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21. 发明申请

US20080285018A1 DEVICE AND METHOD FOR RANGE-RESOLVED DETERMINATION OF SCATTERED LIGHT, AND AN ILLUMINATION MASK 有权
标题翻译：用于范围确定散射光的方法和方法，以及照明面具
公开(公告)号：US20080285018A1
公开(公告)日：2008-11-20
申请号：US12181774
申请日：2008-07-29
申请人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
发明人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
IPC分类号： G01J1/00
CPC分类号： G03F7/70591 , G03F7/70941
摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.
摘要翻译：一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域，提供相关联的图像场掩模和相应的设备。还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处外部暗场区域，其定义了最大散射范围。该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

22. 发明授权

US07408631B2 Device for the range-resolved determination of scattered light, operating method, illumination mask and image-field mask 有权
标题翻译：用于范围分辨的散射光确定装置，操作方法，照明掩模和图像场掩模
公开(公告)号：US07408631B2
公开(公告)日：2008-08-05
申请号：US10960082
申请日：2004-10-08
申请人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
发明人： Michael Arnz , Oswald Gromer , Gerd Klose , Joachim Stuehler , Matthias Manger
IPC分类号： G01B9/00 , G01J1/00 , G03B27/42
CPC分类号： G03F7/70591 , G03F7/70941
摘要： An illumination mask (10a) for a device for the range-resolved determination of scattered light, having one or more scattered-light measuring structures (11a) which respectively include an inner dark-field zone which defines a minimum scattering range, to an associated image-field mask and a corresponding device is provided. Also provided is an associated operating method and a microlithography projection-exposure system having such a device. The scattered-lighter measuring structure in the illumination mask has a scattered-light marker zone (20a) in the form of a bright-field zone, which on the one hand borders the inner dark-field zone and on the other hand borders an outer dark-field zone, which defines a maximum scattering range. The device may optionally be designed for the multi-channel measuring of scattered light by using a suitable image-field mask and also for multi-channel wavefront measurement, and the detection part may contain an immersion medium. Applications include, for example, the range-resolved determination of scattered light of projection objectives in microlithography projection-exposure systems.
摘要翻译：一种用于用于范围分辨确定散射光的装置的照明掩模（10a），具有一个或多个散射光测量结构（11a），其分别包括限定最小散射范围的内部暗场区域，提供相关联的图像场掩模和相应的设备。还提供了具有这种装置的相关联的操作方法和微光刻投影曝光系统。照明面罩中散焦点测量结构具有明亮区域形式的散射光标记区域（20a），其一方面与内暗区区域相接触，另一方面边界处外部暗场区域，其定义了最大散射范围。该设备可以可选地被设计用于通过使用合适的图像场掩模并且还用于多通道波前测量的散射光的多通道测量，并且检测部分可以包含浸没介质。应用包括例如在微光刻投影曝光系统中投射物镜的散射光的范围分辨确定。

23. 发明授权

US09297994B2 Grating-assisted autofocus device and autofocusing method for an imaging device 有权
标题翻译：用于成像装置的光栅辅助自动对焦装置和自动对焦方法
公开(公告)号：US09297994B2
公开(公告)日：2016-03-29
申请号：US13606997
申请日：2012-09-07
申请人： Sascha Perlitz , Michael Arnz , Dirk Seidel
发明人： Sascha Perlitz , Michael Arnz , Dirk Seidel
IPC分类号： G02B7/04 , H04N5/232 , G02B21/24
CPC分类号： G02B21/244 , G02B21/245
摘要： There is provided an autofocus device for an imaging device which has an imaging lens system with a first focal plane, an object stage for holding an object and a first movement module for the relative movement of object stage and imaging lens system, wherein the autofocus device comprises an image-recording module with a second focal plane the position of which relative to the first focal plane is known, a second movement module for the relative movement of object stage and image-recording module, a focus module for producing a two-dimensional, intensity-modulated focusing image in a focus module plane which intersects the second focal plane and a control module which controls the image-recording module for focusing the imaging device, which then records a first two-dimensional image of the object together with the focusing image during a predetermined first exposure time, and wherein the control module, using the first two-dimensional image recorded by means of the image-recording module and taking into account the relative position of the first and second focal plane, evaluates the required changes in distance between the object stage and the imaging lens system and controls the first movement module such that the evaluated change in distance is carried out, wherein the control module controls the second movement module such that, during the first exposure time for recording the first two-dimensional image, the object stage is moved relative to the image-recording module in a plane parallel to the second focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有具有第一焦平面的成像透镜系统，用于保持物体的物体台和用于物体台和成像透镜系统的相对运动的第一移动模块，其中自动对焦装置包括具有第二焦平面的图像记录模块，其相对于第一焦平面的位置是已知的，用于对象台和图像记录模块的相对移动的第二移动模块，用于产生二维，在与第二焦平面相交的聚焦模块平面中的强度调制聚焦图像和控制图像记录模块以控制成像装置聚焦的控制模块，该成像装置然后将对象的第一二维图像与聚焦在预定的第一曝光时间期间的图像，并且其中所述控制模块使用通过图像记录模式记录的第一二维图像并且考虑到第一和第二焦平面的相对位置，评估对象台和成像透镜系统之间所需的距离变化，并且控制第一移动模块，使得执行评估的距离变化，其中控制模块控制第二移动模块，使得在用于记录第一二维图像的第一曝光时间期间，物体台在平行于第二焦平面的平面中相对于图像记录模块移动。

24. 发明授权

US09014505B2 Method and device for determining the position of a first structure relative to a second structure or a part thereof 有权
标题翻译：用于确定第一结构相对于第二结构或其一部分的位置的方法和装置
公开(公告)号：US09014505B2
公开(公告)日：2015-04-21
申请号：US13491729
申请日：2012-06-08
申请人： Michael Arnz
发明人： Michael Arnz
IPC分类号： G06K9/00 , G03F7/20
CPC分类号： G03F7/70633
摘要： The position of a first structure relative to a second structure can be determined by a) providing a reference image containing the first structure, b) providing a measurement image containing the second structure, in which the measurement image is recorded with an image sensor with a plurality of sensor pixels and the image sensor has at least one known faulty sensor pixel, c) producing a masked measurement image with a masked region that corresponds to the second structure, and forming an optimization function of the shift of the masked measurement image and the reference image relative to each other, d) determining the extreme value of the optimization function and determining the optimum value of the shift based on the extreme value, and e) determining the position of the first structure relative to the second structure on the basis of the optimum shift value.
摘要翻译：第一结构相对于第二结构的位置可以通过以下步骤来确定：a）提供包含第一结构的参考图像，b）提供包含第二结构的测量图像，其中测量图像被记录有图像传感器多个传感器像素和图像传感器具有至少一个已知的故障传感器像素，c）产生具有对应于第二结构的掩蔽区域的掩蔽测量图像，并且形成屏蔽测量图像和参考图像，d）确定优化函数的极值并基于极值确定移位的最佳值，以及e）基于第一结构相对于第二结构确定第一结构的位置最佳偏移值。

25. 发明授权

US08693805B2 Determination of the relative position of two structures 有权
标题翻译：确定两个结构的相对位置
公开(公告)号：US08693805B2
公开(公告)日：2014-04-08
申请号：US13375830
申请日：2010-07-23
申请人： Michael Arnz , Dirk Seidel
发明人： Michael Arnz , Dirk Seidel
IPC分类号： G06K9/36 , G06K9/20 , G06K9/32
CPC分类号： G03F7/70633 , G03F7/70625
摘要： A method is provided for determining the position of a first structure (8a) relative to a second structure (8b) or a part thereof, said method having the steps of: a) providing a first picture (F1) having a multiplicity of pixels and which contains the first structure, b) providing a second picture (F2) having a multiplicity of pixels and which contains the second structure, c) forming an optimization function with the displacement of the two pictures relative to one another as parameter, the optimization function overlying the two pictures and masking the overlay such that in a determination of an extreme value of the optimization function a contribution is made only by the region of the overlay that corresponds to the second structure or the part thereof, d) ascertaining the extreme value of the optimization function and determining the optimal value of the displacement based on the extreme value of the optimization function, and e) determining the position of the first structure relative to the second structure or a part thereof with the optimal displacement value ascertained in step d).
摘要翻译：提供了一种用于确定第一结构（8a）相对于第二结构（8b）或其一部分的位置的方法，所述方法具有以下步骤：a）提供具有多个像素的第一图像（F1）和其包括第一结构，b）提供具有多个像素并且包含第二结构的第二图像（F2），c）形成具有两个图像相对于彼此的位移的优化函数作为参数，优化函数覆盖两幅图像并掩盖覆盖层，使得在确定最优化函数的极值时，仅通过对应于第二结构或其部分的覆盖区域进行贡献，d）确定最优值优化函数，并基于优化函数的极值确定位移的最优值，以及e）确定第一结构rel的位置具有在步骤d）中确定的最佳位移值的第二结构或其一部分。

26. 发明授权

US08473237B2 Method for calibrating a specimen stage of a metrology system and metrology system comprising a specimen stage 有权
标题翻译：用于校准包括样品台的计量系统和计量系统的样品台的方法
公开(公告)号：US08473237B2
公开(公告)日：2013-06-25
申请号：US12726908
申请日：2010-03-18
申请人： Alexander Huebel , Matthias Manger , Gerd Klose , Uwe Schellhorn , Michael Arnz
发明人： Alexander Huebel , Matthias Manger , Gerd Klose , Uwe Schellhorn , Michael Arnz
IPC分类号： G06F19/00 , G01B11/14
CPC分类号： G01B11/03 , G01B21/042
摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.
摘要翻译：提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内使用光学系统测量样品的校准位置和标记位置。使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。考虑到测量的标记位置，基于模型确定校准参数的值。

27. 发明申请

US20130062501A1 Autofocus Device and Autofocussing Method For An Imaging Device 有权
标题翻译：成像装置的自动对焦装置和自动聚焦方法
公开(公告)号：US20130062501A1
公开(公告)日：2013-03-14
申请号：US13606997
申请日：2012-09-07
申请人： Sascha Perlitz , Michael Arnz , Dirk Seidel
发明人： Sascha Perlitz , Michael Arnz , Dirk Seidel
IPC分类号： G02B27/40
CPC分类号： G02B21/244 , G02B21/245
摘要： There is provided an autofocus device for an imaging device which has an imaging lens system with a first focal plane, an object stage for holding an object, and a first movement module for the relative movement of object stage and imaging lens system. The autofocus device comprises an image-recording module with a second focal plane, a second movement module for the relative movement of object stage and image-recording module, and a control module which controls the image-recording module for focusing the imaging device. The control module controls the first movement module such that evaluated change in distance between the object stage and the imaging lens system is carried out, and controls the second movement module such that, during the first exposure time for recording the first two-dimensional image, the object stage is moved relative to the image-recording module in a plane parallel to the second focal plane.
摘要翻译：提供了一种用于成像装置的自动对焦装置，其具有具有第一焦平面的成像透镜系统，用于保持物体的物体台和用于物体台和成像透镜系统的相对运动的第一移动模块。自动对焦装置包括具有第二焦平面的图像记录模块，用于对象台和图像记录模块的相对移动的第二移动模块，以及控制图像记录模块以聚焦成像装置的控制模块。所述控制模块控制所述第一移动模块，使得执行所述对象台和所述成像镜头系统之间的距离的评估变化，并且控制所述第二移动模块，使得在用于记录所述第一二维图像的所述第一曝光时间期间，物体台在与第二焦平面平行的平面中相对于图像记录模块移动。

28. 发明申请

US20120121205A1 DETERMINATION OF THE RELATIVE POSITION OF TWO STRUCTURES 有权
标题翻译：确定两个结构的相对位置
公开(公告)号：US20120121205A1
公开(公告)日：2012-05-17
申请号：US13375830
申请日：2010-07-23
申请人： Michael Arnz , Dirk Seidel
发明人： Michael Arnz , Dirk Seidel
IPC分类号： G06K9/36
CPC分类号： G03F7/70633 , G03F7/70625
摘要： A method is provided for determining the position of a first structure (8a) relative to a second structure (8b) or a part thereof, said method having the steps of: a) providing a first picture (F1) having a multiplicity of pixels and which contains the first structure, b) providing a second picture (F2) having a multiplicity of pixels and which contains the second structure, c) forming an optimization function with the displacement of the two pictures relative to one another as parameter, the optimization function overlying the two pictures and masking the overlay such that in a determination of an extreme value of the optimization function a contribution is made only by the region of the overlay that corresponds to the second structure or the part thereof, d) ascertaining the extreme value of the optimization function and determining the optimal value of the displacement based on the extreme value of the optimization function, and e) determining the position of the first structure relative to the second structure or a part thereof with the optimal displacement value ascertained in step d).
摘要翻译：提供了一种用于确定第一结构（8a）相对于第二结构（8b）或其一部分的位置的方法，所述方法具有以下步骤：a）提供具有多个像素的第一图像（F1）和其包括第一结构，b）提供具有多个像素并且包含第二结构的第二图像（F2），c）形成具有两个图像相对于彼此的位移的优化函数作为参数，优化函数覆盖两幅图像并掩盖覆盖层，使得在确定最优化函数的极值时，仅通过对应于第二结构或其部分的覆盖区域进行贡献，d）确定最优值优化函数，并基于优化函数的极值确定位移的最优值，以及e）确定第一结构rel的位置具有在步骤d）中确定的最佳位移值的第二结构或其一部分。

29. 发明申请

US20100254611A1 METHOD AND DEVICE FOR DETERMINING THE POSITION OF AN EDGE OF A MARKER STRUCTURE WITH SUBPIXEL ACCURACY IN AN IMAGE, HAVING A PLURALITY OF PIXELS, OF THE MARKER STRUCTURE 有权
标题翻译：用于确定标记结构边缘的位置的方法和装置，具有标记结构的像素的多重图像中的SUBPIXEL精度
公开(公告)号：US20100254611A1
公开(公告)日：2010-10-07
申请号：US12749938
申请日：2010-03-30
申请人： Michael Arnz
发明人： Michael Arnz
IPC分类号： G06K9/48
CPC分类号： G03F9/7092 , G03F9/7088
摘要： The position of an edge of a marker structure in an image of the marker structure is determined with subpixel accuracy. A discrete intensity profile of the edge, having profile pixels, is derived from the image pixels, and a continuous profile function of the edge is determined based on the profile pixels. Profile pixels whose intensity values are near an intensity threshold value are selected as evaluation pixels. Based on the evaluation pixels, a curve of continuous intensity is calculated. A position coordinate at which the intensity value of the continuous intensity curve matches the threshold value is selected as a first position coordinate, and the distance is determined between the first position coordinate and the position coordinate of the evaluation pixel that, from among the evaluation pixels previously selected, has the closest intensity value to the threshold value. The determined distance is compared to a predetermined threshold, and if the distance is greater than the threshold, a shift is effected, and the process iteratively performs the steps of selects the adjacent profile pixels, calculates the curve of continuous intensity, and so forth. If the distance is not greater than the threshold, the position of the edge in the captured image is determined with subpixel accuracy from all the distances determined in step g).
摘要翻译：用子像素精度确定标记结构的图像边缘的位置。从图像像素导出具有轮廓像素的边缘的离散强度分布，并且基于轮廓像素确定边缘的连续轮廓函数。选择其强度值接近强度阈值的轮廓像素作为评估像素。基于评估像素，计算连续强度的曲线。选择连续强度曲线的强度值与阈值相匹配的位置坐标作为第一位置坐标，并且在评估像素的第一位置坐标和位置坐标之间确定距离，从评估像素先前选择的，具有与阈值最接近的强度值。将确定的距离与预定阈值进行比较，并且如果距离大于阈值，则进行移位，并且处理迭代地执行选择相邻轮廓像素，计算连续强度的曲线等的步骤。如果距离不大于阈值，则从步骤g）中确定的所有距离的子像素精度确定拍摄图像中边缘的位置。

30. 发明申请

US20100241384A1 METHOD FOR CALIBRATING A SPECIMEN STAGE OF A METROLOGY SYSTEM AND METROLOGY SYSTEM COMPRISING A SPECIMEN STAGE 有权
标题翻译：用于校准包含样本阶段的计量系统和计量系统的样本阶段的方法
公开(公告)号：US20100241384A1
公开(公告)日：2010-09-23
申请号：US12726908
申请日：2010-03-18
申请人： Alexander Huebel , Matthias Manger , Gerd Klose , Uwe Schellhorn , Michael Arnz
发明人： Alexander Huebel , Matthias Manger , Gerd Klose , Uwe Schellhorn , Michael Arnz
IPC分类号： G06F19/00
CPC分类号： G01B11/03 , G01B21/042
摘要： A method for calibrating a specimen stage of a metrology system is provided, in which a specimen that has multiple marks is positioned successively in different calibration positions, each mark is positioned in the photography range of an optical system by means of the specimen stage in each calibration position of the specimen, and the mark position is measured using the optical system. A model is set up that describes positioning errors of the specimen stage using a system of functions having calibration parameters to be determined. The model takes into consideration at least one systematic measurement error that occurs during the measurement of the mark positions. The values of the calibration parameters are determined based on the model with consideration of the measured mark positions.
摘要翻译：提供了一种用于校准测量系统的样本台的方法，其中具有多个标记的样本连续地位于不同的校准位置，每个标记通过每个标记的样本台位于光学系统的摄影范围内使用光学系统测量样品的校准位置和标记位置。使用具有要确定的校准参数的函数系统来设置描述样本台的定位误差的模型。该模型考虑了在测量标记位置期间发生的至少一个系统测量误差。考虑到测量的标记位置，基于模型确定校准参数的值。

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