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21. 发明申请

US20090023082A1 PELLICLE FRAME 审中-公开
标题翻译：球形框架
公开(公告)号：US20090023082A1
公开(公告)日：2009-01-22
申请号：US12176745
申请日：2008-07-21
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/00
CPC分类号： G03F1/64
摘要： The present invention is directed to provide a pellicle frame that causes little harm to the flatness of a photomask, even in the case where a pellicle is affixed after completion of the photomask.
摘要翻译：本发明的目的在于提供即使在完成光掩模之后附着防护薄膜组件的情况下也不会对光掩模的平坦度造成伤害的防护薄膜框架。

22. 发明授权

US06803161B2 Framed pellicle for protection of photolithographic photomask 有权
标题翻译：用于保护光刻光掩模的防护薄膜
公开(公告)号：US06803161B2
公开(公告)日：2004-10-12
申请号：US10419933
申请日：2003-04-22
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F900
CPC分类号： G03F1/64
摘要： An improvement is provided in the photolithographic patterning of a photoresist layer by pattern-wise exposure to short-wavelength ultraviolet light through a pattern-bearing photomask which is dustproof protected by mounting a framed pellicle thereon. With an object to overcome the troubles therein due to absorption of short-wavelength ultraviolet light by oxygen and the interaction of atmospheric oxygen in the space surrounded by the photomask and the framed pellicle with the energy of the short-wavelength ultraviolet, the framed pellicle is provided in the frame with at least two gas-passage openings through which the air inside is replaced with nitrogen in conducting the ultraviolet exposure. The openings are preferably covered with a filter member and covered further with a covering member having a gas nozzle which is connected to a feed source of an inert gas such as nitrogen.
摘要翻译：通过图案式曝光到短波紫外光，通过在其上安装框架防护薄膜的防尘防护图案的光掩模，在光致抗蚀剂层的光刻图案中提供了改进。为了克服其中由于氧气引起的短波长紫外光的吸收以及由光掩模和框架防护薄膜组成的空间中的大气氧与短波长紫外线的能量的相互作用的目的，框架防护薄膜是在框架中设置有至少两个气体通道开口，在进行紫外线曝光时，内部的空气被氮气置换。这些开口优选用过滤器构件覆盖，并进一步覆盖具有气体喷嘴的覆盖构件，该气体喷嘴连接到诸如氮气的惰性气体的进料源。

23. 发明授权

US06736252B2 Work holder for through hole examination apparatus 有权
标题翻译：通孔检查仪工作台
公开(公告)号：US06736252B2
公开(公告)日：2004-05-18
申请号：US10040265
申请日：2001-10-24
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： B65G1564
CPC分类号： G01N21/95692 , G01B5/0004
摘要： A work holder is provided for a through hole examination apparatus that reduces the generation of scrubbed-off metal powder caused by abrasion during the movements, and has a high operability. Also, it is an object to provide a work holder for a through hole examination apparatus that can readily adjust the holder to be parallel at low costs. A work holder 18 is provided for a through hole examination apparatus, which retains a workpiece having through holes provided therein and transfers the same between a work replacement operation region and a through hole examination region. A roller movement device 50 is mounted on the holder main body to enable a rolling movement thereof, and the roller movement device is made to be height-adjustable such that the parallel degree of the holder is adjustable.
摘要翻译：提供了一种用于通孔检查装置的工件保持器，其减少了在运动期间由磨损引起的洗涤金属粉末的产生，并且具有高可操作性。另外，本发明的目的是提供一种用于通孔检查装置的工件保持器，其可以容易地以低成本调整保持器平行。设置有用于通孔检查装置的工件保持器18，该通孔检查装置保持具有设置在其中的通孔的工件，并在工件更换操作区域和通孔检查区域之间传送。辊移动装置50安装在保持器主体上以能够进行滚动运动，并且使辊运动装置可高度可调，使得保持器的平行度可调节。

24. 发明授权

US06368683B1 Pellicle for photolithography 有权
标题翻译：光刻薄膜
公开(公告)号：US06368683B1
公开(公告)日：2002-04-09
申请号：US09534526
申请日：2000-03-27
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F114
CPC分类号： G03F1/62
摘要： There is disclosed a pellicle for photolithography comprising at least a pellicle membrane adhered to a pellicle frame, wherein the pellicle membrane exhibits light transmission of 50% or more when it is irradiated by an excimer laser having a wavelength of 160 nm or less. The present invention provides a pellicle for photolithography comprising a pellicle membrane of high light transmission and excellent durability even after long term irradiation with a vacuum ultraviolet light of a short wavelength.
摘要翻译：公开了一种用于光刻的防护薄膜组件，其至少包括粘附在防护薄膜组件框架上的防护薄膜组件，其中当通过具有160nm或更小的波长的准分子激光器照射时，防护薄膜组件的光透射率为50％以上。本发明提供了一种用于光刻的防护薄膜，其包括具有高透光性的防护薄膜，并且即使在短波长的真空紫外线长时间照射之后也具有优异的耐久性。

25. 发明授权

US08652711B2 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US08652711B2
公开(公告)日：2014-02-18
申请号：US13373442
申请日：2011-11-15
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/64 , G03F1/62
CPC分类号： G03F1/62 , G03F1/64
摘要： There is provided a pellicle in which the mask-bonding agglutinant layer has the adhesion strength of 1 N/m through 100 N/m, preferably 4 N/m through 80 N/m, and more preferably the agglutinant layer has a facial flatness of 15 micrometers or smaller, and still more preferably the membrane-bonding adhesive layer has a facial flatness of 15 micrometers or smaller: for the purpose of better preventing the pellicle frame from affecting the mask to deform.
摘要翻译：提供一种防护薄膜，其中掩模粘合凝集层的粘合强度为1N / m至100N / m，优选为4N / m至80N / m，更优选地，粘着强度层具有 15微米以下，进一步优选膜粘接层的面平坦度为15微米以下：为了更好地防止防护薄膜组件框架对掩模的变形。

26. 发明授权

US08383297B2 Pellicle for lithography and method for manufacturing pellicle film 有权
标题翻译：用于光刻的防护薄膜和防护薄膜制造方法
公开(公告)号：US08383297B2
公开(公告)日：2013-02-26
申请号：US13032186
申请日：2011-02-22
申请人： Toru Shirasaki , Kunihiro Ito
发明人： Toru Shirasaki , Kunihiro Ito
IPC分类号： G03F1/62
CPC分类号： G03F1/62
摘要： Provided are a pellicle for lithography which can prevent a haze from being generated on a photomask even if a short wave length laser such as an ArF excimer laser is used for a long period of time, and a method for producing a pellicle film to be attached to the pellicle for lithography. The pellicle 1 for lithography is comprised of a frame-like pellicle frame 4 having one open frame on one side of the pellicle frame and another open frame on another side of the pellicle frame; and a laser beam transmissive pellicle film 2 for lithography, which is attached to the one side of the pellicle frame. The another open frame is capable of attaching to a photomask 10 and the pellicle film has a venting hole 7 having a hole size through which a gas molecule 15 can pass but not a foreign particle 16.
摘要翻译：提供一种用于光刻的防护薄膜组件，即使长时间使用诸如ArF准分子激光器的短波长激光器也能够防止在光掩模上产生雾度，以及要附着的防护薄膜的制造方法到光刻薄膜。用于光刻的防护薄膜1由防护薄膜组件框架的一侧上具有一个开放框架的框架式防护薄膜框架4和防护薄膜组件框架的另一侧上的另一开放框架组成。以及用于光刻的激光束透射防护薄膜2，其附接到防护薄膜组件框架的一侧。另一个开放框架能够附着到光掩模10上，并且防护薄膜具有通气孔7，该通气孔具有孔尺寸，气体分子15可以通过孔径而不是外来颗粒16。

27. 发明授权

US08356849B2 Pellicle handling tool 有权
标题翻译：防护薄膜处理工具
公开(公告)号：US08356849B2
公开(公告)日：2013-01-22
申请号：US13040331
申请日：2011-03-04
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： B66C1/42
CPC分类号： B25J1/00 , B25J15/00 , G03F1/62
摘要： A handling tool for handling a pellicle which is used in the lithography carried out in a manufacturing process of semiconductor devices, comprising a handle, a main shaft connected with a fore-end of the handle to form a T-shaped part, two parallel arms protruding forward from the both ends of the said main shaft orthogonally to form a U-shaped part, and four pellicle frame holders of which two are each provided on the inward side surface of each arm respectively, wherein the arms are designed in a manner such that they are both capable of moving towards and away from each other so as to be able to adjust the arm-to-arm distance, and the said holders are provided so that they can grasp the frame's side surfaces at the four corners of the pellicle frame when the said arms are closed.
摘要翻译：一种用于处理在半导体器件的制造过程中进行的光刻中使用的防护薄膜组件的处理工具，包括手柄，与手柄的前端连接以形成T形部件的主轴，两个平行臂正交地从所述主轴的两端向前突出以形成U形部分，并且在每个臂的内侧表面上分别设置有四个防护膜框架保持器，其中两个分别设置在每个臂的内侧表面上，其中臂以这样的方式设计它们都能够彼此移动并远离彼此，以便能够调节臂与臂的距离，并且所述保持器被设置成使得它们能够抓住框架在防护薄膜的四个角部处的侧表面当所述臂关闭时的框架。

28. 发明授权

US08349526B2 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US08349526B2
公开(公告)日：2013-01-08
申请号：US13064335
申请日：2011-03-21
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/64
CPC分类号： G03F1/64
摘要： There is provided a pellicle for lithography which is capable of preventing or at least restricting the outgas from its mask-bonding agglutinant layer from entering the hollow of the pellicle by virtue of a unique structure of the mask-boding agglutinant layer, that is, the agglutinant layer is formed of two or more juxtaposed endless belts of which the inner-most belt that faces the pellicle hollow is made of a substance which is non-agglutinant while at least one of the other belts is agglutinant; when the outer-most belt is also made of a non-agglutinant substance, the outgas is completely prevented from escapting from the pellicle.
摘要翻译：提供了一种用于光刻的防护薄膜组件，其能够通过掩模粘附凝集层的独特结构来防止或至少限制其掩模粘结凝集层的气体进入防护薄膜组件的中空部分，即，凝集层由两个或更多个并置的环形带形成，其中面向防护薄膜空心的最内侧带由不凝集的物质制成，而至少一个其它带是凝集的; 当最外侧的皮带也由非凝集物质制成时，完全防止出气从防护薄膜组件脱出。

29. 发明申请

US20120276473A1 PELLICLE FOR LITHOGRAPHY 有权
标题翻译：胶版胶片
公开(公告)号：US20120276473A1
公开(公告)日：2012-11-01
申请号：US13455345
申请日：2012-04-25
申请人： Junichi TSUKADA , Toru Shirasaki
发明人： Junichi TSUKADA , Toru Shirasaki
IPC分类号： G03F1/62
CPC分类号： G03F1/64 , G03F1/62
摘要： A pellicle for lithography, in which an agglutinant layer is so controlled that the deformation of the pellicle frame is prevented from transferring to an exposure original plate to which the pellicle is attached so that pattern transferred scarcely undergoes deformation; in particular the agglutinant layer has a Young's modulus of 0.02 to 0.08 MPa and a tensile bond strength of 0.04 to 0.08 N/mm2.
摘要翻译：一种用于光刻的防护薄膜组件，其中控制凝集层以防止防护薄膜组件框架的变形转移到附着有防护薄膜的曝光原版，使得图案转印几乎不发生变形; 特别是凝集层的杨氏模量为0.02〜0.08MPa，拉伸粘合强度为0.04〜0.08N / mm2。

30. 发明授权

US08220654B2 Fuel tank structure 有权
标题翻译：油箱结构
公开(公告)号：US08220654B2
公开(公告)日：2012-07-17
申请号：US12360885
申请日：2009-01-28
申请人： Touru Suda , Masayuki Hirose , Toru Shirasaki , Takayuki Usui , Taku Masaki , Hiroaki Suganuma
发明人： Touru Suda , Masayuki Hirose , Toru Shirasaki , Takayuki Usui , Taku Masaki , Hiroaki Suganuma
IPC分类号： B65D8/00 , B65D1/24 , B65D85/00 , B60P3/00
CPC分类号： B60K15/077 , B60K2015/03105 , B60K2015/0344
摘要： A partitioning plate, that is positioned between a jet pump and a main suction, is set within a reserve cup of a fuel tank, so as to separate an interior of the reserve cup into a fuel feed-out chamber in which the main suction is disposed, and a fuel introducing chamber in which the jet pump is disposed. The partitioning plate is disposed at an incline with respect to a vehicle longitudinal direction. In cases in which acceleration in any of a forward direction, a rearward direction, a leftward direction and a rightward direction of a vehicle acts on fuel within the reserve cup, some of fuel within the fuel introducing chamber flows into the fuel feed-out chamber. A fuel tank structure is provided that can reliably ensure fuel within the fuel feed-out chamber in a case in which acceleration arises at fuel within a fuel accommodating portion.
摘要翻译：定位在喷射泵和主吸力之间的分隔板设置在燃料箱的储备杯内，以将储备杯的内部分离成燃料供给室，其中主吸力为以及配置喷射泵的燃料导入室。分隔板相对于车辆纵向设置在倾斜角度。在车辆的向前方向，向后方向，向左方向和向右方向上的加速度作用在储备杯内的燃料上的情况下，燃料引入室内的一些燃料流入燃料送出室。提供了一种燃料箱结构，其能够在燃料容纳部内的燃料加速的情况下可靠地确保燃料供给室内的燃料。

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