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21. 发明申请

US20110042874A1 OBJECT PROCESSING APPARATUS, EXPOSURE APPARATUS AND EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：对象处理装置，曝光装置和曝光方法及装置制造方法
公开(公告)号：US20110042874A1
公开(公告)日：2011-02-24
申请号：US12855283
申请日：2010-08-12
申请人： Yasuo AOKI , Tomohide HAMADA , Hiroshi SHIRASU , Manabu TOGUCHI
发明人： Yasuo AOKI , Tomohide HAMADA , Hiroshi SHIRASU , Manabu TOGUCHI
IPC分类号： B23Q3/00 , B23Q7/00
CPC分类号： G03F7/70716 , B65G49/065 , B65G2249/04 , G03F7/70791 , G03F7/70816 , H01L21/68 , H01L21/6838 , Y10T29/49998
摘要： A plurality of air levitation units that jet air to the lower surface of a substrate are placed below the substrate, and the substrate is supported in a noncontact manner so as to be substantially horizontal. Further, a portion subject to exposure of the substrate is held by a fixed-point stage from below in a noncontact manner, and the surface position of the portion subject to exposure is adjusted in a pinpoint manner. Accordingly, exposure can be performed on the substrate with high precision, and a configuration of a substrate stage device can be simplified.
摘要翻译：将空气喷射到基板的下表面的多个空气悬浮单元放置在基板的下方，并且以非接触的方式支撑基板以使其基本上水平。此外，由基板曝光的部分以非接触方式从下方被定点台保持，并且以精确的方式调整曝光部分的表面位置。因此，能够高精度地对基板进行曝光，能够简化基板台装置的结构。

22. 发明申请

US20100018950A1 MOVABLE BODY APPARATUS, PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD, DEVICE MANUFACTURING METHOD, MANUFACTURING METHOD OF MOVABLE BODY APPARATUS, AND MOVABLE BODY DRIVE METHOD 有权
标题翻译：可移动身体装置，图案形成装置和图案形成方法，装置制造方法，可移动身体装置的制造方法和可动身体驱动方法
公开(公告)号：US20100018950A1
公开(公告)日：2010-01-28
申请号：US12553549
申请日：2009-09-03
申请人： Yasuo AOKI , Hiroshi SHIRASU , Yoshihiko KUDO
发明人： Yasuo AOKI , Hiroshi SHIRASU , Yoshihiko KUDO
IPC分类号： B44C1/22 , C23F1/08
CPC分类号： G03F7/70758 , G03F7/70716 , G03F7/70791 , H01L21/682
摘要： A substrate stage and an empty-weight canceling mechanism that supports an empty weight of the substrate stage are made up of separate bodies. Accordingly, the size and weight of the substrate stage (a structure including the substrate stage) can be reduced, compared with the case where the substrate stage and the empty-weight canceling mechanism are integrally configured. Further, due to movement of an X coarse movement stage and a Y coarse movement stage by an X drive mechanism and a Y drive mechanism, the substrate stage is driven in an XY plane and also the empty-weight canceling mechanism that supports the empty weight of the substrate stage is driven. With this operation, the substrate stage can be driven without difficulty even when the substrate stage and the empty-weight canceling mechanism are configured of separate bodies.
摘要翻译：支撑衬底台的空重量的衬底台和空重量消除机构由分离的主体构成。因此，与基板台和空重重量抵消机构一体构成的情况相比，能够减小基板台（包括基板载台的结构）的尺寸和重量。此外，由于通过X驱动机构和Y驱动机构的X粗移动台和Y粗移动台的移动，基板台在XY平面中被驱动，并且还支撑空重量的空重量抵消机构的衬底台被驱动。通过该操作，即使基板台和空重量抵消机构由分离的主体构成，也能够无困难地驱动基板台。

23. 发明授权

US07372543B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
公开(公告)号：US07372543B2
公开(公告)日：2008-05-13
申请号：US11471658
申请日：2006-06-21
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B27/32 , G03B27/54 , G03B27/44
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus includes a plurality of projection optical systems, each of which has optical elements arranged in an optical path between a first surface and a second surface and forms a radiation pattern from the first surface onto an exposure field on the second surface via the optical elements. The apparatus also includes a movable portion disposed in the side of the second surface with respect to the plurality of projection optical systems, which holds an object to be moved relative to the exposure field in a first direction during a scanning exposure of the object with the radiation patterns. Each of the plurality of projection optical systems is telecentric on the side of the second surface, and the exposure fields are arranged at different positions in a second direction crossing the first direction.

24. 发明授权

US06795169B2 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus 失效
标题翻译：曝光装置，光学投影装置和调整光学投影装置的方法
公开(公告)号：US06795169B2
公开(公告)日：2004-09-21
申请号：US10382874
申请日：2003-03-07
申请人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masashi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B2742
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure apparatus having a plurality of projection optical systems where each of the projection optical systems projects a predetermined pattern onto a substrate and forms an exposure field on the substrate. The exposure apparatus also includes a substrate stage which holds the substrate and which moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction, and the projection optical systems and the substrate relatively move during a pattern projecting operation along the scanning direction.
摘要翻译：一种具有多个投影光学系统的曝光装置，其中每个投影光学系统将预定图案投影到基板上并在基板上形成曝光场。曝光装置还包括保持基板并沿至少沿直线延伸的扫描方向移动的基板台。多个曝光区域沿着与扫描方向交叉的方向排列，并且投影光学系统和基板沿着扫描方向在图案投影操作期间相对移动。

25. 发明授权

US06351305B1 Exposure apparatus and exposure method for transferring pattern onto a substrate 失效
标题翻译：用于将图案转印到基板上的曝光装置和曝光方法
公开(公告)号：US06351305B1
公开(公告)日：2002-02-26
申请号：US09173530
申请日：1998-10-15
申请人： Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
发明人： Masahi Tanaka , Masato Kumazawa , Kinya Kato , Masaki Kato , Hiroshi Chiba , Hiroshi Shirasu
IPC分类号： G03B2732
CPC分类号： G02B17/0892 , G02B13/22 , G02B17/002 , G02B17/008 , G02B17/045 , G02B17/0605 , G02B17/08 , G02B17/0812 , G02B17/082 , G02B17/0828 , G02B17/086 , G02B27/144 , G02B27/145 , G03B27/32 , G03F7/70066 , G03F7/70216 , G03F7/70225 , G03F7/70241 , G03F7/70275 , G03F7/70358 , G03F7/70791
摘要： An exposure method includes first through third steps. In the first step, respective first and second illumination regions of a mask having a predetermined pattern are illuminated with an illumination light having a predetermined wavelength. In the second step, an image of the mask is formed, respectively, in first and second exposure regions (formed on a substrate) based on the illumination that passes through the first and second illumination regions. The first and second exposure regions each have a substantially polygonal shape defined by two parallel sides and two sides other than the two parallel sides. In the third step, the first and second exposure regions and the substrate are moved relatively in a first direction such that the first and second exposure regions are formed in different positions in a second direction which crosses the first direction.
摘要翻译：曝光方法包括第一至第三步骤。在第一步骤中，用具有预定波长的照明光照射具有预定图案的掩模的相应的第一和第二照明区域。在第二步骤中，基于通过第一和第二照明区域的照明，分别在第一和第二曝光区域（形成在基板上）形成掩模的图像。第一曝光区域和第二曝光区域各自具有由两个平行侧和除了两个平行侧之外的两个侧面限定的大致多边形形状。在第三步骤中，第一和第二曝光区域和衬底相对于第一方向移动，使得第一和第二曝光区域在与第一方向交叉的第二方向上形成在不同的位置。

26. 发明授权

US5760881A Exposure apparatus with light shielding portion for plotosensitive elements 失效
标题翻译：具有光敏元件遮光部分的曝光装置
公开(公告)号：US5760881A
公开(公告)日：1998-06-02
申请号：US540458
申请日：1995-10-10
申请人： Seiji Miyazaki , Kei Nara , Hiroshi Shirasu , Tsuyoshi Narabe
发明人： Seiji Miyazaki , Kei Nara , Hiroshi Shirasu , Tsuyoshi Narabe
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70216 , G03F7/70358 , G03F9/70
摘要： An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.
摘要翻译：一种曝光装置，具有照明光学系统，用于将来自光源的光束照射到掩模的图案区域，用于通过通过掩模的光束将图案区域的图像转印到感光基板上，具有多个设置在彼此对应的位置处的掩模和感光基板上的第一参考标记和第二参考标记的集合，以及用于屏蔽朝向第二参考标记辐射的光束的遮光装置，由此可以重新 - 通过防止掩模上的第一参考标记叠加在感光基板上的第二参考标记上或者被转印到靠近第二参考标记的部分上，从而在后处理中使用第二参考标记。

27. 发明授权

US5581075A Multi-beam scanning projection exposure apparatus and method with beam monitoring and control for uniform exposure of large area 失效
标题翻译：多光束扫描投影曝光装置和方法，具有大面积均匀曝光的光束监视和控制
公开(公告)号：US5581075A
公开(公告)日：1996-12-03
申请号：US446509
申请日：1995-05-22
申请人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
发明人： Tsuyoshi Naraki , Masamitsu Yanagihara , Hiroshi Shirasu , Tomohide Hamada , Tetsuo Kikuchi , Noriaki Yamamoto
IPC分类号： G03F7/20 , G01J1/32
CPC分类号： G03F7/7005 , G03F7/70091 , G03F7/70275 , G03F7/70358 , G03F7/70475 , G03F7/70791
摘要： An exposure apparatus comprises a plurality of illumination optical systems for generating a plurality of light beams, a plurality of projection optical systems disposed corresponding to the plurality of illumination optical systems, respectively, a plurality of light intensity detectors, provided respectively for the plurality of illumination optical systems, for detecting individual intensities of the plurality of light beams, a light intensity changing device for changing the respective intensities of the plurality of light beams, and a control device for controlling the light intensity changing device and uniformizing the intensities of the plurality of light beams to a substantially fixed level.
摘要翻译：曝光装置包括多个用于产生多个光束的照明光学系统，分别对应于多个照明光学系统设置的多个投影光学系统，分别为多个照明设置的多个光强度检测器用于检测多个光束的各个强度的光学系统，用于改变多个光束的各个强度的光强度改变装置，以及用于控制光强度改变装置的控制装置，并且使多个光束的强度均匀化光束达到基本上固定的水平。

28. 发明授权

US4368383A System for focus detection utilizing a photoelectric sensor array 失效
标题翻译：利用光电传感器阵列进行焦点检测的系统
公开(公告)号：US4368383A
公开(公告)日：1983-01-11
申请号：US294724
申请日：1981-08-20
申请人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
发明人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
IPC分类号： G03B3/10 , G01J1/16 , G03B3/00
CPC分类号： G03B3/10
摘要： A light measuring device capable of amplifying the difference of the time-sequential pulse output signals from the photoelectric sensor array regardless of the magnitude of said pulse output signals, comprises optical system means; means comprising a photoelectric sensor array having a plurality of photoelectric sensors for receiving the light passing through said optical system means and generating electric signals respectively corresponding to the intensity of light received by said photoelectric sensors as time-sequential signals of a determined interval; means for generating a comparison signal of a determined magnitude related to the output level of said electric signals; and processing means adapted to receive said electric signals and said comparison signal to generate output signals related to the difference of said signals in a sequential manner.
摘要翻译：能够放大来自光电传感器阵列的时序脉冲输出信号的差异而不管所述脉冲输出信号的幅度的光测量装置包括光学系统装置; 包括具有多个光电传感器的光电传感器阵列的装置，所述光电传感器用于接收通过所述光学系统装置的光，并且产生分别对应于由所述光电传感器接收的光的强度的电信号作为确定间隔的时间序列信号; 用于产生与所述电信号的输出电平有关的确定幅度的比较信号的装置; 以及适于接收所述电信号和所述比较信号的处理装置，以顺序方式产生与所述信号的差相关的输出信号。

29. 发明授权

US4339665A Apparatus for detecting displacement of optical image 失效
标题翻译：用于检测光学图像位移的装置
公开(公告)号：US4339665A
公开(公告)日：1982-07-13
申请号：US123211
申请日：1980-02-21
申请人： Ken Utagawa , Hiroshi Shirasu
发明人： Ken Utagawa , Hiroshi Shirasu
IPC分类号： G01D5/26 , G01B11/00 , G01C15/00 , G02B7/36 , H01J40/14
CPC分类号： G02B7/36
摘要： Apparatus for detecting displacement of optical image is disclosed which comprises a photosensitive element array, a first circuit, a second circuit and a phase difference measuring circuit. The photosensitive element array is composed of a number of photosensitive elements disposed on and near the focal plane of an image forming optical system through which an optical image is formed. The first circuit multiplies the electric outputs from photosensitive elements in the array by vectors whose phases sequentially increase or decrease, and then adds the products together to form an added output. The second circuit multiplies the electric outputs from photosensitive elements slightly shifted from the above elements in the same array, and then adds the products together to form a second added output. The difference in phase between the first and second added outputs is measured by the phase difference measuring circuit.
摘要翻译：公开了一种用于检测光学图像位移的装置，其包括光敏元件阵列，第一电路，第二电路和相位差测量电路。感光元件阵列由设置在形成光学图像的图像形成光学系统的焦平面上和附近的许多感光元件组成。第一个电路通过相位顺序增加或减小的矢量将阵列中的光敏元件的电输出相乘，然后将产品相加在一起形成一个附加的输出。第二电路将来自与上述元件稍微偏移的光敏元件的电输出相乘在同一阵列中，然后将产品相加在一起形成第二个附加输出。第一和第二相加输出之间的相位差由相位差测量电路测量。

30. 发明授权

US4291224A Light image space frequency component extracting device 失效
标题翻译：光图像空间频率分量提取装置
公开(公告)号：US4291224A
公开(公告)日：1981-09-22
申请号：US98153
申请日：1979-11-28
申请人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
发明人： Hiroshi Shirasu , Akira Ogasawara , Ken Utagawa
IPC分类号： G01J1/42 , G02B7/36 , G02B27/40 , G02B27/46
CPC分类号： G02B7/365 , G02B27/40
摘要： This invention discloses a device for extracting the space frequency component of an image formed by an optical system. The device comprises means having a photoelectric element array including a plurality of photoelectric elements on which said image is projected and time-sequentially generating, at a predetermined period, a pulse output having a magnitude corresponding to the intensity of light received by each of the photoelectric elements, means for successively storing the respective pulse outputs, means for converting each of the stored pulse outputs into an AC signal, and means for adding together the AC signals and producing the same.
摘要翻译：本发明公开了一种用于提取由光学系统形成的图像的空间频率分量的装置。该装置包括具有光电元件阵列的装置，该光电元件阵列包括多个光电元件，在该多个光电元件上投影所述图像并且以预定周期时间顺序地产生具有对应于由光电元件，用于连续存储各个脉冲输出的装置，用于将每个存储的脉冲输出转换为AC信号的装置，以及用于将AC信号相加并产生该装置的装置。

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