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    • 21. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US06768755B2
    • 2004-07-27
    • US09746065
    • 2000-12-26
    • Daijiro InoueRyoji HiroyamaKunio TakeuchiYasuhiko NomuraMasayuki Hata
    • Daijiro InoueRyoji HiroyamaKunio TakeuchiYasuhiko NomuraMasayuki Hata
    • H01S500
    • H01S5/2231H01S5/06226H01S5/2206H01S5/2222H01S5/2226H01S5/2227
    • A depletion enhancement layer having a striped opening on the upper surface of a ridge portion, a low carrier concentration layer and an n-type current blocking layer are successively formed on a p-type cladding layer having the ridge portion. The low carrier concentration layer has a lower carrier concentration than the n-type current blocking layer. The band gap of the depletion enhancement layer is set to an intermediate level between the band gaps of the p-type cladding layer and the low carrier concentration layer. Alternatively, a first current blocking layer having a low carrier concentration and a second current blocking layer of the opposite conduction type are formed on an n-type depletion enhancement layer, and a p-type contact layer is formed on the second current blocking layer of the opposite conduction type and another p-type contact layer.
    • 在具有脊部的p型包覆层上依次形成具有在脊部上表面上的条纹开口的耗尽增强层,低载流子浓度层和n型电流阻挡层。 低载流子浓度层的载流子浓度比n型电流阻挡层低。 耗尽增强层的带隙被设定为p型覆层和低载流子浓度层的带隙之间的中间电平。 或者,在n型耗尽增强层上形成具有低载流子浓度的第一电流阻挡层和相反导电型的第二电流阻挡层,并且在第二电流阻挡层上形成p型接触层 相反的导电类型和另一个p型接触层。