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21. 发明申请

WO2009022184A3 LOW IMPEDANCE PLASMA 审中-公开
标题翻译：低阻抗等离子体
公开(公告)号：WO2009022184A3
公开(公告)日：2009-04-09
申请号：PCT/GB2008050709
申请日：2008-08-14
申请人： GENCOA LTD , BELLIDO-GONZALEZ VICTOR
发明人： BELLIDO-GONZALEZ VICTOR
IPC分类号： H01J37/34
CPC分类号： H01J37/3405 , H01J37/3452
摘要： A magnetron sputtering apparatus (100) comprising: a magnetic array arranged to create a magnetic field (103) in the vicinity of a tubular target (2) which target at least partially surrounds the magnetic array and acts as a cathode (2a); an anode (2b); the magnetic array being arranged to create an asymmetric plasma distribution with respect to the normal angle of incidence to a substrate (3); and means (1b) for enhancing the magnetic field to produce a relatively low impedance path for electrons flowing from the cathode (2a) to the anode (2b).
摘要翻译：磁控管溅射装置（100）包括：磁性阵列，被布置成在管状靶（2）附近产生磁场（103），所述磁场靶至少部分地围绕所述磁阵列并用作阴极（2a）; 阳极（2b）; 磁性阵列被布置成相对于基板（3）的法向入射角产生不对称等离子体分布; 以及用于增强磁场以产生从阴极（2a）流到阳极（2b）的电子的相对低阻抗路径的装置（1b）。

22. 发明申请

US20180261428A1 ION SOURCE SPUTTERING 审中-公开
公开(公告)号：US20180261428A1
公开(公告)日：2018-09-13
申请号：US15759966
申请日：2016-10-11
申请人： GENCOA LTD
发明人： Victor Bellido-Gonzalez
IPC分类号： H01J37/32 , H01J37/34
CPC分类号： H01J37/32027 , H01J37/32045 , H01J37/32422 , H01J37/32568 , H01J37/342 , H01J37/3438 , H01J37/3444
摘要： An ion source comprising: an electrode; a counter electrode; means for generating an electrical potential between the electrode and counter-electrode; one or more magnets arranged, in use, to confine a plasma generated around the electrode upon application of the said electrical potential; and an aperture in the counter-electrode through which ions from the said plasma can escape; characterized in that: the means for generating an electrical potential between the electrode and counter electrode comprises a DC signal generator that is: electrically connected to the electrode and the counter-electrode; adapted, in use, to apply a baseline DC potential to the electrode and the counter-electrode with the DC potential at the electrode being positive relative to the DC potential at the counter electrode; and adapted, in use, to apply a sequence of DC pulses superimposed onto the baseline DC potential.

23. 发明申请

US20160050916A1 BIO CONTROL ACTIVITY SURFACE 审中-公开
标题翻译：生物控制活动表面
公开(公告)号：US20160050916A1
公开(公告)日：2016-02-25
申请号：US14888242
申请日：2014-04-01
申请人： GENCOA LTD
发明人： Victor BELLIDO-GONZALEZ , Dermot Patrick MONAGHAN
IPC分类号： A01N25/34 , A01N59/20 , C23C14/35 , A61L31/16 , C23C16/56 , C23C14/58 , A01N59/16 , A01N59/00
CPC分类号： A01N25/34 , A01N59/00 , A01N59/16 , A01N59/20 , A61L31/16 , A61L2300/404 , B82Y5/00 , C23C14/35 , C23C14/5826 , C23C14/584 , C23C14/5846 , C23C14/5873 , C23C16/56 , A01N25/12
摘要： A bio control surface (100) comprising a substrate (5) and a first plurality of discrete, spaced-apart particles (1) disposed on the substrate (5) and a second plurality of discrete, spaced-apart particles (6) disposed on the substrate (5), wherein the first (1) and second (6) pluralities of discrete, spaced-apart particles are formed from species having different chemical and/or electrical properties. An intermediate layer (4) may be interposed between the particles (1, 6) and the substrate (5). The bio control surface (100) can be activated by exposure to particular conditions, which cause the first (1) and second (6) pluralities of particles to adopt different potentials (+, −), such that flow of charge, heat, ions etc. can be used to neutralise or kill bacteria or microorganisms resident on the surface (100).
摘要翻译：生物控制表面（100），包括基底（5）和设置在基底（5）上的第一多个离散的间隔开的颗粒（1）和第二多个离散的间隔开的颗粒（6）所述基板（5），其中所述第一（1）和第二（6）多个离散的间隔开的颗粒由具有不同化学和/或电特性的物质形成。中间层（4）可以介于颗粒（1,6）和基底（5）之间。可以通过暴露于特定条件来激活生物控制表面（100），这导致第一（1）和第二（6）个颗粒采用不同的电位（+， - ），使得电荷，热，离子等等可用于中和或杀死驻留在表面上的细菌或微生物（100）。

24. 发明申请

US20150008120A1 IN-VACUUM ROTATIONAL DEVICE 有权
标题翻译：真空旋转装置
公开(公告)号：US20150008120A1
公开(公告)日：2015-01-08
申请号：US14372003
申请日：2013-01-14
申请人： Gencoa Ltd.
发明人： Jonathan Price
IPC分类号： H01J37/34
CPC分类号： H01J37/3405 , C23C14/3407 , H01J37/342 , H01J37/3435
摘要： This invention relates to the in-vacuum rotational device on a cylindrical magnetron sputtering source where the target or target elements of the target construction of such device are enabled to rotate without the need of a vacuum to atmosphere or vacuum to coolant dynamic seal. This invention relates to the use of the device in vacuum plasma technology where a plasma discharge, or any other appropriate source of energy such as arcs, laser, which can be applied to the target or in its vicinity would produce suitable coating deposition or plasma treatment on components of different nature. This invention also relates but not exclusively to the use of the device in sputtering, magnetron sputtering, arc, plasma polymerisation, laser ablation and plasma etching. This invention also relates to the use of such devices and control during non-reactive and reactive processes, with or without feedback plasma process control. This invention also relates to the arrangement of these devices as a singularity or a plurality of units. This invention also relates to the target construction which can be used in such device. This invention also relates to the use of these devices in different power modes such as DC, DC pulsed, RF, AC, AC dual, HIPIMS, or any other powering mode in order to generate a plasma, such as sputtering plasma, plasma arc, electron beam evaporation, plasma polymerization plasma, plasma treatment or any other plasma generated for the purpose of a process, for example, and not exclusively, as deposition process or surface treatment process, etc.
摘要翻译：本发明涉及圆柱形磁控溅射源上的真空内旋转装置，其中这种装置的目标结构的目标元件能够转动而不需要真空至大气或真空到冷却剂动态密封。本发明涉及该装置在真空等离子体技术中的应用，其中等离子体放电或任何其它适当的能量源（例如弧，激光）可以施加到靶或其附近将产生合适的涂层沉积或等离子体处理对不同性质的成分。本发明还涉及但不限于在溅射，磁控溅射，电弧，等离子体聚合，激光烧蚀和等离子体蚀刻中使用该装置。本发明还涉及在具有或不具有反馈等离子体过程控制的非反应性和反应性过程中这种装置的使用和控制。本发明还涉及这些装置作为奇点或多个单元的布置。本发明还涉及可用于这种装置中的目标结构。本发明还涉及这些器件在诸如DC，DC脉冲，RF，AC，AC双重，HIPIMS或任何其它供电模式的不同功率模式中的用途，以便产生等离子体，例如溅射等离子体，等离子弧，电子束蒸发，等离子体聚合等离子体，等离子体处理或为了工艺目的而产生的任何其他等离子体，例如但不限于沉积工艺或表面处理工艺等。

25. 发明专利

GB201802848D0 Plasma monitoring system 未知
公开(公告)号：GB201802848D0
公开(公告)日：2018-04-11
申请号：GB201802848
申请日：2018-02-22
申请人： GENCOA LTD

26. 发明专利

GB2501345B In-Vacuum rotational device 未知
公开(公告)号：GB2501345B
公开(公告)日：2016-06-22
申请号：GB201300607
申请日：2013-01-14
申请人： GENCOA LTD
发明人： JONATHAN PRICE
IPC分类号： H01J37/34

27. 发明专利

GB201605162D0 Ion enhanced deposition 未知
公开(公告)号：GB201605162D0
公开(公告)日：2016-05-11
申请号：GB201605162
申请日：2016-03-28
申请人： GENCOA LTD AND NANO4ENERGY SLNE

28. 发明专利

GB201306385D0 In-vacuum rotational device-ll 未知
公开(公告)号：GB201306385D0
公开(公告)日：2013-05-22
申请号：GB201306385
申请日：2013-04-09
申请人： GENCOA LTD

29. 发明专利

GB201305528D0 Biocide surface 未知
公开(公告)号：GB201305528D0
公开(公告)日：2013-05-08
申请号：GB201305528
申请日：2013-03-26
申请人： GENCOA LTD

30. 发明专利

GB0816740D0 Uniformity control on a plasma source 未知
公开(公告)号：GB0816740D0
公开(公告)日：2008-10-22
申请号：GB0816740
申请日：2008-09-12
申请人： GENCOA LTD

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