. Each marker structure set includes at least one calibration marker structure created using different known values of the process parameter. The method includes obtaining measurement data, with the optical detection apparatus, from at least one marker structure provided on a substrate and exposed using an unknown value of the process parameter; and determining the unknown value of the process parameter from the obtained measurement data by employing regression coefficients in a model based on the known values of the process parameter and the calibration measurement data.
摘要翻译：根据实施例的方法包括从设置在校准基板上的多个标记结构集合，利用光学检测装置获得校准测量数据。每个标记结构集包括使用过程参数的不同已知值创建的至少一个校准标记结构。该方法包括使用光学检测装置从设置在基板上的至少一个标记结构获得测量数据，并使用未知的工艺参数值进行曝光; 以及基于所述过程参数和所述校准测量数据的已知值，通过使用模型中的回归系数，从所获得的测量数据中确定所述过程参数的未知值。

29. 发明授权

US07715019B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US07715019B2
公开(公告)日：2010-05-11
申请号：US12423934
申请日：2009-04-15
申请人： Antoine Gaston Marie Kiers , Goce Naumoski
发明人： Antoine Gaston Marie Kiers , Goce Naumoski
IPC分类号： G01B11/24
CPC分类号： G03F7/70625
摘要： A method is provided for determining an actual profile of an object printed on a substrate. The method can include receiving an actual spectrum signal associated with the object, selecting a first model profile, and generating a first model spectrum signal associated with the first model profile. The method can further include comparing the first model spectrum signal with the actual spectrum signal. If the first model spectrum signal and the actual spectrum signal do not match a desired tolerance, the aforementioned selecting, generating, and comparing can be repeated with a second model profile. The second model profile can be selected based on the first model spectrum signal having undergone an optimization process based on a number of variable parameters of the first model profile, where the number of variable parameters is reduced by approximating the first model profile to a single shape with a reduced number of variable parameters.
摘要翻译：提供了一种用于确定印刷在基板上的物体的实际轮廓的方法。该方法可以包括接收与对象相关联的实际频谱信号，选择第一模型分布，以及生成与第一模型分布相关联的第一模型频谱信号。该方法还可以包括将第一模型频谱信号与实际频谱信号进行比较。如果第一模型频谱信号和实际频谱信号与期望的公差不匹配，则可以用第二模型分布重复上述选择，生成和比较。可以基于已经经历基于第一模型轮廓的可变参数的数量的优化处理的第一模型谱信号来选择第二模型轮廓，其中通过将第一模型轮廓近似为单个形状来减少可变参数的数量具有减少的可变参数数量。

30. 发明授权

US07630087B2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
标题翻译：检测方法和装置，光刻设备，光刻处理单元和器件制造方法
公开(公告)号：US07630087B2
公开(公告)日：2009-12-08
申请号：US11603257
申请日：2006-11-22
申请人： Leonardus Henricus Marie Verstappen , Antoine Gaston Marie Kiers , Goce Naumoski
发明人： Leonardus Henricus Marie Verstappen , Antoine Gaston Marie Kiers , Goce Naumoski
IPC分类号： G01B11/24
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G03F7/70625
摘要： Measurement of a profile of a scatterometry object on top of one or more product layers on a substrate is disclosed. To prevent an unknown parameters of one or more product layers having an effect on the measurement of the object profile, the thickness of the one or more product layers is measured prior to measuring the profile of the scatterometry object on the layer(s). In an embodiment, each of a plurality of product layers is measured as it is exposed so that only the degree of freedom of the most recently exposed product layer is unknown at each measurement step. When each of a plurality of product layers has been measured, and a scatterometry object is placed at the top of the layers, only the degrees of freedom of that scatterometry object should be unknown and only the profile of the object should need to be measured.
摘要翻译：公开了在衬底上的一个或多个产品层之上的散射对象的轮廓的测量。为了防止影响对象轮廓测量的一个或多个产品层的未知参数，在测量层之间的散射对象的轮廓之前测量一个或多个产品层的厚度。在一个实施例中，多个产品层中的每一个在被暴露时被测量，使得在每个测量步骤中仅最近曝光的产品层的自由度是未知的。当已经测量了多个产品层中的每一个并且散射物体放置在层的顶部时，仅该散射对象的自由度应该是未知的，并且仅需要测量对象的轮廓。

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