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21. 发明专利

JP2010258470A Lithography projection apparatus 有权
标题翻译： LITHOGRAPHY投影设备
公开(公告)号：JP2010258470A
公开(公告)日：2010-11-11
申请号：JP2010151194
申请日：2010-07-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE SMIT JOANNES THEODOOR , BANINE VADIM YEVGENYEVICH , BISSCHOPS THEODORUS HUBERTUS J , MODDERMAN THEODORUS MARINUS , DIERICHS MARCLE MATHIJS T M
IPC分类号： H01L21/027 , B01D19/00 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/708 , G03F7/70858
摘要： PROBLEM TO BE SOLVED: To improve the lithography performance of an apparatus having a liquid that fills the space between a final element of a projection system and a substrate. SOLUTION: A lithographic apparatus and a device manufacturing method make use of a high-refractive index liquid, confined in a reservoir 13, at least partly filling a lithography field between a final element of a projection lens and the substrate. Bubbles forming in the liquid resulting from dissolved atmospheric gases or the gas discharge from an apparatus element exposed to the liquid are detected and removed so that they do not interfere with the exposure, to cause burning defects on the substrate. The detection can be carried out, by measuring the frequency dependence of ultrasonic attenuation in the liquid and the removal of bubbles can be implemented by: degassing and pressurizing the liquid; isolating the liquid from the atmosphere; supplying a continuous flow of liquid through the lithography field using liquids of low surface tension; and further, phase-shifting the ultrasonic standing-wave nodes. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提高具有填充投影系统的最终元件和基板之间的空间的液体的装置的光刻性能。解决方案：光刻设备和器件制造方法利用限制在储存器13中的高折射率液体，至少部分地填充投影透镜的最终元件与基底之间的光刻场。检测并除去由溶解的大气气体引起的液体中形成的气泡或暴露于液体的装置元件的气体排出，使得它们不干扰曝光，引起基板上的燃烧缺陷。可以通过测量液体中超声波衰减的频率依赖性进行检测，并且可以通过以下方式实现气泡的去除：对液体进行脱气和加压; 从大气隔离液体; 使用低表面张力的液体通过光刻领域提供连续的液体流; 并且进一步移相超声波驻波节点。版权所有（C）2011，JPO＆INPIT

22. 发明专利

JP2010045400A Lithographic apparatus and device manufacturing method 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：JP2010045400A
公开(公告)日：2010-02-25
申请号：JP2009264762
申请日：2009-11-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： BAKKER LEVINUS P , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , KOSHELEV KONSTANTIN NIKOLAEVITCH , MERTENS BASTIAAN MATTHIAS , MOORS JOHANNES HUBERTUS JOSEPHINA , SCHUURMANS FRANK JEROEN PIETER , ZUKAVISHVILI GIVI GEORGIEVITCH , WOLSCHRIJN BASTIAAN THEODOOR , VAN DER VELDEN MARC H L
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70933 , B82Y10/00 , G03F7/70033 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus which reduces sputtering due to gas that has been introduced in an optical path of a projection beam, and to provide a device manufacturing method. SOLUTION: The lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The lithographic apparatus includes an optical element in an optical path of the beam, a gas inlet for introducing gas into the optical path of the beam so that the gas will be ionized by the beam to create an electric field toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold value of kinetic energy for sputtering the optical element that is greater than a kinetic energy developed by ions of the gas in the electric field. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其减少由于在投影光束的光路中引入的气体引起的溅射，并提供器件制造方法。解决方案：光刻设备被布置成将来自辐射源的光束投射到基板上。光刻设备包括光束的光路中的光学元件，用于将气体引入光束的光路中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合到用于供应气体的气体入口。气体具有用于溅射光学元件的动能的阈值，其大于由电场中的气体的离子产生的动能。版权所有（C）2010，JPO＆INPIT

23. 发明专利

JP2010045358A Radiation source, lithographic apparatus, and method of manufacturing device 审中-公开
标题翻译：辐射源，光刻设备及其制造方法
公开(公告)号：JP2010045358A
公开(公告)日：2010-02-25
申请号：JP2009183973
申请日：2009-08-07
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCHIMMEL HENDRIKUS GIJSBERTUS , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF , BOSSCHART CAREL HOPE
IPC分类号： H01L21/027
CPC分类号： H05G2/003 , G03F7/70033 , G03F7/70891 , G03F7/70916 , G21K1/06 , H05G2/005 , H05G2/008
摘要： PROBLEM TO BE SOLVED: To control fuel droplets by a method reducing potential contamination on other surfaces in a radiation source and other parts of a lithographic apparatus.
SOLUTION: The radiation source is configured to generate extreme ultraviolet rays. The radiation source comprises a laser which is configured to generate a radiation beam to be guided to a plasma generation part for plasma generation when the radiation beam interacts with fuel, an optical component comprising a surface which is configured and positioned to be hit with droplets of the fuel, and a temperature conditioner configured to raise the temperature of the surface. A coating may be so provided on the surface as to change at least one nature of the surface. The energy source may be configured so that the droplets of fuel solidify before they hit the surface or to prevent the droplets of fuel from vaporizing.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：通过减少辐射源和光刻设备的其它部分中的其它表面上的潜在污染的方法来控制燃料液滴。解决方案：辐射源被配置为产生极紫外线。辐射源包括激光器，其被配置为当辐射束与燃料相互作用时，产生要被引导到等离子体产生部件的等离子体产生部件的辐射束;光学部件，其包括被配置并定位成被喷射的液滴所述燃料和配置为升高所述表面的温度的温度调节器。可以在表面上设置涂层以改变表面的至少一种性质。能量源可以被配置为使得燃料液滴在它们撞击表面之前固化或者防止燃料液滴蒸发。版权所有（C）2010，JPO＆INPIT

24. 发明专利

JP2010045355A Radiation source, lithography apparatus and device manufacturing method 审中-公开
标题翻译：辐射源，光刻设备和器件制造方法
公开(公告)号：JP2010045355A
公开(公告)日：2010-02-25
申请号：JP2009182957
申请日：2009-08-06
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES , BANINE VADIM YEVGENYEVICH , KLUNDER DERK JAN WILFRED , SOER WOUTER ANTHON
IPC分类号： H01L21/027
CPC分类号： G21K1/062 , B82Y10/00 , G03F7/70033 , G03F7/70925 , G21K2201/064 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To prevent damage to a component of a lithography apparatus, in particular, a mirror located nearby a plasma source due to contaminant particles. SOLUTION: The lithography apparatus includes a radiation source which generates extreme ultraviolet radiation. The radiation source includes a chamber in which plasma is generated and the mirror which reflects radiation emitted by the plasma. The mirror includes a multilayer structure including an Mo/Si alternation layer. A border Mo layer or border Si layer or a border diffusion barrier layer of the alternation layer forms an uppermost layer of the mirror, and the uppermost layer faces the chamber inward. A hydrogen group generator generates hydrogen in the chamber. The hydrogen group removes debris, generated from the plasma, from the mirror. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了防止光刻设备的部件，特别是由于污染物颗粒而位于等离子体源附近的反射镜的损坏。解决方案：光刻设备包括产生极紫外辐射的辐射源。辐射源包括其中产生等离子体的室和反射由等离子体发射的辐射的反射镜。反射镜包括包括Mo / Si交替层的多层结构。边界Mo层或边界Si层或交替层的边界扩散阻挡层形成反射镜的最上层，最上层向内面向腔室。氢气发生器在腔室中产生氢气。氢离子从镜子中除去从等离子体产生的碎片。版权所有（C）2010，JPO＆INPIT

25. 发明专利

JP2006222426A METHOD FOR REMOVAL OF DEPOSITION ON OPTICAL ELEMENT, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND DEVICE MANUFACTURED THEREBY 审中-公开
公开(公告)号：JP2006222426A
公开(公告)日：2006-08-24
申请号：JP2006028417
申请日：2006-02-06
申请人： ASML NETHERLANDS BV
发明人： BAKKER LEVINUS P , BANINE VADIM YEVGENYEVICH , LEONARDUS FRANKEN JOHANNES CHR , JOSEPHINA MOORS JOHANNES HUBER , SPEE CAROLUS IDA MARIA ANTONIU , WASSINK ARNOUD C , ANTONIUS BROM PAUL P A
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a method for removal of deposition on an optical element of a lithographic apparatus, and the lithographic apparatus. SOLUTION: The method for removal of deposition on a radiation collector of a lithographic apparatus includes a process of providing a gas barrier to the end of the radiation collector, thereby providing a radiation collector enclosure volume; a process of providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen, deuterium and/or tritium containing gas; and a process of removing at least part of the deposition from the radiation collector. The lithographic apparatus includes the radiation collector; a circumferential hull enclosing the radiation collector; and the gas barrier at the end of the radiation collector, thereby providing the radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet feeds a gas to the radiation collector enclosure volume and an outlet exhausts a gas from the radiation collector enclosure volume. COPYRIGHT: (C)2006,JPO&NCIPI

26. 发明专利

JP2005150721A Lithographic apparatus suppressed in contamination, method of manufacturing device, and device manufactured by them 有权
标题翻译：污染物抑制装置，制造方法及其制造的装置
公开(公告)号：JP2005150721A
公开(公告)日：2005-06-09
申请号：JP2004325789
申请日：2004-11-10
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BAKKER LEVINUS PIETER , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR V , KOSHELEV KONSTANTIN N , KRIVTSUN VLADIMIR M
IPC分类号： G03F7/20 , H01L21/027
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70908 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a lithographic projector provided with a radiation system which emits a radiant projected beam. SOLUTION: The lithographic projector is provided with a particle supply unit 22 which supplies getter particles into a radiant projected beam for performing the role of a getter for contaminated particles in the projected beam. The getter particles have diameters of ≥1 nm, preferably, COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种设置有发射辐射投影光束的辐射系统的光刻投影仪。解决方案：光刻投影仪设置有颗粒供应单元22，其将吸气剂颗粒提供到辐射投影光束中，用于执行投影光束中污染颗粒的吸气剂的作用。吸气剂颗粒的直径为≥1nm，优选<1,000nm。在一个实施例中，该光刻投影仪具有伴随有板构件52,57,59和69的污染物捕集器9,50,55和67，用于捕获投影光束中的污染颗粒; 颗粒供给单元22,45,54,58,65和71，其将污染物捕集器9,50,55和67的颗粒供应到上游侧的空间，使得颗粒可能与污染的颗粒碰撞并给出附加的速度分量到被污染的颗粒朝向板状构件52,57,59和69.版权所有（C）2005，JPO＆NCIPI

27. 发明专利

JP2004343082A Lithographic projection apparatus with condenser including concave face and convex face 审中-公开
标题翻译：具有冷凝器的平面投影装置，包括凹凸面和凸面
公开(公告)号：JP2004343082A
公开(公告)日：2004-12-02
申请号：JP2004105027
申请日：2004-03-31
申请人： Asml Netherlands Bv , エイエスエムエルネザランドズベスローテンフエンノートシャップ
发明人： BANINE VADIM YEVGENYEVICH
IPC分类号： G02B17/06 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70175
摘要： PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which an ML condenser has been substituted by a condenser that can form a radiation beam by collecting a radiated light within a solid angle which is equivalent to the solid angle within which the ML condenser collects the radiated light.
SOLUTION: The lithographic apparatus to be disclosed includes a radiation source that emits the radiated light and at least one condenser (59; 63; 73) that collects the radiated light by being arranged close to the radiation source (51) and forms a radiated beam (52). The at least one condenser includes a first reflector on a concave-face mirror (53) and a second reflector on a convex-face mirror (55). The concave-face mirror (53) is arranged surrounding the convex-face mirror (55). The first reflector on the concave-face mirror (53) receives the radiated light from the radiation source (51). The first reflector reflects the received radiated light toward the second reflector on the convex-face mirror (55) to form a beam of the radiated light (52).
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种光刻投影装置，其中ML冷凝器已经被可以形成辐射束的聚光器取代，该聚光器通过以等于立体角的立体角收集辐射光， ML冷凝器收集辐射光。解决方案：待公开的光刻设备包括发射辐射光的辐射源和通过靠近辐射源（51）布置而收集辐射光的至少一个冷凝器（59; 63; 73），并形成辐射束（52）。所述至少一个聚光器包括凹面镜（53）上的第一反射器和凸面镜（55）上的第二反射器。凹面镜53围绕凸面镜55配置。凹面反射镜（53）上的第一反射器接收来自辐射源（51）的辐射光。第一反射器将接收到的辐射光反射到凸面反射镜（55）上的第二反射器，以形成辐射光束（52）。版权所有（C）2005，JPO＆NCIPI

28. 发明专利

JP2012074388A Radiation source 有权
标题翻译：辐射源
公开(公告)号：JP2012074388A
公开(公告)日：2012-04-12
申请号：JP2011249581
申请日：2011-11-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： VAN EMPEL TJARKO ADRIAAN RUDOLF , BANINE VADIM YEVGENYEVICH , LOOPSTRA ERIK ROELOF , SOER WOUTER ANTHON , WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES
IPC分类号： H05G2/00 , H01L21/027
CPC分类号： G03F7/70916 , G21K2201/064 , H05G2/005
摘要： PROBLEM TO BE SOLVED: To provide an extreme ultraviolet radiation device capable of reducing the damage of a collector.SOLUTION: A radiation source includes: a radiation emitter that emits radiation; a collector 6 that collects the radiation; and a contaminant trap 5 that captures a contaminant emitted by the radiation source. The contaminant trap includes: a plurality of foils that extends radially substantially; a first magnetic ring that is located outside an outer cone orbit of the radiation collected by the collector; and a second magnetic ring that is located within the orbit of the radiation collected by the collector. The magnetic rings generate magnetic field including a component parallel to the foil.
摘要翻译：要解决的问题：提供能够减少收集器损坏的极紫外辐射装置。解决方案：辐射源包括：发射辐射的辐射发射器; 收集器6收集辐射; 以及捕获由辐射源发射的污染物的污染物阱5。污染物捕集器包括：多个基本上径向延伸的箔; 位于由收集器收集的辐射的外锥轨道外部的第一磁环; 以及位于由收集器收集的辐射的轨道内的第二磁环。磁环产生包括平行于箔的部件的磁场。版权所有（C）2012，JPO＆INPIT

29. 发明专利

JP2011129908A Lithography apparatus and device manufacturing method 审中-公开
标题翻译： LITHOGRAPHY设备和设备制造方法
公开(公告)号：JP2011129908A
公开(公告)日：2011-06-30
申请号：JP2010274157
申请日：2010-12-09
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： SCACCABAROZZI LUIGI , BANINE VADIM YEVGENYEVICH , IVANOV VLADIMIR VITALEVITCH , YAKUNIN ANDREY MIKHAILOVICH
IPC分类号： H01L21/027 , G03F1/08
CPC分类号： G03F1/84 , G03F7/7085 , G03F7/70908 , G03F7/70916
摘要： PROBLEM TO BE SOLVED: To provide a high-speed method of detecting a particle on an arbitrary pattern.
SOLUTION: A thermal radiation from a mask MA is detected using a system and a method. A debris particle D on the mask MA is heated, but not cooled rapidly like a peripheral mask. Radiations emitted from the particle D and mask MA are different in wavelength because of the resulting temperature difference. Therefore, the thermal radiation is detected to detect presence of the particle D deposited on the mask. When the particle D is detected, the mask MA can be cleaned.
COPYRIGHT: (C)2011,JPO&INPIT

30. 发明专利

JP2011061195A Imprint lithography method and apparatus 有权
标题翻译：印刷方法和装置
公开(公告)号：JP2011061195A
公开(公告)日：2011-03-24
申请号：JP2010184511
申请日：2010-08-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： WUISTER SANDER FREDERIK , BANINE VADIM YEVGENYEVICH , DIJKSMAN JOHAN FREDERIK , KRUIJT-STEGEMAN YVONNE WENDELA , LAMMERS JEROEN HERMAN , KOOLE ROELOF
IPC分类号： H01L21/027 , B29C59/02 , B81C99/00
CPC分类号： B29C43/34 , B29C43/021 , B29C43/58 , B29C2043/025 , B29K2101/12 , B44C1/20 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： PROBLEM TO BE SOLVED: To provide an imprint lithography method and an apparatus capable of eliminating or relaxing the problem of unevenness in an imprint template. SOLUTION: The imprint lithography method includes a step of providing a first amount 60 of an imprintable medium having a first etching rate when solidified on a first area of a substrate and a step of providing a second amount 62 of an imprintable medium having a second etching rate different from the first etching rate when solidified on a second area different from the first area on the substrate. COPYRIGHT: (C)2011,JPO&INPIT

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