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21. 发明申请

WO2003021728A3 VERY NARROW BAND, TWO CHAMBER, HIGH REP RATE GAS DISCHARGE LASER SYSTEM 审中-公开
公开(公告)号：WO2003021728A3
公开(公告)日：2003-03-13
申请号：PCT/US2002/027925
申请日：2002-08-28
申请人： CYMER, INC. , KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
发明人： KNOWLES, David, S. , BROWN, Daniel, J., W. , BESAUCELE, Herve, A. , MYERS, David, W. , ERSHOV, Alexander, I. , PARTLO, William, N. , SANDSTROM, Richard, L. , DAS, Plash, P. , ANDERSON, Stuart, L. , FOMENKOV, Igor, V. , UJAZDOWSKI, Richard, C. , ONKELS, Eckehard, D. , NESS, Richard, M. , SMITH, Scott, T. , HULBURD, William, G. , OICLES, Jeffrey
IPC分类号： H01S3/11
摘要： An injection seeded modular gas discharge laser system (2) capable of producing high quality pulsed beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator (10) producing a very narrow band seed beam, which is amplified (12) in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in the ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan (10A) providing sufficient gas flow to permit operation at pulse rates of 4,000 Hz or greater by cleaning debris from the discharge region in less time that the approximately 0.25 milliseconds between pulses. The masters oscillation is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

22. 发明申请

WO0199246A3 LASER WAVELENGTH CONTROL UNIT WITH PIEZOELECTRIC DRIVER 审中-公开
标题翻译：具有压电驱动器的激光波长控制单元
公开(公告)号：WO0199246A3
公开(公告)日：2002-02-28
申请号：PCT/US0113863
申请日：2001-04-30
申请人： CYMER INC , SPANGLER RONALD L , JACQUES ROBERT N , EVERAGE GEORGE J , ANDERSON STUART L , PALENSCHAT FREDERICK A , FOMENKOV IGOR V , SANDSTROM RICHARD L , PARTLO WILLIAM N , ALGOTS JOHN M , BROWN DANIEL J W
发明人： SPANGLER RONALD L , JACQUES ROBERT N , EVERAGE GEORGE J , ANDERSON STUART L , PALENSCHAT FREDERICK A , FOMENKOV IGOR V , SANDSTROM RICHARD L , PARTLO WILLIAM N , ALGOTS JOHN M , BROWN DANIEL J W
IPC分类号： H01S3/137 , G03F7/20 , H01S3/036 , H01S3/038 , H01S3/04 , H01S3/041 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/11 , H01S3/13 , H01S3/131 , H01S3/134 , H01S3/22 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： Fast wavelenght correction equipment for an electric discharge laser includes at least one piezoelectic drive (80) and a fast wavelength measurement system and a fast feedback response time. In a preferred embodiment equipment is provided to control wavelength on a slow, intermediate amd fast time scales, which vary in range from several milliseconds to a few microseconds respectively. Techniques include a combination of a relatively slow stepper motor (82) and a very fast piezoelectric drive (80) for tuning the laser wavelength using a tuning mirror (14).
摘要翻译：用于放电激光器的快速波长校正设备包括至少一个压电驱动器（80）和快速波长测量系统以及快速反馈响应时间。在优选实施例中，提供了设备来控制在缓慢的，中间的快速时间尺度上的波长，其分别在几毫秒至几微秒的范围内变化。技术包括相对较慢的步进电机（82）和非常快的压电驱动器（80）的组合，用于使用调谐镜（14）来调谐激光波长。

23. 发明申请

WO9837601A3 AERODYNAMIC CHAMBER DESIGN FOR HIGH PULSE REPETITION RATE EXCIMER LASERS 审中-公开
标题翻译：高脉冲重复速率激光器的空气动力室设计
公开(公告)号：WO9837601A3
公开(公告)日：1998-11-19
申请号：PCT/US9802041
申请日：1998-02-04
申请人： CYMER INC , MORTON RICHARD G , FOMENKOV IGOR V , PARTLO WILLIAM N
发明人： MORTON RICHARD G , FOMENKOV IGOR V , PARTLO WILLIAM N
IPC分类号： H01S3/097 , H01S3/036 , H01S3/225 , H01S
CPC分类号： H01S3/036 , H01S3/225
摘要： An excimer laser (100) chamber capable of arc-free operation at repetitive pulse rates of 1 kHz or greater is provided. The chamber balances the electrode design criteria required to produce a well-defined discharge channel with the flow design criteria required to achieve high clearing rates at comparatively high blower efficiency. A ceramic insulator (118) located on either side of the cathode (108)/pre-ionizer (130) assembly enhances the flow of gas through the discharge region by reducing the turbulence in the electrode region. A series of specifically designed flow vanes further enhances the gas flow.

24. 发明申请

WO2012170144A1 SYSTEMS AND METHODS FOR BUFFER GAS FLOW STABILIZATION IN A LASER PRODUCED PLASMA LIGHT SOURCE 审中-公开
标题翻译：激光产生的等离子体光源中缓冲气体流动稳定的系统和方法
公开(公告)号：WO2012170144A1
公开(公告)日：2012-12-13
申请号：PCT/US2012/037363
申请日：2012-05-10
申请人： CYMER, INC. , FOMENKOV, Igor, V. , FLEUROV, Vladimir, B. , PARTLO, William, N. , ERSHOV, Alexander, I.
发明人： FOMENKOV, Igor, V. , FLEUROV, Vladimir, B. , PARTLO, William, N. , ERSHOV, Alexander, I.
IPC分类号： H05G2/00
CPC分类号： H05G2/005 , H05G2/008
摘要： An extreme-ultraviolet (EUV) light source comprising an optic, a target material, mid a laser beam passing through said optic along a beam path to irradiate said target material; The EUV light source further includes a system generating a gas flow directed toward said target material along said beam -path, said system having a tapering member surrounding a volume and a plurality of gas lines, each gas fine outputtmg a gas stream into said volume.
摘要翻译：一种极紫外（EUV）光源，包括光学元件，目标材料，沿着光束路径通过所述光学元件的激光束中间，以照射所述靶材料; EUV光源还包括产生沿着所述光束路径朝向所述目标材料的气流的系统，所述系统具有围绕体积和多个气体管线的锥形构件，每个气体精细地输出到所述体积中的气流。

25. 发明申请

WO2012134736A1 SYSTEM AND METHOD FOR COMPENSATING FOR THERMAL EFFECTS IN AN EUV LIGHT SOURCE 审中-公开
标题翻译：用于补偿EUV光源中的热效应的系统和方法
公开(公告)号：WO2012134736A1
公开(公告)日：2012-10-04
申请号：PCT/US2012/027907
申请日：2012-03-06
申请人： CYMER, INC. , GRAHAM, Matthew, R. , HAUGAN, Olav , PARTLO, William, N.
发明人： GRAHAM, Matthew, R. , HAUGAN, Olav , PARTLO, William, N.
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , G02B7/028 , H01S3/005
摘要： A method and apparatus for compensating for thermal effects on the focal spot of a lens used to focus a laser beam on a target material at an irradiation site in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. The EUV energy output of the light system is measured at sample intervals as a proxy for the laser power. The thermal load on the focusing lens is estimated from the measured EUV power, the expected change in the focal length of the lens for the thermal load is calculated, and the lens position is adjusted to compensate for the calculated focal length change. The actual position of the lens may be determined and compared to its desired position, and adjusted to insure that it remains in the desired position.
摘要翻译：公开了一种用于补偿在激光产生的等离子体（UVP）极紫外（EUV）光系统中的照射位置处将激光束聚焦在目标材料上的用于焦点的焦点的热效应的方法和装置。以采样间隔测量光系统的EUV能量输出作为激光功率的代表。根据所测量的EUV功率估计聚焦透镜上的热负荷，计算用于热负荷的透镜焦距的预期变化，并且调节透镜位置以补偿计算的焦距变化。可以确定透镜的实际位置并将其与其期望位置进行比较，并进行调整以确保其保持在期望的位置。

26. 发明申请

WO2012118644A1 SYSTEMS AND METHODS FOR OPTICS CLEANING IN AN EUV LIGHT SOURCE 审中-公开
标题翻译：在光源中进行光学清洁的系统和方法
公开(公告)号：WO2012118644A1
公开(公告)日：2012-09-07
申请号：PCT/US2012/025963
申请日：2012-02-21
申请人： CYMER, INC. , BYKANOV, Alexander, N. , DE DEA, Silvia , ERSHOV, Alexander, I. , FLEUROV, Vladimir, B. , FOMENKOV, Igov, V. , PARTLO, William, N.
发明人： BYKANOV, Alexander, N. , DE DEA, Silvia , ERSHOV, Alexander, I. , FLEUROV, Vladimir, B. , FOMENKOV, Igov, V. , PARTLO, William, N.
IPC分类号： C03C15/00
CPC分类号： H05G2/008 , G03F7/70925 , H05G2/005
摘要： An extreme-ultraviolet (EUV) light source h described herein comprising an optic; a primary EUV light radiator generating an EUV light emitting plasma and producing, a deposit on said optic; and a cleaning system comprising a gas and a secondary light radiator, the secondary light radiator generating a laser produced plasma and producing a cleaning species with the gas.
摘要翻译：本文所述的极紫外（EUV）光源h包括光学元件; 产生EUV发光等离子体的主要EUV光辐射体并在所述光学器件上产生沉积物; 以及包括气体和次级光辐射器的清洁系统，所述次级光辐射体产生激光产生的等离子体并且产生具有气体的清洁物质。

27. 发明申请

WO2011075345A1 METROLOGY FOR EXTREME ULTRAVIOLET LIGHT SOURCE 审中-公开
标题翻译：极光紫外光源的计量学
公开(公告)号：WO2011075345A1
公开(公告)日：2011-06-23
申请号：PCT/US2010/059277
申请日：2010-12-07
申请人： CYMER, INC. , SENEKERIMYAN, Vahan , KIM, Nam-Hyong , BERGSTEDT, Robert, N. , FOMENKOV, Igor, V. , PARTLO, William, N.
发明人： SENEKERIMYAN, Vahan , KIM, Nam-Hyong , BERGSTEDT, Robert, N. , FOMENKOV, Igor, V. , PARTLO, William, N.
IPC分类号： H05G2/00
CPC分类号： G01J1/429 , H05G2/008
摘要： An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; a beam delivery system configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location; and a metrology system. The beam delivery system includes converging lens configured and arranged to focus the amplified light beam at the target location, The metrology system includes a light collection system configured to collect a portion of the amplified light beam reflected from the converging lens and a portion of a guide laser beam reflected from the converging lens. The light collection system includes a dichroic optical device configured to optically separate the portions.
摘要翻译：极紫外光系统包括产生放大光束的驱动激光器系统; 配置成在目标位置产生目标材料的目标材料输送系统; 射束传送系统，被配置为接收从驱动激光系统发射的放大光束并将放大的光束引向目标位置; 和计量系统。光束传送系统包括会聚透镜，其被配置和布置成将放大的光束聚焦在目标位置。测量系统包括光收集系统，其被配置为收集从会聚透镜反射的放大光束的一部分和导引部分从会聚透镜反射的激光束。光采集系统包括配置为光学地分离这些部分的二向色光学装置。

28. 发明申请

WO2010048604A1 SYSTEM METHOD AND APPARATUS FOR SELECTING AND CONTROLLING LIGHT SOURCE BANDWIDTH 审中-公开
标题翻译：用于选择和控制光源带宽的系统方法和装置
公开(公告)号：WO2010048604A1
公开(公告)日：2010-04-29
申请号：PCT/US2009/061981
申请日：2009-10-24
申请人： CYMER, INC. , FIGUEROA, Efrain , PARTLO, William, N. , MARTIN, John, Martin , MOSER, Ralf , DEUBEL, Markus , HEINRICH, Andreas , GLOCKL, Oliver , LENGEL, Anton , ACKVA, Johannes
发明人： FIGUEROA, Efrain , PARTLO, William, N. , MARTIN, John, Martin , MOSER, Ralf , DEUBEL, Markus , HEINRICH, Andreas , GLOCKL, Oliver , LENGEL, Anton , ACKVA, Johannes
IPC分类号： H01S3/10
CPC分类号： H01S3/08009 , G01J3/02 , G01J3/0237 , G01J3/027 , G01J3/06 , G01J3/14 , G01J3/18 , G01J2003/1208 , G02B5/1828 , H01S3/08004 , H01S3/1055 , H01S3/1067
摘要： A mechanism for bandwidth selection includes a dispersive optical element having a body including a reflective face of dispersion including an area of incidence extending in a longitudinal axis direction along the reflective face of the dispersive optical element The body also includes a first end block, disposed at a first longitudinal end of the body and a second end block, disposed at a second longitudinal end of the body, the second longitudinal end being opposite the first longitudinal end The bandwidth selection mechanism also includes a first actuator mounted on a second face of the dispersive optical element, the second face opposite the reflective face, the first actuator having a first end coupled to the first end block and a second end coupled to the second end block, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block
摘要翻译：用于带宽选择的机构包括具有主体的分散光学元件，该主体包括具有沿着沿着分散光学元件的反射面的纵轴方向延伸的入射区域的分散体的反射面。本体还包括第一端块，主体的第一纵向端部和设置在主体的第二纵向端部处的第二纵向端部，第二纵向端部与第一纵向端部相对。带宽选择机构还包括安装在分散体的第二面上的第一致动器光学元件，与反射面相对的第二面，第一致动器具有联接到第一端块的第一端和联接到第二端块的第二端，第一致动器可操作以对第一端施加相等且相反的力块和第二端块

29. 发明申请

WO2006049886A3 EUV COLLECTOR DEBRIS MANAGEMENT 审中-公开
标题翻译： EUV收集器破产管理
公开(公告)号：WO2006049886A3
公开(公告)日：2009-03-05
申请号：PCT/US2005037725
申请日：2005-10-20
申请人： CYMER INC , PARTLO WILLIAM N , FOMENKOV IGOR V , ERSHOV ALEXANDER I , OLDHAM WILLIAM , HEMBERG OSCAR , MARX WILLIAM F
发明人： PARTLO WILLIAM N , FOMENKOV IGOR V , ERSHOV ALEXANDER I , OLDHAM WILLIAM , HEMBERG OSCAR , MARX WILLIAM F
IPC分类号： H01L21/302 , H01L21/306
CPC分类号： B08B7/00
摘要： A method and apparatus that may comprise an EUV light producing mechanism utilizing an EUV plasma source material comprising a material that will form an etching compound, which plasma source material produces EUV light in a band around a selected center wavelength comprising: an EUV plasma generation chamber; an EUV light collector contained within the chamber having a reflective surface containing at least one layer comprising a material that does not form an etching compound and/or forms a compound layer that does not significantly reduce the reflectivity of the reflective surface in the band; an etchant source gas contained within the chamber comprising an etchant source material with which the plasma source material forms an etching compound, which etching compound has a vapor pressure that will allow etching of the etching compound from the reflective surface. The etchant source material may comprises a halogen or halogen compound. The etchant source material may be selected based upon the etching being stimulated in the presence of photons of EUV light and/or DUV light and/or any excited energetic photons with sufficient energy to stimulate the etching of the plasma source material. The apparatus may further comprise an etching stimulation plasma generator providing an etching stimulation plasma in the working vicinity of the reflective surface; and the etchant source material may be selected based upon the etching being stimulated by an etching stimulation plasma. There may also be an ion accelerator accelerating ions toward the reflective surface. The ions may comprise etchant source material. The apparatus and method may comprise a part of an EUV production subsystem with an optical element to be etched of plasma source material.
摘要翻译：可以包括使用EUV等离子体源材料的EUV发光机构的方法和装置，所述EUV等离子体源材料包括将形成蚀刻化合物的材料，所述等离子体源材料在所选择的中心波长周围的带内产生EUV光，包括：EUV等离子体产生室 ; 包含在室内的EUV光收集器具有反射表面，该反射表面包含至少一层，该层包含不形成蚀刻化合物的材料和/或形成不显着降低该带中的反射表面的反射率的化合物层; 包含在腔室内的蚀刻剂源气体包括蚀刻剂源材料，等离子体源材料与蚀刻剂源材料形成蚀刻化合物，该蚀刻化合物具有允许从反射表面蚀刻蚀刻化合物的蒸气压。蚀刻剂源材料可以包含卤素或卤素化合物。蚀刻剂源材料可以基于在存在EUV光和/或DUV光的光子和/或具有足够能量以激发等离子体源材料的蚀刻的任何激发能量光子的情况下被激发的蚀刻来选择。该装置还可以包括在反射表面的工作附近提供蚀刻刺激等离子体的蚀刻刺激等离子体发生器; 并且蚀刻剂源材料可以基于通过蚀刻刺激等离子体刺激的蚀刻来选择。还可以存在离子加速剂将离子朝向反射表面加速。离子可以包括蚀刻剂源材料。该装置和方法可以包括具有待蚀刻的等离子体源材料的光学元件的EUV生产子系统的一部分。

30. 发明申请

WO2008127599A3 METHOD AND APPARATUS FOR STABILIZING AND TUNING THE BANDWIDTH OF LASER LIGHT 审中-公开
标题翻译：用于稳定和调谐激光束带宽的方法和装置
公开(公告)号：WO2008127599A3
公开(公告)日：2008-12-11
申请号：PCT/US2008004598
申请日：2008-04-09
申请人： CYMER INC A NEVADA CORP , PARTLO WILLIAM N , JACQUES ROBERT N , O'BRIEN KEVIN M , ISHIHARA TOSHIHIKO
发明人： PARTLO WILLIAM N , JACQUES ROBERT N , O'BRIEN KEVIN M , ISHIHARA TOSHIHIKO
IPC分类号： H01S3/22
CPC分类号： H01S3/1055 , G02B27/646 , H01S3/137 , H01S3/139 , H01S3/225 , H01S2301/02
摘要： According to aspects of an embodiment of the disclosed subject matter, method and apparatus are disclose that ma y comprise adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, without utilizing any beam magnification control, or adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for other than bandwidth control, and adjusting a differential timing between gas discharges in the seed laser and amplifier laser for bandwidth control, based on the error signal, or for control of another laser operating parameter other than bandwidth, while utilizing beam magnification control for bandwidth control based on the error signal.
摘要翻译：根据所公开的主题的实施例的方面，公开了一种方法和装置，其包括基于误差信号调整种子激光器中的气体放电与用于带宽控制的放大器激光器之间的差分定时，或用于控制另一个除了带宽之外的激光操作参数，不利用任何光束放大控制，或者基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一个激光器操作参数同时利用除带宽控制之外的光束放大控制，并且基于误差信号调整种子激光器和放大器激光器中的气体放电之间的差分定时，或用于控制除带宽之外的另一激光器操作参数，同时利用基于误差信号的带宽控制的光束放大控制。

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