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    • 30. 发明申请
    • TRANSISTOR OF SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING THE SAME
    • 半导体器件的晶体管及其制造方法
    • US20090170250A1
    • 2009-07-02
    • US12396614
    • 2009-03-03
    • Jae Kyoung MUNJong Won LIMWoo Jin CHANGHong Gu JIHo Kyun AHNHae Cheon KIM
    • Jae Kyoung MUNJong Won LIMWoo Jin CHANGHong Gu JIHo Kyun AHNHae Cheon KIM
    • H01L21/338
    • H01L29/66462H01L29/7785
    • Provided are a transistor of a semiconductor device and method of fabricating the same. The transistor includes: an epitaxy substrate disposed on a semi-insulating substrate and having a buffer layer, a first Si planar doping layer, a first conductive layer, a second Si planar doping layer, and a second conductive layer, which are sequentially stacked, the second Si planar doping layer having a doping concentration different from that of the first Si planar doping layer; a source electrode and a drain electrode diffusing into the first Si planar doping layer to a predetermined depth and disposed on both sides of the second conductive layer to form an ohmic contact; and a gate electrode disposed on the second conductive layer between the source and drain electrodes and being in contact with the second conductive layer. In this structure, both isolation and switching speed of the transistor can be increased. Also, the maximum voltage limit applied to the transistor is increased due to increases in gate turn-on voltage and threshold voltage and a reduction in parallel conduction element. As a result, the power handling capability of the transistor can be improved, thus improving a high-power low-distortion characteristic and an isolation characteristic.
    • 提供半导体器件的晶体管及其制造方法。 晶体管包括:设置在半绝缘衬底上并具有缓冲层的外延衬底,第一Si平面掺杂层,第一导电层,第二Si平面掺杂层和第二导电层, 所述第二Si平面掺杂层具有与所述第一Si平面掺杂层的掺杂浓度不同的掺杂浓度; 源极电极和漏电极,其扩散到所述第一Si平面掺杂层中至预定深度并且设置在所述第二导电层的两侧以形成欧姆接触; 以及设置在所述源极和漏极之间的所述第二导电层上并与所述第二导电层接触的栅电极。 在这种结构中,可以提高晶体管的隔离和开关速度。 此外,施加到晶体管的最大电压限制由于栅极导通电压和阈值电压的增加以及并联导通元件的减小而增加。 结果,可以提高晶体管的功率处理能力,从而提高高功率低失真特性和隔离特性。