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1. 发明授权

US08426084B2 Pellicle for lithography 有权
标题翻译：光刻胶片
公开(公告)号：US08426084B2
公开(公告)日：2013-04-23
申请号：US12954351
申请日：2010-11-24
申请人： Toru Shirasaki , Kenichi Fukuda
发明人： Toru Shirasaki , Kenichi Fukuda
IPC分类号： G03F1/64
CPC分类号： G03F1/64 , G03F1/62
摘要： A pellicle 10 for lithography includes a pellicle frame 3, a pellicle membrane 1 adhered onto the upper end surface of the pellicle frame 3 and an agglutinant layer 4 formed on the lower surface of the pellicle frame 3 and the agglutinant layer 4 is formed by hardening a curable composition containing a straight chain perfluoro compound having a perfluoro structure in a main chain. The thus constituted pellicle 10 generates only a small amount of a decomposition gas even when it is used for a long time, thereby preventing solid-like foreign materials from separating out on a pattern region of a photomask 5 and can suppress degradation of an the agglutinant agent contained in an agglutinant layer 4 to be used for fixing a photomask 5 to the pellicle frame 3. Further, this pellicle 10 can be easily peeled off from a photomask 5 and replaced with a new one.
摘要翻译：用于光刻的防护薄膜组件10包括防护薄膜框架3，粘附在防护薄膜组件框架3的上端表面上的防护薄膜1和形成在防护薄膜框架3的下表面上的凝集层4和凝集层4通过硬化含有在主链中具有全氟结构的直链全氟化合物的固化性组合物。即使长时间使用，这样构成的防护薄膜组件10仅产生少量的分解气体，从而防止固体状杂质在光掩模5的图案区域分离出来，并且能够抑制凝集物的劣化包含在用于将光掩模5固定在防护薄膜组件框架3上的凝集层4中的试剂。此外，该防护薄膜组件10可以容易地从光掩模5剥离并替换为新的。

2. 发明授权

US08221945B2 Pellicle frame and lithographic pellicle 有权
标题翻译：防护薄膜组件和平版胶片
公开(公告)号：US08221945B2
公开(公告)日：2012-07-17
申请号：US12819536
申请日：2010-06-21
申请人： Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
发明人： Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
IPC分类号： G03F1/62 , G03F1/64
CPC分类号： G03F1/64
摘要： A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has a curved line-containing recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and an area of no greater than 20 mm2.
摘要翻译：提供一种防护薄膜组件框架，其包括防护薄膜框架杆，所述防护薄膜框架杆具有在具有彼此平行的上边缘和下边缘的四边形的至少一个侧边缘中具有弯曲线容纳凹部的形状的横截面，面积不大于20mm2。

3. 发明授权

US07968252B2 Pellicle frame 有权
标题翻译：防护薄膜框架
公开(公告)号：US07968252B2
公开(公告)日：2011-06-28
申请号：US12204257
申请日：2008-09-04
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/00 , B32B1/00
CPC分类号： G03F1/64 , Y10T428/13
摘要： The present invention is directed to reduce pellicle frame distortions due to the tension of a pellicle film and caused during handling, thereby providing an excellent pellicle frame capable of reducing the distortion of a photomask due to a pellicle affixation. In the pellicle frame of the present invention, the frame consists of a plurality of layers of which at least one layer has a different elastic modulus. It is preferable to: make the pellicle frame compositely of a layer having an elastic modulus of 10 GPa or smaller and of a layer having an elastic modulus of 50 GPa or greater; join these layers of the pellicle frame in a direction perpendicular to the pellicle film face; laminate such that layers having a large elastic modulus form the outermost layer; or reverse this lamination structure.
摘要翻译：本发明涉及由于防护薄膜的张力而引起的防护薄膜组件的变形，并且在处理过程中引起的，由此提供了能够减少由于防护薄膜组件而导致的光掩模变形的优良防护薄膜框架。在本发明的防护薄膜框架中，框架由多个层组成，至少一层具有不同的弹性模量。优选：使防弹薄膜组件复合地具有弹性模量为10GPa以下的层和弹性模量为50GPa以上的层; 在防护薄膜组件框架的这些层垂直于防护薄膜表面的方向上连接; 使得具有大弹性模量的层形成最外层; 或反转该层压结构。

4. 发明授权

US07901841B2 Pellicle for photolithography 有权
标题翻译：光刻薄膜
公开(公告)号：US07901841B2
公开(公告)日：2011-03-08
申请号：US11898142
申请日：2007-09-10
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/00
CPC分类号： G03F1/64
摘要： In a photolithographic pellicle for dustproof protection of a photomask for photolithographic patterning by mounting thereon with the aid of a pressure-sensitive adhesive layer on one end surface of the pellicle frame, the adverse influence on the flatness of the photomask caused by mounting the pellicle can be minimized when the thickness of the pressure-sensitive adhesive layer is 0.4 mm or larger or when the elastic modulus of the layer does not exceed 0.5 MPa.
摘要翻译：在用于通过在防护薄膜组件框架的一个端面上借助于粘合剂层安装在其上的用于光刻图案的光掩模的光刻防护薄膜组件中，通过安装防护薄膜组件导致的光掩模的平坦度的不利影响当压敏粘合剂层的厚度为0.4mm以上时或者当层的弹性模量不超过0.5MPa时，可以使其最小化。

5. 发明申请

US20070238030A1 PELLICLE FOR LITHOGRAPHY 审中-公开
标题翻译：胶版胶片
公开(公告)号：US20070238030A1
公开(公告)日：2007-10-11
申请号：US11683638
申请日：2007-03-08
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/14 , A47G1/12 , G03F1/00
CPC分类号： G03F1/62 , G03F7/70983
摘要： The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic procedure. The pellicle used in the photolithography using ArF excimer laser beams is characterized in that the pellicle has a pellicle membrane having a thickness which is 400 nm or smaller and at which the membrane exhibits a local maximum transmissivity to a vertically incident ArF excimer laser beam. Also, the pellicle is characterized by having a pellicle membrane having a thickness at which the membrane exhibits a local maximum transmissivity to an inclinedly incident ArF excimer laser beam. Herein, the angle of inclined incidence is preferably 13.4 degrees, and the pellicle membrane has preferably a thickness of 600 nm or smaller, in particular in a range selected from 560 to 563 nm and 489 to 494 nm and 418 to 425 nm and 346 to 355 nm and 275 to 286 nm and 204 to 217 nm.
摘要翻译：本发明提供了一种用于光刻中的光刻用防护薄膜，为可用于光刻工艺的倾斜入射光束提供更宽的透射率范围。使用ArF准分子激光的光刻法中使用的防护薄膜组件的特征在于，防护薄膜组件具有厚度为400nm以下的防护薄膜，并且膜对垂直入射的ArF准分子激光束具有局部最大透射率。此外，防护薄膜组件的特征在于具有薄膜，薄膜的厚度在该薄膜的表现出对倾斜入射的ArF准分子激光束的局部最大透射率。这里，倾斜入射角优选为13.4度，防护薄膜的厚度优选为600nm以下，特别优选为560〜563nm，489〜494nm，418〜425nm，346〜 355nm和275至286nm和204至217nm。

6. 发明授权

US06977126B2 Pellicle, photomask, pellicle frame, and method for manufacturing pellicle 有权
标题翻译：防护薄膜组件，光掩模，防护薄膜组件和防护薄膜制造方法
公开(公告)号：US06977126B2
公开(公告)日：2005-12-20
申请号：US10016628
申请日：2001-12-17
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F1/62 , G03F1/64 , H01L21/027 , G03F9/00 , G03F7/00
CPC分类号： G03F1/64 , G03F7/70808
摘要： A pellicle for protecting a reticle, on which a circuit pattern is formed for manufacturing a semiconductor device, from an attachment of a foreign matter, comprising: a pellicle film having a predetermined thickness, through which a light transmits to the reticle; and a pellicle frame, on which a periphery of the pellicle film contacts, including: a body part having a frame shape, the height of which is substantially constant all over the body part; and an upper protruding part formed on an upper end of the body part that protrudes upward from the upper end of the body part for directly contacting with a surface of the pellicle film, the height of the upper protruding part being constant all over the upper protruding part.
摘要翻译：一种用于保护用于制造半导体器件的电路图案用于制造半导体器件的掩模版的防护薄膜，其特征在于，包括：具有预定厚度的防护薄膜，光通过该防护薄膜透射到所述掩模版; 以及防护薄膜组件，防护薄膜组件的周边与其接触，防护薄膜组件框架包括：主体部分，其具有框架形状，其高度在整个身体部分上基本上恒定; 以及形成在所述主体部的上端部的上部突出部，其从所述主体部的上端向上方突出，以与所述防护薄膜的表面直接接触，所述上部突出部的高度在所述上部突出部部分。

7. 发明授权

US06593034B1 Framed pellicle for protection of photolithographic photomask 有权
标题翻译：用于保护光刻光掩模的防护薄膜
公开(公告)号：US06593034B1
公开(公告)日：2003-07-15
申请号：US09706757
申请日：2000-11-07
申请人： Toru Shirasaki
发明人： Toru Shirasaki
IPC分类号： G03F900
CPC分类号： G03F1/64
摘要： An improvement is provided in the photolithographic patterning of a photoresist layer by pattern-wise exposure to short-wavelength ultraviolet light through a pattern-bearing photomask which is dustproof protected by mounting a framed pellicle thereon. With an object to overcome the troubles therein due to absorption of short-wavelength ultraviolet light by oxygen and the interaction of atmospheric oxygen in the space surrounded by the photomask and the framed pellicle with the energy of the short-wavelength ultraviolet, the framed pellicle is provided in the frame with at least two gas-passage openings through which the air inside is replaced with nitrogen in conducting the ultraviolet exposure. The openings are preferably covered with a filter member and covered further with a covering member having a gas nozzle which is connected to a feed source of an inert gas such as nitrogen.
摘要翻译：通过图案式曝光到短波紫外光，通过在其上安装框架防护薄膜的防尘防护图案的光掩模，在光致抗蚀剂层的光刻图案中提供了改进。为了克服其中由于氧气引起的短波长紫外光的吸收以及由光掩模和框架防护薄膜组成的空间中的大气氧与短波长紫外线的能量的相互作用的目的，框架防护薄膜是在框架中设置有至少两个气体通道开口，在进行紫外线曝光时，内部的空气被氮气置换。这些开口优选用过滤器构件覆盖，并进一步覆盖具有气体喷嘴的覆盖构件，该气体喷嘴连接到诸如氮气的惰性气体的进料源。

8. 发明授权

US5693382A Frame-supported pellicle for dustproof protection of photomask in photolithography 失效
标题翻译：用于光刻中光掩模防尘保护的框架支撑防护薄膜
公开(公告)号：US5693382A
公开(公告)日：1997-12-02
申请号：US647140
申请日：1996-05-09
申请人： Yuichi Hamada , Satoshi Kawakami , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
发明人： Yuichi Hamada , Satoshi Kawakami , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
IPC分类号： C09J127/12 , G03F1/62 , G03F1/64 , G03F7/20 , H01L21/027 , A47G1/12
CPC分类号： G03F1/64 , G03F1/62 , Y10T428/3154 , Y10T428/31544
摘要： Disclosed is a frame-supported pellicle, which is an integral body consisting of a rigid frame and a transparent plastic film adhesively bonded to one end surface of the frame in a slack-free fashion, for dustproof protection of a photomask used in a photolithographic patterning work in the manufacture of fine electronic devices such as LSIs and liquid crystal display panels. The frame-supported pellicle is prepared by bonding the frame and plastic film with an adhesive having a glass transition temperature substantially lower than that of the polymeric resin forming the film and the adhesive bonding work is performed at a temperature higher than the glass transition temperature of the adhesive but lower than that of the polymeric resin of the film so that excellent adhesive bonding strength can be obtained between the frame and the resin film still without causing any adverse influences on the resin film such as distortion and crease formation.
摘要翻译：公开了一种框架支撑的防护薄膜，其是由刚性框架和透明塑料薄膜组成的整体，所述刚性框架和透明塑料薄膜以无松弛的方式粘合到所述框架的一个端面上，以防止光刻图案中使用的光掩模的防尘保护在制造诸如LSI和液晶显示面板的精细电子器件中工作。框架支撑的防护薄膜组件是用玻璃化转变温度基本上低于形成薄膜的聚合物树脂的玻璃化转变温度的粘合剂将框架和塑料薄膜粘合而制成的，并且粘合剂在高于玻璃化转变温度粘合剂但低于膜的聚合物树脂的粘合剂，从而在框架和树脂膜之间仍然可以获得优异的粘合强度，而不会对树脂膜造成任何不利影响，例如变形和折痕形成。

9. 发明授权

US5419972A Frame-supported pellicle for dustproof protection of photomask 失效
标题翻译：镜框防护薄膜，用于光掩模的防尘保护
公开(公告)号：US5419972A
公开(公告)日：1995-05-30
申请号：US287778
申请日：1994-08-09
申请人： Sakae Kawaguchi , Yuichi Hamada , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
发明人： Sakae Kawaguchi , Yuichi Hamada , Toru Shirasaki , Yoshihiko Nagata , Meguru Kashida , Yoshihiro Kubota
IPC分类号： G03F1/64 , G03F7/20 , H01L21/027 , G03B27/58
CPC分类号： G03F1/64 , G03F7/70866 , Y10T428/12569 , Y10T428/12736 , Y10T428/12743 , Y10T428/1275 , Y10T428/12764
摘要： An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by providing the whole surface of the pellicle frame made from an alluminum alloy with a metallic plating layer of nickel or chromium so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling as a consequence of dust particle formation by contacting with the inner surface of the holder case by virtue of the extremely high smoothness of the metal-plated frame surface.
摘要翻译：提出了一种用于光掩模防尘保护的框架式防护薄膜组件的改进，该光掩模由刚性框架和透明塑料膜组成，该透明塑料膜以无松弛的方式粘合到框架的一个端面上，用于光刻图案工作用于制造精密电子零件和装置。通过提供由铝合金制成的防护薄膜组件的整个表面由镍或铬的金属镀层提供，从而完全解决了在运输和处理过程中防尘薄膜上的灰尘颗粒沉积在防尘薄膜上的不可避免的问题由于金属镀层的框架表面的平滑度极高，因此与保持器壳体的内表面接触而形成粉尘颗粒的结果。

10. 发明授权

US08467035B2 Pellicle frame and lithographic pellicle 有权
标题翻译：防护薄膜组件和平版胶片
公开(公告)号：US08467035B2
公开(公告)日：2013-06-18
申请号：US12819486
申请日：2010-06-21
申请人： Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
发明人： Toru Shirasaki , Kishore Chakravorty , David Mushell , Grace Ng
IPC分类号： G03B27/62 , G03F1/62
CPC分类号： G03F1/64
摘要： A pellicle frame is provided that includes a pellicle frame bar having a cross-section with a shape that has at least one triangular recess in at least one side edge of a quadrilateral having an upper edge and a lower edge parallel to each other and a cross-sectional area of no greater than 20 mm2. There is also provided a lithographic pellicle that includes a pellicle film stretched over one end face of the pellicle frame via a pellicle film adhesive, and that includes an exposure master plate adhesive on the other end face.
摘要翻译：提供一种防护薄膜组件框架，其包括防护薄膜框架杆，所述防护薄膜框架杆具有截面形状，所述形状在具有彼此平行的上边缘和下边缘的四边形的至少一个侧边缘中具有至少一个三角形凹槽，切片面积不大于20mm2。还提供了一种平版印刷薄膜，其包括通过防护薄膜粘合剂在防护薄膜组件框架的一个端面上延伸的防护薄膜，并且在另一端面上包括曝光母板粘合剂。

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