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21. 发明申请

US20100097588A1 EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND MASK 有权
标题翻译：曝光方法，装置制造方法和掩模
公开(公告)号：US20100097588A1
公开(公告)日：2010-04-22
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/42 , G03B27/32 , G03F1/00
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

22. 发明申请

US20090122428A1 Reflective optical elements exhibiting multimetallic-like self-correction of distortions caused by heating 审中-公开
标题翻译：反射光学元件表现出由加热引起的变形的多金属状自校正
公开(公告)号：US20090122428A1
公开(公告)日：2009-05-14
申请号：US11983611
申请日：2007-11-09
申请人： Alton H. Phillips , Douglas C. Watson
发明人： Alton H. Phillips , Douglas C. Watson
IPC分类号： G02B7/185
CPC分类号： G02B7/181 , G02B7/008 , G02B7/028
摘要： Optical elements are disclosed that exhibit “multimetallic”-like self corrections of thermally induced distortions. An exemplary optical element includes first and second portions. The first portion has a first coefficient of thermal expansion (CTE), an obverse surface, and a reverse surface. A second portion is bonded to the reverse surface. The second portion has a second CTE different from the first CTE to form an optical element exhibiting a thermally multimetallic-like change in curvature of the obverse surface accompanying a temperature change of the optical element. The second portion has a thermal-response property in a first direction that is different from a thermal-response property in a second direction. Thus, aberrations such as astigma-type aberrations can be readily self-corrected.
摘要翻译：公开了表现出热诱导失真的“多金属”状自校正的光学元件。示例性的光学元件包括第一和第二部分。第一部分具有第一热膨胀系数（CTE），正面和反面。第二部分结合到反面。第二部分具有与第一CTE不同的第二CTE，以形成随着光学元件的温度变化而呈现正面的热多金属样变化的光学元件。第二部分在第一方向上具有与第二方向上的热响应特性不同的热响应特性。因此，诸如散光像差的像差可以容易地自校正。

23. 发明申请

US20090027639A1 EUV Reticle Handling System and Method 有权
标题翻译： EUV光栅处理系统和方法
公开(公告)号：US20090027639A1
公开(公告)日：2009-01-29
申请号：US12242050
申请日：2008-09-30
申请人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
发明人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
IPC分类号： G03B27/52
CPC分类号： G03F7/70741
摘要： An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.
摘要翻译：公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。外壳包括第一和第二部分，其在处理，检查，存储和运输期间形成围绕保护的掩模版的外壳。外壳与加热器和散热器一起提供封闭的掩模版的热泳保护。

24. 发明授权

US07095482B2 Multiple system vibration isolator 有权
标题翻译：多系统隔振器
公开(公告)号：US07095482B2
公开(公告)日：2006-08-22
申请号：US10186876
申请日：2002-06-28
申请人： Alton H. Phillips , Douglas C. Watson , Andrew J. Hazelton
发明人： Alton H. Phillips , Douglas C. Watson , Andrew J. Hazelton
IPC分类号： G03B27/42 , F16M13/00 , F01B7/00
CPC分类号： F16F15/0232 , F16F9/02
摘要： A vibration isolator (200) for isolating a first assembly (206) from vibration from a second assembly (208) includes a first system (202) and a second system (204) coupled to the first system (202). In one embodiment, the first system (202) supports the majority of the first assembly (206) relative to the second assembly (208) and the second system (204) adjusts for a change in the location of the center of gravity of the first assembly (206). Further, the second system (204) can be used to compensate for fluctuations in the atmospheric pressure near the vibration isolator (200).
摘要翻译：用于将第一组件（206）与来自第二组件（208）的振动隔离的隔振器（200）包括耦合到第一系统（202）的第一系统（202）和第二系统（204）。在一个实施例中，第一系统（202）相对于第二组件（208）支撑大部分第一组件（206），并且第二系统（204）调节第一组件（206）的重心位置的变化组件（206）。此外，第二系统（204）可以用于补偿隔振器（200）附近的大气压力的波动。

25. 发明授权

US07466396B2 Lithography apparatus and method utilizing pendulum interferometer system 失效
标题翻译：利用摆锤干涉仪系统的平版印刷设备和方法
公开(公告)号：US07466396B2
公开(公告)日：2008-12-16
申请号：US11546368
申请日：2006-10-12
申请人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
发明人： Michael B. Binnard , Douglas C. Watson , W. Thomas Novak , Hiroto Horikawa , Yoshifumi Nakakoji , Hideaki Sakamoto
IPC分类号： G03B27/74
CPC分类号： G03F7/709 , G03F7/70775 , G03F7/70833
摘要： Reticle and/or wafer stage interferometers are mounted to a supporting body that is separate from the body that supports the projection optical system of a lithography apparatus. This enables the size of the body supporting the projection optical system to be reduced so that it has more favorable dynamic characteristics.
摘要翻译：标线片和/或晶片台干涉仪安装到与支撑光刻设备的投影光学系统的主体分离的支撑体上。这使得能够减小支撑投影光学系统的主体的尺寸，使其具有更有利的动态特性。

26. 发明申请

US20080285003A1 Linear motor driven automatic reticle blind 审中-公开
标题翻译：线性电机驱动自动掩模版盲
公开(公告)号：US20080285003A1
公开(公告)日：2008-11-20
申请号：US11803595
申请日：2007-05-15
申请人： Michael B. Binnard , Douglas C. Watson , Yoichi Arai
发明人： Michael B. Binnard , Douglas C. Watson , Yoichi Arai
IPC分类号： G03B27/42
CPC分类号： G03F7/70066
摘要： A reticle blind which is capable of being opened and closed at a relatively high speed and which does not cause mechanical disturbances or reaction forces. The reticle blind includes two reticle blind assemblies designed to cooperate with one another to control the passing of a laser beam of an exposure system onto a work piece, such as a semiconductor wafer or flat panel display. Each reticle blind assembly includes a linear motor having a mover and a blind configured to be positioned between a first position and a second position by the mover. Each reticle blind assembly also includes a counter mass assembly including a portion of a guide mechanism having at least one guide bar and a stator of the linear motor. The stator of the linear motor and the guide bar are integrated to form the counter mass which is configured to absorb reaction forces that are created when the blind is moved. In various embodiments, the blinds can be configured to operate in the vertical or horizontal orientation.
摘要翻译：能够以相对较高的速度打开和关闭且不引起机械干扰或反作用力的掩模版盲板。掩模版盲包括两个掩模版盲组件，其设计成彼此配合以控制曝光系统的激光束通过诸如半导体晶片或平板显示器的工件。每个掩模版盲组件包括具有移动器的线性电动机和被构造成由移动器定位在第一位置和第二位置之间的盲板。每个掩模版盲组件还包括反质量组件，其包括具有至少一个引导杆和线性电动机的定子的引导机构的一部分。线性电动机和引导杆的定子被整合以形成相对质量块，其被构造成吸收当盲人移动时产生的反作用力。在各种实施例中，百叶窗可被配置成在垂直或水平取向上操作。

27. 发明申请

US20080105069A1 Fine Stage Z Support Apparatus 审中-公开
标题翻译：精细级Z支持装置
公开(公告)号：US20080105069A1
公开(公告)日：2008-05-08
申请号：US11666858
申请日：2005-11-04
申请人： Michael B. Binnard , Andrew J. Hazelton , Douglas C. Watson , Yoichi Arai
发明人： Michael B. Binnard , Andrew J. Hazelton , Douglas C. Watson , Yoichi Arai
IPC分类号： A47J43/08 , B65H1/00 , F16M11/00 , H01L21/00
CPC分类号： G03F7/70816 , G03F7/70716 , H01L21/682
摘要： An apparatus for supporting an object is disclosed. The apparatus includes an air bearing coupled to an air bellows. When used in a vacuum environment, the apparatus preferably includes an air bearing housing with vacuum to remove the pressurized fluid used in the air bearing.
摘要翻译：公开了一种用于支撑物体的装置。该装置包括联接到空气波纹管的空气轴承。当在真空环境中使用时，装置优选地包括具有真空的空气轴承壳体，以去除在空气轴承中使用的加压流体。

28. 发明授权

US08425060B2 Self-correcting optical elements for high-thermal-load optical systems 有权
公开(公告)号：US08425060B2
公开(公告)日：2013-04-23
申请号：US11983615
申请日：2007-11-09
申请人： Douglas C. Watson , Alton H. Phillips
发明人： Douglas C. Watson , Alton H. Phillips
IPC分类号： G02B5/08
CPC分类号： G02B7/028 , G02B7/008 , G02B7/181
摘要： Mirrors and other optical elements are disclosed that include a body defining an optical surface (typically a reflective surface) and an opposing second surface. The body has a coefficient of thermal expansion (CTE). The optical element includes a correcting portion (e.g., a layer) attached to the second surface and having a CTE that, during heating of the optical element, imparts a bending moment to the body that at least partially offsets a change in curvature of the optical surface caused by heating. The body can be internally cooled. The body and correcting portion desirably are made of respective thermally conductive materials that can vary only slightly in CTE. The body desirably has a lower CTE than the correcting portion, and the correcting portion can be tuned according a variable property of the body and/or reflective surface. The body and correcting portion desirably function cooperatively in a thermally bimetallic-like manner.

29. 发明授权

US07591561B2 Liquid cooled mirror for use in extreme ultraviolet lithography 有权
标题翻译：用于极紫外光刻的液体冷却镜
公开(公告)号：US07591561B2
公开(公告)日：2009-09-22
申请号：US11382342
申请日：2006-05-09
申请人： Alton H. Phillips , Derek Coon , Douglas C. Watson
发明人： Alton H. Phillips , Derek Coon , Douglas C. Watson
IPC分类号： G02B5/08
CPC分类号： G02B5/10 , G02B7/1815 , G03F7/70783 , G03F7/70891 , G03F7/70983 , G21K1/06 , G21K2201/065
摘要： Methods and apparatus for internally or directly cooling a mirror using a fluid with laminar flow properties are disclosed. According to one aspect of the present invention, an internally cooled mirror includes an optical surface that absorbs light, and at least one microchannel formed beneath the optical surface. The mirror also includes a port that supplied a fluid to the microchannel. The fluid is subjected to a laminar flow and absorbs heat associated with the absorbed light.
摘要翻译：公开了使用具有层流性质的流体内部或直接冷却反射镜的方法和装置。根据本发明的一个方面，内部冷却镜包括吸收光的光学表面和形成在光学表面下方的至少一个微通道。镜子还包括向微通道供应流体的端口。流体经受层流并吸收与吸收的光相关的热量。

30. 发明申请

US20090033907A1 DEVICES AND METHODS FOR DECREASING RESIDUAL CHUCKING FORCES 审中-公开
标题翻译：减少残肢的装置和方法
公开(公告)号：US20090033907A1
公开(公告)日：2009-02-05
申请号：US12168726
申请日：2008-07-07
申请人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
发明人： Douglas C. Watson , Christopher S. Margeson , Alton H. Phillips , Hiromitsu Yoshimoto , Noriya Kato
IPC分类号： G03B27/62
CPC分类号： G03B27/62 , G03F7/707
摘要： Devices and methods are disclosed for holding a reticle or analogous object, particularly a planar object. An exemplary reticle-holding device includes a reticle chuck having a reticle-holding surface on which a reticle is placed to hold the reticle. The device includes at least one ultrasonic transducer (as an exemplary vibration-inducing device) sonically coupled to the reticle to excite, whenever the ultrasonic transducer is being energized, a vibrational mode in the reticle or reticle chuck, or both. The vibration mode is sufficient to reduce an adhesion force holding the reticle to the reticle-holding surface. Sonic coupling can be by direct contact with the transducer or across a gap.
摘要翻译：公开了用于保持掩模版或类似物体，特别是平面物体的装置和方法。示例性的掩模版保持装置包括具有掩模版保持表面的掩模版卡盘，在其上放置掩模版以保持掩模版。每当超声波换能器通电时，该装置包括至少一个超声波换能器（作为示例性的振动诱导装置），其超声波耦合到光罩以激发，在标线片或光罩卡盘或两者中均振动模式。振动模式足以减少将掩模版保持在掩模版保持表面上的粘附力。声波耦合可以通过与换能器或间隙直接接触。

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