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21. 发明申请

WO2007024693A2 IP-ENHANCED CELLULAR SERVICES 审中-公开
标题翻译： IP增强细胞服务
公开(公告)号：WO2007024693A2
公开(公告)日：2007-03-01
申请号：PCT/US2006/032334
申请日：2006-08-17
申请人： NET2PHONE, INC.
发明人： MAYER, Daniel, J. , STANIFORTH, Alan, V.
IPC分类号： H04Q7/20 , H04M1/00
CPC分类号： H04W48/18 , H04M1/2535 , H04M1/72502 , H04W76/10 , H04W88/16 , H04W92/02
摘要： A portable, multimedia terminal adapter cellular (MTAC) has input/outputs for a cellular phone, a PSTN, a cellular network, an IP network and a telephone, which may be integrated. The MTAC has a Digital Subscriber Line (DSL) adapted for connection to both the IP network and the PSTN, and connects signaling, media and DC power with the cellular phone. A service platform determines operative presence of the cellular phone. Transcoding between the cellular network and the IP network is performed only by a codec of the cellular phone. The MTAC bridges the PSTN and the cellular phone without gateway functionality, and has gateway functionality that bridges the IP network and the cellular phone without transcoding. The service platform proxies fetch information from databases and in response to signaling at the initiation stage of a communication session, estimates a cost comparison of a communication session traversing each of two paths, respectively through an IP network and a cellular network; and in response to a choice based upon the cost comparison, signals the setting up of the communication session through the network of the choice.
摘要翻译：便携式多媒体终端适配器蜂窝（MTAC）具有可以被集成的蜂窝电话，PSTN，蜂窝网络，IP网络和电话的输入/输出。 MTAC具有适于连接到IP网络和PSTN的数字用户线路（DSL），并且与蜂窝电话连接信令，媒体和直流电力。服务平台确定蜂窝电话的操作存在。蜂窝网络和IP网络之间的转码仅由蜂窝电话的编解码器进行。 MTAC桥接PSTN和蜂窝电话而无需网关功能，并具有网桥功能，可桥接IP网络和蜂窝电话而无需转码。服务平台代理从数据库提取信息并响应于在通信会话的发起阶段的信令，分别通过IP网络和蜂窝网络估计遍历两个路径中的每一个的通信会话的成本比较; 并且响应于基于成本比较的选择，通过所选择的网络来指示建立通信会话。

22. 发明申请

WO2006053122A2 SYSTEM AND METHOD OF UTILIZING A MACHINE READABLE MEDICAL MARKING FOR MANAGING SURGIGAL PROCEDURES 审中-公开
标题翻译：用于管理手术程序的机器可读医疗标记的系统和方法
公开(公告)号：WO2006053122A2
公开(公告)日：2006-05-18
申请号：PCT/US2005/040732
申请日：2005-11-10
申请人： INTERNATIONAL BARCODE CORPORATION , LUBOW, Allen
发明人： LUBOW, Allen
IPC分类号： G06F17/00 , G06K5/00
CPC分类号： G06K17/00 , A61B90/90 , A61B90/94 , A61B90/96 , G06F19/00 , G06F19/3481 , G06K19/06037 , G06K2017/009 , G06Q50/22 , G06Q50/24 , G16H40/20 , G16H40/63
摘要： The method and system include marking a surgery site (e.g., location of surgical incision) or a site of other medical action with a machine-readable medical marking (e.g., bar code or a dot pattern), which may be used in conjunction with (1) a scanner for reading the machine-readable medical marking and (2) a controller for controlling medical actions in response to the read machine-readable medical marking. The system and method ensure the validation of the surgical procedure, the patient awaiting the surgical procedure, and the site or location on the patient where the surgery is to be performed. Utilizing a scanning device for reading machine-readable medical markings, and a controller, there are additional means to check and double check the medical action before the actual medical action (e.g., surgery) is performed.
摘要翻译：该方法和系统包括用机器可读医学标记（例如，条形码或点图案）来标记手术部位（例如，手术切口的位置）或其他医疗行为的部位，其可以与（ 1）用于读取机器可读医疗标记的扫描器和（2）用于响应于所读取的机器可读医疗标记来控制医疗动作的控制器。系统和方法确保外科手术的验证，等待外科手术的患者以及要进行手术的患者的部位或位置。利用扫描装置读取机器可读医疗标记和控制器，在进行实际的医疗动作（例如手术）之前，还有另外的手段来检查和重复检查医疗行为。

23. 发明申请

WO2004003822A1 CONTROLLING A MATERIAL PROCESSING TOOL AND PERFORMANCE DATA 审中-公开
标题翻译：控制材料加工工具和性能数据
公开(公告)号：WO2004003822A1
公开(公告)日：2004-01-08
申请号：PCT/US2003/016239
申请日：2003-06-27
申请人： TOKYO ELECTRON LIMITED , LAM, Hieu, A. , YUE, Hongyu
发明人： LAM, Hieu, A. , YUE, Hongyu
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G05B2219/31443 , G05B2219/32366 , G05B2219/45031 , Y02P90/20 , Y02P90/26
摘要： According to an embodiment of the present invention, a material processing systeme (1) including a process tool (10) and a process performance control system (100). The process performance control system (100) includes a process performance controller (55) coupled to the process tool (10), where the process performance controller (55) includes a process performance prediction model (110), a process recipe correction filter (120), a process controller (130), and process performance model correction algorithm (150). The process performance prediction model (110) is configured to receive tool data from a plurality of sensors coupled to process tool (10) and to predict process performance data. The process recipe correction filter (120) is coupled to the process performance prediction model (110) and configured to receive predicted process performance data and generate a process recipe correction for run-to-run process control. The process controller (130) is coupled to the process recipe correction filter (120) and is configured to update a process recipe according to the process recipe correction.
摘要翻译：根据本发明的实施例，一种包括处理工具（10）和过程执行控制系统（100）的材料处理系统（1）。过程性能控制系统（100）包括耦合到处理工具（10）的过程性能控制器（55），其中过程性能控制器（55）包括过程性能预测模型（110），过程配方校正过滤器（120）），过程控制器（130）和过程执行模型校正算法（150）。过程性能预测模型（110）被配置为从耦合到过程工具（10）的多个传感器接收工具数据并且预测过程性能数据。过程配方校正滤波器（120）耦合到过程性能预测模型（110）并且被配置为接收预测的过程性能数据并且生成用于运行过程控制的过程配方校正。过程控制器（130）耦合到过程配方校正过滤器（120），并被配置为根据处理配方校正更新过程配方。

24. 发明申请

WO2003103821A1 AUGER WITH FORWARD ANGLED LEADING EDGE 审中-公开
标题翻译：具有前瞻性的领先优势
公开(公告)号：WO2003103821A1
公开(公告)日：2003-12-18
申请号：PCT/US2003/015401
申请日：2003-06-04
申请人： KUHN KNIGHT INC. , KNIGHT, William, S.
发明人： KNIGHT, William, S.
IPC分类号： B01F7/24
CPC分类号： B01F7/241 , A01K5/004 , B01F7/00208 , B01F13/0035 , B01F13/004 , B01F2013/108 , B01F2215/0008
摘要： An auger (34) for vertical mixers includes a forward angled leading edge (42). The leading edge (42) includes an inner portion (52), which may or may not be aligned with a radial line (56) extending from the axis of rotation (37) of the auger. The leading edge also includes an outer portion (54) adjacent to the inner portion (52), which is angled forward of the radial line (56) and extends forward of the inner portion (62).
摘要翻译：用于垂直混合器的螺旋推运器（34）包括前倾角前缘（42）。前缘（42）包括内部部分（52），内部部分（52）可以与从螺旋钻的旋转轴线（37）延伸的径向线（56）对准也可以不对齐。所述前缘还包括与所述内部部分（52）相邻的外部部分（54），所述外部部分（54）在所述径向线（56）的前方倾斜并在所述内部部分（62）的前方延伸。

25. 发明申请

WO2003102724A3 METHOD AND SYSTEM FOR DATA HANDLING, STORAGE AND MANIPULATION 审中-公开
公开(公告)号：WO2003102724A3
公开(公告)日：2003-12-11
申请号：PCT/US2003/014550
申请日：2003-05-28
申请人： TOKYO ELECTRON LIMITED , WILLIS, James
发明人： WILLIS, James
IPC分类号： H01L21/66
摘要： The present invention provides for an improved data collection system comprising a measurement device (50) and a controller (55), wherein the controller (55) provides at least one algorithm for data handling, storage and manipulation. The present invention further provides for an improved method of data handling, storage and manipulation comprising the steps of measuring a first set of data using a measurement device coupled to a process reactor (16), producing a first set of reduced data using a peak extraction algorithm executed on a controller coupled to the measurement device, wherein the first set of reduced data comprises a data volume equal to or less than a data volume of the first set of data. In an alternate embodiment of the present invention a first reduced data set and a second reduced data set can be determined, compared and correlated with a state of the plasma processing system (1). The state of the plasma processing system (1) can include an endpoint condition or a fault condition.

26. 发明申请

WO2003090267A1 METHOD FOR REMOVING PHOTORESIST AND ETCH RESIDUES 审中-公开
标题翻译：去除光刻胶和蚀刻残留物的方法
公开(公告)号：WO2003090267A1
公开(公告)日：2003-10-30
申请号：PCT/US2003/000031
申请日：2003-01-17
申请人： TOKYO ELECTRON LIMITED , BALASUBRAMANIAM, Vaidyanathan , HAGIWARA, Masaaki , NISHIMURA, Eiichi , INAZAWA, Kouichiro , HATAMURA, Yasunori
发明人： BALASUBRAMANIAM, Vaidyanathan , HAGIWARA, Masaaki , NISHIMURA, Eiichi , INAZAWA, Kouichiro , HATAMURA, Yasunori
IPC分类号： H01L21/302
CPC分类号： H01L21/76814 , G03F7/427 , H01L21/02063 , H01L21/31138
摘要： A method is provided for plasma ashing (120) to remove photoresist remnants (106) and etch residues (110) that are formed during preceding plasma etching of dielectric layers (104) . The ashing method uses a two-step plasma process involving an hydrogen-containing gas, where low or zero bias is applied to the substrate in the first cleaning step (120) to remove significant amount of photoresist remnants (106) and etch residues (110) from the substrate, in addition to etching and removing detrimental fluoro-carbon residues from the chamber surfaces. An increased bias is applied to the substrate in the second cleaning step (130) to remove the remains of the photoresist (106) and etch residues (110) from the substrate. The two-step process reduces the memory effect commonly observed in conventional one-step ashing processes. A method of endpoint detection can be used to monitor the ashing process.
摘要翻译：提供了一种用于等离子体灰化（120）以去除在介电层（104）的先前等离子体蚀刻期间形成的光致抗蚀剂残余物（106）和蚀刻残留物（110）的方法。灰化方法使用涉及含氢气体的两步等离子体工艺，其中在第一清洁步骤（120）中向基板施加低或零偏压以去除大量的光致抗蚀剂残余物（106）和蚀刻残余物（110）），除了蚀刻并从室表面去除有害的氟碳残余物。在第二清洗步骤（130）中对衬底施加增加的偏压以去除光致抗蚀剂（106）的残余物并从衬底蚀刻残余物（110）。两步法减少了常规一步灰化过程中常见的记忆效应。端点检测方法可用于监测灰化过程。

27. 发明申请

WO2003083911A1 A SYSTEM AND METHOD FOR DETERMINING THE STATE OF A FILM IN A PLASMA REACTOR USING AN ELECTRICAL PROPERTY 审中-公开
标题翻译：用于确定使用电气性能的等离子体反应器中的膜的状态的系统和方法
公开(公告)号：WO2003083911A1
公开(公告)日：2003-10-09
申请号：PCT/US2003/008679
申请日：2003-03-28
申请人： TOKYO ELECTRON LIMITED , DONOHUE, John
发明人： DONOHUE, John
IPC分类号： H01L21/00
CPC分类号： H01J37/32082 , H01J37/32935
摘要： The present invention describes a system and method for monitoring a material film within a plasma processing device. The plasma processing device comprises a plasma reactor formed by a reactor wall and an electrode, a RF generator to couple electrical energy to the electrode, an impedance match network to maximize the transfer of electrical energy from the RF generator to the plasma through the electrode, and an electrical measurement device for measuring an electrical property of the plasma processing device. The present invention further provides a method of monitoring the state of the wall film comprising the steps of energizing the electrode by coupling electrical energy from the RF generator through the impedance match network to the electrode and forming a plasma, measuring an electrical property between the RF generator and the electrode, and determining a state of the film on the reactor wall, wherein the determining includes correlating an electrical property with the state of the wall film. In addition, the present invention provides a method for determining a time for scheduling at least one of a cleaning process and a maintenance process for the plasma reactor when the state of the film exceeds a threshold value.
摘要翻译：本发明描述了一种用于监测等离子体处理装置内的材料膜的系统和方法。等离子体处理装置包括由反应器壁和电极形成的等离子体反应器，将电能耦合到电极的RF发生器，阻抗匹配网络，以最大化通过电极从RF发生器到等离子体的电能传递，以及用于测量等离子体处理装置的电性能的电气测量装置。本发明还提供一种监测壁膜状态的方法，包括以下步骤：通过将来自RF发生器的电能通过阻抗匹配网络耦合到电极并形成等离子体来激发电极，测量RF 发电机和电极，以及确定反应器壁上的膜的状态，其中确定包括将电性能与壁膜的状态相关联。此外，本发明提供了一种当薄膜的状态超过阈值时，确定用于调度等离子体电抗器的清洁处理和维护处理中的至少一个的时间的方法。

28. 发明申请

WO2003081216A3 PROCESS MONITORING USING INFRARED OPTICAL DIAGNOSTICS 审中-公开
公开(公告)号：WO2003081216A3
公开(公告)日：2003-10-02
申请号：PCT/US2003/006710
申请日：2003-03-17
申请人： TOKYO ELECTRON LIMITED , LUDVIKSSON, Audunn
发明人： LUDVIKSSON, Audunn
IPC分类号： G01N21/35
摘要： A method and apparatus for real-time monitoring of the substrate and the gaseous process environment in a semiconductor process step is described. The method uses infrared spectroscopy for in-situ analysis of gaseous molecular species in the process region (120) and characterization of adsorbed chemical species on a substrate (110). The process monitoring can be applied to endpoint- and fault detection in etching and deposition processes, and chamber cleaning and chamber condition steps.

29. 发明申请

WO2003065132A3 METHOD AND APPARATUS FOR PROCESS MONITORING AND CONTROL 审中-公开
公开(公告)号：WO2003065132A3
公开(公告)日：2003-08-07
申请号：PCT/US2003/000047
申请日：2003-01-28
申请人： TOKYO ELECTRON LIMITED , LUDVIKSSON, Audunn
发明人： LUDVIKSSON, Audunn
IPC分类号： H01L21/00
摘要： A method and apparatus for real-time monitoring of a gaseous environment during a semiconductor process (100). The method utilizes metastable electronic energy transfer to excite and ionize the chamber gaseous effluent (114) and correlates the fluorescence signals from the excited species and mass spectroscopy analysis of the ions generated with the process status (115), 160). In addition to the ability to produce excited species that fluoresce, the method has the ability to generate molecular ions from the labile compounds, reduce fragmentation and operate at higher pressures than conventional ionization methods.

30. 发明申请

WO2002071631A2 APPARATUS AND METHOD OF IMPROVING IMPEDANCE MATCHING BETWEEN AN RF SIGNAL AND A MULTI-SEGMENTED ELECTRODE 审中-公开
标题翻译：改善RF信号与多分辨电极之间的阻抗匹配的装置和方法
公开(公告)号：WO2002071631A2
公开(公告)日：2002-09-12
申请号：PCT/US2002/005588
申请日：2002-02-27
申请人： TOKYO ELECTRON LIMITED , JETVIC, Jovan , MITROVIC, Andrej
发明人： JETVIC, Jovan , MITROVIC, Andrej
IPC分类号： H04B
CPC分类号： H01J37/32082 , H01J37/32183
摘要： An apparatus and method of improving impedance matching between a RF signal and a multi-segmented electrode in a plasma reactor powered by the RF signal. The apparatus and method phase shifts the RF signal driving one or more electrode segment of the multi-segmented electrode, amplifies the RF signal, and matches an impedance of the RF signal with an impedance of the electrode segment, where the RF signal is modulated prior to matching of the impedance of the RF signal. The apparatus and method directionally couples an output of the matching of the impedance of the RF signal and the electrode segment, and adjusts the output of the matching of the impedance of the RF signal such that a directionally coupled output signal and a reference signal representing the RF signal at the output of the master RF oscillator produces a demodulated signal of minimal amplitude.
摘要翻译：一种改善由RF信号供电的等离子体反应器中的RF信号和多段电极之间的阻抗匹配的装置和方法。该装置和方法相位移动驱动多分段电极的一个或多个电极段的RF信号，放大RF信号，并将RF信号的阻抗与电极段的阻抗匹配，其中RF信号先前被调制以匹配RF信号的阻抗。该装置和方法定向耦合RF信号和电极段的阻抗匹配的输出，并且调整RF信号的阻抗匹配的输出，使得定向耦合的输出信号和表示在主RF振荡器的输出处的RF信号产生最小振幅的解调信号。

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